| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
|---|
| 01/03/2008 | US20080003523 substrate has a first layer having a first surface energy and having a planar measurement portion, a liquid containment pattern is over the measurement portion of the first layer, liquid containment pattern has a second surface energy that is different from the first surface energy |
| 01/03/2008 | US20080003522 Photoresist with metal oxide nanoparticles |
| 01/03/2008 | US20080003510 Correction method and correction system for design data or mask data, validation method and validation system for design data or mask data, yield estimation method for semiconductor integrated circuit, method for imporving design rule, mask production method, and semiconductor integrated circuit production method |
| 01/03/2008 | US20080003509 Performing a lyophobic treatment on a surface of a translucent substrate; putting a light-shielding material on that surface in a desired shape by a droplet discharge; and firing the light-shielding material to form the light-shielding pattern |
| 01/03/2008 | US20080003508 A transparent substrate, a peripheral pattern formed on the transparent substrate along a contour of a target pattern to be transferred onto a wafer, and an assist pattern disposed inside the peripheral pattern thereby preventing the assist pattern from being undesirably on the target pattern |
| 01/03/2008 | US20080001077 Charged particle beam drawing apparatus, charged particle beam drawing method and semiconductor device manufacturing method |
| 01/03/2008 | US20080000087 Organic Substrate with Integral Thermal Dissipation Channels, and Method for Producing Same |
| 01/02/2008 | EP1872639A1 Method of forming flexible electronic circuits |
| 01/02/2008 | EP1872638A1 A method of forming flexible electronic circuits |
| 01/02/2008 | EP1872172A2 Method and apparatus for analyzing an imaging material |
| 01/01/2008 | US7315367 Defining a pattern on a substrate |
| 01/01/2008 | US7314853 Cleaning solution for photoresist and method for forming pattern using the same |
| 01/01/2008 | US7314704 Matrix mixture of an activator and color former (leuko dye) are adapted to form a mark, and fixer that retards fading of the dark mark when exposed to an oil; labeling of optical storage media and is a calcium salt of a monoalkyl phthalate |
| 01/01/2008 | US7314700 Imaging polymer (ketal-functionalized); radiosensitive dissolution-inhibiting acid generator; and unprotected acidic group-functionalized radiation sensitive acid generator (dimethylphenylsulfonium perfluorobutylsulfonate); used with electron projection, extreme UV , and soft x-ray radiation |
| 01/01/2008 | US7314690 Suppress the loading effect and achieve a high CD (critical dimension) accuracy when forming a highly accurate pattern by dry etching; photomask blank having, on the light-transmissive substrate, a chromium film, an etching mask film having a resistance against etching of the chromium film, and a resist |
| 01/01/2008 | US7314689 After aligning the mask or reticle substrate with a predetermined reference system, an offset angle of a feature to be processed is determined; substrate is rotated in a predetermined direction by the offset angle; and the feature is processed using the predetermined reference system |
| 12/27/2007 | US20070298355 Resist top coat composition and patterning process |
| 12/27/2007 | US20070298354 Carbon coating on an implantable device |
| 12/27/2007 | US20070298353 Pattern forming method and method for manufacturing semiconductor device |
| 12/27/2007 | US20070298348 Silver Halide Color Photographic Light-Sensitive Material and Image Forming Method |
| 12/27/2007 | US20070298335 Exposure Condition Setting Method, Substrate Processing Device, and Computer Program |
| 12/25/2007 | US7312447 Electron beam depicting method, mother die manufacturing method, mother die, metallic mold manufacturing method, metallic mold and optical element |
| 12/25/2007 | US7312022 Developing solution contains a heterocyclic compound having three or more heteroatoms which when added, capable of enhancing the sensitivity of the silver halide color photosensitive material; high sensitivity, excellent color image storability |
| 12/25/2007 | US7312021 Creating a holographic representation of an image using a computer generated local encoding technique (LET); patterned material comprises transparent and opaque regions; three-dimensional patterns may be formed in photoresist layer of target one step; lithography; semiconductors |
| 12/25/2007 | US7312004 Exposed regions of a substrate are etched to a predetermined depth; Additional regions are exposed and trimmed to a predetermined thickness to provide desired attenuation amount; final etched depth compensating for the change of relative phase shift caused by trimming |
