| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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| 03/20/2008 | US20080070159 Stereolithography resins and methods |
| 03/20/2008 | US20080070158 Lithographic printing plate precursor and method for preparation of lithographic printing plate |
| 03/20/2008 | US20080070157 Cyclodextrin derivative, photoresist composition including the cyclodextrin derivative and method of forming a pattern using the photoresist composition |
| 03/20/2008 | US20080070133 Method for forming patterns using single mask |
| 03/20/2008 | US20080070131 computer softeware used to form latent images on photoresists |
| 03/20/2008 | US20080070126 lithography photomasks comprising attenuation segements including an layout of sub-resolution features, used for manufacturing semiconductor devices, by exposing and developing workpiece having a layer of photosensitive materials |
| 03/20/2008 | US20080070010 electron beam lithography; removal of pattern, removing a portion of the resist to provide a patterned resist-coated substrate,spin coating the patterned resist-coated substrate with a liquid sol precursor( CoFe2O4) crystallization by heating |
| 03/19/2008 | EP1000371A4 Ultra-broadband uv microscope imaging system with wide range zoom capability |
| 03/18/2008 | US7344824 Alternating aperture phase shift photomask having light absorption layer |
| 03/13/2008 | WO2008030950A2 Method of mask making to prevent phase edge and overlay shift for chrome-less phase shifting mask |
| 03/13/2008 | WO2008030428A2 Composition for forming a laser-markable coating and a laser-markable material containing organic absorption enhancement additives |
| 03/13/2008 | US20080063990 High Refractive Index Fluids for Immersion Lithography |
| 03/13/2008 | US20080063989 disposing a tri(1H,1H-perfluorooctyl-1-oxy)tridecafluoro-1,1,2,2-tetrahydrooctylsilane silane and Tri(1H,1H-heptafluoro-1-butoxy)methylgermane compounds such that radiation passes through at least a portion of the liquid before impinging on a surface to perform lithography at short wavelength |
| 03/13/2008 | US20080063987 An immersion boundary between an immersion area contact part and noncontact part on the immersion supporting plate formed when an immersion area is moved according to a predetermined exposure area and an exposure map is determined in advance. then, immersion supporting plate is cleaned while moving jig |
| 03/13/2008 | US20080063986 Method of forming fine pattern of semiconductor device |
| 03/13/2008 | US20080063985 Method for forming fine pattern of semiconductor device |
| 03/13/2008 | US20080063984 Process Solutions Containing Surfactants |
| 03/13/2008 | US20080063978 Photo-curable resin composition, method of patterning the same, and ink jet head and method of fabricating the same |
| 03/13/2008 | US20080063976 a silicon carbide, nitride or oxide, a polysisequioxanes, or a metal, or metal compound capable of diffusing to a top surface of the resist material, and has an etch rate different from that of the first material ( photoresist or a polymer) |
| 03/13/2008 | US20080063956 Mark position detection apparatus |
| 03/13/2008 | US20080063949 Functional Substrate |
| 03/13/2008 | US20080063948 Forming a photomask pattern comprising sub-resolution assist features (SRAF); improved techniques for dealing with illegal SRAF by reassigning them to another position without deleting so as not to interfer with optical proximity correction process |
| 03/13/2008 | US20080062223 Liquid ejection head, method of manufacturing liquid ejection head and image forming apparatus |
| 03/13/2008 | US20080061248 compositions suitable for use as immersion liquids in immersion lithography, and immersion lithography processes and apparatus for using the compositions with uv radiation |
| 03/12/2008 | CN100374956C A composition containing a photoacid generator monomer and carrier coated with the same and application thereof |
| 03/11/2008 | US7341824 Controlled-release layer is applied to a surface of substrate base; conductive metal layer is coated; creating dielectric peg; nozzle layer is applied; photolithography is used to define a trench; removing controlled-release layer |
| 03/06/2008 | US20080057448 improved uniform surface state; including a biphenol derivatives reducing agent for silver, polyvinyl butyral binder, non-photosensitive organic silver salt; Low fog, high image density, excellent image tone, and excellent raw stock storability |
| 03/06/2008 | US20080057447 rapid thermal processing of a photothermographic materials; involving a transport feed roller, light-insensitive layer or back coating layer contains a lubricant fatty ester, a biphenol derivatives reducing agent for silver |
