| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
|---|
| 08/07/2007 | US7252911 Implanting ions into a mask substrate with pattern-forming material with light-transmissive exposure regions; ions in the regions dissipate electrostatic charges, thus preventing the buildup of electrostatic charges which could otherwise attract image-distorting particles to the mask or damage the mask |
| 08/02/2007 | WO2007031712A3 Method of forming conductive tracks |
| 08/02/2007 | US20070178412 Method for manufacturing printed circuit board with thin film capacitor embedded therein |
| 08/02/2007 | US20070178394 Resist composition |
| 08/02/2007 | US20070178393 photomask may include a projecting pattern selectively formed on a substrate and a reflective layer on the substrate and the projecting pattern; for extreme ultra-violet light; photolithography |
| 08/02/2007 | US20070178392 Method for manufacturing attenuated phase-shift masks and devices obtained therefrom |
| 08/02/2007 | US20070178391 Mask having balance pattern and method of patterning photoresist using the same |
| 08/02/2007 | US20070178390 Exposure mask, liquid crystal display device using the same, and method of manufacturing liquid crystal display device using the same |
| 08/02/2007 | US20070176131 Radiation image information detecting panel and radiation image information read-out system |
| 08/02/2007 | DE19743540B4 Verfahren zur Herstellung einer Lithographie-Druckplatte A method for preparing a lithographic printing plate |
| 07/31/2007 | US7250620 EUV lithography filter |
| 07/31/2007 | US7250372 Method for BARC over-etch time adjust with real-time process feedback |
| 07/31/2007 | US7250248 Method for forming pattern using a photomask |
| 07/31/2007 | US7250247 Fabricating an integrated circuit includes placing at least two antireflective coating layers chosen so radiation reflected mutally cancels when combined, between a reflective surface and another material |
| 07/31/2007 | US7250237 Exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing; determining corrective information based on the measured attributes |
| 07/31/2007 | US7250235 Focus monitor method and mask |
| 07/26/2007 | US20070172777 Image forming method using a silver halide color photographic light-sensitive material, and silver halide color photographic light-sensitive material |
| 07/26/2007 | US20070172776 Adding mixture of aqueous solution of solvent, dispensing agent and base to developer; developing imaged printing plate using developer; adding aqueous regenerator to maintain the activity of the aqueous developer |
| 07/26/2007 | US20070172775 Method of forming an organic semiconductor pattern and method of manufacturing an organic thin film transistor using the same |
| 07/26/2007 | US20070172772 Microlens |
| 07/26/2007 | US20070172771 Method for manufacturing electrodes of a plasma display panel |
| 07/26/2007 | US20070172769 Pattern forming method |
| 07/26/2007 | US20070172768 increasing its solubility in an alkaline developer under action of an acid generator; prevent development defects after development in immersion photolithography; silicon-free resin is a copolymer of trimethylsilanol modified methacrylic acid-methyl methacrylate; making the semiconductors |
| 07/26/2007 | US20070172753 Photosensitive resin composition and manufacturing method of semiconductor device using the same |
| 07/26/2007 | US20070172745 Evanescent wave assist features for microlithography |
| 07/26/2007 | US20070172744 New aperture design for improving critical dimension accuracy and electron beam lithography throughput |
| 07/26/2007 | US20070170616 Storage magazine for microstructured molded parts and fabrication procedure |
| 07/25/2007 | EP1810206A2 Method and apparatus associated with anisotropic shrink in sintered ceramic items |
| 07/25/2007 | CN101006329A Embedded attenuated phase shift mask with tunable transmission |
| 07/24/2007 | US7248349 Exposure method for correcting a focal point, and a method for manufacturing a semiconductor device |
| 07/24/2007 | US7247421 Photothermographic material is developed in a thermal developing device configured such that a distance between an exposing section and a developing section is not more than 50 cm |
| 07/24/2007 | US7247420 Two-layer film and method of forming pattern with the same |
