G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents

Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726)
11/2006
11/23/2006	US20060261296 Mobile radiography image recording system
11/22/2006	EP1521843A4 Method for chemiluminescent detection
11/21/2006	US7139064 Optical system for providing a hexapole illumination and method of forming a photoresist pattern on a substrate using the same
11/21/2006	US7138225 Silver salt photothermographic dry imaging material
11/21/2006	US7138224 Squarylium compound and photothermographic material containing the same
11/21/2006	US7138221 Photothermographic material containing a transparent support, and a photosensitive layer of a photosensitive silver halide, a photostable silver behenate and polyvinyl butyral binder with a glass transition temperature of 45 degree C or more
11/16/2006	US20060257798 Alkaline developer for radiation sensitive compositions
11/16/2006	US20060257792 Three dimensional topologies without multiple photolithography layers; mono-molecular layer enables very high spatial resolution; azomonochlorosilane initiator layer; radiating to selectively reduce density, polymerized monomers as a mask; miniature steps, slopes or surface variations; semiconductors
11/16/2006	US20060257779 Stimulable phosphor screens or panels and manufacturing control thereof
11/16/2006	US20060257757 Methods for converting reticle configurations
11/16/2006	US20060257756 Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device
11/16/2006	US20060257754 Pellicles having low adhesive residue
11/16/2006	US20060257753 Photomask and method thereof
11/16/2006	US20060257750 Reticle alignment and overlay for multiple reticle process
11/16/2006	US20060257749 Method for reducing critical dimension
11/16/2006	US20060256926 X-ray diagnosis apparatus
11/16/2006	US20060256136 Compositing two-dimensional and three-dimensional image layers
11/15/2006	EP1721215A1 Method for the production of masks used in photolithography, and use of such masks
11/14/2006	US7135277 Image forming layer of a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder; high sensitivity for medical images used in making diagnoses, and high recording speeds
11/14/2006	US7135276 Photothermographic material and method for preparing photosensitive silver halide emulsion
11/14/2006	US7135275 Solid bleach-fixing composition for silver halide color photographic light-sensitive material, and method for processing silver halide color photographic light-sensitive material
11/14/2006	US7135274 Exposure to laser diode beams; mixture of silver halide emulsion, silver compound, binder and reducing agent
11/14/2006	US7135257 Multi-step phase shift mask and methods for fabrication thereof
11/09/2006	WO2004066276A3 Method and system for replicating film data to a metal substrate and article of manufacture
11/09/2006	US20060252277 Methods of forming patterned photoresist layers over semiconductor substrates
11/09/2006	US20060251996 Multilayer; core mixture of thermoplastic resin and irared radiation absorber; overcoating mixture of thermoplastic resin and electromagnetic radiation absorber; melt blending
11/09/2006	US20060251995 Method for the production of an anti-reflecting surface on optical integrated circuits
11/09/2006	US20060251994 Apparatus and method for characterizing an image system in lithography projection tool
11/09/2006	US20060251974 Reticles
11/08/2006	CN1284041C Solid bleach-fixing composition for silver halide color photographic light-sensitive material, and method for processing silver halide color photographic light-sensitive material
11/08/2006	CN1284009C Apparatus and method for exposure of imcro-lens array
11/07/2006	US7133121 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region
11/07/2006	US7132228 Developer dispersions for thermally developable materials
11/07/2006	US7132226 use of a slipping agent such as fatty ester or microcrystalline wax which can form a stable solid dispersion and enables production of a photothermographic material that shows a difference in coefficient of dynamic friction within a specific range between two measurement velocities
11/07/2006	US7132222 Magnetic etching process, especially for magnetic or magnetooptic recording
11/07/2006	US7132221 Method to print photoresist lines with negative sidewalls
11/07/2006	US7132219 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition
11/07/2006	US7132201 Transparent in visible light, use as a mask in an etching process during fabrication of semiconductor devices by allowing a reading of the alignment mark in the visible light range
11/02/2006	WO2006116223A1 Photosensitive laminate
11/02/2006	US20060246734 Methods of forming patterned photoresist layers over semiconductor substrates
11/02/2006	US20060246380 Micropattern forming material and method for forming micropattern
11/02/2006	US20060246379 Generic patterned conductor for customizable electronic devices
11/02/2006	US20060246377 Suitable as photolatent acids in ArF resist technology; thermally stable, even at high bake temperatures during processing and provide high photospeed; surface coatings, printing inks, printing plates, dental formulations, colour filters, resists, or image-recording materials, photoresist
11/02/2006	US20060246361 Irradiating laser light onto glass substrate surface to form a pit used as a marker; preparing substrate information including identification, symbols, unique chemical/physical/optical properties, surface shape, material, and defect; correlation with computers; photoresists
11/02/2006	US20060246359 Exposing to electromagnetic radiation; determining slant of image plane of substrate in exposed region by converting sizes of marks into displacements when there is no point in exposed region that meets focusing condition; computer programs
11/02/2006	US20060246357 System and method for manufacturing a mask for semiconductor processing
11/01/2006	CN1854133A Heterocycle-bearing onium salts
11/01/2006	CN1282881C Photographic fabrication method of radial gradual change dimmer sheet
10/2006
10/31/2006	US7130118 Dynamic projection screen
