| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
|---|
| 01/09/2007 | US7160628 Opaque chrome coating having increased resistance to pinhole formation |
| 01/04/2007 | US20070004234 Fluids for immersion lithography systems |
| 01/04/2007 | US20070003883 Developer for positive photosensitive composition |
| 01/04/2007 | US20070003880 Negative photosensitive resin composition |
| 01/04/2007 | US20070003878 Reduced pitch multiple exposure process |
| 01/04/2007 | US20070003877 Inorganic semiconductive films and methods therefor |
| 01/04/2007 | US20070003876 Producing layer of photoresist with relief structure on flat substrate by forming shape of a relief die disposed in opposite relationship to substrate; removing relilef die; producing interference pattern by dividing coherent light; positioning, exposure, development; forming grooves and recesses; drying |
| 01/04/2007 | US20070003874 Exposing a resist on a substrate to a rectangularly-shaped shot from an electron beam to form a non-angled feature; altering the rotational orientation by a predetermined angle; and forming a 2nd feature by exposing to a 2nd shot from the new angle to form an angled feature |
| 01/04/2007 | US20070003861 Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same |
| 01/04/2007 | US20070003844 Method for adjusting dimensions of photomask features |
| 01/04/2007 | US20070003840 Focus determination method, device manufacturing method, and mask |
| 01/04/2007 | US20070002232 Optical compensation film, polarizing plate and liquid crystal display device |
| 01/03/2007 | EP1738223A2 Targeted radiation treatment using a spectrally selective radiation emitter |
| 01/03/2007 | CN1293639C Memory array with loop line pattern structure and fabricating method thereof |
| 01/02/2007 | US7159197 Shape-based geometry engine to perform smoothing and other layout beautification operations |
| 01/02/2007 | US7158164 Thermal development method and apparatus |
| 01/02/2007 | US7157665 Heat development apparatus and method |
| 01/02/2007 | US7157214 Black-and-white photothermographic materials are imageable using ultraviolet, visible, infrared, or X-radiation; imaging layers include hydrophilic binders or water-dispersible latex polymer binders and chemically and spectrally sensitized photosensitive silver halide grains |
| 01/02/2007 | US7157212 Photoimaging using a hybrid organic-inorganic polymer such as POSS (Polyhedral Oligomeric Silsesquioxane)-based polymers and multi-photon exposure; making waveguides for example; polysilsesquioxanes can be used in high temperature process without decomposing |
| 01/02/2007 | US7157192 Square dummy patters uniformize pattern density; dielectrics; plasma enhance chemical vapor deposition; chemical mechanical polishing |
| 01/02/2007 | US7157191 Opaque material replaces defects/pinholes on radiation transparent/patterned substrate; semiconductors; integrated circuits; photolithography |
| 01/02/2007 | US7157189 Covering the mask layer with photoresist which contains a film forming polymer containing acid-labile group to be cleaved by an acid for liberating a polymer with increased solubility in alkaline developer |
| 12/28/2006 | WO2006078791A3 Systems, masks and methods for printing contact holes and other patterns |
| 12/28/2006 | US20060292876 Plasma etching method and apparatus, control program and computer-readable storage medium |
| 12/28/2006 | US20060292502 Multicolor thermal imaging method and thermal printer |
| 12/28/2006 | US20060292499 Optical information recording medium, method for manufacturing the same, and initialization device |
| 12/28/2006 | US20060292463 Analyzing front side mark behavior on a substrate during an integrated circuit manufacturing process, without the need of etching global alignment marks; Chemical Mechanical Polishing |
| 12/28/2006 | US20060292460 Etching photomasks, photoresists; excimer lasers |
| 12/28/2006 | US20060292458 Method of creating photo mask data, method of photo mask manufacturing, and method of manufacturing semiconductor device |
| 12/28/2006 | US20060292455 Method for checking phase shift angle of phase shift mask, lithography process and phase shift mask |
| 12/28/2006 | US20060292454 photoresists; photomasks; etching; semiconductors |
| 12/28/2006 | US20060289965 Thin film transistor array panel and manufacturing method thereof |
| 12/28/2006 | US20060289814 Method for erasing radiation energy remaining in radiation image storage panel |
