| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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| 06/29/2006 | US20060141375 Exposure apparatus, a tilting device method for performing a tilted focus test, and a device manufactured accordingly |
| 06/29/2006 | US20060141374 Lithographic apparatus with multiple alignment arrangements and alignment measuring method |
| 06/29/2006 | US20060141373 Lithographic apparatus and device manufacturing method |
| 06/29/2006 | US20060141372 Mask pattern and method for forming resist pattern using mask pattern thereof |
| 06/29/2006 | US20060141369 Correction is made to pattern data affected by a proximity effect when a pattern is formed on a photomask or wafer for a semiconductor device, by detecting, according to the design data, a space portion being placed on a photomask or wafer and having a specified size, detecting an edge to be corrected |
| 06/29/2006 | US20060141368 Designing the database patterns of the photo mask according to a design rule of a semiconductor element; performing optical proximity correction of the designed database patterns; detecting failure of the database patterns by obtaining a plurality of bias values based on at least two space width |
| 06/29/2006 | US20060141366 Method and system for optimization of transistor sizing based on layout density |
| 06/29/2006 | US20060141365 Designing method and device for phase shift mask |
| 06/29/2006 | US20060138410 Method for measuring information about a substrate, and a substrate for use in a lithographic apparatus |
| 06/28/2006 | EP1269257B1 Method of forming image on support |
| 06/28/2006 | CN2791070Y Automatic controller for closed loop electrolytic silver recovery |
| 06/27/2006 | US7068433 Focusing screen master and manufacturing method thereof |
| 06/27/2006 | US7068432 Controlling lens shape in a microlens array |
| 06/27/2006 | US7068297 Watermarking method for motion picture image sequence |
| 06/27/2006 | US7067242 a support with layers of a non-photosensitive source of reducible silver ions, a reducing agent and a binder with a conductive metal oxide; reducing electrostatic charge |
| 06/27/2006 | US7067240 Gray scale fabrication method using a spin-on glass material and integrated optical designs produced therefrom |
| 06/27/2006 | US7067238 Method for manufacturing a substrate for use in a stamper manufacturing process, as well as a substrate obtained by using such a method |
| 06/27/2006 | US7067236 Exposure to light source; development; plasma display panel; liquid crystals; screen printing electroconductive and dielectric paste |
| 06/27/2006 | US7067221 Designing method and device for phase shift mask |
| 06/22/2006 | WO2005038524A3 Novel photosensitive resin compositions |
| 06/22/2006 | US20060134558 Epoxy resin containing benzil monoxime pendant group; coating layer between an etching layer and a photoresist layer to absorb an exposure light in a photolithography |
| 06/22/2006 | US20060134557 Method and apparatus for thermal development having a textured support |
| 06/22/2006 | US20060134556 Methods and compositions for forming aperiodic patterned copolymer films |
| 06/22/2006 | US20060134555 Monolithic inkjet printhead and method of manufacturing the same |
| 06/22/2006 | US20060134544 Radiographic image conversion panel, method for manufacturing the same, method for forming phosphor particle, method for forming photostimulable phosphor precursor, phosphor precursor and photostimulable phosphor |
| 06/22/2006 | US20060134536 Method and system for determining post exposure bake endpoint |
| 06/22/2006 | US20060134535 Lensed fiber array for sub-micron optical lithography patterning |
| 06/22/2006 | US20060134534 Photomask and method for maintaining optical properties of the same |
| 06/22/2006 | US20060134532 lithography; photoresists; etching |
| 06/22/2006 | US20060134531 Mask for electromagnetic radiation and method of fabricating the same |
| 06/22/2006 | US20060134530 Multi-transmission phase mask and exposure method using the same |
| 06/22/2006 | US20060134529 Optimization to avoid sidelobe printing |
| 06/22/2006 | US20060133728 Fabrication of structures in an optical substrate |
| 06/22/2006 | US20060133579 Distortion corrector for digital radiograph |
