| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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| 10/12/2006 | US20060228636 Pattern layout for forming integrated circuit |
| 10/12/2006 | US20060228633 Method of resolving phase conflicts in an alternating phase shift mask and the alternating phase shift mask |
| 10/12/2006 | US20060226927 Method of terminating bus,bus termination resistor and wiring subtrate having terminated buses and method of its manufacture |
| 10/12/2006 | US20060226382 Method for manufacturing image recording medium |
| 10/11/2006 | EP1709483A1 Silver halide color photographic light-sensitive material and color image-forming method |
| 10/11/2006 | CN1846169A Negative resist composition with fluorosulfonamide-containing polymer |
| 10/10/2006 | US7119893 Determination of center of focus by parameter variability analysis |
| 10/10/2006 | US7119368 Thin film transistor array panel and manufacturing method thereof |
| 10/10/2006 | US7118850 Color developer replenisher and concentrated composition for color photographic material |
| 10/10/2006 | US7118849 Photothermographic materials with UV absorbing compounds |
| 10/10/2006 | US7118847 Polymer and photoresist compositions |
| 10/10/2006 | US7118836 Flatness, thinness; poly 3,4-ethylenedioxythiophene and polystyrene sulphonic acid film having silver metal randomly distributed throughout; high conductivity |
| 10/10/2006 | US7118834 Exposure method, exposure quantity calculating system using the exposure method and semiconductor device manufacturing method using the exposure method |
| 10/10/2006 | US7118833 Forming partial-depth features in polymer film |
| 10/05/2006 | WO2006104755A2 Pretreatment compositions |
| 10/05/2006 | WO2006103238A1 Protective material comprising reversible and irreversible photochemical functional constituents, and coating method |
| 10/05/2006 | WO2005116757A3 Coatings containing nanotubes, methods of applying the same and transparencies incorporating the same |
| 10/05/2006 | US20060223012 Thermal processing method of silver salt photothermographic dry imaging material |
| 10/05/2006 | US20060223010 suitable as a chemically-amplified resist sensitive to active radiation particularly to deep ultraviolet rays represented by a KrF excimer laser, an ArF excimer laser, or an F2 excimer laser; photoacid generator which is at least one compound selected from sulfonyloxyimide and disulfonyldiazomethane |
| 10/05/2006 | US20060223009 Imaging methods |
| 10/05/2006 | US20060223008 Composition for forming antireflection film, laminate, and method for forming resist pattern |
| 10/05/2006 | US20060222997 Adhesion improver for photosensitive resin composition and photosensitive resin composition containing same |
| 10/05/2006 | US20060222975 Integrated optical metrology and lithographic process track for dynamic critical dimension control |
| 10/05/2006 | US20060222968 For semiconductors, microelectronic and microelectromechanical devices, and microfluidic and photonic devices; eliminating image distorting charging effects during electron beam patterning of the template and charging effects during scanning electron microscope inspection |
| 10/05/2006 | US20060222967 Reticle, method for manufacturing magnetic disk medium using reticle, and magnetic disk medium |
| 10/05/2006 | US20060222966 Mask layout and method of forming contact pad using the same |
| 10/05/2006 | US20060222965 Mask, Method for Producing Mask, and Method for Producing Wired Board |
| 10/05/2006 | US20060222964 Method for manufacturing photomask and method for manufacturing semiconductor device using photomask |
| 10/05/2006 | US20060222963 Methods of forming patterns in substrates |
| 10/05/2006 | US20060222962 Masking of repeated overlay and alignment marks to allow reuse of photomasks in a vertical structure |
| 10/05/2006 | US20060222961 Leaky absorber for extreme ultraviolet mask |
| 10/05/2006 | US20060219964 Recording sheet usage count evaluation method and apparatus, and medical image processing apparatus |
| 10/05/2006 | US20060219963 X-ray sensor |
| 10/03/2006 | US7116411 Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems |
| 10/03/2006 | US7116398 Lithographic apparatus and device manufacturing method |
