Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726)
04/2006
04/20/2006US20060081793 Head-worn video display with viewing screen
04/20/2006DE102005025398A1 Maskenrohling, Herstellungsverfahren für eine Phasenänderungsmaske und Herstellungsverfahren für eine Form Mask blank manufacturing method of a phase change mask and fabrication method of a mold
04/19/2006CN1252776C Method for manufacturing fluorescent screen in the interior surface of CRT view panel
04/18/2006US7031591 Optical waveguide, forming material and making method
04/18/2006US7029836 Radiographic image conversion panel and method for manufacturing the same
04/18/2006US7029834 Photothermography; antifogging agents; shelf life; storage stability; mixture of silver halide emulsion and reducible silver compound with stabilizer on support; exposure to electromagneti waves; forming latent images
04/18/2006US7029827 After forming a resist film from a positive chemically amplified resist material, performing insolubilization treatment for making the surface of resist film insoluble in developer, pattern exposing, then developing the film
04/18/2006US7029826 Contacting silica dielectric film with plasma comprising at least one surface modification agent, at a concentration, and for a time period, effective to render the silica dielectric film hydrophobic
04/18/2006US7029819 Absorption x-rays; emission of electromagnetic waves; on support having a reflective polyester surfaces containing barium sulfate particles; radiology images
04/18/2006US7029808 Photosensitive coating material for a substrate and process for exposing the coated substrate
04/18/2006US7029802 Embedded bi-layer structure for attenuated phase shifting mask
04/18/2006US7029801 Method of manufacturing mask for electron beam lithography and mask blank for electron beam lithography
04/18/2006US7029799 Dividing pattern into zones; drawing
04/18/2006US7029798 Forming conformation pattern on surfaces of photoresist; controlling thickness; exposure; forming latent image; contacting with developer solution
04/13/2006US20060078831 Multiphoton curing to provide encapsulated optical elements
04/13/2006US20060078830 Bank structure, method of forming bank structure, device, electro-optical device and electronic apparatus
04/13/2006US20060078818 Near-field exposure photoresist and fine pattern forming method using the same
04/13/2006US20060078808 Method for measuring overlay and overlay mark used therefor
04/13/2006US20060078807 Lithographic mask alignment
04/13/2006US20060078806 Lithographic apparatus and device manufacturing method
04/13/2006US20060078805 Lithographic apparatus and device manufacturing method
04/13/2006US20060078804 Calibration of optical line shortening measurements
04/13/2006US20060076525 Binderless storage phosphor screen
04/11/2006US7027156 patterned layer is formed by curing an activating light curable liquid disposed on a substrate in the presence of a patterned template; particularly useful for micro- and nano-imprint lithography processes
04/11/2006US7026490 Semiconductors; light emitting diodes; solar cells; efficiency; current density; acylation the corresponding diketone compound with acetic ahydride and boron compound
04/11/2006US7026259 Liquid-filled balloons for immersion lithography
04/11/2006US7026106 Exposure method for the contact hole
04/11/2006US7026105 Photothermographic materials containing silver halide sensitized with combination of compounds
04/11/2006US7026104 Heat-developable photosensitive material and method of forming images
04/11/2006US7026098 Accurate, uniform, high speed; micropatterns; entire disk surface; unidirectional rotation
04/11/2006US7026081 Optical proximity correction method utilizing phase-edges as sub-resolution assist features
04/11/2006US7026079 Process for preparing a substantially transparent conductive layer configuration
04/11/2006US7026078 Method of manufacturing photomask
04/11/2006US7026076 Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARC
04/11/2006US7024996 Measuring electroconductivity; calibration; replacement of developer
04/06/2006WO2006037027A1 Phase-shift mask providing balanced light intensity through different phase-shift apertures and method for forming such phase-shift mask
04/06/2006WO2006036028A1 Silver halide color photographic light-sensitive material
04/06/2006US20060075377 Functionalized beads for the immobilization of nucleic acids, wherein the beads are stably associated with a solid support selected from multiwell plates, arrays of pits and multiwell supports
04/06/2006US20060073422 Portable conformable deep ultraviolet master mask
04/06/2006US20060073416 Mechanically robust interconnect for low-k dielectric material using post treatment
04/06/2006US20060073397 Masking arrangement and method for producing integrated circuit arrangements
04/06/2006US20060073396 Multi-exposure semiconductor fabrication mask sets and methods of fabricating such multi-exposure mask sets
04/06/2006US20060073394 Reduced mask count gate conductor definition
04/05/2006EP1558654A4 Novel copolymer, photoresist compositions thereof and deep uv bilayer system thereof
04/05/2006CN1756996A A method of patterning photoresist on a wafer using an attenuated phase shift mask
04/05/2006CN1756992A Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARC
04/05/2006CN1249704C Blank disk and direct die press and its manufacture method
04/04/2006US7022468 photographic films for providing images with superior graininess and enhanced sharpness, comprising support blue-sensitive, green-sensitive and red-sensitive silver emulsion layers, containing yellow dye, magenta dye and cyan dye forming couplers respectively; interimage effects
04/04/2006US7022463 Near-field exposure photoresist and fine pattern forming method using the same
04/04/2006US7022454 Binders; resolution of relief image
03/2006
03/30/2006US20060068337 Substrate processing method
03/30/2006US20060068334 Phase-shifting optical maskless lithography enabling asics at the 65 and 45 NM nodes
03/30/2006US20060068333 Manufacturing method of plasma display panel
03/30/2006US20060068330 Method for forming photosensitive polyimide pattern and electronic devices having the pattern
