| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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| 05/10/2007 | US20070105055 Manufacturing method of master disc for optical disc, and master disc for optical disc |
| 05/10/2007 | US20070105029 semiconductors; lithography; etching; microelectronics |
| 05/10/2007 | US20070105028 Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device |
| 05/10/2007 | US20070105027 first protective material layer covering top surface of one bump defect, wherein a portion of side surfaces of bump defect remains uncovered by any protective material layer; second protective material layer covering areas of mask adjacent at least one bump defect; minimizing damage of surrounding area |
| 05/10/2007 | US20070105026 Mask, mask blank, and methods of producing these |
| 05/10/2007 | US20070105025 Mask, mask blank, and methods of producing these |
| 05/10/2007 | US20070102651 includes semiconductor substrate and bottom coupled die |
| 05/09/2007 | CN1315006C Colour developing liquid treating agent composition for silver coloured camera photosensitive materials and method thereof |
| 05/08/2007 | US7215411 Method of exposing wafer using scan-type exposure apparatus |
| 05/08/2007 | US7214476 Image forming method using photothermographic material |
| 05/08/2007 | US7214475 Compound for optical materials and methods of fabrication |
| 05/08/2007 | US7214474 Poly(dodecylacrylate-co-sodium acrylate), poly(styrene-co-alpha-methylstyrene-co-acrylic acid), poly(acrylic acid-co-methyl methacrylate), hydrophobic poly(acrylic acid), poly (vinylnaphtalene-alt-maleic acid)-g-polystyrene, and a poly(2-hydroxyethyl-11-methacryloyloxyundecyldimethylammonium bromide) |
| 05/08/2007 | US7214464 Fog-density development in exposed areas of the image is imagewise inhibited by the presence of one of two organic silver salts that releases a density-inhibiting agent upon thermal development |
| 05/03/2007 | US20070099130 Developer for recording materials |
| 05/03/2007 | US20070099129 Developing method and developing apparatus |
| 05/03/2007 | US20070099125 Fabrication Method for a Damascene Bit Line Contact Plug |
| 05/03/2007 | US20070099124 Composition for Removing Immersion Lithography Solution and Method for Manufacturing Semiconductor Device Including Immersion Lithography Process Using the Same |
| 05/03/2007 | US20070099123 Method of forming solder mask and wiring board with solder mask |
| 05/03/2007 | US20070099121 forming a discharge port used to discharge a liquid, through a photolithographic process and forming a flow path; coating layer contains a copolymer of methacrylic anhydride and methyl methacrylate; small droplets are accurately discharged |
| 05/03/2007 | US20070099120 Developing solution for lithographic printing plate precursor and method for making lithographic printing plate |
| 05/03/2007 | US20070099100 Method for exposing a substrate and lithographic projection apparatus |
| 05/03/2007 | US20070099098 Reference marks is placed inside a pattern area on a first layer mask which is used to form the first layer pattern, plurality of second reference marks is placed on a second layer mask which is used to form the second layer pattern and in which one second reference mark is matched |
| 05/03/2007 | US20070099097 Multi-purpose measurement marks for semiconductor devices, and methods, systems and computer program products for using same |
| 05/03/2007 | US20070099091 Method of the adjustable matching map system in lithography |
| 05/03/2007 | US20070098886 Methods of forming coatings containing nanotubes and methods of applying the same |
| 05/03/2007 | DE102004014482B4 Verfahren zum Erweitern von Limitierungen für Strukturweiten beim Herstellungsprozess von Fotomasken Method for upgrading of limitations for feature sizes in the manufacturing process of photomasks |
| 05/02/2007 | EP1779199A1 Aqueous edge bead remover |
| 05/02/2007 | CN1313885C Method of removing resist pattern |
| 05/01/2007 | US7212688 Computer program and method for converting an image to machine control data |
| 05/01/2007 | US7211815 Masking; printing a pattern using; determination, calibration, adjustment |
