| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
|---|
| 08/08/2006 | US7087352 Measurement by adjustment lithography exposure of light; detection of interference pattern; spectral curves stored in library |
| 08/03/2006 | WO2006081534A1 Compositions and methods for image development of conventional chemically amplified photoresists |
| 08/03/2006 | US20060172233 Silver salt photothermographic dry imaging material, image recording method and image forming method for the same |
| 08/03/2006 | US20060172230 hazardous waste reduction in stereolithography; nonhazardous: photosensitizer 4-benzoyl-4-methyldiphenyl sulfide, photoacid diffusion inhibitor, an oxetane, and boron containing cationic photoinitiator; fluorinated surfactants or polymers increase curing rate; antimony-free |
| 08/03/2006 | US20060172229 Alignment system used in nano-imprint lithography and nano imprint lithography method using the alignment system |
| 08/03/2006 | US20060172228 Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition |
| 08/03/2006 | US20060172207 Exposure analyzing system, method for analyzing exposure condition, and method for manufacturing semiconductor device |
| 08/03/2006 | US20060172205 Etching, photoresists; latent imaging |
| 08/03/2006 | US20060172204 Systems, masks and methods for printing contact holes and other patterns |
| 08/02/2006 | EP1685443A2 Storage phosphor erase |
| 08/01/2006 | US7086031 Methods of forming patterned reticles |
| 08/01/2006 | US7085469 Process for producing three-dimensional polyimide optical waveguide |
| 08/01/2006 | US7085450 Fabrication of structures in an optical substrate |
| 08/01/2006 | US7083901 Joining member for Z-interconnect in electronic devices without conductive paste |
| 08/01/2006 | US7083897 Method of fabricating a poly fuse |
| 08/01/2006 | US7083896 Highly reflective substrates for the digital processing of photopolymer printing plates |
| 08/01/2006 | US7083880 Forming semiconductor devices, microelectronic devices, microelectromechanical devices, microfluidic devices, and photonic devices |
| 07/27/2006 | WO2006078791A2 Systems, masks and methods for printing contact holes and other patterns |
| 07/27/2006 | WO2006028858A3 Methods of removing photoresist on substrates |
| 07/27/2006 | US20060166148 Method of producing liquid developer and liquid developer produced by the method |
| 07/27/2006 | US20060166147 Developer composition |
| 07/27/2006 | US20060166146 Developer regenerators |
| 07/27/2006 | US20060166144 Reduced loss high efficiency diffractive and associated methods |
| 07/27/2006 | US20060166142 Illuminant distribution evaluation method, optical member manufacturing method, illumination optical device, exposure apparatus, and exposure method |
| 07/27/2006 | US20060166112 Photomask for nearfield exposure, method for making pattern using the photomask, and apparatus for making pattern including the photomask |
| 07/27/2006 | US20060166111 Mask, mask forming method, pattern forming method, and wiring pattern forming method |
| 07/27/2006 | US20060166110 Method and apparatus for improving depth of focus during optical lithography |
| 07/27/2006 | US20060166109 Method to correct EUVL mask substrate non-flatness |
| 07/27/2006 | US20060166108 Method for etching a molybdenum layer suitable for photomask fabrication |
| 07/27/2006 | US20060163743 Semiconductor device and method for manufacturing the same, and electric device |
| 07/26/2006 | EP1683164A2 Phosphor screen and imaging assembly |
| 07/26/2006 | EP1682940A1 Ultrahigh speed imaging assembly for radiography |
| 07/26/2006 | EP1682939A1 High-speed radiographic film |
| 07/26/2006 | CN1266540C Silver halide color photographic material and image forming method |
| 07/26/2006 | CN1266539C Silver halide emulsion and silver halide photosensitive material |
| 07/25/2006 | US7081322 Nanopastes as ink-jet compositions for printing plates |
| 07/20/2006 | WO2006075985A1 Bi-wavelength optical intensity modulators using materials with saturable absorptions |
| 07/20/2006 | US20060160036 Near-field exposure method and apparatus, near-field exposure mask, and device manufacturing method |
| 07/20/2006 | US20060160035 Image forming method using photothermographic material |
