| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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| 03/29/2007 | US20070072094 Photomask features with chromeless nonprinting phase shifting window |
| 03/29/2007 | US20070072091 Reference wafer and process for manufacturing same |
| 03/29/2007 | US20070071306 Inspection method and photomask |
| 03/28/2007 | EP1767988A1 Security material with reversible and irreversible photochemical components and coating methods |
| 03/27/2007 | US7195860 Forming resist film on substrate, irradiating selectively the resist film with exposure to light with a liquid on resist film, and forming resist pattern by developing film, wherein step of performing pattern exposure includes sub-step of removing a gas included in film; prevents diffraction abnormality |
| 03/27/2007 | US7195846 Methods of manufacturing photomask blank and photomask |
| 03/27/2007 | US7195715 Forming a first resist layer on one surface of a quartz substrate, exposing first resist layer to light of a first amount of exposure to form a patterned first masking layer, forming a second resist layer on the other surface of quartz substrate, exposing second resist layer, etching |
| 03/22/2007 | WO2007031712A2 Method of forming conductive tracks |
| 03/22/2007 | WO2007031710A2 Method of forming a flexible heating element |
| 03/22/2007 | US20070066367 Method and arrangement for repairing memory chips using microlithography methods |
| 03/22/2007 | US20070065759 Optical information recording medium and method for manufacturing the same |
| 03/22/2007 | US20070065758 Multi-stack optical storage medium |
| 03/22/2007 | US20070065757 Photo-curable resin composition and a method for forming a pattern using the same |
| 03/22/2007 | US20070065756 High sensitivity electron beam resist processing |
| 03/22/2007 | US20070065734 Exposure method, exposure mask, and exposure apparatus |
| 03/22/2007 | US20070065733 CPL mask and a method and program product for generating the same |
| 03/22/2007 | US20070065732 Photomask providing uniform critical dimension on semiconductor device and method of manufacturing the same |
| 03/22/2007 | US20070065731 Photomask, method for fabricating photomask, and method for fabricating semiconductor device |
| 03/22/2007 | US20070065730 Photomask and pattern formation method and mask data generation method using the same |
| 03/22/2007 | US20070065729 shading elements attenuate light passing through the regions, so as to compensate for the critical dimensio (CD) variations on the wafer and hence provide and improved CD tolerance wafer; computer program uses a reference calibration list to determine the parameters of the shading elements |
| 03/22/2007 | US20070065667 Photocuring composition and plasma display panel produced by using the same |
| 03/22/2007 | US20070065575 Method for in situ photoresist thickness characterization |
| 03/22/2007 | DE102004021415B4 Verfahren zum Strukturbelichten einer photoreaktiven Schicht und zugehörige Be lichtungsvorrichtung A method for exposing a photo-reactive layer structure and related Be clearing device |
| 03/21/2007 | EP1764646A2 Photothermographic material and image forming method |
| 03/20/2007 | US7193715 Measurement of overlay using diffraction gratings when overlay exceeds the grating period |
| 03/20/2007 | US7192696 Image forming method using photothermographic material |
| 03/20/2007 | US7192695 having a photosensitive silver halide, a non-photosensitive organic silver salt, a bisphenol reducing agent, and a binder, on at least one surface of a support; improved thermal development speed and process control |
| 03/20/2007 | US7192694 Mixture of silver halide emulsion, reducible silver compound, binder and reducing agents |
| 03/15/2007 | US20070061035 Method and computer-readable medium for in situ photoresist thickness characterization |
| 03/15/2007 | US20070059651 Photolithography microelectronic fabrication; minimizing precipitation of developing reactant; involves rinsing polymer layer with an additional charge of developer fluid to minimize a sudden change in pH; and then rinsing said polymer layer with a rinse fluid of different chemistry than developer |
| 03/15/2007 | US20070059650 Developing solution for photosensitive composition and method for forming patterned resist film |
| 03/15/2007 | US20070059649 Method for manufacturing semiconductor device |