| 03/06/2008 | US20080057446 having (meth)acryl and carboxyl groups can be developed with aqueous solution of weak alkaline sodium carbonate; patterned layer adherers to substrate; patterned protective coating for semiconductor and wirings, cover-lay film, and solder resist; copolymers of polyether, polysiloxane, polysulfones |
| 03/06/2008 | US20080057445 Self-aligned spatial frequency doubling |
| 03/06/2008 | US20080057444 stacking, exposure the first mask, developing the positive photoresist layer to form an intaglio, molding; forming a multiple levels in a simple process; use for forming circuit patterns |
| 03/06/2008 | US20080057443 Methods of improving single layer resist patterning scheme |
| 03/06/2008 | US20080057441 Method of manufacturing semiconductor device |
| 03/06/2008 | US20080057440 illuminators, supports and projectors arranged to transfer pattern onto substrates, and liquid supply system comprising tanks and fluid flow controllers; non-contact gas seal forms; using immersion lithography to increase throughput |
| 03/06/2008 | US20080057436 Photosensitive polymer and photoresist composition |
| 03/06/2008 | US20080057432 Toner composition and method of preparation |
| 03/06/2008 | US20080057418 Method and system for reducing overlay errors within exposure fields by apc control strategies |
| 03/06/2008 | US20080057411 Purification by removing sulfur, carbon and oxygen compounds by contact with excited oxygen; photoresist layer is removed with a sulfur hexafluoride; etching; binary, attenuated phase shift masks (APSMs) and high transmission attenuated photomasks; molybdenum-doped silicon oxynitride and chrome layers |
| 03/06/2008 | US20080057410 Repairing a defect by forming a phase voxel cavity in the photolithographic mask to compensate; microelectronics, semiconductors |
| 03/06/2008 | US20080057409 Method of Mask Making to Prevent Phase Edge and Overlay Shift For Chrome-Less Phase Shifting Mask |
| 03/06/2008 | US20080057408 Photomask and pattern forming method employing the same |
| 03/06/2008 | US20080055581 Devices and methods for pattern generation by ink lithography |
| 03/06/2008 | US20080055578 Roll printer with decomposed raster scan and X-Y distortion correction |
| 03/06/2008 | US20080054202 Storage Phosphor Layer and System and Method for Erasing Same |
| 03/06/2008 | US20080054201 Storage Phosphor Layer and System and Method for Erasing Same |
| 03/06/2008 | US20080054200 Storage Phosphor Layer and System and Method for Erasing Same |
| 03/05/2008 | EP1894049A2 System and method for increasing efficiency and quality for exposing images on celluloid or other photo sensitive material |
| 03/04/2008 | US7338752 Method for forming metal pattern and electromagnetic interference filter using pattern formed by the method |
| 03/04/2008 | US7338743 First polymer in which part of alkali-soluble groups are protected by an acid group labilized by an acid; a second polymer in which all alkali-soluble groups are protected by an acid group labilized by an acid; and an acid generator. |
| 03/04/2008 | US7338736 Method of fabricating a phase shift mask |
| 03/04/2008 | US7338609 Partial edge bead removal to allow improved grounding during e-beam mask writing |
| 02/28/2008 | US20080050682 Developer for Thermal Positive Type Photosensitive Composition |
| 02/28/2008 | US20080050679 Methods and systems for performing immersion processing during lithography |
| 02/28/2008 | US20080050678 Coating composition includes a solvent and 20 to 35 percent by weight of a polymer prepared by a condensation reaction of an acrylate polymer including a hydroxyl group with a derivative of muramic acid and a derivative of mandelic acid; enhanced optical properties, etching properties and coatabilities |
| 02/28/2008 | US20080050677 Processing method, manufacturing method of semiconductor device, and processing apparatus |
| 02/28/2008 | US20080050660 Multi-Layer Body Including a Diffractive Relief Structure and Method for Producing the Same |
| 02/28/2008 | US20080049281 Security hologram, method of recording same, and method of using same |
| 02/28/2008 | US20080048280 Light Receiving Device, Method for Fabricating Same, and Camera |
| 02/26/2008 | US7336341 Simulator of lithography tool for correcting focus error and critical dimension, simulation method for correcting focus error and critical dimension, and computer medium for storing computer program for simulator |
| 02/26/2008 | US7335466 Silver salt photothermographic dry imaging material, image recording method and image forming method for the same |
| 02/26/2008 | US7335449 The light-shielding layer is patterned to form a main pattern and a phantom pattern; eliminate optical proximity effects; substrate with the phantom pattern can be narrower; etched to form trenches in the substrate; photolithographic process to make semiconductor wafer |
| 02/21/2008 | WO2008022178A2 Method for separating optical and resist effects in process models |