| 10/03/2006 | US7115532 Treating the outer surface with a basic fluid of tetramethyl ammonium hydroxide or ammonium fluoride; applying photoresist onto the treated outer surface, patterning and developing |
| 10/03/2006 | US7115358 Photostable silver salt of an azole compound, a silver salt of a mercapto compound |
| 10/03/2006 | US7115354 Microfabrication of pattern imprinting |
| 10/03/2006 | US7115344 Photomask and pattern forming method employing the same |
| 10/03/2006 | US7115343 Methods of designing photomasks and optimizing lithographic and etch processes used in microelectronics manufacturing; subresolution assist features |
| 10/03/2006 | US7115342 Preparation of photomasks |
| 09/28/2006 | US20060216658 Method of processing silver halide materials |
| 09/28/2006 | US20060216657 Image forming method using photothermographic material |
| 09/28/2006 | US20060216656 Silver salt photothermographic dry imaging material and image forming method by use thereof |
| 09/28/2006 | US20060216655 Compositions, systems, and methods for imaging |
| 09/28/2006 | US20060216652 Composition for forming anti-reflective coating for use in lithography |
| 09/28/2006 | US20060216651 Method and system for drying a substrate |
| 09/28/2006 | US20060216648 Nanopastes for use as patterning compositions |
| 09/28/2006 | US20060216633 Bisanthracene derivative and organic electroluminescence device using the same |
| 09/28/2006 | US20060216615 Wavefront engineering with off-focus mask features |
| 09/28/2006 | US20060216614 Method of mask making and structure thereof for improving mask ESD immunity |
| 09/28/2006 | US20060214330 Use of novel micro- and nano-imprinting techniques for making supported three-dimensional micro- and nano-structures for pixel segregation in OLED-based displays; using polymers of lower glass transition temperatures and eliminates heating required to assemble thermoplastic polymers |
| 09/28/2006 | US20060213602 Electrode is formed on surface of transparent base member and photosensitive slurry containing dielectric powder is applied thereon; photosensitive slurry is exposed from backside of base member up to predetermined thickness, and subjected to development; excellent uniformity in thickness; cell phones |
| 09/27/2006 | CN1277287C Method for shrinking critical dimension of semiconductor devices |
| 09/27/2006 | CN1277152C Original negative, exposure method and original negative making method |
| 09/26/2006 | US7113530 Gallium nitride based semiconductor laser and image exposure device |
| 09/26/2006 | US7112402 comprising, on a support, an image forming layer containing a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent and a binder, and a non-photosensitive layer, wherein non-photosensitive layer contains an ester slipping agent liquid at a ordinary temperature |
| 09/26/2006 | US7112399 Photothermographic materials with opaque crossover control means |
| 09/26/2006 | US7112398 blocked compound, preferably a developer, that decomposes by a 1,2 elimination mechanism to release a photographically useful group on thermal activation |
| 09/21/2006 | WO2006097916A2 Optical mask for all-optical extended depth-of-field for imaging systems under incoherent illumination |
| 09/21/2006 | WO2005072235A3 Structured materials and methods |
| 09/21/2006 | US20060210935 non-photosensitive aliphatic carboxylic acid silver salts; a photosensitive emulsion containing photosensitive silver halide grains; a silver ion reducing agent; a binder; and a cyan coloring leuco dye |
| 09/21/2006 | US20060210930 Scanning the photomask which has sub-patterns formed inside rectangular region including all the main patterns; scan target range is regulated by inspecting apparatus; every scan target range in the rectangular region includes a main pattern and a sub-pattern; preventing alignment mixup in target range |
| 09/21/2006 | US20060210929 Photosensitive composition and forming process of structured material using the composition |
| 09/21/2006 | US20060210911 Exposure apparatus and method, measuring apparatus, and device manufacturing method |
| 09/21/2006 | US20060210910 Photo-conductor layer for constituting radiation imaging panels |