| 03/15/2007 | US20070059646 exposing pressure sensitive or photosensitive elements dispersed in binders, to pressure or radiation to form latent images, then development to form patterned images and electroless or electrodeposition of metals to the image to improve the electroconductivity of the conductors, used in printed circuits |
| 03/15/2007 | US20070059644 Micropattern formation material and method of micropattern formation |
| 03/15/2007 | US20070059615 selecting a set of values for the selectable process parameters, determining the substrate reflectivity in the resist layer for these parameters, and evaluating if the determined substrate reflectivity is smaller than a maximum allowable substrate reflectivity in the resist layer |
| 03/15/2007 | US20070059614 Obtaining reference CD (critical dimension) vs. pitch function for lithographic projection apparatus at at least a plurality of pitch values using a reference illumination profile; obtaining target value; generating a sensitivity map for a given pattern; calculating, data processing; integrated circuits |
| 03/15/2007 | US20070059611 forming the transmitting layer from a transparent substrate having three regions; forming a phase shift (halftone) mask with reduce cost; avoid uneven thickness induced by etching process by using a lift-off process in the manufacturing process of transmitting layers |
| 03/15/2007 | US20070058147 Apparatus for and method of processing substrate subjected to exposure process |
| 03/15/2007 | US20070056513 System for situ photoresist thickness characterizaton |
| 03/14/2007 | EP1761457A1 Imprinting of supported and free-standing 3-d micro-or nano-structures |
| 03/13/2007 | US7190526 coating with photoresists, then masking and exposing, developing and etching to form microstructure convex lenses, used in use in photodetectors |
| 03/13/2007 | US7190433 Apparatus and method of exposing a semiconductor device having a curved surface to light |
| 03/13/2007 | US7189499 Reducing the spacing between adjacent photoresist patterns, by heating to shrink the overcoatings, control pattern dimensions; semiconductors, photolithographic |
| 03/13/2007 | US7189498 Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography process |
| 03/13/2007 | US7189495 Method of forming photoresist pattern free from side-lobe phenomenon |
| 03/13/2007 | US7189480 Mask used for layer formation and process of making the mask |
| 03/08/2007 | WO2006026278B1 Method for reducing acrylamide formation in thermally processed foods |
| 03/08/2007 | WO2005091784A3 Lens array and method for making same |
| 03/08/2007 | US20070054221 Method of manufacturing nozzle plate |
| 03/08/2007 | US20070054213 Radiographic image conversion panel and production method thereof |
| 03/08/2007 | US20070054205 Process for forming anti-reflection coating and method for improving accuracy of overlay measurement and alignment |
| 03/08/2007 | US20070054204 For forming a fine pattern used for producing a semiconductor integrated circuit device; combination of a desired phase change and a desired transmittance can be selected arbitrarily for the phase shift film |
| 03/08/2007 | US20070054199 Semiconductor device manufacturing method, wafer and reticle |
| 03/08/2007 | US20070054198 Photomask for double exposure and double exposure method using the same |
| 03/08/2007 | US20070054197 Photolithography; Mask for improving proximity effects; no dummy patterns are formed and the workable area of the wafer is increased |
| 03/08/2007 | US20070053497 Instrument for holding and aligning an x-ray sensing device |
| 03/07/2007 | CN1303479C Method for forming patterned ITO structure by using photosensitive ITO solution |
| 03/07/2007 | CN1303474C Optical proximity correction for phase shifting photolithographic masks |
| 03/06/2007 | US7186498 Alkaline developer for radiation sensitive compositions |
| 03/06/2007 | US7186495 (Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it |
| 03/06/2007 | US7186488 Semiconductor device manufacturing method and semiconductor device manufacturing system |
| 03/06/2007 | US7186487 Method of controlling exposure processes by monitoring photon levels, and system for accomplishing same |
| 03/06/2007 | US7186486 Method to pattern a substrate |
| 03/06/2007 | US7186485 Inspection method and a photomask |
