| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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| 06/26/2008 | US20080151207 Magneto-optical photoresist |
| 06/26/2008 | US20080149304 Method of making a heat exchanger core component |
| 06/24/2008 | US7390618 Manufacturing method of microstructure, manufacturing method and manufacturing device of electronic device |
| 06/24/2008 | US7390611 Photoresist coating composition and method for forming fine pattern using the same |
| 06/24/2008 | US7389585 Method of manufacturing a liquid discharging head |
| 06/19/2008 | US20080145801 Imaging layers of: a photosensitive silver halide, a non-photosensitive source of reducible silver ions, a reducing agent, a polymeric binder, and a substituted olefinic co-developer; reduction of sensitivity to high humidity, improved processing latitude |
| 06/19/2008 | US20080145800 Photothermographic materials containing developer and co-developer |
| 06/19/2008 | US20080145799 Substrate developing method, substrate processing method and developing solution supply nozzle |
| 06/19/2008 | US20080145793 Apply composition on photoresist layer to form image modifying material layer; form modifying pattern on resist layer; expose to radiation of wavelength lambda 1; modify image intensity in photoresist layer beneath; high resolution lithographic semiconductor features |
| 06/19/2008 | US20080145792 Reduction of line edge roughness with a conformal coating of a sealant |
| 06/19/2008 | US20080145791 Configured to transfer a pattern onto a substrate; integrated post-exposure bake device; bake substrate to a predefined temperature cycle; higher efficiency processing facility; maintain optimum performance parameters, critical dimension or overlay; asynchronous execution of the respective operations |
| 06/19/2008 | US20080145778 Image bearing member configured to operate at a linear velocity of at least 300 mm/sec; electroconductive substrate; charge blocking layer overlying; moire prevention layer overlying blocking layer; photosensitive layer of titanyl phthalocyanine; irradiation emitted forms a latent electrostatic image |
| 06/19/2008 | US20080145769 Entry acceptance unit takes measured dimension of transfer pattern; calculations of triaxial vector components at every position; flare electric field vector by polarization ratio of exposure tool; light intensity by adding electric field vector and flare, calculate sum of squares of triaxial components |
| 06/18/2008 | EP1932392A2 Method of forming a flexible heating element |
| 06/18/2008 | EP1932174A1 Oxidizing aqueous cleaner for the removal of post-etch residues |
| 06/18/2008 | EP1932057A2 Method of forming conductive tracks |
| 06/17/2008 | US7388216 Pattern writing and forming method |
| 06/17/2008 | US7387870 Method for manufacturing ceramic green sheet and method for manufacturing electronic part using that ceramic green sheet |
| 06/17/2008 | US7387867 Manufacturing method of semiconductor integrated circuit device |
| 06/17/2008 | US7387865 mixture of sulfonium or iodonium acid generators and nonionic surfactants, used to form analysis apparatus on solid substrates |
| 06/12/2008 | WO2008069953A1 El panel with thermally transferred rear electrode |
| 06/12/2008 | US20080138747 Method for Forming a Photoresist Pattern |
| 06/12/2008 | US20080138722 Exposure mask, its manufacture method, pattern transfer method, pattern forming method, and SRAM manufacture method |
| 06/12/2008 | US20080138577 Nano-fiber arrayed surfaces |
| 06/11/2008 | EP1658622A4 Method and system for drying a substrate |
| 06/10/2008 | US7385676 Mask set having separate masks to form different regions of integrated circuit chips, exposure system including the mask set with an aperture device, and method of using the mask set to expose a semiconductor wafer |
| 06/10/2008 | US7384731 increasing the speed of a silver halide photosensitive material without degrading the storage stability |
| 06/10/2008 | US7384727 Semiconductor processing patterning methods |
| 06/10/2008 | US7384724 Method for fabricating optical devices in photonic crystal structures |
| 06/10/2008 | US7384713 Exposure mask blank manufacturing method and exposure mask manufacturing method |
| 06/10/2008 | US7384712 Transferring pattern to substrate; holes surrounded by sheilding zones; forming semiconductors |
| 06/10/2008 | US7384597 Organic silver salt composition and manufacturing method thereof and photothermographic material |
| 06/05/2008 | WO2008065976A1 Method for forming conductive pattern |
| 06/05/2008 | US20080131822 spin coating a low dielectric material onto substrates, then pre-baking, exposing to radiation, post-baking, developing with developer solutions and hard-baking to form impression patterns, stamps or molds |