| 06/22/2006 | US20060130969 Partial edge bead removal to allow improved grounding during e-beam mask writing |
| 06/21/2006 | EP1671186A2 Photoresist coating process for microlithography |
| 06/20/2006 | US7065737 Multi-layer overlay measurement and correction technique for IC manufacturing |
| 06/20/2006 | US7063938 filling a monomer solution into interstices of colloidal crystals for photopolymerization inside them; masking; not only more simplified two-dimensional patterns but also complicated two- or three-dimensional patterns can be obtained |
| 06/20/2006 | US7063921 Photomask, in particular alternating phase shift mask, with compensation structure |
| 06/15/2006 | US20060129968 Effective proximity effect correction methodology |
| 06/15/2006 | US20060127825 Developer composition for resists and method for formation of resist pattern |
| 06/15/2006 | US20060127824 Masks dividing patterns of a certain section and placing the parts on a plurality of masks or on different areas of the same mask and able to form the patterns of that section as before division by overlaying the masks or different areas |
| 06/15/2006 | US20060127822 Storing the fluid syringe that contains the photoresist solution within the coating module; instructing the dispense arm and gripper to select and removably engage the fluid syringe; actuating fluid syringe to dispense entire photoresist solution contained therein onto semiconductor wafer |
| 06/15/2006 | US20060127819 Method for producing optical fiber |
| 06/15/2006 | US20060127814 Mandrel with controlled release layer for multi-layer electroformed ink-jet orifice plates |
| 06/15/2006 | US20060127812 Impervious barrier film includes an alkali-soluble polymer and a basic amine, amide or imide; immersion photolithography using exposing light of a shorter wavelength, such as KrF or ArF excimer lasers, or F2 , ArKr, or Ar2 lasers; fine resist pattern; good shapes |
| 06/15/2006 | US20060127780 Forming a capping layer for a EUV mask and structures formed thereby |
| 06/15/2006 | US20060127779 Ultra-thin high-precision glass optic and method of manufacturing same |
| 06/15/2006 | US20060127729 Fuel cell |
| 06/15/2006 | US20060124875 Reading method for radiation image information and radiation image reading apparatus |
| 06/14/2006 | CN1788237A Method for evaluating the effects of multiple exposure processes in lithography |
| 06/13/2006 | US7062748 System and method of correcting mask rule violations after optical proximity correction |
| 06/13/2006 | US7061691 Optical lens and method of producing the same, method of producing optical lens array, focus error signal production method, and optical pickup apparatus |
| 06/13/2006 | US7061591 Maskless lithography systems and methods utilizing spatial light modulator arrays |
| 06/13/2006 | US7061589 Conduit for pumping light transmission into interior cavity between pellicle and masking structure |
| 06/13/2006 | US7060519 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server |
| 06/13/2006 | US7060423 Mixture of photosensitive silver halide emulsion, organosiliver compound, developer and binder |
| 06/13/2006 | US7060413 Radiation sensitive compositions and methods |
| 06/13/2006 | US7060400 Method to improve photomask critical dimension uniformity and photomask fabrication process |
| 06/13/2006 | US7060397 Using a charged particle beam to eliminate attached particles from the result of splashing, correcting defects; semiconductor wafer |
| 06/08/2006 | WO2006060504A2 Tri-tone trim mask for alternating phase-shift photolithography |
| 06/08/2006 | US20060122408 Photogenerated reagents |
| 06/08/2006 | US20060121743 Flow control of photo-polymerizable resin |
| 06/08/2006 | US20060121393 Green sheet and method of manufacturing the same, and a method of manufacturing a plasma display panel |
| 06/08/2006 | US20060121375 System and method utilizing an electrooptic modulator |
| 06/08/2006 | US20060121374 Method for determining pattern misalignment over a substrate |
| 06/08/2006 | US20060121373 Method and structure for manufacturing bonded substrates using multiple photolithography tools |
| 06/08/2006 | US20060121368 Photomask structure and method of reducing lens aberration and pattern displacement |