| 03/06/2007 | US7186483 Method of determining alignment of a template and a substrate having a liquid disposed therebetween |
| 03/06/2007 | US7186481 Flare measuring mask and flare measuring method of semiconductor aligner |
| 03/01/2007 | WO2006011977A3 Method of making grayscale mask for grayscale doe production by using an absorber layer |
| 03/01/2007 | US20070048676 Method for manufacturing printing plate |
| 03/01/2007 | US20070048673 Perfluoropolyether benzotriazole compounds |
| 03/01/2007 | US20070048672 Barrier coating compositions containing silicon and methods of forming photoresist patterns using the same |
| 03/01/2007 | US20070048671 Barrier coating compositions containing fluorine and methods of forming photoresist patterns using such compositions |
| 03/01/2007 | US20070048670 Coating compositions for use in forming patterns and methods of forming patterns |
| 03/01/2007 | US20070048666 Two-photon recording method, two-photon absorption recording material, two-photon absorption recording-reproduction method and optical recoding medium |
| 03/01/2007 | US20070048656 Quinone diazide sulfonic acid ester of a phenol compound; and a polybenzoxazole precursor; prebaking coated semiconductor; exposure, development, heating |
| 03/01/2007 | US20070048635 performing an exposure process for substrates in lithography tools using an automated focus adjustment process on the basis of focus tilt parameter; using a fault detection module; determining a current focus fault status on the basis of current value and a statistical value; wafers; cost efficiency |
| 03/01/2007 | US20070048631 Mask defect repairing method and semiconductor device manufacturing method |
| 03/01/2007 | US20070048625 Lithographic template and method of formation and use |
| 03/01/2007 | US20070045883 Spin replicated flexible and concentrically registered stamper and stamped optical disk |
| 02/28/2007 | EP1756673A1 Developer for a photopolymer protective layer |
| 02/28/2007 | EP1756668A2 Coatings containing nanotubes, methods of applying the same and substrates incorporating the same |
| 02/28/2007 | EP1756666A1 Photothermographic materials with improved natural age keeping |
| 02/28/2007 | EP1756627A2 Lens array and method for making same |
| 02/28/2007 | CN1302336C Photographic processing system |
| 02/27/2007 | US7185312 Exposure method for correcting line width variation in a photomask |
| 02/27/2007 | US7185311 Mask evaluating method, mask evaluating system, method of manufacturing mask and computer program product |
| 02/27/2007 | US7183043 Shadow mask and method for producing a shadow mask |
| 02/27/2007 | US7183025 Phase difference specifying method |
| 02/27/2007 | US7183024 Forming images; antifogging agents; exposure of film to radiation; forming latent images; one step development |
| 02/27/2007 | US7183022 Providing a sharp imaging, improves the imaging of closely adjacent structures, with at least two masks, strongly coupled structures, simultaneous imaging; semiconductors |
| 02/22/2007 | WO2007021654A2 Apparatus for developing photoresist and method for operating the same |
| 02/22/2007 | US20070042299 Method to print photoresist lines with negative sidewalls |
| 02/22/2007 | US20070042287 Multi-layer photoresist and method for making the same and method for etching a substrate |
| 02/22/2007 | US20070041506 Digital sensor holder |
| 02/22/2007 | US20070039676 Bonding a deformable film to a fluid flow structure to inhibit blocking of flow paths by placing the structure on an electrostatic chuck support, placing the film on another chuck support, and thermally bonding the structure and the film to one another; electrostatic forces inhibit deformation |
| 02/22/2007 | US20070039499 Process for treating photothermographic dry imaging material |
| 02/21/2007 | EP1753609A2 Light scattering euvl mask |
| 02/20/2007 | US7180533 Image processing apparatus, image processing method, and program |
| 02/20/2007 | US7179585 Image forming method utilizing photothermographic material |
| 02/20/2007 | US7179583 Providing a photosensitive printing element;cutting the photosensitive printing element in a pattern of a desired size and shape for mounting on a sleeve or cylindrical carrier; andapplying an edge-covering formulation to cover the cut surfaces of the printing element |
| 02/20/2007 | US7179569 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing the same |