| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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| 02/14/2006 | US6998203 Proximity correcting lithography mask blanks |
| 02/09/2006 | WO2006013383A1 Grey card for controlling exposure and white balance of a digital camera |
| 02/09/2006 | US20060029888 Method of application of a dielectric sheet and photosensitive dielectric composition(s) and tape(s) used therein |
| 02/09/2006 | US20060029879 Silicon based optically degraded arc for lithographic patterning |
| 02/09/2006 | US20060029867 Device and method for controlling close contact of near-field exposure mask, and near-field exposure mask for the same |
| 02/09/2006 | US20060027752 Method for the production of an protective layer for a layer of luminescent material |
| 02/09/2006 | US20060027307 Method of application of a dielectric sheet and photosensitive dielectric composition(s) and tape(s) used therein |
| 02/09/2006 | DE112004000591T5 Herstellungsverfahren für Photomaske und Photomaskenrohling Manufacturing process for photomask and photomask blank |
| 02/09/2006 | DE10346681B4 Film-Folien-System Screen-film system |
| 02/09/2006 | DE102004031398A1 Verfahren zur photolithographischen Projektion eines Musters auf einen Halbleiterwafer mit einer alternierenden Phasenmaske Photolithographic process for projecting a pattern on a semiconductor wafer with an alternating phase mask |
| 02/07/2006 | US6994940 Phase shift mask, method for forming pattern using phase shift mask and manufacturing method for electronic device |
| 02/02/2006 | WO2006011977A2 Method of making grayscale mask for grayscale doe production by using an absorber layer |
| 02/02/2006 | US20060024625 Silver halide emulsion and silver halide photographic material |
| 02/02/2006 | US20060024619 Master plate for fabricating a stamper plate, stamper plate, storage medium, and method for fabricating the master plate, stamper plate and storage medium |
| 02/02/2006 | US20060024617 Products with data-encoding pattern |
| 02/02/2006 | US20060024616 Basic quencher/developer solutions for photoresists |
| 02/02/2006 | US20060024594 Method for exposing a substrate with a structure pattern which compensates for the optical proximity effect |
| 02/02/2006 | US20060024593 Optical device and manufacturing method thereof |
| 02/02/2006 | US20060024592 Crystallization; photomasks; dielectrics; semiconductors |
| 02/02/2006 | US20060024590 Methods of forming patterns in semiconductor constructions, methods of forming container capacitors, and methods of forming reticles configured for imprint lithography |
| 02/01/2006 | EP1620822A2 Effective proximity effect correction methodology |
| 01/31/2006 | US6993741 Generating mask patterns for alternating phase-shift mask lithography |
| 01/31/2006 | US6992296 Scintillator panel, method of manufacturing scintillator panel, radiation detection device, and radiation detection system |
| 01/31/2006 | US6991896 comprises photomasks/optical filters for patterning contact-holes; improved resolution |
| 01/31/2006 | US6991888 Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds |
| 01/31/2006 | US6991878 Photomask repair method and apparatus |
| 01/26/2006 | US20060019203 Method of manufacturing a photothermographic material by aqueous coating and a photothermographic material prepared therewith |
| 01/26/2006 | US20060019201 Post-dry etching cleaning liquid composition and process for fabricating semiconductor device |
| 01/26/2006 | US20060019199 applying a crosslinkable polyvinyllphenol homo or copolymer, a bishydroxymethylbenze or naphthalene a crosslinking compound, a triphenylsulfonium hexaflate photoacid generator and propylene glycol/1,2-/, 1-methyl ether 2-acetate solvent on a substrate having prestructure gate electrode, photocrosslinking |
| 01/26/2006 | US20060019183 Imprint alignment method, system, and template |
| 01/26/2006 | US20060019180 Photo mask, focus measuring method using the mask, and method of manufacturing semiconductor device |
| 01/26/2006 | US20060019177 Lithographic mask and manufacturing method thereof |
| 01/26/2006 | US20060019176 Chromeless phase shift mask and method of fabricating the same |
| 01/26/2006 | US20060019175 Method of manufacturing membrane mask, method of manufacturing semiconductor device, and membrane mask |
| 01/26/2006 | US20060019173 Method of designing charged particle beam mask, charged particle beam mask, and charged particle beam transfer method |
| 01/26/2006 | US20060018529 Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure |
| 01/26/2006 | US20060018436 Intraoral dental radiology positioning device for use with aiming ring |
| 01/26/2006 | US20060017623 Electrically conductive patterns, antennas and methods of manufacture |
| 01/26/2006 | US20060017029 Medical image recording apparatus and medical radiography cassette |
| 01/25/2006 | EP1618436A2 Determination of center of focus by parameter variability analysis |
| 01/24/2006 | US6989920 System and method for dose control in a lithographic system |
| 01/24/2006 | US6989886 Series of lens components are dimensioned to collect at least third order diffraction components of the patterned beam, which reduce ghosting effects; microlens array (MLA) imaging systems |
| 01/24/2006 | US6989333 Process for forming a pattern |
| 01/24/2006 | US6989231 Method of forming fine patterns using silicon oxide layer |
| 01/24/2006 | US6989223 High-speed radiographic film |
| 01/24/2006 | US6989221 negative/postive films; digital imaging |
| 01/19/2006 | US20060014112 Color developer concentrate for color film processing |
| 01/19/2006 | US20060014111 Development of an exposed photothermographic material using a developing device at a distance of 0-50 cm between an exposing section and a developing section to obtain a maximum density of 3.8-5.0 of the developed photothermographic material; image forming layer formed from an aqueous coating |
