| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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| 05/30/2006 | US7053979 Process for amelioration of scanning synchronization error |
| 05/30/2006 | US7053202 Immunoglobulin DNA cassette molecules, monobody constructs, methods of production, and methods of use therefor |
| 05/30/2006 | US7052828 Photothermographic material |
| 05/30/2006 | US7052819 Photothermographic materials with improved natural age keeping |
| 05/30/2006 | US7052808 Transmission mask with differential attenuation to improve ISO-dense proximity |
| 05/30/2006 | US7052806 Exposure controlling photomask and production method therefor |
| 05/26/2006 | WO2006054791A1 Resin cured film for flexible printed wiring board and production process thereof |
| 05/25/2006 | US20060110693 Exposure method and apparatus, exposure mask, and device manufacturing method |
| 05/25/2006 | US20060110692 Imagewise exposing and thermal developing a photothermographic material using an image recording apparatus, wherein a part of the sheet is exposed and, in parallel with the exposure, development is started on a part of the sheet having been already exposed; high-quality images |
| 05/25/2006 | US20060110691 Photothermographic material |
| 05/25/2006 | US20060110686 Method for forming metal pattern by using metal nanocrystals |
| 05/25/2006 | US20060110685 Apparatus and method to improve resist line roughness in semiconductor wafer processing |
| 05/25/2006 | US20060110684 Photomask for forming small contact hole array and methods of fabricating and using the same |
| 05/25/2006 | US20060110683 Process of improved grayscale lithography |
| 05/25/2006 | US20060110667 Method of fabrication of semiconductor integrated circuit device and mask fabrication method |
| 05/25/2006 | US20060110666 Stray light feedback for dose control in semiconductor lithography systems |
| 05/25/2006 | US20060110665 Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus |
| 05/25/2006 | US20060110663 Mask for depositing thin film of flat panel display and method of fabricating the mask |
| 05/24/2006 | EP1658622A2 Method and system for drying a substrate |
| 05/23/2006 | US7049054 Between the outermost protective layer and the underlying imaging layers; said ionic latex polymer is other than a carboxy-containing latex polymer, for example methyl methacrylate-butyl acrylate-[2-(methacryloyloxy)ethyl]trimethylammonium chloride terpolymer; thermographic, photothermographic materials |
| 05/23/2006 | US7049051 Process for forming and acoustically connecting structures on a substrate |
| 05/23/2006 | US7049050 wafer is placed on the surface of a hot plate, the hot plate is then positioned under an angle with a horizontal direction and may be turned such that the active surface of the wafer, over which a photoresist mask has been formed, faces downwards; changing Critical Dimension in a layer of photoresist |
| 05/23/2006 | US7049034 Photomask having an internal substantially transparent etch stop layer |
| 05/18/2006 | WO2006053174A1 Holder for an x-ray sensing device |
| 05/18/2006 | WO2006050614A1 Printable substrate, processes and compositions for preparation thereof |
| 05/18/2006 | US20060107248 Generating mask patterns for alternating phase-shift mask lithography |
| 05/18/2006 | US20060105274 Method for forming a lithography mask |
| 05/18/2006 | US20060105273 Method for producing electronic device |
| 05/18/2006 | US20060105272 applying on a substrate a photoresist layer, applying above the photoresist layer an organic barrier layer of e.g. polysilicate, in a single step, thermally treating photoresist and barrier layer composition to remove solvent from the photoresist, immersion exposing photoresist to activation radiation |
| 05/18/2006 | US20060105265 Blue dye with particularly high purity and positive triboelectric control effect |
| 05/18/2006 | US20060105250 Test photomask and compensation method using the same |
| 05/18/2006 | US20060105249 Exposure mask and method of manufacturing the same |
| 05/18/2006 | US20060105248 Method of reducing the average process bias during production of a reticle |