| 07/20/2006 | US20060160031 EUV lithography filter |
| 07/20/2006 | US20060160001 Systems for determining width/space limits for product mask layouts; mask writer generates first pattern on a test mask, a lithography tool generates a second pattern on a wafer like the first pattern by a lithography process using a preset exposure dose; measures widths; controls according to difference |
| 07/20/2006 | US20060157658 Radiation image photographing apparatus |
| 07/20/2006 | DE112004001611T5 Phthalocyanin-Vorläufer bei infrarotempfindlichen Zusammensetzungen Phthalocyanine precursor with infrared-sensitive compositions |
| 07/19/2006 | EP1680711A2 Novel photosensitive resin compositions |
| 07/19/2006 | CN1806205A Highly reflective substrates for the digital processing of photopolymer printing plates |
| 07/19/2006 | CN1265248C Photoetching with micro trace photoresist detecting pattern and its detecting method |
| 07/13/2006 | WO2006073926A1 Containment structure and method |
| 07/13/2006 | US20060154400 Method of forming a nanogap and method of manufacturing a nano field effect transitor for molecular device and bio-sensor, and molecular device and bio-sensor manufactured using the same |
| 07/13/2006 | US20060154187 Development of radiation-sensitive elements |
| 07/13/2006 | US20060154186 Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings |
| 07/13/2006 | US20060154181 Applying resin that displays increased alkali solubility under the action of acid, and an acid generator that generates acid on exposure to substrate; prebaking; selective exposure, post exposure baking; alkali development; heat treatment |
| 07/13/2006 | US20060154180 Imaging element for use as a recording element and process of using the imaging element |
| 07/13/2006 | US20060154179 Imprint lithography |
| 07/13/2006 | US20060154178 Method for the production of photoresist structures |
| 07/13/2006 | US20060154177 reducing space width of holes and simultaneously removing unwanted holes to change pattern density; coating patterned resist layer with a water soluble negative resist layer, patternwise exposure, forming crosslinked plugs, removing uncrosslinked sections, pattern transfer to substrate; microelectronics |
| 07/13/2006 | US20060154169 Radiation-sensitive compositions comprising a 1,4-dihydropyridine sensitizer and imageable elements based thereon |
| 07/13/2006 | US20060154158 quaternaryammonium having a lower alkyl or a lower hydroxyalkyl groups as main component; anionic surfactant containing biphenyl ether having one or more metal sulfonate group and an alkyl or alkoxy group; prebaking resist layer, exposing to light, alkali developing; improved dimensional controllability |
| 07/13/2006 | US20060154157 Distortions of the developed photosensitive film pattern are compensated for; more accurate target photosensitive film pattern; the depth of focus of the photolithography process is increased; uniformity |
| 07/13/2006 | US20060154154 Mask and method of manufacturing a poly-silicon layer using the same |
| 07/13/2006 | US20060154152 Flare reduction in photolithography |
| 07/13/2006 | US20060154151 Method for quartz photomask plasma etching |
| 07/13/2006 | US20060153561 Electro-mechanical system and method for mixing replenishment for plate precursor developers |
| 07/12/2006 | CN1264198C Optical masks, manufacture method thereof and manufacture method of electronic elements |
| 07/11/2006 | US7075651 Image forming characteristics measuring method, image forming characteristics adjusting method, exposure method and apparatus, program and storage medium, and device manufacturing method |
| 07/11/2006 | US7075639 Method and mark for metrology of phase errors on phase shift masks |
| 07/11/2006 | US7074652 Method for separating sapphire wafer into chips |
| 07/11/2006 | US7074549 Photothermographic materials containing phosphors and methods of using same |
| 07/11/2006 | US7074547 Photomask and method of fabricating semiconductor device by use of same |
| 07/11/2006 | US7074530 Continuous gray levels, the change in light intensity between each gray level is both finite and linear, produces a smoother and more linear profile on the object being made, meets the sub-resolution requirements of most optical tools |