| 09/21/2006 | US20060210893 Method and system for overlay control using dual metrology sampling |
| 09/21/2006 | US20060210891 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same |
| 09/21/2006 | US20060210889 Reduces the optical proximity effect by the light interference, and reduce the aberration of a projection lens such as the coma aberration; enhances the resolution limit |
| 09/21/2006 | US20060210887 Lithography mask and methods for producing a lithography mask |
| 09/21/2006 | US20060210886 Method for making grayscale photo masks and optical grayscale elements |
| 09/21/2006 | US20060210885 In photolithography process on a photoresist coated substrate, determining the effect of flare on line shortening; measure misalignments; measuring the degree of flare distortion; semiconductor processing |
| 09/21/2006 | US20060209436 Driving system and optical-element driving system |
| 09/21/2006 | US20060209287 Positioning apparatus, exposure apparatus, and device manufacturing method |
| 09/21/2006 | US20060209123 High density reinforced orifice plate |
| 09/21/2006 | US20060208208 Radiation image storage panel |
| 09/20/2006 | CN1276287C Radioactive ray image forming materials and method thereof |
| 09/19/2006 | US7109366 Compositions for removing metal ions from aqueous process solutions and methods of use thereof |
| 09/19/2006 | US7108962 A photographic processing composition, comprising at least one compound selected from the group consisting of a compound represented by formula (I) and a compound represented by formula (II): A1-X-L-Y-A2 (I) wherein, in formula (I), A1 and |
| 09/19/2006 | US7108960 detector to detection intensity of luminescence radiation from reflector |
| 09/19/2006 | US7108946 Integrated circuit manufacturing; improved alignment and resolution |
| 09/14/2006 | US20060204904 Metal mask and manufacturing method thereof |
| 09/14/2006 | US20060204901 Method of manufacturing a microlens substrate, a microlens substrate, a transmission screen, and a rear projection |
| 09/14/2006 | US20060204897 Negative resist composition comprising base polymer having epoxy ring and si-containing crosslinker and patterning method for semiconductor device using the same |
| 09/14/2006 | US20060204896 Composition for stripping photoresist and method for manufacturing thin transistor array panel using the same |
| 09/14/2006 | US20060204869 Laser processing device |
| 09/14/2006 | US20060204864 Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation |
| 09/14/2006 | US20060204862 Methods, systems and computer program products for correcting photomask using aerial images and boundary regions |
| 09/14/2006 | US20060204861 Optical mask for all-optical extended depth-of-field for imaging systems under incoherent illumination |
| 09/14/2006 | US20060204860 first layer of light transmissive material, layer of etch stop material and 2nd layer of light transmissive material have thicknesses such that light of the given wavelength directed from a light source through etched portions of the substrate to pattern a photosensitive surface will be shifted in phase |
| 09/14/2006 | US20060204859 An extra dose trim mask, method of manufacture, and lithographic process using the same |
| 09/14/2006 | CA2599269A1 Medical implants |
| 09/13/2006 | EP1483628A4 Full phase shifting mask in damascene process |
| 09/13/2006 | CN1275096C Slushing compound pattern shaping method and system |
| 09/13/2006 | CN1275092C Method for making patterns of phase shift transformation light shield used in semiconductor chips manufacturing and structure thereof |
| 09/13/2006 | CN1275091C Photolithographic critical dimension control using reticle measurements |
| 09/12/2006 | US7107572 Methods of forming patterned reticles |
| 09/12/2006 | US7106490 Methods and systems for improved boundary contrast |
| 09/12/2006 | US7105287 Emulsion of silver halide grains, complex of a group 8 metal and one aqua ligand or an organic ligand; enhanced sensitivity, superior latent image stability, coating solution stability and storage stability, high quality prints, superior image quality and print reproducibility |
| 09/12/2006 | US7105283 Photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent for silver ions, and a binder on a support |