| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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| 09/18/2007 | US7270917 Forming a first hard mask layer over a substrate;forming an acid layer over the first hard mask layer;depositing a photoresist layer over the acid layer; patterning the photoresist layer to form a pattern; transferring the pattern to the first hard mask layer below the acid layer |
| 09/13/2007 | US20070212899 Photosensitive resin composition and method for manufacturing semiconductor apparatus using the same |
| 09/13/2007 | US20070212652 Method and system for enhanced lithographic alignment |
| 09/13/2007 | US20070212651 Method for forming recess on slider surface |
| 09/13/2007 | US20070212624 Method for determining an edge profile of a volume of a photoresist after a development process |
| 09/13/2007 | US20070212620 Mask data generation method and mask |
| 09/13/2007 | US20070212617 For exposure of semiconductor wafer with dipole illumination light; photoresists |
| 09/13/2007 | DE102006011140A1 Prozesskontrollstreifen und Verfahren zur Aufzeichnung Process control strip and method for recording |
| 09/12/2007 | CN100337158C Thermal developing appts. and thermal developing method and program |
| 09/11/2007 | US7269819 Method and apparatus for generating exposure data |
| 09/11/2007 | US7267935 Thermally developable materials stabilized with crown ethers |
| 09/11/2007 | US7267934 Development of an exposed photothermographic material using a developing device at a distance of 0-50 cm between an exposing section and a developing section at 100-140 degrees C. at a conveying rate of 20-200 mm/sec to obtain a maximum density of 4.0-5.0 of the developed photothermographic material |
| 09/11/2007 | US7267933 Image forming method using photothermographic material |
| 09/11/2007 | US7267932 Method for high resolution patterning using soft X-ray, process for preparing nano device using the same method |
| 09/11/2007 | US7267929 Producing barrier ribs for a pixel pattern from a mixture of an alkali-soluble photosensitive resin having acidic groups and at least three ethylenic double bonds per molecule; an ink repellent copolymer having fluoroalkyl groups; and a photopolymerization initiator |
| 09/11/2007 | US7267927 Method for fabricating semiconductor device and equipment for fabricating the same |
| 09/11/2007 | US7267912 Exposure mask and pattern exposure method |
| 09/11/2007 | US7267859 Thick porous anodic alumina films and nanowire arrays grown on a solid substrate |
| 09/06/2007 | US20070207536 Fluorescence biosensor |
| 09/06/2007 | US20070207415 Process for producing wiring circuit board |
| 09/06/2007 | US20070207414 Ink jet recording head and manufacturing method of the same |
| 09/06/2007 | US20070207394 Photomask is provided with the test pattern and an image of the pattern is obtained; edges of the image are determined and, therefrom, a set of edge position data are obtained; ddge position data are fitted to a straight line to determine edge position residuals; amplitude spectrum is calculated |
| 09/06/2007 | US20070207393 Photomask formation method, photomask, and semiconductor device fabrication method |
| 09/06/2007 | US20070207392 Manufacturing method of photo mask and manufacturing method of semiconductor device |
| 09/06/2007 | US20070207391 Multiple resist layer phase shift mask (PSM) blank and PSM formation method |
| 09/05/2007 | EP1521843B1 Method for chemiluminescent detection |
| 09/04/2007 | US7266802 Drawing apparatus and drawing method |
| 09/04/2007 | US7264920 Image forming layer containing photosensitive silver halide emulsions, nonphotosensitive organic silver compound, reducing agent and binder; medical imaging for diagnosis; high speed resolution |
| 09/04/2007 | US7264919 Mono-sheet heat-developable photosensitive material and method of forming image |
| 09/04/2007 | US7264909 Exposure parameters for all of the selected exposure patterns to be corrected include position, focal point, astigmatism, rotation, and magnification |
| 09/04/2007 | US7264908 Photo mask blank and photo mask |
| 09/04/2007 | US7264906 OPC based illumination optimization with mask error constraints |
