Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726)
06/2007
06/21/2007US20070141517 Improving resist resolution by using a dipolar group coupled to an anion of a photo-acid generator of the resist to force anisotropic acid diffusion process during post-exposure bake; limiting lateral acid diffusion to increase vertical; chemically amplified resists; semiconductors; miniaturization
06/21/2007US20070141486 Device manufacturing method and computer program product
06/21/2007US20070141483 Near-field exposure photoresist and fine pattern forming method using the same
06/21/2007US20070141481 photoresists with varying transmissive areas; halftones
06/21/2007US20070141480 including a first pattern portion having a first minimum dimension and a second pattern portion having a second minimum dimension includes a first exposure step of performing exposure using a Levenson-type mask and a second exposure step of performing exposure using a half tone-type mask
06/21/2007US20070141479 mask pattern includes a main pattern to be transferred through exposure and an auxiliary pattern that diffracts exposing light and is not transferred through the exposure; can improve contrast in forming a pattern in an arbitrary shape
06/21/2007US20070139855 Lithographic apparatus and method of manufacturing an electrostatic clamp for a lithographic apparatus
06/20/2007CN1985335A Method for bilayer resist plasma etch
06/19/2007US7232651 Optical recording materials
06/19/2007US7232631 Silicon oxide on silicon substrate; controlling thickness; doping with boron, phorphosus
06/19/2007US7232256 Intraoral radiographic dental x-ray packets having non-lead radiation shielding
06/14/2007WO2007067706A2 Pressurized aerosol formulation for use in radiation sensitive coatings
06/14/2007US20070134602 High-pressure processing apparatus
06/14/2007US20070134601 Supplying a rinsing liquid onto a substrate with a light-exposed pattern formed thereon and treated by a developing procedure; rinsing liquid contains a polyethylene glycol family surfactant or an acetylene glycol family surfactant in a critical micelle concentration or less
06/14/2007US20070134599 Growing or depositing a carbon nanotube (NT) array on a substrate;functionalizing it by partial thermal degradation of a polymer to form a NT structure; characterizing functionalization of the structure; and processing the functionalized NT structure according to the characterized functionalization
06/14/2007US20070134595 Pressurized aerosol formulation for use in radiation sensitive coatings
06/14/2007US20070134567 Mask and method of manufacturing display device using the same
06/14/2007US20070134564 Method of manufacturing semiconductor device, mask and semiconductor device
06/14/2007US20070134563 Photomask and method of manufacturing semiconductor device
06/14/2007US20070134562 Fabrication method for photomask, fabrication method for device and monitoring method for photomask
06/14/2007US20070132811 Ink jet head manufacturing method and ink jet head manufactured by the manufacturing method
06/14/2007US20070132157 Processing method
06/14/2007DE102005059743A1 Translucent paper`s discrimination and/or copying protection producing method, involves applying paper with colorless lacquer in defined region as identification, where intensification of background is viewable by refraction of light
06/12/2007US7229748 Method for forming a micro pattern, micro pattern, method for fabricating a mold for forming the micro pattern through transcription, and mold for forming the micro pattern through transcription
06/12/2007US7229747 Surface treatment of interpenetrating polymer networkcarbon tubes; photolithography; heat curing; negative patterns
06/12/2007US7229743 Electron beam lithography method, patterned master carrier for magnetic transfer, lithography method for patterned master carrier for magnetic transfer, and method for producing performatted magnetic recording media
06/12/2007US7229742 Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system
06/12/2007US7229738 Silver halide emulsion layer on a support, contains a fluorine compound with >/=2 fluoroalkyl groups, and anionic and nonionic hydrophilic groups
06/12/2007US7229724 Optical transmission pattern; etching edges; on radiation transparent substrate
06/12/2007US7229723 Method for forming an opening in a light-absorbing layer on a mask
06/12/2007US7229722 Alternating phase shift mask design for high performance circuitry
06/12/2007US7228623 Process for fabricating a multi layer circuit assembly
06/07/2007WO2006026280A8 Method for reducing acrylamide formation in thermally processed foods
06/07/2007US20070128557 Phototool coating
06/07/2007US20070128555 polymerizable ester compound containing a fluorinated alkyl group, a lactone ring, and an acid-eliminatable unit within a common molecule can be polymerized into a polymer which meets water repellency as needed for the immersion lithography
06/07/2007US20070128553 Method for forming feature definitions
06/07/2007US20070128549 Forming patterns on a first substrate using an E-beam lithography, transferring the patterns formed on the first substrate to a second substrate using a nanoimprint lithography to complete an mold
06/07/2007US20070128529 Exposure method and apparatus, coating apparatus for applying resist to plural substrates, and device manufacturing method
06/07/2007US20070128527 A wafer for a circuit having a transparent substrate with a pattern light-reducing layer having sidewalls with openings to expose non-patterned regions and having an angle of < 90 degrees improve intensity balance of an image-formed by light-transmitted through the mask
06/07/2007US20070128524 Method of arranging mask patterns
06/07/2007US20070127625 Flat image detector
06/06/2007EP1793272A1 Silver halide color photographic photosensitive material and method of image forming
06/06/2007EP1791653A2 Optical films and methods of making the same
06/05/2007US7226866 Etching method for making a reticle
06/05/2007US7226723 Providing a substrate having a resist thereon;exposing the resist to at least one generally rectangular-shaped shot from an electron beam, rotating at least one of the substrate and a path of the generally rectangular-shaped shot; andexposing the resist with rectangular-shaped shot from electron beam
06/05/2007US7226721 Having a high dry etching rate compared with photoresist, and causing no intermixing with the photoresist, manufacture of semiconductor device
06/05/2007US7226707 Methods of printing structures
