| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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| 02/07/2008 | US20080032239 Pattern formation method |
| 02/07/2008 | US20080032238 System and method for controlling the size and/or distribution of catalyst nanoparticles for nanostructure growth |
| 02/07/2008 | US20080032233 Crossbar-array designs and wire addressing methods that tolerate misalignment of electrical components at wire overlap points |
| 02/07/2008 | US20080032232 Novel resins and photoresist compositions comprising same |
| 02/07/2008 | US20080032230 Substrate used for immersion lithography process, method of manufacturing substrate used for immersion lithography process, and immersion lithography |
| 02/07/2008 | US20080032207 Method for correcting optical proximity effects |
| 02/07/2008 | US20080032206 Photomask registration errors of which have been corrected and method of correcting registration errors of photomask |
| 02/07/2008 | US20080032205 Formed on photomask during integrated circuit processing |
| 02/07/2008 | US20080032204 Methods of optical proximity correction |
| 02/07/2008 | US20080032203 Lithographic method and patterning device |
| 02/07/2008 | US20080029714 Digital camera with integrated infrared (IR) response |
| 02/07/2008 | US20080029708 Digital camera with integrated ultraviolet (UV) response |
| 02/05/2008 | US7327377 Exposure apparatus and method for exposing a photosensitive material with a plurality of exposure heads |
| 02/05/2008 | US7327013 Stencil mask with charge-up prevention and method of manufacturing the same |
| 02/05/2008 | US7326527 Silver salt photothermographic dry imaging material and image forming method by use thereof |
| 02/05/2008 | US7326519 Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern using the photoresist composition |
| 02/05/2008 | US7326518 Photoresist compositions |
| 02/05/2008 | US7326505 Conveying the substrate to an exposing position of a lithographic apparatus, exposing the substrate at the exposing position to a beam of radiation, conveying the exposed substrate from the exposing position toward a processing position |
| 02/05/2008 | US7326501 Method for correcting focus-dependent line shifts in printing with sidewall chrome alternating aperture masks (SCAAM) |
| 01/31/2008 | US20080028358 Quick and accurate modeling of transmitted field |
| 01/31/2008 | US20080026333 Comprising blue-sensitive layer, green-sensitive layer and red-sensitive layer on a transparent support; capable of recording digital image information without deterioration |
| 01/31/2008 | US20080026332 Developing agent and manufacturing method thereof |
| 01/31/2008 | US20080026331 Lactone-containing compound, polymer, resist composition, and patterning process |
| 01/31/2008 | US20080026330 Immersion topcoat materials with improved performance |
| 01/31/2008 | US20080026329 Surface modification of polymer surface using ion beam irradiation |
| 01/31/2008 | US20080026328 Method for fabricating a structure for a microelectromechanical systems (mems) device |
| 01/31/2008 | US20080026327 Method for forming fine pattern with a double exposure technology |
| 01/31/2008 | US20080026326 Method of producing thin film magnetic head |
| 01/31/2008 | US20080026325 Adding a layer of metal to a wafer having a thin film layer and a release layer to which has been transferred a pattern from a photoresist; heating to cause deformation and cracking; applying a solvent to penetrate the cracks to reach and dissolve the release layer; andremoving the release layer |
| 01/31/2008 | US20080026318 depositing a metal layer into the opening to form a roughening metal bump with improved adhesion; first depositing a composite sacrificial material comprises photoresist material with a filler mixture, irradiating to form a opening, baking, developing; flip-chip packaging a microelectronic chip |
| 01/31/2008 | US20080026314 Silane Compound, Polysiloxane, and Radiation-Sensitive Resin Composition |
| 01/31/2008 | US20080026306 Patterning and treatment methods for organic light emitting diode devices |
| 01/31/2008 | US20080026305 Apparatus and method for alignment using multiple wavelengths of light |
| 01/31/2008 | US20080026298 Determining minimum resolvable pitch of spaced, adjacent line elements, wherein each of the line elements are separately resolvable when projected by the lithographic imaging system, and selecting a process monitor grating period; designing a process monitor grating pattern; sensitivity to dose and focus |
