| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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| 11/13/2007 | US7294437 Systems for modeling a transmitted electromagnetic field through a mask, to design a mask, and to create a library of corrections including edge corrections, edge-to-edge corrections, and corner corrections |
| 11/08/2007 | US20070259292 Method for making a micro-fluid ejection device |
| 11/08/2007 | US20070259290 Measuring and/or inspecting method, measuring and/or inspecting apparatus, exposure method, device manufacturing method, and device manufacturing apparatus |
| 11/08/2007 | US20070259289 Thin film transistor array panel, manufacturing method thereof, and mask therefor |
| 11/08/2007 | US20070259280 Photomask, exposure control method and method of manufacturing a semiconductor device |
| 11/08/2007 | US20070259274 photoresist mixtures including acid generators, curing agents, solvents, dissolution accelerators, surfactants, adhesion promoters and antifoam agents, used for generating image on substrates; lithography |
| 11/08/2007 | US20070259272 Photoresist composition and method of manufacturing a thin-film transistor substrate using the same |
| 11/08/2007 | US20070257217 Radiographic-image recording medium containing shock-resistant member |
| 11/07/2007 | CN101069128A Silver halide color photographic light-sensitive material |
| 11/07/2007 | CN101068893A Resin cured film for flexible printed wiring board and production process thereof |
| 11/06/2007 | US7293249 Contrast based resolution enhancement for photolithographic processing |
| 11/06/2007 | US7291427 Exposing a substrate bonded to a polymer via a grafted chain that includes a substrate-bonding group and and also a phototcleavable group to cleave the group in exposed areas and removing the graft chain from those areas; a conductor may then be adhered to the areas having the graft polymer chains |
| 11/01/2007 | WO2007005204A3 System and method for critical dimension reduction and pitch reduction |
| 11/01/2007 | WO2006078918A3 Replication tools and related fabrication methods and apparatus |
| 11/01/2007 | US20070254246 Developer used for planographic printing plate material and processing method by use thereof |
| 11/01/2007 | US20070254234 Stabilized azo dye and method for its preparation |
| 11/01/2007 | US20070254218 Phase shifting mask capable of reducing the optical proximity effect and method for preparing semiconductor devices using the same |
| 11/01/2007 | US20070252963 Lithographic Apparatus, Method of Exposing a Substrate, Method of Measurement, Device Manufacturing Method, and Device Manufacturing Thereby |
| 10/31/2007 | EP1849846A2 Method for chemiluminescent detection |
| 10/31/2007 | EP1849181A2 Replication tools and related fabrication methods and apparatus |
| 10/31/2007 | DE10327613B4 Verfahren zur Bildung einer Öffnung auf einer alternierenden Phasenmaske A method for forming an opening on an alternating phase mask |
| 10/31/2007 | CN101065647A Phase-shift mask providing balanced light intensity through different phase-shift apertures and method for forming such phase-shift mask |
| 10/30/2007 | US7288772 Diagnostic system for profiling micro-beams |
| 10/30/2007 | US7288769 Method for the production of and protective layer for a layer of luminescent material |
| 10/30/2007 | US7288358 Comprising substrate, phosphor layer, and transparent water vapor proof film, which is constituted of a water vapor proof layer and a transparent thin film; radiation image storage panel, which has good water vapor proof characteristics and is capable of yielding image of good image quality; sensitivity |
| 10/30/2007 | US7288344 Accommodating diffraction in the printing of features on a substrate |
| 10/25/2007 | WO2007120835A2 Methods and apparatus for preserving orientation information in radiography images |
| 10/25/2007 | US20070248917 Exposing a photoresist to near-field light through photomask using polarized exposure light having an electrical field component parallel to the first direction to form a latent image in the photoresist only in discrete regions at which the second slit opening crosses the light the light shield portion |
| 10/25/2007 | US20070248915 Method for manufacturing patterned thin-film layer |
| 10/25/2007 | US20070248913 Process for producing film forming resins for photoresist compositions |
| 10/25/2007 | US20070248907 Apparatus and method for laser engraveable printing plates |
| 10/25/2007 | US20070248905 Two-layer film and method of forming pattern with the same |
| 10/25/2007 | US20070248899 Pattern decomposition and optical proximity correction method for double exposure when forming photomasks |
| 10/25/2007 | US20070248898 Targets for alignment of semiconductor masks |
| 10/25/2007 | US20070248893 Method of forming a mask layout and layout formed by the same |
| 10/25/2007 | US20070248892 A method of aligning a first article relative to a second article and an apparatus for aligning a first article relative to a second article |
| 10/25/2007 | US20070246441 Resist composition, method for forming resist pattern using the same, array substrate fabricated using the same and method of fabricating the array substrate |
| 10/24/2007 | CN101061058A Imprinting of supported and free-standing 3-D micro-or nano-structures |
| 10/24/2007 | CN100345253C Optic micro distance correcting method |
| 10/23/2007 | US7286219 Exposure system, semiconductor device, and method for fabricating the semiconductor device |
| 10/23/2007 | US7285365 Patterning a workpiece covered with a layer sensitive to electromagnetic radiation by concurrently using a plurality of exposure beams having a predetermined separation; reducing compact disk errors |
| 10/23/2007 | US7284324 Method of making photolithographically-patterned out-of-plane coil structures |
| 10/18/2007 | WO2007117319A2 Phase shifting mask having a calibration feature and method therefor |
| 10/18/2007 | US20070243490 Prevention of plasma induced damage arising from etching of crack stop trenches in multi-layered low-k semiconductor devices |
| 10/17/2007 | EP1845109A2 Optical devices made from radiation curable fluorinated compositions |
| 10/17/2007 | CN100343756C Camera for encoding audio signals |
