| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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| 03/16/2006 | US20060057506 Controlling resist profiles through substrate modification |
| 03/16/2006 | US20060057501 Antireflective compositions for photoresists |
| 03/16/2006 | US20060057499 Highly reflective substrates for the digital processing of photopolymer printing plates |
| 03/16/2006 | US20060057476 Antireflective coating; making semiconductors at lower wavelengths using reflective masks that can be effectively inspected at multiple wavelengths; wide bandwidth inspection contrast for extreme ultra-violet reticles |
| 03/16/2006 | US20060057475 Binary optical proximity correction; forming a photolithographic mask layout with Sub-Resolution Assist Feature; computer programs; process control |
| 03/16/2006 | US20060057474 Photomasks; optics |
| 03/16/2006 | US20060057473 photomasks; phase shifting |
| 03/16/2006 | US20060057471 Lithographic apparatus and device manufacturing method |
| 03/16/2006 | US20060057362 Coatings containing nanotubes, methods of applying the same and transparencies incorporating the same |
| 03/16/2006 | US20060054868 Coatings containing nanotubes, methods of applying the same and substrates incorporating the same |
| 03/15/2006 | EP1634122A1 Method for evaluating the effects of multiple exposure processes in lithography |
| 03/15/2006 | EP1634120A1 Highly reflectivesubstrates for the digital processing of photopolymer printing plates |
| 03/14/2006 | US7013439 Contrast based resolution enhancing technology |
| 03/14/2006 | US7011936 Photomask and method of structuring a photoresist by double exposure with imaging auxiliary structures and different exposure tools |
| 03/14/2006 | US7011930 Method for control of temperature-sensitivity of polymers in solution |
| 03/14/2006 | US7011927 Electron beam duplication lithography method and apparatus |
| 03/14/2006 | US7011926 Gap forming pattern fracturing method for forming optical proximity corrected masking layer |
| 03/14/2006 | US7011909 Radiation phase shifting partially transparent layer; producing semiconductors |
| 03/09/2006 | WO2006026280A2 Method for reducing acrylamide formation in thermally processed foods |
| 03/09/2006 | WO2006026278A2 Method for reducing acrylamide formation in thermally processed foods |
| 03/09/2006 | US20060051710 Compound containing an anthranilic acid blocking group |
| 03/09/2006 | US20060051687 Inspection system and inspection method for pattern profile |
| 03/09/2006 | US20060051684 Photo-mask having exposure blocking region and methods of designing and fabricating the same |
| 03/09/2006 | US20060051683 Method of manufacturing mask for exposure, mask for exposure, and package body of mask for exposure |
| 03/09/2006 | US20060051681 Method of repairing a photomask having an internal etch stop layer |
| 03/09/2006 | US20060051679 Lithographic method for wiring a side surface of a substrate |
| 03/09/2006 | US20060049137 Multi-step process for etching photomasks |
| 03/07/2006 | US7010764 Effective proximity effect correction methodology |
| 03/07/2006 | US7010434 Complementary division condition determining method and program and complementary division method |
| 03/07/2006 | US7009753 Pattern generator |
| 03/07/2006 | US7008883 Photoresist composition for forming an insulation film, insulation film for organic electroluminescence devices and process for producing the insulation film |
| 03/07/2006 | US7008761 Precipitation of silver halide particles, used in photosensitive silver halide emulsions in photography |
| 03/07/2006 | US7008756 Method of fabricating an X/Y alignment vernier |
| 03/07/2006 | US7008748 Silver salt-toner co-precipitates and imaging materials |
| 03/07/2006 | US7008735 Mask for improving lithography performance by using multi-transmittance photomask |
| 03/07/2006 | US7008733 Method of improving a resolution of contact hole patterns by utilizing alternate phase shift principle |
| 03/07/2006 | US7008732 substrate with main patterns and sub-resolution assistant features, with 180 degree phase differences between assistant features and main pattern; high resolution |
| 03/07/2006 | US7008731 Method of manufacturing a photomask and method of manufacturing a semiconductor device using the photomask |
| 03/07/2006 | US7008730 Application of high transmittance attenuating phase shifting mask with dark tone for sub-0.1 micrometer logic device contact hole pattern in 193 NM lithography |
| 03/07/2006 | US7008729 Method for fabricating phase mask of photolithography process |
| 03/02/2006 | WO2006022405A1 Silver halide color photographic photosensitive material and method of image forming |
| 03/02/2006 | US20060046497 Manufacturing method |
| 03/02/2006 | US20060046209 Image forming method |
| 03/02/2006 | US20060046168 Method for designing an illumination light source, method for designing a mask pattern, method for manufacturing a photomask, method for manufacturing a semiconductor device and a computer program product |
| 03/02/2006 | US20060046167 measuring the flare density function of a projection lens using a test mask and a photoresist detector that comprises a positive photoresist film deposited on a wafer |
| 03/02/2006 | US20060046166 Controlling critical dimensions of structures formed on a wafer in semiconductor processing |
| 03/02/2006 | US20060046165 Lithographic apparatus, device manufacturing method, calibration method and computer program product |
| 03/02/2006 | US20060046162 Manufacturing method of semiconductor device |
| 03/02/2006 | US20060046160 bridging the mask gap between the first feature and the second feature; design of a microelectronic device; printing patterns for integrated circuits on semiconductor wafers; computer program product comprising instructions for data processing apparatus to perform operations |
| 03/02/2006 | US20060046159 Methods of manufacturing substrates with multiple images |
| 03/02/2006 | US20060046158 Substrates with multiple images |
| 03/02/2006 | US20060045518 Replenishment system for a print media processor |
| 03/02/2006 | US20060042753 Method for transferring process control models between plasma processing chambers |