03/30/2006US20060068329 patterned electroconductive layer and antistatic layer; to prevent uncontrolled localized static buildup that can cause electrically modulated imaging layers to switch states; friction control, scratch resistances, light stability, less dirt, improved transport through finishing and cutting equipment
03/30/2006US20060068315 Color forming compositions and associated methods
03/30/2006US20060068305 Method for aligning exposure mask and method for manufacturing thin film device substrate
03/30/2006US20060068304 Reduces an area necessary for alignment marks of an object while maintaining the minimum allowable gap among alignment marks on the same exposure mask
03/30/2006US20060068302 Detecting defects in a first mask with features usable to pattern regular elements and redundancy elements of a microelectronic or microelectromechanical substrate; making a second mask including second features usable to pattern interconnections between the regular elements and the redundancy elements
03/30/2006US20060068301 Pattern decision method and system, mask manufacturing method, image-forming performance adjusting method, exposure method and apparatus, program, and information recording medium
03/30/2006US20060068299 Multi wavelength multi layer printing
03/30/2006US20060065862 Radiation image storage panel
03/30/2006DE102004044887A1 Road traffic monitoring method for use in crossings, involves arranging light-diminishing filter in path of rays of flashgun for diminishing light of flashgun, where light impinges on strongly reflecting number plate of vehicle
03/28/2006US7018936 Ion implant lithography method of processing a semiconductor substrate
03/28/2006US7018790 Multilayer; support, image forming layer containi ng organic siver salt, binder and reducing agents
03/28/2006US7018788 Phase shifting lithographic process
03/28/2006US7018783 Fine structure and devices employing it
03/28/2006US7018779 Eliminating amino group outgrowths; forming thin oxynitride film between silicon nitride layer and antireflective coating
03/28/2006US7018770 High speed reflective radiographic material
03/28/2006US7018748 Process for producing hard masks
03/28/2006US7018745 Controlled phase delay between beams for writing bragg gratings
03/23/2006US20060063114 Method of converting a recording element
03/23/2006US20060063113 Antireflection film, polarizing plate and display device
03/23/2006US20060063112 Forming on a substrate a first layer of viscous polymer having a first pattern with a residual thickness independent of compressive forces employed to form said first layer; and generating into said first layer, a second pattern having a shape inverse to said first pattern; imprint lithography
03/23/2006US20060063095 positive-working, aqueous base developable photosensitive polybenzoxazole (PBO) precursor compositions of polyamides where the hydroxyl groups of the dihydroxydiamine monomer unit may be sulfonated with a quinonediazide, a diazonaphthoquinone photoactive compound, and a solvent; relief images
03/23/2006US20060063078 Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same
03/23/2006US20060063077 Mask patterns including gel layers for semiconductor device fabrication and methods of forming the same
03/23/2006US20060063076 Pseudo low volume reticle (PLVR) design for asic manufacturing
03/23/2006US20060063075 Layout of a vertical pattern used in dipole exposure apparatus
03/23/2006US20060060567 Treating with supercritical carbon dioxide to cause swelling, cracking or delamination of the photoresist; reacting with ozone, removing with water; do not damage the underlying photoresist; do not use organic contaminants or leave an organic residue
03/23/2006US20060060562 depositing a memory material on a semiconductor substrate; protecting an edge during undercutting etching for image transfer
03/23/2006US20060060538 Compositions for removing metal ions from aqueous process solutions and methods of use thereof
03/22/2006EP1636655A2 Method of designing a reticle and forming a semiconductor device therewith
03/22/2006EP1563513B1 Method for the production of and protective layer for a layer of luminescent material
03/22/2006EP1352294A4 Reproducing sound encoded in infrared ink on photographs
03/22/2006EP1240557A4 Imaging method using phase boundary masking with modified illumination
03/21/2006US7016017 Lithographic apparatus and method for optimizing an illumination source using isofocal compensation
03/21/2006US7016015 Lithographic apparatus and device manufacturing method
03/21/2006US7014989 Photothermographic imaging layer containing a hydrophilic polymer binder or a water-dispersible polymer latex binder, in reactive association cotnaining a photosensitive silver halide, a non-photosensitive source of reducible silver ions other than a silver salt of a urazole, a reducing agent
03/21/2006US7014977 Images viewed without a light box; high speed processing; silver halide emulsion layer dispersed in a hydrophilic polymeric vehicle mixture including oxidized gelatin; layer of incorporated black-and-white developing agent and codeveloper
03/21/2006US7014965 The short sides of the rectangular patterns of two separate reticles are parallel to the scanning direction in each photolithography; rotating the wafer to form two transferred patterns with orthogonal overlay structures; overlap errors improved
03/21/2006US7014962 Half tone alternating phase shift masks
03/21/2006US7014959 CD uniformity of chrome etch to photomask process
03/21/2006US7014958 Method for dry etching photomask material
03/21/2006US7014373 Photographic processing arrangement and a processing solution supply cartridge for the processing arrangement
03/21/2006CA2127238C Photopolymerisable compositions
03/16/2006WO2006028951A2 Controlling critical dimensions of structures formed on a wafer in semiconductor processing
03/16/2006WO2006028649A2 Compositions of water-insoluble active organic compounds
03/16/2006US20060057509 Silver halide photosensitive material and image forming method therefor
03/16/2006US20060057508 Image forming method using photothermographic material
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