| 07/24/2007 | US7247412 Preparing a reflection photo mask having a reflection layer and absorption patterns that are formed on the reflection layer to define reflection regions; exposure is performed using the reflection photo mask, thereby forming the patterns on the wafe, critical dimensions, measuring dimensions |
| 07/24/2007 | US7247410 Complementary division mask, method of producing mask, and program |
| 07/19/2007 | WO2007081390A2 Switching micro-resonant structures using at least one director |
| 07/19/2007 | WO2007080877A1 Heat-developable photosensitive material and method for heat-development treatment of heat-developable photosensitive material |
| 07/19/2007 | US20070166652 Digital Mold Texturizing Methods, Materials, and Substrates |
| 07/19/2007 | US20070166651 Stamper, method of forming a concave/convex pattern, and method of manufacturing an information recording medium |
| 07/19/2007 | US20070166649 Method of forming a micro device |
| 07/19/2007 | US20070166646 suitable for reducing forward scattering, backward scattering, and re-scattering in electron beam lithography using the cell masks |
| 07/19/2007 | US20070166630 Photomasks including multi-layered light-shielding and methods of manufacturing the same |
| 07/19/2007 | US20070166627 forming a transfer pattern of desired size with high accuracy, by performing multiple exposure using a plurality of masks having different patterns over different mask substrates |
| 07/19/2007 | US20070166626 Scattering bar OPC application method for mask ESD prevention |
| 07/19/2007 | US20070165357 Overlay Correction By Reducing Wafer Slipping After Alignment |
| 07/18/2007 | EP1602007A4 A method of patterning photoresist on a wafer using a reflective mask with a multi-layer arc |
| 07/18/2007 | CN101002117A Optical films and methods of making the same |
| 07/17/2007 | US7245356 Lithographic apparatus and method for optimizing illumination using a photolithographic simulation |
| 07/17/2007 | US7244542 For microelectronics; relief imaging |
| 07/17/2007 | US7244534 Device manufacturing method |
| 07/12/2007 | US20070160938 Organic el display panel comprising electrode separator and its manufacturing method |
| 07/12/2007 | US20070160937 Photocurable resin composition and a method for forming a pattern |
| 07/12/2007 | US20070160936 Adhesion method using gray-scale photolithography |
| 07/12/2007 | US20070160932 Electron beam lithography apparatus |
| 07/12/2007 | US20070160920 Generating a photomask level design of an integrated circuit design of the integrated circuit, designating regions of the photomask level design between adjacent integrated circuit element shapes, placing monitor structure shapes of a monitor structure in designated region |
| 07/12/2007 | US20070160919 Phase-Shift Mask Providing Balanced Light Intensity Through Different Phase-Shift Apertures And Method For Forming Such Phase-Shift Mask |
| 07/12/2007 | US20070160916 reflective layer formed over front surface of substrate and chucking layer formed over rear surface positioned to chuck substrate to electrostatic chuck |
| 07/12/2007 | US20070160915 Phase shifting mask having a calibration feature and method therefor |
| 07/11/2007 | EP1805830A2 High aspect ratio c-mems architecture |
| 07/11/2007 | CN1997929A Lens array and method of making same |
| 07/11/2007 | CN1997878A Method for correcting critical dimension variations in photomasks |
| 07/11/2007 | CN1326204C Grating alignment procedure |
| 07/11/2007 | CN1325993C Mask correcting method |
| 07/11/2007 | CN1325020C Human body measurement calculating and analysis method |
| 07/10/2007 | US7241561 Photothermographic reducing agents with bicyclic or tricyclic substitution |
| 07/10/2007 | US7241558 Multi-layer semiconductor integrated circuits enabling stabilizing photolithography process parameters, the photomask being used, and the manufacturing method thereof |
| 07/10/2007 | US7241542 Process for controlling the proximity effect correction |
| 07/10/2007 | US7241541 Reference marks is placed inside a pattern area on a first layer mask which is used to form the first layer pattern, plurality of second reference marks is placed on a second layer mask which is used to form the second layer pattern and in which one second reference mark is matched |