| 09/04/2007 | US7264415 Methods of forming alternating phase shift masks having improved phase-shift tolerance |
| 09/04/2007 | US7264345 Liquid composition for ink jet, ink set for ink jet, and recording method and recording apparatus using the same |
| 08/30/2007 | US20070202448 Selenium-sensitized silver chloride content of 90 mole % or above; N-(o-oxyphenyl)-alpha-(cyclo)alkanoyl-alpha-1-cyclicimidoacetamide yellow dye-forming coupler; magenta and cyan dye-forming couplers; light-insensitive hydrophilic colloid layer |
| 08/30/2007 | US20070202447 Transport system in which a feed roller in contact with a bundle of stacked film sheets feeds the uppermost film sheet through rotation of the feed roller to expose and develop the sheet; back coating layer contains a matting resin and has center-line mean roughness of 50-120 nm |
| 08/30/2007 | US20070202444 Resist pattern forming method and apparatus |
| 08/30/2007 | US20070202418 Multi layer, attenuated phase shifting mask |
| 08/30/2007 | US20070201135 Optical element and method of manufacturing optical element |
| 08/28/2007 | US7262422 Use of supercritical fluid to dry wafer and clean lens in immersion lithography |
| 08/28/2007 | US7262001 Support with organic silver salt, silver halide, binder, and a reducing agent; roughness; high image density; storage stability, heat resistance |
| 08/28/2007 | US7262000 Photothermographic material and image forming method for the photothermographic material |
| 08/28/2007 | US7261999 Photothermographic materials containing post-processing stabilizers |
| 08/28/2007 | US7261997 Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings |
| 08/28/2007 | US7261985 Large feature-shift coma sensitivity is simulated for a range of illumination conditions, resulting source sensitivity data is modeled and a practical array of source shapes, each of which is optimized to eliminate the effects of transverse distortion due to third-order coma, is identified |
| 08/28/2007 | US7261984 Exposure pattern or mask and inspection method and manufacture method for the same |
| 08/28/2007 | US7261983 Reference wafer and process for manufacturing same |
| 08/28/2007 | US7261982 Utilizing photolithographic master and slave mask set; simple, low cost technique for correcting errors; adjusts to varying wafer positions |
| 08/28/2007 | US7261981 Generating simplified layout patterns from the predetermined main shapes of the mask, such layout patterns are generated by eliminating detail of the main shapes which leads to unmanufacturable associated shapes while preserving geometrically relevant shape information, associated shapes are generated |
| 08/23/2007 | WO2007030528A3 Photomask and method for forming a non-orthogonal feature on the same |
| 08/23/2007 | WO2005022600A3 Method and systems for processing overlay data |
| 08/23/2007 | US20070198964 Multi-dimensional analysis for predicting RET model accuracy |
| 08/23/2007 | US20070196776 Stable High Ph Developer |
| 08/23/2007 | US20070196775 Removing solution for photosensitive composition |
| 08/23/2007 | US20070196769 Methods of forming patterns in semiconductor devices using photo resist patterns |
| 08/23/2007 | US20070196747 Grid-based resist simulation |
| 08/23/2007 | US20070196746 Methods and apparatuses for applying wafer-alignment marks |
| 08/23/2007 | US20070196745 comprising a slit-shaped main transmission region and three pairs of slit-shaped auxiliary transmission regions; improving resolution, high light intensity contrast, narrow the exposed width of the resist film with a small uniform width |
| 08/23/2007 | US20070196744 Method for producing a mask for the lithographic projection of a pattern onto a substrate |
| 08/23/2007 | US20070196742 Mask-Patterns Including Intentional Breaks |
| 08/23/2007 | US20070196741 Phase Calibration for Attenuating Phase-Shift Masks |
| 08/23/2007 | US20070195937 Mount for image receiver |
| 08/23/2007 | DE10340611B4 Lithografiemaske zur Abbildung von konvexen Strukturen Lithography mask for imaging of convex structures |
| 08/22/2007 | EP1532484A4 Lithographic printing with polarized light |
| 08/22/2007 | EP1509404B1 Multilayer body with a layer having at least one laser-sensitive material |