| 10/17/2007 | CN100343755C Image processor, image processing method and programm |
| 10/16/2007 | US7283236 Alignment system and lithographic apparatus equipped with such an alignment system |
| 10/16/2007 | US7283198 Reticle thermal detector |
| 10/16/2007 | US7282459 Ejection method and optical device manufacturing method for arranging nozzles in agreement with sections subject to ejection |
| 10/16/2007 | US7282316 Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same |
| 10/16/2007 | US7282311 Method of forming an integrated optical circuit |
| 10/16/2007 | US7282307 Providing a mask substrate;forming a lower multilayer reflective stack; forming a first embedded layer over the lower multilayer reflective stack; forming a second embedded layer; forming a top multilayer reflective stack; etching an opening through the top multilayer reflective stack |
| 10/16/2007 | US7282306 May eliminate the need for a second exposure with a trim mask; accordingly, alignment problems associated with the second exposure may be avoided; single exposure may be more compatible with high speed manufacturing |
| 10/16/2007 | US7281868 Heat developing apparatus and heat developing method |
| 10/11/2007 | WO2007031710A3 Method of forming a flexible heating element |
| 10/11/2007 | US20070238055 Method for manufacturing optical disk master, method for manufacturing optical disk, and apparatus for manufacturing optical disk master |
| 10/11/2007 | US20070238052 Coating compositions for photolithography |
| 10/11/2007 | US20070238038 light emitted from excimer laser applied to photomask pattern, diffracted light is projected onto substrate via projection lens; dimensional stability |
| 10/11/2007 | US20070238032 transparent substrate, half-tone film provided on a part on which light-shielding pattern is to be formed and a part on which semi-light shielding pattern is to be formed, where semi-light shielding pattern includes first and second light shielding patterns, second having smaller dimensions than first |
| 10/11/2007 | US20070238027 Method for generating alignment marks and related masks thereof |
| 10/10/2007 | EP1470447A4 Photolithographic critical dimension control using reticle measurements |
| 10/10/2007 | CN101052317A Method for reducing acrylamide formation in thermally processed foods |
| 10/10/2007 | CN101052307A Method for reducing acrylamide formation in thermally processed foods |
| 10/09/2007 | US7281234 Short edge smoothing for enhanced scatter bar placement |
| 10/09/2007 | US7279258 Method and arrangement for controlling focus parameters of an exposure tool |
| 10/09/2007 | US7279253 Near-field light generating structure, near-field exposure mask, and near-field generating method |
| 10/04/2007 | WO2006098877A9 Method and apparatus for analyzing an imaging material |
| 10/04/2007 | US20070231747 Radiation-sensitive negative resin composition |
| 10/04/2007 | US20070231717 Dynamic compensation system for maskless lithography |
| 10/04/2007 | US20070231715 Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the method |
| 10/04/2007 | US20070231714 Photomask making method and semiconductor device manufacturing method |
| 10/04/2007 | US20070231712 Alternating phase shift masking |
| 10/04/2007 | US20070231711 System and method for making photomasks |
| 10/04/2007 | US20070231710 Method and system for forming a photomask pattern |
| 10/04/2007 | US20070228525 Substrate earthing mechanism for use in charged-particle beam writing apparatus |
| 10/04/2007 | US20070228296 Parallel Electron Beam Lithography stamp (PEBLS) |
| 10/03/2007 | CN101048700A Silver halide color photographic photosensitive material and method of image forming |
| 10/02/2007 | US7277155 Exposure apparatus and method |
| 10/02/2007 | US7276316 Providing a phase shift mask substrate having a layer of phase shifting material and a layer of an opaque material, and depositing a first resist layer on the substrate; resist layer is exposed by a direct write electron beam or laser energy source and developed, and the substrate is etched |
| 09/27/2007 | US20070224551 Method of fabricating photoresist thinner |
| 09/27/2007 | US20070224542 Patterning method using photomask |
| 09/27/2007 | US20070224527 Apparatus for and method of recording image |
| 09/27/2007 | US20070224526 Fast method to model photoresist images using focus blur and resist blur |
| 09/27/2007 | US20070224525 Lithographic apparatus and device manufacturing method with double exposure overlay control |
| 09/27/2007 | US20070224519 The sub-resolution assist features improve corner rounding and allow optical proximity correction end features, such as hammerheads and serifs to be reduced in size or eliminated; reducing corner pullback, reticle mask-making critical dimension; microelectronic; micromechanical photolithography |
| 09/26/2007 | CN100339732C Method for manufacturing optical waveguide and connecting structure of optical device |
| 09/25/2007 | US7275226 Method of performing latch up check on an integrated circuit design |
| 09/25/2007 | US7274429 Integrated lithographic fabrication cluster |
| 09/25/2007 | US7273685 Method for controlling semiconductor device production process and a method for producing semiconductor devices |
| 09/25/2007 | US7272889 Production method of suspension board with circuit |
| 09/20/2007 | US20070218411 Display apparatus |
| 09/20/2007 | US20070218398 Photosensitive silane coupling agent, method of modifying surface, method of forming pattern, and method of fabricating device |
| 09/18/2007 | US7270945 Image forming method using photothermographic material |
| 09/18/2007 | US7270944 Compositions, systems, and methods for imaging |
| 09/18/2007 | US7270943 Compositions, systems, and methods for imaging |
| 09/18/2007 | US7270929 Media for laser imaging |
| 09/18/2007 | US7270922 Method for determining an edge profile of a volume of a photoresist after a development process |
| 09/18/2007 | US7270921 Energy beam is radiated onto a resist-applied target while the energy beam is adjusted to correct the pattern-size variation occurring in the etching process; resist on the target is developed to form a resist pattern; target is etched with the resist pattern as a mask, thus forming patterns |
| 09/18/2007 | US7270920 Fabrication method of a semiconductor device |