| 12/26/2006 | US7155394 Audio playback device that reads data encoded as dots of infra-red ink |
| 12/26/2006 | US7153645 Light-sensitive layer of light-insensitive silver salt of aliphatic carboxylic acid particles, a light-sensitive emulsion of light-sensitive silver halide grains, a silver ion reducing agent and a binder; leuco dyes or couplers control the tone of silver image; storage stability |
| 12/26/2006 | US7153644 Silver halide color photosensitive material and image forming method |
| 12/26/2006 | US7153639 Silver halide color photographic lightsensitive material |
| 12/26/2006 | US7153635 Thermally developable materials processable at lower temperatures |
| 12/26/2006 | US7153634 Dual layer workpiece masking and manufacturing process |
| 12/26/2006 | US7153616 Reference reticle is used to perform various functions and/or tests such as wafer (or flat panel) exposures, aerial image scans, vibration measurements, and periodic calibrations that ensure the tool is operating as intended |
| 12/21/2006 | US20060286491 Formation of a mask on an integrated electronic circuit |
| 12/21/2006 | US20060286490 Methods of making templates for use in imprint lithography and related structures |
| 12/21/2006 | US20060286460 Photomask, method of making a photomask and photolithography method and system using the same |
| 12/20/2006 | CN1882877A Process for the manufacture of flexographic printing plates |
| 12/19/2006 | US7151593 Method for imaging wafers using a projection mask aligner |
| 12/19/2006 | US7151238 Thermal development apparatus and thermal development process |
| 12/19/2006 | US7150964 Process for treating photothermographic dry imaging material |
| 12/19/2006 | US7150949 Further method to pattern a substrate |
| 12/19/2006 | US7150948 Faster wafer fabrication without wasting exposure area; simultaneous evaluation |
| 12/19/2006 | US7150946 Method for the repair of defects in photolithographic masks for patterning semiconductor wafers |
| 12/14/2006 | US20060281021 Illuminative treatment of holographic media |
| 12/14/2006 | US20060281014 Method and apparatus for protecting a reticle used in chip production from contamination |
| 12/14/2006 | US20060279837 High NA system for multiple mode imaging |
| 12/13/2006 | EP1730477A1 Embedded attenuated phase shift mask with tunable transmission |
| 12/12/2006 | US7149998 Lithography process modeling of asymmetric patterns |
| 12/12/2006 | US7147996 Development of radiographic silver halide materials having an incorporated black-and-white developing agent in a one step or a two step process with an alkaline activator and a fixing composition; reflective supports allow images to be viewed without a light box |
| 12/12/2006 | US7147982 Ultrahigh speed imaging assembly for radiography |
| 12/12/2006 | US7147977 A wafer is held on a pin chuck, and a pattern is transferred by exposure to light; the differences in distance between a focal position of the exposure light and the principal surface of the wafer held on the pin chuck are set at 50% or less; high precision lithography patterns; miniaturization |
| 12/12/2006 | US7147975 For forming a fine pattern in fabrication of semiconductor integrated circuit devices |
| 12/07/2006 | US20060276327 Monomeric nonmetallic compound, particularly a thiuram mono- or disulfide capable of forming a complex with a metal ion in an aqueous solution, entrapped within or supported onto a support material, and optionally a 1a or 2a metal dithiocarbamate; metal complexes formed also claimed |
| 12/07/2006 | US20060276044 Forming a resin mold, interposing a photosensitive polymer forming layers, exposing the layered structure with an electron beam, ultraviolet radiation or visible radiaton, removing an exposed photosensitive polymer, and filling the vacant portion with a metal |
| 12/07/2006 | US20060275713 Hybrid type optical disc and manufacturing metod for hybrid type optical disc |
| 12/07/2006 | US20060275712 Method for fabrication of physical patterns and the method for fabrication of device using the same |
| 12/07/2006 | US20060275708 Custom polarization, such as a combination of radial and tangential polarization; Forbidden pitch is avoided; patterning the polarized beam of radiation; projecting the patterned beam of radiation onto a target portion of the wafer |
