| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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| 09/12/2006 | US7105282 Photothermographic material is developed in a thermal developing device configured such that a distance between an exposing section and a developing section is not more than 50 cm |
| 09/12/2006 | US7105280 Forming a layer of a rigid magnetic material over a permanent master with a topographical pattern to be formed in a recording medium; separating the layer of rigid material from the master having an imprinting surface with a topographical pattern, replicating the pattern of the permanent master |
| 09/12/2006 | US7105278 Exposing a photosensitive surface to light through a mask with a transmissivity to light and a plurality of features in a dense nonuniform repetitive pattern for forming structures in a semiconductor pattern; symmetry is broken without altering the semiconductor features that are formed |
| 09/12/2006 | US7105265 Method for removing resist pattern |
| 09/12/2006 | US7105255 EUV reflection mask and lithographic process using the same |
| 09/08/2006 | WO2006004798A3 Multilayer optical display device |
| 09/07/2006 | US20060199114 Negates effect of fine dust causing defects; locating an exposure mask at a predetermined position with respect to a wafer, exposing a resist film, then displacing the exposure mask relative to the wafer by a predetermined dimension, and further exposing the resist film; semiconductors |
| 09/07/2006 | US20060199113 Image forming method using photothermographic material |
| 09/07/2006 | US20060199109 Phase Shift Photomask and Method for Improving Printability of a Structure on a Wafer |
| 09/07/2006 | US20060199107 Copolyalkylene oxide of optionally substituted alkyl 1,2-epoxypropionate and 9-anthracenylmethyl 2,3-epoxypropionate; between etching layer and photoresist to absorb exposure light in photolithography; prevents the occurrence of standing wave, undercutting and notching to obtain uniform pattern profile |
| 09/07/2006 | US20060199091 Printing a mask with maximum possible process window through adjustment of the source distribution |
| 09/07/2006 | US20060199090 Method of setting focus condition at time of exposure, apparatus for setting focus condition at time of exposure, program, and computer readable recording medium |
| 09/07/2006 | US20060199089 Method for manufacturing a semiconductor device |
| 09/07/2006 | US20060199088 Laser etched fiducials in roll-roll display |
| 09/07/2006 | US20060199083 Method and apparatus for identifying and correcting phase conflicts |
| 09/07/2006 | US20060198950 Method of manufacturing patterned recording medium |
| 09/07/2006 | US20060197333 Process for providing marking on security papers |
| 09/06/2006 | CN1830039A Method and system for drying a substrate |
| 09/05/2006 | US7102736 Method of calibration, calibration substrate, and method of device manufacture |
| 09/05/2006 | US7102652 Compositing two-dimensional and three-dimensional image layers |
| 09/05/2006 | US7101658 Heat-developable photosensitive material and heat-developing method using the same |
| 09/05/2006 | US7101656 Forming photoresist layer on a glass master; cutting photoresist layer by projecting light beam onto the glass master having the photoresist layer thereon to expose the photoresist layer to light; developing the photoresist layer |
| 09/05/2006 | US7100322 Method of manufacturing an alternating phase shift mask |
| 08/31/2006 | WO2006091881A2 Merging sub-resolution assist features of a photolithographic mask |
| 08/31/2006 | WO2006091712A2 Image capture device and methods |
| 08/31/2006 | US20060194448 Replication tools and related fabrication methods and apparatus |
| 08/31/2006 | US20060194154 Developer composition |
| 08/31/2006 | US20060194130 Run to run control for lens aberrations |
| 08/31/2006 | US20060194129 Substrate edge focus compensation |
| 08/31/2006 | US20060194126 Mask blank transparent substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing method |
| 08/31/2006 | US20060194125 Used for exposure of a resist film in a fabrication process of a semiconductor device; liquid immersion lithography technique which achieves a high resolution |
| 08/31/2006 | US20060194124 Semiconductor device, method of manufacturing the same, and phase shift mask |
| 08/31/2006 | US20060194123 Method of generating a photolithography patterning device, computer program, patterning device, method of determining the position of a target image on or proximate a substrate, measurement device, and lithographic apparatus |
| 08/31/2006 | US20060193442 Dental sensor clamp |
| 08/31/2006 | DE10345476B4 Lithographische Maske und Verfahren zum Bedecken einer Maskenschicht Lithographic mask and method for covering a mask layer |
| 08/30/2006 | EP1695143A2 Filling an area of an image marked on a product with a laser |
| 08/30/2006 | CN1272643C Composite mask for producing a diffuser |
| 08/29/2006 | US7099010 Due to the symmetry of the structure, the overlay accuracy in the first direction may be determined on the basis of the same reference data as used for the second, so that establishing libraries is simplified. |
| 08/29/2006 | US7097963 Halogen substituted tetraazaindene compounds in photothermographic materials |
| 08/29/2006 | US7097946 For use insemiconductor manufacturing; lithography |
| 08/29/2006 | US7096547 Manufacturing method of ceramic device using mixture with photosensitive resin |
| 08/24/2006 | US20060188822 Off-axis projection optics and extreme ultraviolet lithography apparatus employing the same |
| 08/24/2006 | US20060188797 Apparatus and method for optical interference fringe based integrated circuit processing |
| 08/24/2006 | US20060188796 Performing OPC on structures with virtual edges |
| 08/24/2006 | US20060188793 Adjustable Transmission Phase Shift Mask |
| 08/24/2006 | US20060188792 Printing of design features using alternating PSM technology with double mask exposure strategy |