| 07/10/2007 | US7241538 Method for providing representative features for use in inspection of photolithography mask and for use in inspection photo-lithographically developed and/or patterned wafer layers, and products of same |
| 07/05/2007 | US20070154853 Silver halide color photographic light-sensitive material and color image-forming method |
| 07/05/2007 | US20070154851 Reducing risk of detachment of photoresist from underlying substrate during development of photoresist pattern using fluid developer by controlling surface composition of the underlying substrate so that contact angle formed between substrate with developer is 20 degrees or greater |
| 07/05/2007 | US20070154848 Low pH Development Solutions for Chemically Amplified Photoresists |
| 07/05/2007 | US20070154846 Switching micro-resonant structures using at least one director |
| 07/05/2007 | US20070154845 Method for fabricating liquid crystal display device |
| 07/05/2007 | US20070154844 Fluorinated compound, fluoropolymer, resist composition, and composition for resist protective film |
| 07/05/2007 | US20070154843 Resin and resin composition |
| 07/05/2007 | US20070154824 calculating an offset of focus position based on information of the shape of the pattern, calculating the offset of the exposure dose based on the shift amount and the offset of the focus position; less likely to be affected by the extrinsic factor or a fluctuation of the lithography environment |
| 07/05/2007 | US20070154823 Multi-attribute light effects for use in curing and other applications involving photoreactions and processing |
| 07/05/2007 | US20070154817 determining image performance effects due to lithographic processing system aberrations and the image performance due to reticle shadowing effects; production of integrated circuits |
| 07/05/2007 | US20070154816 In fabricating the mask in which a lift-off process is used to accomplish the fabrication of the phase shift layer, the issue of nonuniform thicknes of the layer caused by the etching process for defining the phase shiftlayer is prevented; cost efficiency; accurate pattern; improved yield half-tone |
| 07/05/2007 | US20070153378 Rear projection screen with spatial varying diffusing angle |
| 07/05/2007 | US20070153314 Computer program and method for converting an image to machine control data |
| 07/05/2007 | US20070153245 Semiconductor manufacturing apparatus and pattern formation method |
| 07/05/2007 | US20070152167 Reticle discerning device, exposure equipment comprising the same and exposure method |
| 07/05/2007 | DE102005061993A1 Filmtransportvorrichtung Film transport mechanism |
| 07/04/2007 | CN1324400C Phase shift mask, method for forming pattern using phase shift mask and manufacturing method for electronic device |
| 07/03/2007 | US7239369 Lithographic apparatus and device manufacturing method |
| 07/03/2007 | US7238465 Rapid processing; high contrast gradation even in digital exposure; employs gelatin coating and small grain size |
| 06/28/2007 | WO2007055747A3 Visual film identification |
| 06/28/2007 | US20070148601 Optical diffuser with UV blocking coating using inorganic materials for blocking UV |
| 06/28/2007 | US20070148600 Active energy ray-curable resin composition and method for forming resist pattern |
| 06/28/2007 | US20070148599 Multiple step printing methods for microbarcodes |
| 06/28/2007 | US20070148567 Method and apparatus for laser-drilling an inkjet orifice in a substrate |
| 06/28/2007 | US20070148562 Method of achieving CD linearity control for full-chip CPL manufacturing |
| 06/28/2007 | US20070146672 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region |
| 06/28/2007 | US20070145310 Radiation image readout apparatus |
| 06/27/2007 | EP1711861A4 Structured materials and methods |
| 06/27/2007 | EP1709483A4 Silver halide color photographic light-sensitive material and color image-forming method |
| 06/26/2007 | US7235479 Organic solvents having ozone dissolved therein for semiconductor processing utilizing sacrificial materials |
| 06/26/2007 | US7235345 Covering substrate containing photoresist pattern; heating; shrinkage; reducing spacing between photoresist; using water soluble polymer and surfactant mixtures |
| 06/26/2007 | US7235336 to determine a photoresist thickness that will provide the desired photoresist feature size |