10/31/2006	US7129033 50% or more of a total projected area of the photosensitive silver halide is occupied by tabular grains having an aspect ratio of 2 or more, and the grains have at least one epitaxial junction portion having a multifold structure
10/31/2006	US7129032 Black and white photothermographic material and image forming method
10/31/2006	US7129031 Radiographic silver halide photographic material having a good developing speed, an excellent image tone and low residual color after processing
10/31/2006	US7129030 Image forming method using photothermographic material
10/31/2006	US7129028 Method of forming holographic grating
10/31/2006	US7129026 Lithographic process for multi-etching steps by using single reticle
10/31/2006	US7129025 Fabrication method of a three-dimensional microstructure
10/31/2006	US7129024 Electron beam lithography method
10/31/2006	US7128842 Polyimide as a mask in vapor hydrogen fluoride etching
10/26/2006	WO2006113146A2 Systems and methods for modifying a reticle's optical properties
10/26/2006	WO2006113135A2 Method for determining and correcting reticle variations
10/26/2006	WO2006113126A2 Method for monitoring a reticle
10/26/2006	WO2006112887A2 Methods and compositions for forming aperiodic patterned copolymer films
10/26/2006	WO2006111698A1 Method of forming flexible electronic circuits
10/26/2006	WO2006111697A1 A method of forming flexible electronic circuits
10/26/2006	US20060240365 applying thin coating of organoxy-metallic compound, forming optically inert, light absorbing metal oxide film; polyurethane liquid shield coating applied on top; immersion lithography
10/26/2006	US20060240358 Pretreatment compositions
10/26/2006	US20060240339 photolithography structure comprising substrates, multilayer mirrors, phase shifting layers, intensity balancer layers and capping layers, used to form semiconductor integrated circuit chips
10/26/2006	US20060240338 decreases the number of the steps by performing the process under a dry condition, reducing the cost and the environmental burden
10/26/2006	US20060240330 Exposure method, mask, semiconductor device manufacturing method, and semiconductor device
10/25/2006	EP1714190A1 Watermarking method for motion picture image sequence
10/25/2006	CN1282219C Pattern forming method and method for manufacturing seniconductor applying said method
10/24/2006	US7126620 Thermal development method and apparatus
10/24/2006	US7125656 Mixing an aqueous silver ion solution with an aqueous organic alkali metal salt to form organic silver salt particles, using a mixing device in which plural supply tubes are connected to a discharge tube so that an axis of the discharge tube and axes of the supply tubes coincide at a single point
10/24/2006	US7125651 Method of manufacturing semiconductor integrated circuit device optical mask therefor, its manufacturing method, and mask blanks
10/24/2006	US7125647 Radiation-sensitive composition changing in refractive index and utilization thereof
10/24/2006	US7125641 Polymers, resist compositions and patterning process
10/19/2006	US20060234168 Pattern forming materials and pattern formation method using the materials
10/19/2006	US20060234164 Norbornene-type polymers, compositions thereof and lithographic process using such compositions
10/19/2006	US20060234163 Laser-assisted deposition
10/19/2006	US20060234145 Method for determining and correcting reticle variations
10/19/2006	US20060234144 Reticles undergo periodic inspection comprising reticle transmission measurement and/or aerial imaging of the reticle. When such inspection indicates sufficient reticle degradation, the reticle is tagged for correction prior to its subsequent use in a lithography
10/19/2006	US20060234142 Covering with a photoresist mask most but not all of a quartz base coated with a phase shifting material coated with chromium; thinning exposed chromium; removing the first mask; forming second thinner photomask patterned over thinned Cr area; transferring pattern from the second mask to main-field area
10/19/2006	US20060234141 Single trench repair method with etched quartz for attenuated phase shifting mask
10/19/2006	US20060234139 Providing a map indicating optical property adjustments at a plurality of locations on a reticle; adjusting an optical property of the reticle at each of the plurality of locations based the optical property adjustments of the provided map, wherein adjustment is accomplished by using optical beam
10/19/2006	US20060234137 Photomask structures providing improved photolithographic process windows and methods of manufacturing same
10/19/2006	US20060234135 Method for repairing mask-blank defects using repair-zone compensation
10/19/2006	US20060231781 Radiation image information detecting panel
10/19/2006	US20060231524 Techniques for the use of amorphous carbon (apf) for various etch and litho integration schemes
10/18/2006	EP1711861A2 Structured materials and methods
10/17/2006	US7124396 Alternating phase-shift mask rule compliant IC design
10/17/2006	US7123281 Thermal development method and apparatus
10/17/2006	US7122821 Image transfer and output method and system using the same
10/17/2006	US7122482 Methods for fabricating patterned features utilizing imprint lithography
10/17/2006	US7122299 Silver halide photographic light-sensitive material
10/17/2006	US7122296 Providing a substrate having a surface which includes topography formed therein; forming a thin, conformal layer on substrate surface, removing substantially all of the layer from bottomwalls so as to yield holes, trenches
10/17/2006	US7122282 Mask pattern forming method and patterning method using the mask pattern
10/17/2006	CA2148240C On-demand production of lat imaging films
10/12/2006	US20060228654 Solution builder wizard
10/12/2006	US20060228653 DEVELOPMENT OR REMOVAL OF BLOCK COPOLYMER OR PMMA-b-S-BASED RESIST USING POLAR SUPERCRITICAL SOLVENT
10/12/2006	US20060228650 Manufacturing method of laser processed parts and protective sheet for laser processing

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