| 06/08/2006 | US20060121367 Method for producing photomask and method for producing photomask pattern layout |
| 06/08/2006 | US20060121366 Semiconductors, liquid crystal displays; patterning any size or shape by exposure using only one photomask; the mask pattern has a light-shielding film and a phase shifter; light shield zones; chromium film and phase shifting mask on radiation transparent substrate; design masking pattern |
| 06/08/2006 | US20060121365 Mask and exposure device |
| 06/08/2006 | US20060121362 Accurate manufacturing fine patterns for semiconductor wafers by reducing variation of critical dimensions due to lens aberration; subsidiary patterns added into holes formed through ring gate patterns of vertical symmetrical structures to separate them from the ring gate patterns by a designed distance |
| 06/08/2006 | US20060121361 Reticles and methods of forming reticles |
| 06/08/2006 | US20060119827 Maskless optical writer |
| 06/08/2006 | US20060119816 Sensor shield |
| 06/08/2006 | DE102004031398B4 Verfahren zur photolithographischen Projektion eines Musters auf einen Halbleiterwafer mit einer alternierenden Phasenmaske Photolithographic process for projecting a pattern on a semiconductor wafer with an alternating phase mask |
| 06/07/2006 | EP1664936A2 Forming partial-depth features in polymer film |
| 06/07/2006 | EP1664923A1 Negative resist composition with fluorosulfonamide-containing polymer |
| 06/06/2006 | US7057715 Lithography tool test patterns and method |
| 06/06/2006 | US7056650 Thermally developable materials containing cationic overcoat polymer |
| 06/06/2006 | US7056649 Process for producing a tool insert for injection molding a part with two-stage microstructures |
| 06/06/2006 | US7056647 Semiconductors |
| 06/06/2006 | US7056631 Exposure system and method with group compensation |
| 06/06/2006 | US7056627 forming stress correction film between reflection film for reflecting exposure light on substrates and absorber layers for absorbing exposure light; multilayers used for pattern transfer of semiconductors |
| 06/06/2006 | US7056015 Intraoral dental radiology positioning device |
| 06/01/2006 | US20060115773 can improve resolution of the features created on the master by reducing mastering noise; etch stop layer thickness may be selected to be as thin as possible to reduce surface roughness of the multi-layer structure |
| 06/01/2006 | US20060115772 Polymeric tetrahedral carbon films, methods of forming the same and methods of forming fine patterns using the same |
| 06/01/2006 | US20060115771 Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus |
| 06/01/2006 | US20060115770 Printed circuit board including embedded capacitor and method of fabricating same |
| 06/01/2006 | US20060115753 Method and apparatus for performing target-image-based optical proximity correction |
| 06/01/2006 | US20060115752 producing a pattern with pattern generator using modified pattern data set, patterning the beam of radiation with the pattern generator having the pattern based on the production, and projecting the patterned beam onto a target portion of an object |
| 06/01/2006 | US20060115751 Automated overlay metrology system |
| 06/01/2006 | US20060115747 Photo mask structure used during twice-performed photo process and methods of using the same |
| 06/01/2006 | US20060115746 Focus monitoring masks having multiple phase shifter units and methods for fabricating the same |
| 06/01/2006 | US20060115745 Electron beam exposure mask, electron beam exposure method, and electron beam exposure system |
| 06/01/2006 | US20060115743 Dicing lines extending longitudinally and transversely, and chip areas surrounded by the dicing lines are formed in a resist mask; critical-dimension patterns are formed in the dicing lines so as to be paired while placing the center line in between; for verification of process accuracy |
| 06/01/2006 | US20060115742 Tri-tone trim mask for an alternating phase-shift exposure system |
| 06/01/2006 | US20060115053 Unit for acquiring dental radiographic images |
| 06/01/2006 | US20060113280 Partial edge bead removal to allow improved grounding during e-beam mask writing |
| 05/31/2006 | CN1781106A Effective proximity effect correction methodology |