| 05/18/2006 | US20060102859 Radiation image taking apparatus |
| 05/17/2006 | EP1656592A1 Charge control agent comprising a mixture of a triphenylmethane compound and a tetraphenylmethane |
| 05/16/2006 | US7047516 Proximity effect correction apparatus, proximity effect correction method, storage medium, and computer program product |
| 05/16/2006 | US7046413 System and method for dose control in a lithographic system |
| 05/16/2006 | US7046332 Exposure system and method with group compensation |
| 05/16/2006 | US7045275 Multilayer lithography; focusing particle beams; imaging marking element; determination position; high density storage |
| 05/16/2006 | US7045260 Post exposure modification of critical dimensions in mask fabrication |
| 05/16/2006 | US7045259 Post exposure modification of critical dimensions in mask fabrication |
| 05/16/2006 | US7045256 Invention uses a focused ion-beam exposure of the surface of the exposure mask to purposely "damage" this surface over the area where the opaque material is required to be present; accuracy, nonpeeling |
| 05/16/2006 | US7045255 For forming a fine pattern used for producing a semiconductor integrated circuit device; combination of a desired phase change and a desired transmittance can be selected arbitrarily for the phase shift film |
| 05/16/2006 | US7044662 Developing photoresist with supercritical fluid and developer |
| 05/11/2006 | US20060099537 Heat developing apparatus and heat developing method |
| 05/11/2006 | US20060099535 Pattern forming method and pattern forming apparatus |
| 05/11/2006 | US20060099533 Optical wavelength converting device and process for producing the same |
| 05/11/2006 | US20060099532 Method for manufacturing a substrate for use in a stamper manufacturing process, as well as a substrate obtained by using such a method |
| 05/11/2006 | US20060099521 Half tone mask, method for fabricating the same, and flat panel display using the same |
| 05/11/2006 | US20060099519 Method of depositing a material providing a specified attenuation and phase shift |
| 05/11/2006 | US20060099517 Phase shift mask fabrication method thereof and fabrication method of semiconductor apparatus |
| 05/11/2006 | US20060098788 Dental x-ray packets having non-lead radiation shielding |
| 05/11/2006 | US20060098787 Holder for an x-ray sensing device |
| 05/11/2006 | US20060096949 Method of forming a compliant template for UV imprinting |
| 05/11/2006 | DE102004053396A1 Photographic film recorder has digital images provided by such as a LCD monitor in housing base |
| 05/10/2006 | EP1654126A1 Process for providing marking on security papers |
| 05/10/2006 | CN1771464A Determination of center of focus by parameter variability analysis |
| 05/09/2006 | US7041418 Window between pattern layout; projecting laser beams; determination, calibration reflection |
| 05/04/2006 | WO2006004693A3 Method for bilayer resist plasma etch |
| 05/04/2006 | WO2005065303A3 Programmable self-aligning liquid magnetic nanoparticle masks and methods for their use |
| 05/04/2006 | US20060093971 transparent support glass with light attenuators, ultraviolet light exposure of photoresist layer is effectuated in predetermined patterns through exposure photomask having light-transmissive openings |
| 05/04/2006 | US20060093970 Combinations of preservatives and sequestrants to avoid formation of isonitrile malodor |
| 05/04/2006 | US20060093967 Methods of making an integrated waveguide photodetector |
| 05/04/2006 | US20060093964 Manufacturing method of microstructure, manufacturing method and manufacturing device of electronic device |
| 05/04/2006 | US20060093961 Method of verifying electron beam data |
| 05/04/2006 | US20060093927 Pattern mask with features to minimize the effect of aberrations |
| 05/04/2006 | US20060093926 Improving the margin by adding an un-transferable auxiliary pattern by preparing mask pattern data including a pair of two line patterns adjacent to each other in a short edge direction; disposing the auxiliary pattern to a resist film at a center of a space between the lines; semiconductors |