| 08/24/2006 | US20060188791 Merging sub-resolution assist features of a photolithographic mask |
| 08/24/2006 | US20060188070 Image capture device and methods |
| 08/24/2006 | US20060186363 Enhanced spectral range imaging sensor |
| 08/23/2006 | CN1271684C Method for manufacturing electronic component |
| 08/23/2006 | CN1271469C Color developing filling liquid for colour photographic sensitive material and its concentration composition |
| 08/23/2006 | CN1271468C Bleaching bath concentrated composition for silver halide colour photographic sensitive material |
| 08/22/2006 | US7094641 Method for forming wiring pattern, method for manufacturing semiconductor device, electro-optic device and electronic equipment |
| 08/22/2006 | US7094525 Silver halide photographic light-sensitive material |
| 08/22/2006 | US7094520 Die for molding optical panel, process for production thereof, and use thereof |
| 08/22/2006 | US7094503 Nanopastes for use as patterning compositions |
| 08/22/2006 | US7094305 Method for particle production |
| 08/17/2006 | US20060183336 Method of optimized stitching for digital micro-mirror device |
| 08/17/2006 | US20060183060 Nano-imprint lithography method involving substrate pressing |
| 08/17/2006 | US20060183055 Method for defining a feature on a substrate |
| 08/17/2006 | US20060183048 Positive photoresist composition and resist pattern formation |
| 08/17/2006 | US20060183040 Method for controlling semiconductor device production process and a method for producing semiconductor devices |
| 08/17/2006 | US20060183039 Method and systems for utilizing simplified resist process models to perform optical and process corrections |
| 08/17/2006 | US20060183035 For forming a fine pattern used for producing a semiconductor integrated circuit device; combination of a desired phase change and a desired transmittance can be selected arbitrarily for the phase shift film |
| 08/17/2006 | US20060183034 Photomask |
| 08/17/2006 | US20060183033 For semiconductor integrated circuits; improved contrast; forming a small pattern under the same exposure conditions without depending on the shape and the density of the pattern |
| 08/17/2006 | US20060183032 Improved contrast; forming a small pattern under the same exposure conditions without depending on the shape and the density of the pattern; semiconductors, integrated circuits |
| 08/17/2006 | US20060183031 Optical proximity correction method |
| 08/17/2006 | US20060183030 Photomask, method of generating mask pattern, and method of manufacturing semiconductor device |
| 08/17/2006 | US20060183029 Method for producing a mask arrangement and use of the mask arrangement |
| 08/17/2006 | US20060183028 Method for producing a mask layout avoiding imaging errors for a mask |
| 08/17/2006 | US20060183026 Masking for wafer fabrication |
| 08/17/2006 | US20060183025 Methods of forming mask patterns, methods of correcting feature dimension variation, microlithography methods, recording medium and electron beam exposure system |
| 08/17/2006 | US20060181599 Thermal development method and apparatus |
| 08/17/2006 | US20060180175 Method and system for determining flow conditions in a high pressure processing system |
| 08/16/2006 | EP1690137A1 A process for the manufacture of flexographic printing plates |
| 08/16/2006 | EP1558446B1 Thermal generation of a mask for flexography |
| 08/16/2006 | EP1301827B1 Photolithographically-patterned out-of-plane coil structures and method of making |
| 08/15/2006 | US7093227 Methods of forming patterned reticles |
| 08/15/2006 | US7092304 Semiconductor memory |
| 08/15/2006 | US7090964 custom polarization, such as a combination of radial and tangential polarization; Forbidden pitch is avoided |
| 08/15/2006 | US7090963 Process for forming features of 50 nm or less half-pitch with chemically amplified resist imaging |
| 08/15/2006 | US7090395 Wireless digital dental x-ray sensor with positioning apparatus |
| 08/10/2006 | US20060177778 single mask with two or more focus planes to accommodate different exposures |
| 08/10/2006 | US20060177774 forming stack of multiple layers of organic antireflective coatings comprisining absorptive chromophore on substrate, curing and insolubilizing each layer by heating, forming photoresist; immersion lithography |
| 08/10/2006 | US20060177772 Process of imaging a photoresist with multiple antireflective coatings |
| 08/10/2006 | US20060177770 Thin film transistor substrate and manufacturing method thereof |
| 08/10/2006 | US20060177760 Computer to plate color sensor and drying/curing system and method |
| 08/10/2006 | US20060177747 Semiconductors, liquid crystal displays; patterning any size or shape by exposure using only one photomask; the mask pattern has a light-shielding film and a phase shifter |
| 08/10/2006 | US20060177746 Half-tone stacked film, photomask-blank, photomask and fabrication method thereof |
| 08/10/2006 | US20060177745 Phase shift masks |
| 08/10/2006 | US20060177744 Method for producing a mask layout avoiding imaging errors for a mask |
| 08/10/2006 | US20060177743 Photomask, photomask fabrication method, and semiconductor device fabrication method |
| 08/10/2006 | US20060176357 Thermal development method and apparatus |
| 08/09/2006 | EP1687676A2 High speed imaging assembly for radiography |
| 08/09/2006 | CN1268981C Attenuated phase shifting mask having embedded bi-layer structure for and method for making same |
| 08/08/2006 | US7087947 Semiconductor device with loop line pattern structure, method and alternating phase shift mask for fabricating the same |
| 08/08/2006 | US7087915 Radiation image reproducing device and method for reproducing radiation image |
| 08/08/2006 | US7087368 Silver salt photothermographic dry imaging material, image recording method and image forming method for the same |
| 08/08/2006 | US7087364 Antistatic properties for thermally developable materials |