| 12/25/2007 | US7311771 Method and apparatus for forming crystalline portions of semiconductor film |
| 12/20/2007 | US20070292807 3-D relief pattern blank and method of using |
| 12/20/2007 | US20070292778 comparing measured optical property (reflectivity) of object pattern with measured optical properties of reference photoresist patterns via spectrophotometry; semiconductor substrate, photolithography mask substrate; microelectronics |
| 12/20/2007 | US20070292777 Method and apparatus for determining whether a sub-resolution assist feature will print |
| 12/20/2007 | US20070292771 Method and system for optimizing intra-field critical dimension uniformity using a sacrificial twin mask |
| 12/20/2007 | US20070292770 Photolithographic method and apparatus employing a polychromatic mask |
| 12/20/2007 | US20070292768 Comprises arylsulfonyloxime; for integrated circuits; suited for deep UV lithography; improved in pattern profile shape particularly when the thickness of resist film is reduced |
| 12/20/2007 | US20070289944 Method for engraving a golf club head |
| 12/20/2007 | DE10207131B4 Verfahren zur Bildung einer Hartmaske in einer Schicht auf einer flachen Scheibe A method of forming a hard mask in a layer on a flat disc |
| 12/18/2007 | US7310129 Method for carrying out a double or multiple exposure |
| 12/18/2007 | US7309565 Image forming layer surface is brought into contact with sticky rollers during or before exposing and developing to make the peel-off static electrification between the photothermographic dry imaging material and the sticky roller to be from -5 to +5 kV; high quality images for mammary diagnosis |
| 12/18/2007 | US7309564 Photothermographic material and image forming method |
| 12/18/2007 | US7309563 Patterning using wax printing and lift off |
| 12/13/2007 | US20070287106 photolithography; photoresists; photomasks; vacuum drying |
| 12/13/2007 | US20070287078 Reticle, semiconductor die and method of manufacturing semiconductor device |
| 12/12/2007 | EP1774771B1 Grey card for controlling exposure and white balance of a digital camera |
| 12/11/2007 | US7306899 Method for manufacturing photoresist having nanoparticles |
| 12/11/2007 | US7306896 Electron beam duplication lithography method |
| 12/11/2007 | US7306882 Quartz substrate with a partially dug main surface covered with a Cr film; dug portion has an undercut so that Cr film partially serves as an eaves; a subopening exposes an end of the dug portion; allows an eaves to be directly, accurately measured |
| 12/06/2007 | WO2007117273A3 Time-temperature, uv exposure and temperature indicator |
| 12/06/2007 | WO2007078515A3 Interferometric lithography system and method used to generate equal path lengths of interfering beams |
| 12/06/2007 | US20070281250 Electrophotographic image-receiving sheet and process for image formation using the same |
| 12/06/2007 | US20070281247 Laser ablation resist |
| 12/06/2007 | US20070281225 exposing test substrate through stencil to source of directional deposition or etching, comparing stencil pattern to pattern on substrate at a plurality of points along at least one direction to determine pattern run out at said points, fitting measured pattern run out, adjusting |
| 12/06/2007 | US20070281221 Stencil mask |
| 12/06/2007 | US20070281218 Dummy Phase Shapes To Reduce Sensitivity Of Critical Gates To Regions Of High Pattern Density |
| 12/06/2007 | US20070279605 Exposure systems including devices for inhibiting heating caused by infrared radiation from vacuum pump or the like |
| 12/06/2007 | DE102006026422A1 Entwicklerkonzentrat Developer concentrate |
| 12/05/2007 | EP1862852A1 Developer concentrate |
| 12/04/2007 | US7303864 Black and white photothermographic material and image forming method |
| 12/04/2007 | US7303841 Repair of photolithography masks by sub-wavelength artificial grating technology |
| 12/04/2007 | US7303383 Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks |
| 11/29/2007 | US20070275327 Photosensitive resin composition, resist pattern forming method, substrate processing method, and device manufacturing method |
| 11/29/2007 | US20070275313 Calculation method and apparatus of exposure condition, and exposure apparatus |
| 11/29/2007 | US20070275311 a method of manufacturing a display includes defining larger-dimension patterns of a photoresist layer using a first photomask and a proximity exposure machine, and defining smaller-dimension patterns of the same photoresist layer using a second photomask and a stepper exposure machine; efficiency |
| 11/29/2007 | US20070275310 Method for determining an acceptable reticle tolerance for a reticle used to produce an integrated circuit layout |