| 01/31/2008 | US20080025754 Toner for developing electrostatic latent image and method of manufacturing same, electrostatic latent image developer, cartridge, and image forming apparatus |
| 01/31/2008 | US20080025467 Intraoral dental radiology positioning device for use with x-ray receptor |
| 01/30/2008 | CN100365502C Laser label on light sensitive material and light sensitive material including said label |
| 01/29/2008 | US7323294 Photographic colour material containing a resorcinol derivative as black coupler |
| 01/29/2008 | US7323291 Dual layer workpiece masking and manufacturing process |
| 01/29/2008 | US7323278 Method of adding fabrication monitors to integrated circuit chips |
| 01/29/2008 | US7323277 Photomask |
| 01/24/2008 | WO2008011497A2 Optical diffusers, photomasks and their methods of fabrication |
| 01/24/2008 | WO2007120835A3 Methods and apparatus for preserving orientation information in radiography images |
| 01/24/2008 | US20080021525 In vivo implantable coil assembly |
| 01/24/2008 | US20080020330 Method for Developing a Photoresist |
| 01/24/2008 | US20080020328 Method for forming micropattern |
| 01/24/2008 | US20080020326 forming a complicated layout; merging the pattern for first exposure of the first patterns with the pattern for second exposure of the second patterns; forming a semiconductor device |
| 01/24/2008 | US20080020325 Positive and negative dual function magnetic resist lithography |
| 01/24/2008 | US20080020304 Electrical, Plating And Catalytic Uses Of Metal Nanomaterial Compositions |
| 01/24/2008 | US20080020302 Device having etched feature with shrinkage carryover |
| 01/24/2008 | US20080020301 Method and device for fabricating nano-structure with patterned particle beam |
| 01/24/2008 | US20080020299 Mask and manufacturing method of microlens using thereof |
| 01/24/2008 | US20080020296 by utilizing a dark field in the imaging process, it is possible to eliminate the complications associated with shielding previously imaged features when utilizing a clear field imaging; enabled by a non-transitory computer readable medium |
| 01/24/2008 | US20080020295 Exposure mask and method for manufacturing semiconductor device using the same |
| 01/24/2008 | US20080020294 test photomask includes first mask pattern and second mask pattern formed at center portion of first; first mask pattern is pattern with light condensing effect and nature in which exposure-dose amount to transfer object varies in dependence on focus variation, a two-dimensional Fresnel zone pattern |
| 01/24/2008 | US20080020293 Vortex mask and method for preparing the same and method for preparing a circular pattern using the same |
| 01/24/2008 | US20080020292 photoresists; photomasks |
| 01/24/2008 | US20080020291 large mask with random apertures formed by forming smaller mask with random pattern of transmissive apertures created by perturbing; uniformity |
| 01/24/2008 | US20080020288 Resist Composition and Process for Formation of Resist Patterns |
| 01/24/2008 | US20080018981 Spatial light modulator features |
| 01/24/2008 | US20080018712 Liquid discharge head and method of manufacturing the same |
| 01/22/2008 | US7321012 crosslinking by oxidation in the solid or swollen state, where the swollen state refers to the polymer swollen by solvent without being dissolved in it; polythiophenes for example; electrolytic cells |
| 01/22/2008 | US7320847 locally etching first substrate as far as protective layer to form a trench around a reversed alignment marker; forming a patterned layer on a second surface of first substrate using a lithographic projector having a front-to-back alignment system |
| 01/17/2008 | WO2007117319A3 Phase shifting mask having a calibration feature and method therefor |
| 01/17/2008 | WO2007005169A3 Color film developer composition and process therefor |
| 01/17/2008 | US20080014536 Colorant-Containing Curable Composition, Color Filter Using The Composition, And Method For Manufacturing The Same |
| 01/17/2008 | US20080014535 photoresists; Scanning Electron Microscope, Charge-Coupled Device camera, image analysis device |
| 01/17/2008 | US20080014533 Semiconductor device fabrication and dry develop process suitable for critical dimension tunability and profile control |
| 01/17/2008 | US20080014532 Laminate body, and method for manufacturing thin substrate using the laminate body |