| 05/04/2006 | US20060093925 Method for repairing opaque defects in photolithography masks |
| 05/04/2006 | US20060093924 Method and apparatus for correction of defects in lithography masks |
| 05/03/2006 | EP1652007A1 Further method to pattern a substrate |
| 05/03/2006 | EP1652006A1 Psm alignment method and device |
| 05/02/2006 | US7038762 Method and apparatus for irradiating a microlithographic substrate |
| 05/02/2006 | US7037791 Application of single exposure alternating aperture phase shift mask to form sub 0.18 micron polysilicon gates |
| 05/02/2006 | US7037641 Silver halide emulsion sheet for detecting track of charged elementary particles, and processing method thereof |
| 05/02/2006 | US7037640 Image storage phosphor or scintillator panels coated onto flexible supports |
| 05/02/2006 | US7037628 Method of a floating pattern loading system in mask dry-etching critical dimension control |
| 05/02/2006 | CA2256559C N-bis- or n-tris-[(1,2-dicarboxy-ethoxy)-ethyl]-amine derivatives and preparation and use of the same |
| 04/27/2006 | WO2005123277A3 Optical films and methods of making the same |
| 04/27/2006 | WO2005115743A3 Light scattering euvl mask |
| 04/27/2006 | US20060088788 Composition for coating over a photoresist pattern |
| 04/27/2006 | US20060088772 Pattern-Distributed Mask |
| 04/27/2006 | US20060088771 A layer of anti-reflective material is formed on a trenched phase shift having portions of a light-blocking layer mask and then removed on horizontal surfaces of the mask and on the light-blocking portions; eliminates intensity imbalances between the alternating trenched and untrenched areas |
| 04/27/2006 | US20060086914 Image transfer and output method and system using the same |
| 04/27/2006 | US20060086913 Digital radiographic unit and a method for taking radiographs in a digital radiographic unit |
| 04/25/2006 | US7035001 High NA system for multiple mode imaging |
| 04/25/2006 | US7033851 Bump structure of a scattering reflective board and method for manufacturing the bump structure |
| 04/25/2006 | US7033738 Process of forming a micro-pattern of a metal or a metal oxide |
| 04/25/2006 | US7033735 Water soluble negative tone photoresist |
| 04/25/2006 | US7033724 Method for producing organically developable, photopolymerizable flexographic printing elements on flexible metallic supports |
| 04/25/2006 | US7033709 masking; selectively coding the spaced regions to define a masked read only memory (ROM) structure that causes optical interference; illumination; development; improved circuit density and reliability; miniaturization; integrated circuits |
| 04/20/2006 | US20060084016 Photosensitive layer having silver behenate, silver halide, reducing agent and binder; and a cyan coloring leuco dye derivative of P,P*-methylenediphenol or bis/P-hydroxyphenyl/sulfide; high density; light radiated image stability and silver color tone; heat resistance |
| 04/20/2006 | US20060084013 Developing solution composition and process for forming image using the composition |
| 04/20/2006 | US20060084010 Lithographic process |
| 04/20/2006 | US20060084009 bonding a patterned photoresist layer having crosslinking structures with a modified polyaniline, to form a conductive/light emitting membrane having high conductivity and transparency; films or layers of light emitting diodes |
| 04/20/2006 | US20060083998 Use of chromeless phase shift features to pattern large area line/space geometries |
| 04/20/2006 | US20060083997 Photomask with wavelength reduction material and pellicle |
| 04/20/2006 | US20060083996 Apparatus for exposing a substrate, photomask and modified illuminating system of the apparatus, and method of forming a pattern on a substrate using the apparatus |
| 04/20/2006 | US20060083995 Method of correcting mask data, method of manufacturing a mask and method of manufacturing a semiconductor device |
| 04/20/2006 | US20060083994 Method and apparatus for removing radiation side lobes |
| 04/20/2006 | US20060083993 Process for the production of photomasks for structuring semiconductor substrates by optical lithography |