| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
|---|
| 04/29/2008 | US7364839 Method for forming a pattern and substrate-processing apparatus |
| 04/29/2008 | US7364837 Method for pattern formation using photoresist cleaning solution |
| 04/29/2008 | US7364835 Developer-soluble materials and methods of using the same in via-first dual damascene applications |
| 04/29/2008 | US7364832 An extremely thin photoresist layer is coated on top of a photosensitive and anti-reflective protective layer of organometallic polymer; stack of the films is selectively exposed to actinic radiation and the latent images on the layers are developed with a common alkaline developer |
| 04/24/2008 | US20080096141 Cleaning Liquid For Lithography And Method For Resist Pattern Formation |
| 04/24/2008 | US20080096140 Ferrule for optical wave guide |
| 04/24/2008 | US20080096134 Positive resist composition and pattern forming method using the same |
| 04/24/2008 | US20080096131 Resist composition and patterning process |
| 04/24/2008 | US20080096128 Base resin is a polyvinylphenol derivative having an alkoxyisobutoxy as a reactive group which is decomposable under the action of an acid to increase solubility in alkali; a sulfonium phtoacid generator, tris(2-(methoxymethoxy)ethyl)amine oxide, a solvent; photoresist; high resolution |
| 04/24/2008 | US20080094596 Methods and systems to compensate for a stitching disturbance of a printed pattern |
| 04/24/2008 | US20080094595 Methods and systems to compensate for a stitching disturbance of a printed pattern |
| 04/23/2008 | EP1914594A2 Silver halide color photographic light-sensitive material and color image-forming method |
| 04/23/2008 | CN100383978C Method for forming image sensor |
| 04/23/2008 | CN100383663C Silver halides emulsions, silver halides colour photographic sensitive material and imaging method |
| 04/22/2008 | US7363611 Printing a mask with maximum possible process window through adjustment of the source distribution |
| 04/22/2008 | US7361457 Hardware and software for directing a beam through a mask onto a wafer surface to outline a circuit pattern; photolithography system including an exposure tool, a mask, array of micromechanical mirrors capable of real time configurable imaging, and addressing circuitry |
| 04/22/2008 | US7361456 Method of manufacturing master disk, apparatus of manufacturing master disk, method of detecting moving distance difference of master disk, and apparatus of detecting moving distance difference of master disk |
| 04/22/2008 | US7361434 for projection of patterns onto substrate such as semiconductor wafers |
| 04/22/2008 | US7361433 Photomask for forming photoresist patterns repeating in two dimensions and method of fabricating the same |
| 04/17/2008 | US20080090420 selectively etching anti-reflective multilayer using photoresist pattern as an etching mask, forming a fine pattern in a peripheral circuit region; improve the data processing speed |
| 04/17/2008 | US20080090396 Light exposure apparatus and method for making semiconductor device formed using the same |
| 04/17/2008 | US20080090186 Method and system for performing development processing during photolithography |
| 04/17/2008 | US20080090179 copolymer of styrene or a-methylstyrene with hydroxy groups or ether groups attached a polycyclic ring; monomer including indene or acenaphthylene; molecular weight of 1,000 to 500,000; exhibit high resolution, etching resistance, good in-plane dimension uniformity |
| 04/17/2008 | US20080090171 Positive resist composition for immersion lithography and method for forming resist pattern |
| 04/17/2008 | US20080090160 contact lithography system includes a patterning tool having a pattern for transfer to a substrate; and a sensor disposed on the patterning tool for sensing a magnetic pattern disposed on the substrate to determine alignment between the patterning tool and the substrate. |
| 04/17/2008 | US20080088809 Edge exposure apparatus, coating and developing apparatus, edge exposure method and coating and developing method, and storage medium |
| 04/17/2008 | US20080088808 Process for forming resist pattern, and resist coating and developing apparatus |
| 04/15/2008 | US7359054 Overlay target and measurement method using reference and sub-grids |
| 04/15/2008 | US7358283 Radiation curable compositions useful in image projection systems |
| 04/15/2008 | US7358038 Black and white photothermographic material and image forming method |
| 04/15/2008 | US7358034 Method of processing on-press developable lithographic printing plate |
| 04/10/2008 | US20080085475 Method of imaging and developing negative-working elements |
| 04/10/2008 | US20080085473 lithographic photoresist; deep UV, x-ray, electon beam: alpha-cyano- or an alpha-trifluoro methacrylate monomer and a vinyl ether monomer; 157 nm. |
| 04/10/2008 | US20080085470 etching resistance and developing property; a high-energy radiation (including ArF excimer lasers) with wavelength of 300 nm or shorter; microlithography; |