| 01/19/2006 | US20060014110 Photoresist stripping solution and a method of stripping photoresists using the same |
| 01/19/2006 | US20060014109 Method for manufacturing a masking member |
| 01/19/2006 | US20060014106 Photoresist undercoat-forming material and patterning process |
| 01/19/2006 | US20060014105 Immersion exposure liquid and pattern formation method |
| 01/19/2006 | US20060014086 Method for manufacturing pattern formed structure |
| 01/19/2006 | US20060014082 Method of correcting mask pattern |
| 01/19/2006 | US20060013365 Method and apparatus for supporting a dental X-ray sensor |
| 01/19/2006 | US20060012667 Filling an area of an image marked on a material with a laser |
| 01/19/2006 | DE102004031079A1 Reflexionsmaske, Verwendung der Reflexionsmaske und Verfahren zur Herstellung der Reflexionsmaske Reflection mask, use of the reflection mask and method of manufacturing the reflection mask |
| 01/18/2006 | CN1237393C Homogeneous photographic color developing concentrate and its preparing process |
| 01/18/2006 | CN1237392C Reagent box part for preparing bleach-fixing liquid and reagent box method and use |
| 01/17/2006 | US6986974 Attenuated phase shift mask for extreme ultraviolet lithography and method therefore |
| 01/17/2006 | US6986971 Reflective mask useful for transferring a pattern using extreme ultraviolet (EUV) radiation and method of making the same |
| 01/17/2006 | US6986850 Partial edge bead removal to allow improved grounding during e-beam mask writing |
| 01/12/2006 | WO2006004693A2 Method for bilayer resist plasma etch |
| 01/12/2006 | WO2005106508A3 Diagnostic system for profiling micro-beams |
| 01/12/2006 | US20060009038 Processing for overcoming extreme topography |
| 01/12/2006 | US20060008758 System for two-step resist soft bake to prevent ILD outgassing during semiconductor processing |
| 01/12/2006 | US20060008749 Method for manufacturing of a mask blank for EUV photolithography and mask blank |
| 01/12/2006 | US20060008748 Protective film-forming composition for immersion exposure and pattern-forming method using the same |
| 01/12/2006 | US20060008745 Translucent electromagnetic shield film, producing method therefor and emulsifier |
| 01/12/2006 | US20060008742 Using photolithographic patterning to form a buffer layer and a luminescent layer and repeating the step at least once; first buffer layer is immiscible with the solution for forming the second buffer layer; preventing cross contamination and narrowing of pixels |
| 01/12/2006 | US20060008741 forming an amorphous carbon layer with low absorption coefficient such that it is transparent in visible light; used in semiconductor devices or as a mask in an etching process |
| 01/12/2006 | US20060008740 Organic devices, organic electroluminescent devices and organic solar cells |
| 01/12/2006 | US20060008735 Radiation sensitive resin composition for forming microlens |
| 01/12/2006 | US20060008728 Photoresist composition |
| 01/12/2006 | US20060008716 Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus |
| 01/12/2006 | US20060008715 Exposure system and method |
| 01/12/2006 | US20060008714 Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method |
| 01/12/2006 | US20060008712 Exposure method, mask fabrication method, fabrication method of semiconductor device, and exposure apparatus |
| 01/12/2006 | US20060008710 Forming a first layer of attenuating material over a portion of the substrate;forming a another layer of material over a portion of the first layer;forming a second layer of attenuating material over a portion of the another layer of material;forming an opaque layer, etching substrate |
| 01/12/2006 | US20060008709 Mask and method for determining mask pattern line length |
| 01/12/2006 | US20060008708 For properly evaluating the line width of a pattern by considering the amount of a determination error caused by charge-up |
| 01/12/2006 | US20060008707 Mask and inspection method therefor and production method for semiconductor device |
| 01/11/2006 | CN1236034C Compositions for removing metal ions from aqueous process solutions and methods of use thereof |
| 01/10/2006 | US6984572 Method for manufacturing electronic component |
| 01/10/2006 | US6984473 Method of patterning a mask blank |
| 01/05/2006 | US20060003601 Method of forming fine patterns |
| 01/05/2006 | US20060003272 Thermal development to develop a latent image formed on a light-sensitive surface of a photothermographic material; cooling; dry imaging material which is capable of providing images with high diagnostic characteristics |
| 01/05/2006 | US20060003270 Developing method of photoresist and developing device |
| 01/05/2006 | US20060003267 Nano-structure and method of fabricating nano-structures |
| 01/05/2006 | US20060003266 Organic electroluminescence display and method of fabricating the same |
| 01/05/2006 | US20060003265 Molecular layer and method of forming the same |
| 01/05/2006 | US20060003263 Phase-change memory device and method of manufacturing the same |
| 01/05/2006 | US20060003262 Forming electrical conductors on a substrate |
| 01/05/2006 | US20060003258 Forming a laser pixel array useful with a pump-beam by forming a layer of an N-(Aryl (imino or azo)phenyl) formamide dye and then exposing to ultraviolet radiation; organic vertical cavity surface emitting lasers |
| 01/05/2006 | US20060003240 Methods for adjusting light intensity for photolithography and related systems |
| 01/05/2006 | US20060003236 Photomask and near-field exposure method |
| 01/05/2006 | US20060003234 multiple exposure patterning to provide mark; photoresists; integrated circuits |
| 01/05/2006 | US20060003233 Exposure mask, method of designing and manufacturing the same, exposure method and apparatus, pattern forming method, and device manufacturing method |
| 01/05/2006 | DE102004019861B3 Verfahren zum Herstellen einer Maske für eine lithographische Abbildung A method of manufacturing a mask for a lithographic imaging |
| 01/04/2006 | EP1612835A1 Method for Reducing the Fogging Effect |