| 05/01/2007 | US7211356 Method of patterning a substrate by feeding mask defect data forward for subsequent correction |
| 05/01/2007 | US7210865 Automatic developing apparatus and process for forming image using the same |
| 04/26/2007 | WO2005114324A3 Coatings containing nanotubes, methods of applying the same and substrates incorporating the same |
| 04/26/2007 | US20070092842 Method of recording and reading digital data on a photographic support |
| 04/26/2007 | US20070092839 Polarizing photolithography system |
| 04/26/2007 | US20070092811 for use in a photolithography process which uses a polarized light as an illumination light; inspecting the size of the birefringence of each of the photomask substrate candidates, and selecting a photomask substrate, in which the size of the birefringence satisfies the standard value |
| 04/26/2007 | US20070092808 which reduces transmittance for inspecting light by increasing reflectance; for enhancing resolution of transfer patterns; photolithography |
| 04/26/2007 | US20070092806 Amplitude patterns of molybenem silicideon a surface and phase patterns of quartz on a second surface, all having different vertical thicknesses to change amplitude and phase of exposing light, respectively; Fourier transform of circuit layout; optimal depth of focus; simplification; miniaturization |
| 04/26/2007 | US20070092805 Microlithography method using a mask with curved surface |
| 04/26/2007 | US20070090312 Method and apparatus for detection of a speckle based physically unclonable function |
| 04/25/2007 | EP1777255A2 Image making medium |
| 04/24/2007 | US7209235 Accurate positioning of components of a optical assembly |
| 04/24/2007 | US7208423 Semiconductor device fabrication method and semiconductor device |
| 04/24/2007 | US7207733 Photographic developer effluent transfer station and drain wash |
| 04/19/2007 | WO2007044630A2 Method and manufacture of multiple photomask patterns and computer readable medium |
| 04/19/2007 | WO2007044446A1 Oxidizing aqueous cleaner for the removal of post-etch residues |
| 04/19/2007 | US20070087284 Multipass multiphoton absorption method and apparatus |
| 04/19/2007 | US20070087273 Alternating phase shift mask |
| 04/19/2007 | US20070087272 Method for preparing a phase-shifting mask and method for preparing a semiconductor device using the phase-shifting mask |
| 04/19/2007 | US20070087271 Phase-shifting mask |
| 04/18/2007 | EP1774771A1 Grey card for controlling exposure and white balance of a digital camera |
| 04/18/2007 | EP1774542A2 Method for bilayer resist plasma etch |
| 04/18/2007 | CN1950748A Bleach concentrate composition for silver halide color- photographic materials, one-part type concentrate composition for replenishment color developers, and method of processing |
| 04/18/2007 | CN1950680A 光散射euvl掩模 Light scattering euvl mask |
| 04/17/2007 | US7205095 Apparatus and method for packaging image sensing semiconductor chips |
| 04/17/2007 | US7205075 Method of forming a vertical memory device with a rectangular trench |
| 04/17/2007 | US7204686 Parallelism adjustment device |
| 04/12/2007 | WO2006096793A3 Medical implants |
| 04/12/2007 | WO2006045002A3 Method and apparatus associated with anisotropic shrink in sintered ceramic items |
| 04/12/2007 | US20070082302 Imaging leading edge to mid range density; reducing distraction effects; readability, aesthetic qualities |
| 04/12/2007 | US20070082301 Image forming method using photothermographic material |
| 04/12/2007 | US20070082300 Image forming method |
| 04/12/2007 | US20070082299 Methods and apparatus for fabricating conductive features on glass substrates used in liquid crystal displays |
| 04/12/2007 | US20070082297 Polymer, top coating layer, top coating composition and immersion lithography process using the same |
| 04/12/2007 | US20070082296 Method of forming micro-patterns using multiple photolithography process |
| 04/12/2007 | US20070082281 Optical lithography to compute aerial image and comparing with computer intensity threshold; semiconductors; integrated circuits |