| 02/21/2008 | US20080045005 Pattern formation method and method for forming semiconductor device |
| 02/21/2008 | US20080044989 Photomask and its method of manufacture |
| 02/21/2008 | US20080044777 Applying a coating of a liquid photosensitive resin to a foraminous element and juxtaposing thereto a first mask comprising both opaque and transparent regions; photosensitive resin is exposed to light; curing |
| 02/21/2008 | US20080044776 Underlayer compositions containing heterocyclic aromatic structures |
| 02/21/2008 | US20080044774 Method for exposing twice by two masks in semiconductor process |
| 02/21/2008 | US20080044773 Method of manufacturing a patterned color conversion layer, and methods of manufacturing a color conversion filter and an organic el display that use a color conversion layer obtained by the method |
| 02/21/2008 | US20080044771 Manufacturing method of fuel cell having micro sensors and polymer layers |
| 02/21/2008 | US20080044770 Process for forming resist pattern, semiconductor device and manufacturing method for the same |
| 02/21/2008 | US20080044769 Method for forming resist pattern, semiconductor device and production method thereof |
| 02/21/2008 | US20080044768 defocusing into a beam used during production of the mask to image the pattern on the mask; may eliminate the need for a second exposure with a trim mask; alignment problems associated with the second exposure may be avoided; single exposure may be more compatible with high speed manufacturing |
| 02/21/2008 | US20080044767 Negative-working imageable materials |
| 02/21/2008 | US20080044765 Ir Radical Polymerization-Type Photopolymer Plate Using Specific Binder Polymer |
| 02/21/2008 | US20080044759 Fine Pattern Forming Material, Method Of Forming Fine Resist Pattern And Electronic Device |
| 02/21/2008 | US20080044748 separating out the adverse effects of the exposure tool from the effects of the photoresist; exposure tool is adjusted to compensate for the errors; methodology includes a determination of where the simulator best focus location is in comparison to the empirically derived best focus location |
| 02/21/2008 | US20080044741 Metrology systems and methods for lithography processes |
| 02/21/2008 | US20080044739 Correction Of Resist Critical Dimension Variations In Lithography Processes |
| 02/21/2008 | US20080043213 Euv Light Source, Euv Exposure System, and Production Method for Semiconductor Device |
| 02/20/2008 | EP1888608A2 Ferric and acid complex |
| 02/20/2008 | EP1501688B8 Multilayer image, particularly a multicolor image |
| 02/19/2008 | US7333200 Overlay metrology method and apparatus using more than one grating per measurement direction |
| 02/19/2008 | US7332265 Silver halide color photographic light-sensitive material, and image-forming method |
| 02/19/2008 | US7332262 Forming amorphous carbon layer on semiconductor stack; etching; elimination of intermediate layer |
| 02/19/2008 | US7332255 enables the user to measure process line shortening on an overlay tool; means for determining the misalignment, means for determining total line shortening, means for determining the equipment line shortening, and means for determining process line shortening |
| 02/14/2008 | US20080038679 Developing agent and manufacturing method thereof |
| 02/14/2008 | US20080038678 ArF excimer laser beam (193 nm); lithography; photoresist; organic copolymer of pyrimidinetrione, imidazolidinedione, imidazolidinetrione or triazinetrione units and a diepoxide, and also a diacid to form a copolyester; solvent |
| 02/14/2008 | US20080038677 Patterning non-planar surfaces |
| 02/14/2008 | US20080038674 Composite Polymer Microfluidic Control Device |
| 02/14/2008 | US20080038672 Method for manufacturing electronic device, electronic device, and electronic apparatus |
| 02/14/2008 | US20080038671 Pattern forming method and apparatus |
| 02/14/2008 | US20080038670 Solder mask application process |
| 02/14/2008 | US20080038662 Polymer having a hydrocarbon chain backbone and containing units derived from norbornadiene, indene, benzofuran, benzothiophene, acenaphthene, or vinyl pyrene, fluorene, phenanthrene, chrysene, naphthacene, pentacene, or acenaphthene; excellent etching resistance; shorter wavelengths |
| 02/14/2008 | US20080038647 Liquid Developer, Method of Making Liquid Developer, Image Forming Method, and Image Forming Apparatus |
| 02/14/2008 | US20080036980 Pattern forming method and apparatus used for the same |
| 02/14/2008 | US20080035980 Mask for forming contact hole |
| 02/14/2008 | US20080035857 Method of manufacturing a radiation image storage panel |
| 02/07/2008 | US20080032244 Method and apparatus for forming crystalline portions of semiconductor film |
| 02/07/2008 | US20080032243 Photoresist Coating Composition and Method for Forming Fine Contact of Semiconductor Device |
| 02/07/2008 | US20080032240 Reduction of CO2 reaction at developer surface |