| 11/29/2007 | US20070275309 Patterning A Single Integrated Circuit Layer Using Multiple Masks And Multiple Masking Layers |
| 11/29/2007 | US20070273029 Photo mask set for forming multi-layered interconnection lines and semiconductor device fabricated using the same |
| 11/28/2007 | EP1501688B1 Multilayer image, particularly a multicolor image |
| 11/27/2007 | US7302651 Technology migration for integrated circuits with radical design restrictions |
| 11/27/2007 | US7300746 Illuminating photoresist layer on wafer using a photomask comprising line-type opaque patterns defining floodlighting portions for forming patterns and phase-shifting regions being arranged between opaque patterns; developing the illuminated photoresist |
| 11/27/2007 | US7300741 Advanced chemically amplified resist for sub 30 nm dense feature resolution |
| 11/27/2007 | US7300730 Providing a substrate having a material layer thereon;depositing an optically tunable anti-reflective coating layer on the material layer; depositing an optically tunable soft mask; exposing to patterned radiation; developing to create patterned image, enhancing the plurality of structures |
| 11/27/2007 | US7300728 Imaging lithographic printing plates, then transferring data to controllers for adjustment; data processing |
| 11/27/2007 | US7300727 Method for forming temporary image |
| 11/27/2007 | US7300724 capping structure may include alternating layers of a capping material, e.g., ruthenium, and a material with a lower EUV absorption coefficient, e.g., silicon |
| 11/27/2007 | US7300619 Compositions and methods for use in three dimensional model printing |
| 11/22/2007 | US20070269754 Acrylic Polymer and Radiation-Sensitive Resin Composition |
| 11/22/2007 | US20070269753 Concentrated processing composition for silver halide color paper and method of processing |
| 11/22/2007 | US20070269752 unnecessary patterns generated in undesired regions by ghost images are avoided as excess acid generated by the photoacid generator is neutralized and removed; spraying before or after an exposing step; water and polyoxyethylene glycol nonionic surfactant; |
| 11/22/2007 | US20070269748 Method for manufacturing an array of interferometric modulators |
| 11/22/2007 | US20070269740 Methods of marking and related structures and compositions |
| 11/22/2007 | US20070269726 Phase-shift mask, manufacturing method thereof and manufacturing method of semiconductor element |
| 11/22/2007 | US20070269722 Transparent film, attenuate film, and opaque film; etch selectivity; halftones |
| 11/22/2007 | US20070267764 Mold for photocuring nano-imprint and its fabrication process |
| 11/22/2007 | US20070267579 Photomask correction method using composite charged particle beam, and device used in the correction method |
| 11/21/2007 | EP1856576A2 Medical implants |
| 11/21/2007 | EP1856575A2 Merging sub-resolution assist features of a photolithographic mask |
| 11/21/2007 | EP1654126B1 Process for providing marking on security papers |
| 11/20/2007 | US7298482 Exposure apparatus and aligning method |
| 11/20/2007 | US7297468 Applying photosensitive resin; development, etching, transferring patern |
| 11/20/2007 | US7297453 femto-second laser, is applied to the reticle at a plurality of embedded positions, and the optical beam is configured to form specific volumes of altered optical properties within the transparent material of the reticle at the specified positions |
| 11/15/2007 | US20070264600 Heterocyclic Colorants Based on Diazabenzoisoindoles |
| 11/15/2007 | US20070264597 Method for manufacturing transflective liquid crystal display |
| 11/15/2007 | US20070264596 Thermal acid generator, resist undercoat material and patterning process |
| 11/15/2007 | US20070264591 Imprint lithography |
| 11/15/2007 | US20070264588 Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks |
| 11/15/2007 | US20070264581 Patterning masks and methods |
| 11/15/2007 | US20070263288 Diffusive Reflecting Structure and Its Manufacturing Method, and Display Device Using It |
| 11/15/2007 | US20070263269 Lithographic apparatus and device manufacturing method |
| 11/15/2007 | US20070262300 Method of forming fine pattern using azobenzene-functionalized polymer and method of manufacturing nitride-based semiconductor light emitting device using the method of forming fine pattern |
| 11/13/2007 | US7295374 Micro-lens and micro-lens fabrication method |
| 11/13/2007 | US7295291 Apparatus and process for the determination of static lens field curvature |
| 11/13/2007 | US7294571 Concave pattern formation method and method for forming semiconductor device |
| 11/13/2007 | US7294440 Method to selectively correct critical dimension errors in the semiconductor industry |