| 01/17/2008 | US20080014513 Xerographic print including portions having a surface tension of no more than 22 mN/m at 25 Deg. C. resulting in a surface tension gradient field; polymeric coating with a surfactant; no pinholes and sufficiently resistant to permeation by the fuser oil to exhibit an absence of haze after 24 hours |
| 01/17/2008 | US20080014511 Photomask with overlay mark and method of fabricating semiconductor device |
| 01/17/2008 | US20080014510 Photomask designing apparatus, photomask, photomask designing method, photomask designing program and computer-readable storage medium on which the photomask designing program is stored |
| 01/17/2008 | US20080013946 Developing method and developing unit |
| 01/15/2008 | US7320110 Multiple language user interface for thermal comfort controller |
| 01/15/2008 | US7319505 Exposure apparatus and device fabrication method |
| 01/15/2008 | US7319396 RFID transducer alignment system |
| 01/15/2008 | US7318993 Doping selected regions of a semiconductor mask layer formed on a carrier with a hard mask layer with a selective ion implantation (direct lithographic writing); wet chemical removal of a doped region to form a semiconductor mask; patterning the carrier using the mask (anisotropic etch); high precision |
| 01/15/2008 | US7318991 Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether |
| 01/10/2008 | US20080008973 Substrate processing method and substrate processing apparatus |
| 01/10/2008 | US20080008972 Method for Automatically Generating at Least One of a Mask Layout and an Illumination Pixel Pattern of an Imaging System |
| 01/10/2008 | US20080008968 Coating method for non-destructive examination of articles of manufacture |
| 01/10/2008 | US20080008967 Utilization of electric field with isotropic development in photolithography |
| 01/10/2008 | US20080008965 Ester compounds and their preparation, polymers, resist compositions and patterning process |
| 01/10/2008 | US20080008963 Reversible heat-sensitive recording medium and method of recording an image using the heat-sensitive recording medium |
| 01/10/2008 | US20080008962 photoresists; heat treatment; improved sensitivity and resolution, for micropatterning lithography |
| 01/10/2008 | US20080008961 Comprising resin component and compound which generates an acid in response to actinic light or radiation; suitable for microfabrication lithography with advantages of resolution, pattern density dependence and mask fidelity |
| 01/10/2008 | US20080008960 Mixture of an adamantane acrylic ester resin which becomes soluble in alkaline developer under action of an acid and sulfonium salt acid generator; microlithography with advantages of resolution, pattern density dependence and mask fidelity; use in precise microfabrication |
| 01/10/2008 | US20080008959 Resin comprising monomers of cyclopentyl- or cyclohexyl (meth)acrylate; hydroxyadamantyl (meth)acrylate; 3,8-epoxy-6-oxabicyclo[3.2.1]octyl (meth)acrylat;, and/or fluoroalkyl (meth)acrylate; ArF lithography; resolution; forms a pattern with high rectangularity |
| 01/10/2008 | US20080008941 coating wafer with photoresist film, irradiating; phase shifters containing molybdenum silicides; photolithography; waveguide effect prevention |
| 01/08/2008 | US7317504 Lithographic apparatus and device manufacturing method |
| 01/08/2008 | US7316895 Mixing the dispersion with an organic polymer to separate the silver halide particles from the dispersion; low fogging, high image density, high sensitivity and superior storage stability |
| 01/08/2008 | US7316893 Modular containment cell arrangements |
| 01/08/2008 | US7316892 Process of preparing planographic printing plate |
| 01/08/2008 | US7316872 Etching bias reduction |
| 01/08/2008 | US7316870 Device manufacturing method, mask set for use in the method, data set for controlling a programmable patterning device, method of generating a mask pattern and a computer program |
| 01/03/2008 | US20080003837 Substrate processing method and semiconductor device manufacturing method carried out in a lithographic process |
| 01/03/2008 | US20080003529 (Meth)Acrylate, Polymer and Resist Composition |
| 01/03/2008 | US20080003528 Photo-masks and methods of fabricating surface-relief grating diffractive devices |
| 01/03/2008 | US20080003527 Photosensitive protecting layer; radiation transparent; liquid crystal displays; thin film transistors |
| 01/03/2008 | US20080003526 Method for fabricating liquid crystal display device |