| 04/10/2008 | US20080085462 Lithographic apparatus and device manufacturing method |
| 04/10/2008 | US20080085456 Radiation mask with spatially variable transmissivity |
| 04/10/2008 | US20080083888 Moving object detection photointerrupter and electric device using the same |
| 04/10/2008 | US20080083618 System and Methods for Determining an Analyte Concentration Incorporating a Hematocrit Correction |
| 04/09/2008 | EP1664936A4 Forming partial-depth features in polymer film |
| 04/08/2008 | US7355673 Method, program product and apparatus of simultaneous optimization for NA-Sigma exposure settings and scattering bars OPC using a device layout |
| 04/08/2008 | US7355672 Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus |
| 04/08/2008 | US7355614 Filling an area of an image marked on a material with a laser |
| 04/08/2008 | US7354695 A surface having features formed by the treatment of a surface- altering process that utilizes a partially transmissive mask that allows a fraction of light to pass through; subtractive lithography, exposing a laser-ablatable substrate, such as a polymeric or ceramic substrate to laser |
| 04/08/2008 | US7354684 Test pattern and method of evaluating the transfer properties of a test pattern |
| 04/08/2008 | US7354683 Lithography mask for imaging of convex structures |
| 04/03/2008 | US20080081300 Silver halide photosensitive material and image forming method using the same |
| 04/03/2008 | US20080081299 forming first patterns over a transparent substrate, detecting a defect die by inspection, forming a mask pattern that selectively exposes the defect die, removing the defect pattern of the defect die using the mask pattern as an etching mask, forming a material layer for forming a second pattern |
| 04/03/2008 | US20080081296 Decreases undesirable events caused by a coupling between an active region and a gate pattern while forming a recess pattern due to a decreased design rule; mass producible |
| 04/03/2008 | US20080081295 Developing solution for lithographic printing plates and production method of lithographic printing plate |
| 04/03/2008 | US20080081294 Good mechanical properties, low-temperature curing; comprising a polymer having a specific structure and a compound containing a methacryloyl or acryloyl group within the molecule |
| 04/03/2008 | US20080081292 Resist composition and pattern forming method using the same |
| 04/03/2008 | US20080081289 crosslinkable polymer containing a secondary benzyl acid-decomposable group with an acid-decomposable crosslinking group; acid generator; high sensitivity, line width roughness, reduction of Iso Dense Bias in a hyperfine region; KrF excimer laser beam |
| 04/03/2008 | US20080081288 Photosensitive composition, compound for use in the photosensitive composition, and pattern-forming method using the photosensitive composition |
| 04/03/2008 | US20080081287 Includes fumaric acid substituted by a first acid labile group released by an acid; a polymer in which an alkali-soluble polymer soluble in an alkaline solution is substituted by a second acid labile group; and a photo-acid generator for generating an acid through irradiation with light |
| 04/03/2008 | US20080081282 High resolution, reduced pattern falling, and good sensitivity and good dissolution contrast achieved even in EUV (extreme ultra violet) exposure, reduction in the line edge roughness |
| 04/03/2008 | US20080081279 Azo dye compound, coloring composition, ink sheet for thermal transfer recording, thermal transfer recording method, color toner, ink for inkjet, and color filter |
| 04/03/2008 | US20080081272 An optical pickup head radiating a laser beam on the label surface printing the label image information; a laser driving unit; a memory; a control unit which sets a trial write region within a label image region, causing the head to radiate the laser beam on the trial write region |
| 04/03/2008 | US20080081269 Azo dye compound, coloring composition, ink sheet for thermal transfer recording, thermal transfer recording method, color toner, ink for inkjet, and color filter |
| 04/03/2008 | US20080081265 Reticle and method of manufacturing method the same |
| 04/03/2008 | US20080081256 Electrochemically depositing polymer on an carbon electrode substrate, forming a thin film of polymer on the substrate, andsoaking the polymer film in a lithuim-ion battery electrolyte solution |
| 04/03/2008 | US20080080068 Microlens, method of manufacturing microlens, and photomask used for manufacturing method |
| 04/03/2008 | US20080080034 System, method and apparatus for a micromachined interferometer using optical splitting |
| 04/03/2008 | US20080079930 Measurement apparatus and method |
| 04/02/2008 | EP1906235A1 Method for image formation |
| 04/01/2008 | US7352453 Method for process optimization and control by comparison between 2 or more measured scatterometry signals |