| 07/11/2006 | US7074525 Projecting light through a photomask using an optical projection system, sub-resolution features in clear areas adjacent to lines and spaces reduce transparency of the clear areas reduce light scattering and flare, greater degree of defocus in the pattern, less resist stripping |
| 07/06/2006 | WO2006071586A1 Boron compounds as stabilizers in photothermographic materials |
| 07/06/2006 | WO2005065109A3 Computer program and method for converting an image to machine control data |
| 07/06/2006 | US20060147847 Antimicrobial compositions and methods |
| 07/06/2006 | US20060147845 Electrically reconfigurable photolithography mask for semiconductor and micromechanical substrates |
| 07/06/2006 | US20060147843 Fabrication process for ultra high density optical disc |
| 07/06/2006 | US20060147842 Laser-markable compositions |
| 07/06/2006 | US20060147841 Pattern plotting device and pattern plotting method |
| 07/06/2006 | US20060147821 Lithographic apparatus and device manufacturing method |
| 07/06/2006 | US20060147819 Method of fabricating chrome-less phase shift mask |
| 07/06/2006 | US20060147818 Method of correcting deviations of critical dimensions of patterns formed on a wafer in a EUVL process |
| 07/06/2006 | US20060147817 made by using a negative photoresist includes a transparent substrate defined with a device chip area, an opaque device pattern formed on the transparent substrate in the device chip area, and a dummy opaque pattern provided on the transparent substrate outside of the device chip area |
| 07/06/2006 | US20060147816 Multi-transmission phase mask and method for manufacturing the same |
| 07/06/2006 | US20060147814 Methods for repairing an alternating phase-shift mask |
| 07/06/2006 | US20060147813 Mask and method to pattern chromeless phase lithography contact hole |
| 07/06/2006 | US20060147812 Method and system for measuring critical dimensions of a mask design pattern |
| 07/05/2006 | CN1262881C Potch processing compound, processing apparatus and method for processing silver colored camera |
| 07/04/2006 | US7073161 Methods of forming patterned reticles |
| 07/04/2006 | US7072565 polysilsesquioxanes and polysiloxanes and second component containing a plurality of functional groups chosen from epoxides, oxetanes, vinyl ethers; can be used in forming the clad and/or core layers to be coated on copper foil and, in the dried state, bent around a conical Mandrel bar without cracking |
| 07/04/2006 | US7072564 Waveguide compositions and waveguides formed therefrom |
| 07/04/2006 | US7072563 polysilsesquioxanes and polysiloxanes and second component containing a plurality of functional groups chosen from hydroxy, amino, thiol, sulphonate ester, carboxylate ester, silyl ester, anhydride, aziridine, methylolmethyl, silyl ether to improve flexibility of the composition in a dried state |
| 07/04/2006 | US7071124 Method to reduce PEB sensitivity of resist |
| 07/04/2006 | US7070916 Radiation image conversion panel and production method thereof |
| 07/04/2006 | US7070915 Method and system for drying a substrate |
| 07/04/2006 | US7070910 Silazane compound amd methods for using the same |
| 07/04/2006 | US7070907 Substrate having character/symbol section and processing method of character/symbol section |
| 07/04/2006 | US7070891 Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation |
| 06/29/2006 | WO2006069255A2 Methods and systems for controlling variation in dimensions of patterned features across a wafer |
| 06/29/2006 | US20060141397 Exposing to a patterned light source a mixture a first photoresist having a glass transition point higher than and an operational absorption in the vicinity of a wavelength longer than those of a second photoresist; light source emits radiation at the wavelength absorbed by the first photoresist |
| 06/29/2006 | US20060141396 Vapor depositing thin layer of lead, lead monoxide, or lead-titanium material; patterning by volatilizing by irradiating with electron beams |
| 06/29/2006 | US20060141376 Methods and systems for controlling variation in dimensions of patterned features across a wafer |