| 04/12/2007 | US20070082280 Pre-specified exposure information used to configure an exposure of the fields is then modified based on the thermally-induced deformation information as predicted by the model; pattern is exposed onto the fields in accordance with the pre-specified exposure information as modified |
| 04/12/2007 | US20070082278 For use in short-wavelength exposure light source/excimer laser; silicon oxynitrides film can be etched by dry etching (RIE: Reactive Ion Etching) using CHF3, or cl2; improving contrast at a boundary portion of an exposure pattern |
| 04/12/2007 | US20070082277 Process margin using discrete assist features |
| 04/12/2007 | US20070082273 Photomask and image device manufacturing method |
| 04/12/2007 | US20070081631 Methods and Apparatus for Preserving Orientation Information in Radiography Images |
| 04/12/2007 | US20070080134 Method of fabricating inkjet nozzle chambers having filter structures |
| 04/12/2007 | US20070080133 Method of fabricating inkjet nozzles having associated ink priming features |
| 04/12/2007 | US20070080132 Method of fabricating inkjet nozzle chambers having sidewall entrance |
| 04/12/2007 | US20070079525 Devices and methods for thermophoretic and electrophoretic reduction of particulate contamination of lithographic reticles and other objects |
| 04/11/2007 | EP1053507B1 Integral thin-film metal resistor with improved tolerance and simplified processing |
| 04/11/2007 | CN1310093C Exposure device |
| 04/10/2007 | US7202488 Correction system, method of correcting deflection distortion, program and method for manufacturing a semiconductor device |
| 04/10/2007 | US7202148 Method utilizing compensation features in semiconductor processing |
| 04/10/2007 | US7202017 as the main substrate can be separated from the sub substrate along the thin portion, the separation line will not be located at an unintended position or will not be in an unintended shape. As a result, reliability of the pattern formed on the main substrate is improved |
| 04/10/2007 | US7202015 acid-decomposable resin in which an alicyclic structure showing no absorption in the 193 nm range is introduced into the main or side chain of a polymer |
| 04/10/2007 | US7202007 Method of forming patterned films |
| 04/10/2007 | US7202006 is switched from a UV absorbing state to a UV transparent state to allow UV light of a sufficient wavelength to convert a photochromic material of the display layer to a colored state to form an image |
| 04/05/2007 | WO2007038134A2 Method of aligning a particle-beam-generated pattern to a pattern on pre-patterned substrate |
| 04/05/2007 | WO2006127538A3 Manufacturing aware design and design aware manufacturing |
| 04/05/2007 | WO2005069805A3 Targeted radiation treatment using a spectrally selective radiation emitter |
| 04/05/2007 | US20070077752 Rework process for removing residual UV adhesive from C4 wafer surfaces |
| 04/05/2007 | US20070077503 Overlay key, method of forming the overlay key and method of measuring overlay accuracy using the overlay key |
| 04/05/2007 | US20070077501 Stencil masks, method of manufacturing stencil masks, and method of using stencil masks |
| 04/05/2007 | US20070075309 Negative photoresist for silicon koh etch without silicon nitride |
| 04/05/2007 | US20070075282 Radiation image storage panel and process for producing the same |
| 04/03/2007 | US7200460 Method of depositing low dielectric constant silicon carbide layers |
| 04/03/2007 | US7199812 Laser marking method |
| 04/03/2007 | US7198973 Method for fabricating an interference display unit |
| 04/03/2007 | US7198889 High-speed positive-working photothermographic system comprising an accelerating agent |
| 04/03/2007 | US7198873 Lithographic processing optimization based on hypersampled correlations |
| 04/03/2007 | US7198872 Light scattering EUVL mask |
| 03/29/2007 | WO2006065557A3 Pulse modulation laser writing system |
| 03/29/2007 | US20070072129 Method for forming flexible printed circuit boards |
| 03/29/2007 | US20070072099 used to correct for drift, or thermal expansion, or gravitational sag in fabrication of a semiconductor device or a photomask/reticle; using optical measurement to register the particle beam to the pre-existing pattern |