| 04/01/2008 | US7352442 Aligner, exposing method, method for manufacturing thin-film transistor, display device, and electronic device using shading means |
| 03/27/2008 | WO2008036295A2 Method for storing holographic data |
| 03/27/2008 | US20080076260 Separation-material composition for photo-resist and manufacturing method of semiconductor device |
| 03/27/2008 | US20080076069 Method of patterning an anti-reflective coating by partial developing |
| 03/27/2008 | US20080076064 Method of creating photolithographic structures with developer-trimmed hard mask |
| 03/27/2008 | US20080076062 Resist composition and pattern-forming method using the same |
| 03/27/2008 | US20080076047 Performing an optical proximity effect correction on the basic layout, defining nonlinear regions and linear regions of the basic layout;combining the image contour of the nonlinear regions and image contour of the linear regions to form an image contour of the entire semiconductor device |
| 03/27/2008 | US20080076046 Depositing an optically tunable soft mask of polymer, an acid generator compound, and a metrology enhancing material coupled to the polymer using a protecting group; metrology enhancing material provides metrology-enhancing properties after being de-protected |
| 03/27/2008 | US20080076045 Modifiable resist layer for providing a first set of optical properties before exposure and a second set of optical properties after exposure; improving the accuracy of measurements made using optical metrology; electronic devices, integrated circuits |
| 03/27/2008 | US20080076041 Transparent substrate, square mask cells having a side shorter than a resolution limit of an exposing device; cell includes a light transmitting region and a light shielding region; a planar region; cells transmitting lights greater than or equal to zero and less than the second light intensity |
| 03/27/2008 | US20080076036 Irradiating the resist layer through a mask to expose an upper surface of the wafer |
| 03/27/2008 | US20080076035 Includes multilayer stack having peripheral region rendered opaque by heating |
| 03/27/2008 | US20080075231 Dental x-ray film viewing device |
| 03/27/2008 | US20080074656 Defining a pattern on a substrate |
| 03/27/2008 | US20080074043 Organic electro-luminescence display device and method of manufacturing the same |
| 03/26/2008 | EP1756627A4 Lens array and method for making same |
| 03/26/2008 | CN100377003C Photography treatment composition and image formation method using same |
| 03/26/2008 | CN100376393C Semiconductor laser and its manufacturing method, manufacturing device and optical device |
| 03/25/2008 | US7350182 Methods of forming patterned reticles |
| 03/25/2008 | US7348132 Exposing oleophilic photosensitive layer comprising polymeric binder, urethane (meth)acrylate monomer, nonurethane (meth)acrylate monomer, free radical initiator, and sensitizing dye, and water soluble or dispersible overcoat; hardening; removing non-exposed areas with aqueous developer or ink |
| 03/25/2008 | US7348130 Electron exposure to reduce line edge roughness |
| 03/25/2008 | US7348129 method and apparatus for reforming an organic material film such as an interlayer insulating film; irradiated onto the organic material film through a hydrocarbon radical generating gas |
| 03/25/2008 | US7348110 Thermally developable imaging material |
| 03/25/2008 | US7348107 Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method |
| 03/25/2008 | US7348106 after forming a predetermined mask pattern through an energy beam resist layer, mask is inspected for at least one missing pattern; mask is repaired in defect area; missing pattern is reformed; mask pattern is transferred in the shift layer material |
| 03/25/2008 | US7348069 Ceramic substrate for thin-film electronic components, method for producing the substrate, and thin-film electronic component employing the substrate |
| 03/20/2008 | WO2008033879A2 Method for achieving compliant sub-resolution assist features |
| 03/20/2008 | WO2008033051A1 X-ray image recording method |
| 03/20/2008 | US20080070416 Phase shift mask including a substrate with recess |
| 03/20/2008 | US20080070168 Scratch layer transfer sheet and method of producing scratch printing product |
| 03/20/2008 | US20080070167 Exposing resist carrying a protective film forming a transparent layer; before development, cleaning with solvent of protective layer comprising 2-butanol, decane, 2-octaonol, 1-pentanol, isobutanol, diisoamyl ether, 2-methyl-1-butanol, dibutyl ether, 2-methyl-2-butanol, and/or 2-methyl-4-pentanol |
| 03/20/2008 | US20080070166 Image sensor and method of forming the same |
| 03/20/2008 | US20080070164 Wet-processing apparatus, wet-processing method and storage medium |
| 03/20/2008 | US20080070162 Information storage elements and methods of manufacture thereof |
| 03/20/2008 | US20080070161 Organobis(4-vinylbenzenesulfonyloxime) derivative monomers; resolution, photolithography; improved focus depth margin and the line edge roughness of photoresist patterns; fineness |