| 08/22/2007 | CN101023393A Photosensitive material for silver halide color photograph |
| 08/21/2007 | US7258968 Thermally developable materials with buried conductive backside coatings |
| 08/21/2007 | US7258967 Photothermographic materials containing print stabilizers |
| 08/21/2007 | US7258966 Multilayer; radiation transparent substrate, overcoating with photoresists; masking; exposure; development |
| 08/16/2007 | US20070190465 Positively radiation-sensitive resin composition |
| 08/16/2007 | US20070190463 Method to align mask patterns |
| 08/16/2007 | US20070190461 Polycarbosilane substituted with a benzyl or diazo group and/or a polysilazane having a substituent capable of absorbing exposure light; high exposure light (particularly ultraviolet light) absorptivity, which efficiently blocks the exposure light that reaches porous insulating films |
| 08/16/2007 | US20070190438 Method and apparatus for controlling light intensity and for exposing a semiconductor substrate |
| 08/16/2007 | US20070190437 Substrate processing apparatus |
| 08/16/2007 | US20070190436 Resist composition |
| 08/16/2007 | US20070190434 Pattern forming method and phase shift mask manufacturing method |
| 08/16/2007 | US20070190432 uses the die area outside of traditionally focused reticle to fabricate components, instead of avoiding this area of reduced precision, uses this area to layout structures with features that are coarser than what can be achieved within high-resolution region of the reticle |
| 08/16/2007 | US20070190431 Photomask structure |
| 08/16/2007 | US20070189756 Grey card for controlling exposure and white balance of a digital camera |
| 08/15/2007 | EP1818719A1 Silver halide photographic material and image-forming method using the same |
| 08/14/2007 | US7256870 Method and apparatus for controlling iso-dense bias in lithography |
| 08/14/2007 | US7256667 Waveguide device and method for making same |
| 08/14/2007 | US7255982 Black-and-white, organic solvent based, containing especially phenylboronic acid or derivatives that provide the materials with reduced initial image Dmin and improved hot-dark Dmin print stability without unacceptable loss in sensitometric properties. |
| 08/14/2007 | US7255979 Lenticular printing |
| 08/14/2007 | US7255974 Pattern formation method |
| 08/14/2007 | US7255892 Chemically bonding a self-assembled molecular film to a surface of a substrate, self-assembled molecular film including defect site and active device molecules, forming a Langmuir-Blodgett (LB) film of a molecule on at least one of a water/solvent interface and an air/water interface, connecting |
| 08/09/2007 | US20070184393 Image Forming Method, Liquid Developer Developing Apparatus, and Image Forming Apparatus |
| 08/09/2007 | US20070184392 Coating and developing method, coating and developing system and storage medium |
| 08/09/2007 | US20070184389 Method of forming a printhead |
| 08/09/2007 | US20070184369 Lithography Verification Using Guard Bands |
| 08/09/2007 | US20070184368 Projection optical system and projection-type image display apparatus |
| 08/09/2007 | US20070184361 Photomask, pattern formation method using the same and mask data creation method |
| 08/09/2007 | US20070184360 Photomask features with interior nonprinting window using alternating phase shifting |
| 08/09/2007 | US20070184359 Photomask, pattern formation method using photomask and mask data creation method |
| 08/09/2007 | US20070184355 Cross-shaped sub-resolution assist feature |
| 08/08/2007 | EP1814955A1 Resin cured film for flexible printed wiring board and production process thereof |
| 08/08/2007 | CN101015042A Methods of removing photoresist on substrates |
| 08/07/2007 | US7254324 Systems and methods for film processing quality control |
| 08/07/2007 | US7252925 1-Alkoxy- or cycloalkoxy(poly)oxyethylenebenzimidazoles, e.g., 1-(2-methoxyethyl)-1H-benzimidazole, used to form amplified resists with excellent resolution, form precisely configured patterns with minimized roughness of sidewalls and useful in microfabrication using electron beams or deep-UV light. |
| 08/07/2007 | US7252913 Method for projection of a circuit pattern, which is arranged on a mask, onto a semiconductor wafer |