06/05/2007US7226706 using a blocker to prevent electron beams from hitting the outer region for an area more than 90 percent of the outer region when patterning a predetermined feature on the substrate; comprising: a non-conductive substrate; and a layer of conductive material on substrate
06/05/2007US7226705 Method of manufacturing a mask blank and a mask, the mask blank and the mask, and useless film removing method and apparatus
05/2007
05/31/2007US20070124708 Contrast based resolution enhancement for photolithographic processing
05/31/2007US20070124108 Structure, system and method for dimensionally unstable layer dimension measurement
05/31/2007US20070122755 Heat developable photosensitive material including a combination of specified reducing agents
05/31/2007US20070122754 Radiating vacuum-ultraviolet light through a photomask to a pattern forming substrate, varying a surface property by the vacuum-ultraviolet light, and forming a property varied pattern with the property varied on a surface of the pattern forming substrate to form a pattern formed body; removing
05/31/2007US20070122750 Salt suitable for an acid generator and a chemically amplified resist composition containing the same
05/31/2007US20070122749 Method of nanopatterning, a resist film for use therein, and an article including the resist film
05/31/2007US20070122737 Coating and developing system and coating and developing method
05/31/2007US20070122733 Positive photosensitive resin composition, method for forming pattern, and electronic part
05/31/2007US20070122723 Process
05/31/2007US20070122718 distribution of the light transmittance is determined so that the resist layer having been exposed in accordance with a first resist shape would be used to form a second resist shape with an aspect ratio higher than the aspect ratio of the first resist shape; gray scale mask; microlens
05/31/2007US20070121789 Holder device for dental x-ray digital sensor
05/30/2007EP1790429A1 Imaging methods
05/30/2007EP1287549A4 An apparatus and a method for forming a pattern using a crystal structure of material
05/30/2007CN1973247A Developer for a photopolymer protective layer
05/29/2007US7223613 Ferroelectric polymer memory with a thick interface layer
05/29/2007US7223528 photographic films comprising supports having photosensitive silver halides, nonphotosensitive organic silver salt, reducing agents and nonphotosensitive layers containing a water soluble magenta dye; quality images having good contrast, discoloration inhibition and surface gloss
05/29/2007US7223505 Thin film formed on a substrate, irradiating with an energy beam to elevate the temperature of a region to a predetermined temperature, and patterning
05/24/2007US20070117410 Method for manufacturing semiconductor device using immersion lithography process
05/24/2007US20070117051 Trimming a MEMS Device to Fine Tune Natural Frequency
05/24/2007US20070117050 Maintenance of photoresist activity on the surface of dielectric arcs for 90 nm feature sizes
05/24/2007US20070117049 Form crosslinks of repeating -(CO-O-CH(-CH3)-O)-; reaction of multifunctional vinyl ether and a polymer with free acid groups, e.g. poly(methacryloyloxy ethyl phthalate); eliminate the bottom anti-reflective coating etch step by using a wet-developable bottom anti-reflective coating; high resolution
05/24/2007US20070117038 Method for forming mark and liquid ejection apparatus
05/24/2007US20070117032 Method for determining an exposure dose and exposure apparatus
05/24/2007US20070117029 Exposure pattern or mask and inspection method and manufacture method for the same
05/24/2007US20070114477 Enhanced sensitivity of a whispering gallery mode microsphere sensor by a high-refractive index surface layer
05/23/2007EP1786277A2 Method for reducing acrylamide formation in thermally processed foods
05/22/2007US7222327 Photo mask, method of manufacturing photo mask, and method of generating mask data
05/22/2007US7221427 Method of making semiconductor chips for liquid crystal display device
05/22/2007US7220981 Radiographic-image recording medium containing shock-resistant member
05/22/2007US7220536 Exhibits minimum contamination of the interior of an imager, low level of odor as well as high abrasion resistance during performing a thermal development, image keeping stability after development
05/22/2007US7220535 Use of separate bands of UV light for the curing and imaging steps ensures that the techniques provide for a marking that is non-interfering with data read out
05/22/2007US7220479 Multilayer body with a layer having at least one laser-sensitive material
05/18/2007WO2006098877A3 Method and apparatus for analyzing an imaging material
05/18/2007WO2005092025A3 Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis
05/18/2007CA2627433A1 Visual film identification
05/17/2007US20070111536 Substrate treatment apparatus and substrate treatment method
05/17/2007US20070111465 Mask, mask blank, and methods of producing these
05/17/2007US20070111144 Display device and manufacturing method of the same
05/17/2007US20070111116 Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same
05/17/2007US20070111114 Silicon thin film in which an opening for selectively irradiating charged particles to a semiconductor substrate is provided and whose irradiation surface on which the charged particles are irradiated is implanted with an impurity, and selectively irradiating charged particles to semiconductor substrate
05/17/2007US20070111113 Photo mask for mitigating stitching effect and exposing method using the same
05/17/2007US20070111110 In-situ plasma treatment of advanced resists in fine pattern definition
05/16/2007EP1784079A2 Method for reducing acrylamide formation in thermally processed foods
05/16/2007EP1730477A4 Embedded attenuated phase shift mask with tunable transmission
05/16/2007CN1965269A Aqueous edge bead remover
05/15/2007US7217504 high-density colour or monochrome images; especially on a transparent support; receiver having at least one radiation absorbing component having pre-determined spectral absorbance properties susceptible to alteration to form an altered radiation absorbing component
05/15/2007US7217502 Nanopastes for use as patterning compositions
05/10/2007WO2007030704A3 System and method for mask verification using an individual mask error model
05/10/2007US20070105276 Mask, mask blank, and methods of producing these
05/10/2007US20070105059 Image forming method using photothermographic material
05/10/2007US20070105058 Dual Layer Workpiece Masking and Manufacturing Process
1 ... 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 ... 118