| 12/07/2006 | US20060275703 Recording medium, near field optical head, optical recording device, and method of manufacturing thereof |
| 12/07/2006 | US20060275692 Method for forming concavo-convex pattern, method for manufacturing master disk, method for manufacturing stamper, and method for manufacturing magnetic recording medium |
| 12/07/2006 | US20060275678 Phase difference specifying method |
| 12/06/2006 | EP1729174A1 Photolithographically-patterned out-of-plane coil structures and method of making |
| 12/06/2006 | EP1727671A2 Coatings containing nanotubes, methods of applying the same and transparencies incorporating the same |
| 12/05/2006 | US7146599 Method for using asymmetric OPC structures on line ends of semiconductor pattern layers |
| 12/05/2006 | US7145633 Apparatus and method of exposing light to a semiconductor device having a curved surface |
| 12/05/2006 | US7144694 Photothermographic imaging material and method for forming image |
| 12/05/2006 | US7144692 Photothermographic material |
| 12/05/2006 | US7144689 Antistatic properties for thermally developable materials |
| 12/05/2006 | US7144688 silver halide having a high silver iodide content; binder contains polymer latex; reducing agent is a bisphenol, e.g., 2,2'-isobutylidenebis(4,6-dimethylphenol); high sensitivity, low fogging, and excellent image stability |
| 12/05/2006 | US7144684 Method for forming pattern using photomask |
| 12/05/2006 | US7144680 Electron beam lithography method using new material |
| 12/05/2006 | US7144663 Transferring, with a pump, the photographic reagent to be measured to a measuring tank via piping without being heated; heating the photographic reagent to be melted after measuring; repeating the procedure |
| 12/05/2006 | US7144157 Drawer for X-ray detectors |
| 11/30/2006 | US20060269877 Apparatus for developing photoresist and method for operating the same |
| 11/30/2006 | US20060269876 Novel compound and method for synthesizing the same, ink, ink cartridge, recording unit, ink-jet recording apparatus, recording method, liquid composition, pattern generating method, article, environmental history-detecting method |
| 11/30/2006 | US20060269875 Calculation system for inverse masks |
| 11/30/2006 | US20060269849 Halftone mask and method of fabricating the same, and method of fabricating display device using the same |
| 11/30/2006 | US20060269848 photomasks; photoresists; lithography; quartz (transparent) substrate with film formed thereon |
| 11/29/2006 | EP1726990A1 Photosensitive material for silver halide color photograph |
| 11/29/2006 | EP1726989A2 Laser marking on photosensitive material and photosensitive material including the marking |
| 11/29/2006 | CN1871555A Forming partial-depth features in polymer film |
| 11/29/2006 | CN1287464C Scintillator panel, method for making same, radiation detector and detecting system thereof |
| 11/28/2006 | US7142375 Films for optical use and methods of making such films |
| 11/28/2006 | US7141358 Image-forming method and developer |
| 11/28/2006 | US7141356 While the disk is rotated unidirectionally, the beam is repeatedly deflected in a figure 8 pattern toward the next deflection initiation point in the radial direction at track edges, so that the deflected directions toward the inner periphery of and toward the outer periphery of the disk intersect |
| 11/28/2006 | US7140769 Radiation sensitive recording plate with orientation identifying marker, method of making, and of using same |
| 11/28/2006 | US7140298 Method for evaluating planographic printing plates and quality-control method thereof |
| 11/23/2006 | US20060265686 in photolithography to inspect respective overlays between the target layer and the underlying layers, control the alignment accuracy through computer data processing, transferring a pattern |
| 11/23/2006 | US20060263728 Method of forming fine patterns |
| 11/23/2006 | US20060263727 Semiconductor chip with coil element over passivation layer |
| 11/23/2006 | US20060263725 for electrical conductors; depositing layer of light absorbing material on side of donor substrate then depositing layer of metal nanoparticles thereon |
| 11/23/2006 | US20060263707 Image forming apparatus |
| 11/23/2006 | US20060263706 Overlay vernier and method for manufacturing semiconductor device using the same |
| 11/23/2006 | US20060263701 Levenson phase shifting mask and method for preparing the same and method for preparing a semiconductor device using the same |