| 03/01/2006 | CN1740914A Exposure apparatus |
| 02/28/2006 | US7006195 Method and system for improving exposure uniformity in a step and repeat process |
| 02/28/2006 | US7005251 Silver salt photothermographic dry imaging material, image recording method and image forming method for the same |
| 02/28/2006 | US7005249 Apparatus for processing substrate and method of processing the same |
| 02/28/2006 | US7005248 Method of forming cavity between multilayered wirings |
| 02/28/2006 | US7005246 Forming antireflective films for liquid crystal displays byshifting a laser or electronic beam against the process target material and simultaneously repeating irradiation in an intermittent mannerto form convex microstructures; accuracy |
| 02/28/2006 | US7005240 Depositing a second layer on first layer; using a lithographic projection for forming elevated structure; conformally depositing a third layer on elevated first structure and on first layer; etching back third layer for forming spacer |
| 02/28/2006 | US7005238 Exposing a chemically amplified photoresist on a substrate supported by a heating plate having a porous partition facing the surface where in the space over the partion an air stream formation mechanism discharges the acid evaporated formed |
| 02/28/2006 | US7005237 Method of making information storage devices by molecular photolithography |
| 02/28/2006 | US7005232 Highly reflective substrates for the digital processing of photopolymer printing plates |
| 02/28/2006 | US7005226 X-ray films comprising supports, multilayer of silver halide emulsions, hydrophilic colloid layers, merocyanine or oxonol dyes, and fluorescence intensifier screens having phosphors and polymer binders, used in medical diagnosis |
| 02/28/2006 | US7005220 Method for structuring a lithography mask |
| 02/28/2006 | US7005215 Mask repair using multiple exposures |
| 02/23/2006 | WO2006020194A2 Imprint alignment method, system, and template |
| 02/23/2006 | US20060040218 Terpene ether solvents |
| 02/23/2006 | US20060040191 Detection method for optimum position detection formula, alignment method, exposure method, device production method, device, and measurement and/or inspection apparatus |
| 02/23/2006 | US20060040190 Providing a substrate with a photoresist coating;selecting a first mask image, selecting a plurality of second mask images, aligning, imaging and thereafter printing the first mask image onto the photoresist coating; sequentially aligning, imaging and printing |
| 02/23/2006 | US20060040189 Advanced oriented assist features for integrated circuit hole patterns |
| 02/23/2006 | US20060040188 Method for designing alternating phase shift masks |
| 02/23/2006 | US20060040187 Lithographic apparatus, method, and computer program product for generating a mask pattern and device manufacturing method using same |
| 02/23/2006 | US20060038888 Image transmission apparatus |
| 02/23/2006 | US20060038134 Radiographic intensifying screen |
| 02/22/2006 | EP1627406A1 Unbaked laminate for producing front plate of plasma display device, and method for producing front plate of plasma display device |
| 02/22/2006 | CN1739065A Method of patterning photoresist on a wafer using a transmission mask with a carbon layer |
| 02/22/2006 | CN1739064A Photoresist removal |
| 02/21/2006 | US7003757 Dissection of edges with projection points in a fabrication layout for correcting proximity effects |
| 02/21/2006 | US7002666 Lithographic apparatus and device manufacturing method |
| 02/21/2006 | US7001711 Patterning method using a photomask |
| 02/21/2006 | US7001710 Method for forming ultra fine contact holes in semiconductor devices |
| 02/21/2006 | US7001694 Photomask and method for producing the same |
| 02/21/2006 | US7001692 Method of forming a mask having nitride film |
| 02/21/2006 | US7001085 Monitoring the concentration of a retarding by-product during automatic high-speed processing by reducing the concentration in the solution by a first method; if exceeding the limit, activating concurrent operation of a second method |
| 02/21/2006 | US7000315 Method of making photolithographically-patterned out-of-plane coil structures |
| 02/16/2006 | US20060035177 Color developing compositions and methods of use |
| 02/16/2006 | US20060035160 A single patterning tool capable of exposing a substrate in large, low resolution areas and small, high resolution areas; integrated circuits; flat panel display screens |
| 02/16/2006 | US20060035159 Method of providing alignment marks, method of aligning a substrate, device manufacturing method, computer program, and device |
| 02/16/2006 | US20060035158 Flowing a reference pattern and an inspection pattern with a first line and a number of parallel second lines and a reference pattern in the orthogonal direction to that in which the first line extends by heating the resist; measuring the distance between the centers of the patterns; checking variations |
| 02/16/2006 | US20060035157 Depositing resist on portion of workpiece, transferring pattern on mask by exposing to light from light guiding cable with connector, mask removable by connector, developing, forming pattern by etching |
| 02/16/2006 | US20060035156 Reticle constructions and methods of forming reticles |
| 02/16/2006 | US20060033900 Exposure method and apparatus |
| 02/15/2006 | CN1734706A A process for controlling the proximity effect correction |
| 02/14/2006 | US6999160 Optimization method of aperture type of projection aligner |
| 02/14/2006 | US6999157 Illumination optical system and method, and exposure apparatus |
| 02/14/2006 | US6998219 Three-dimensional multilayer structure; photolithography; generating ultraviolet light; forming pattern |
| 02/14/2006 | US6998217 Gray scale lithography; accurate, uniform reticle writing smaller features |
| 02/14/2006 | US6998216 Mechanically robust interconnect for low-k dielectric material using post treatment |
| 02/14/2006 | US6998204 patterning the non-transparent film using the etch stop layer to expose areas of the transparent substrate, forming a mask on the non-transparent film to protect selected areas of the transparent substrate and forming a phase shift oxide |