| 06/05/2008 | US20080131814 coating a photoresist film over substrates having undercoatings, pretreating the surface with solvents, forming overcoatings and exposing with an immersion lithography process |
| 06/05/2008 | US20080131787 Oxetane-containing compound, photoresist composition having the same, method of preparing pattern using the photoresist composition, and inkjet print head including polymerization products of the oxetane-containing compound |
| 06/05/2008 | US20080131668 Array substrate, display device, and method for manufacturing the array substrate |
| 06/05/2008 | US20080130316 Light Guide Plate, Production Method Therefor, And Surface Light Source Device Provided With It |
| 06/04/2008 | CN100392506C Film transistor array panel and its manufacturing method |
| 06/03/2008 | US7382959 Optically oriented three-dimensional polymer microstructures |
| 06/03/2008 | US7382447 Method for determining lithographic focus and exposure |
| 06/03/2008 | US7380320 Piezoelectric device and method of manufacturing the device |
| 05/29/2008 | US20080124659 Heat transfer film and method of manufacturing partition walls of plasma display panel using the same |
| 05/27/2008 | US7378676 Stimulable phosphor screens or panels and manufacturing control thereof |
| 05/27/2008 | US7378229 Pattern formation method |
| 05/27/2008 | US7378201 Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device |
| 05/27/2008 | US7378197 Antireflective coating; making semiconductors at lower wavelengths using reflective masks that can be effectively inspected at multiple wavelengths; wide bandwidth inspection contrast for extreme ultra-violet reticles |
| 05/27/2008 | US7377831 Plasma display panel and method of manufacturing the same |
| 05/22/2008 | WO2008061223A2 Enhanced sensitivity of a whispering gallery mode microsphere sensor by a high-refractive index surface layer |
| 05/22/2008 | WO2008060395A2 Intraoral dental radiology positioning device for use with x-ray receptor |
| 05/22/2008 | US20080118876 Lithographic apparatus and method |
| 05/22/2008 | US20080118872 Creating multi-layered structure with e-beam lithography by forming, on substrate, patterned layer having protrusions and recessions, spin-coating polymerizable material upon patterned layer, defining a conformal layer, and selectively removing portions of said multi-layered structure |
| 05/22/2008 | US20080118852 Method and System for Lithography Simulation and Measurement of Critical Dimensions with Improved CD Marker Generation and Placement |
| 05/22/2008 | US20080118851 Measuring plurality of first patterns formed over substrate positions of alignment marks to give first positional information; computing first disalignments of plurality of first patterns with respect to the first coordinate system; subtraction; semiconductors |
| 05/22/2008 | US20080118850 Opaque film formed on transparent substrate configured to form a pattern with which a wafer is exposed; forming microscopic patterns on electronic device such as a semiconductor or a magnetic element |
| 05/20/2008 | US7375809 Alignment routine for optically based tools |
| 05/20/2008 | US7374864 Combined nanoimprinting and photolithography for micro and nano devices fabrication |
| 05/20/2008 | US7374858 resist includes at least one unsaturated, polymerizable monomer; has at least one silicon atom and at least one carbonyl group |
| 05/15/2008 | WO2008058008A2 Grounding assembly for a drum in an image forming apparatus |
| 05/15/2008 | US20080113300 Novolak resin, alcohol solvent, trifluoroacetic acid catalyst; excimer laser; deposit resist using spin coating, puddling, dipping or spraying; tetramethylammonium hydroxide developing solution |
| 05/15/2008 | US20080113280 Creating method of photomask pattern data, photomask created by using the photomask pattern data, and manufacturing method of semiconductor apparatus using the photomask |
| 05/15/2008 | US20080113214 Luminescent device |
| 05/15/2008 | US20080110357 Reducing back-reflection during ablative imaging |
| 05/14/2008 | CN100388286C Method and device for designing alternant phase-shifting mask |
| 05/13/2008 | US7371489 Scanning the photomask which has sub-patterns formed inside rectangular region including all the main patterns; scan target range is regulated by inspecting apparatus; every scan target range in the rectangular region includes a main pattern and a sub-pattern; preventing alignment mixup in target range |
| 05/13/2008 | US7371485 Multi-step process for etching photomasks |
| 05/13/2008 | US7371483 Monitoring apertures in radiation transparent substrate; masking; halftone film; stacks of radiation transparent materials and opacque film ; etching |
| 05/13/2008 | US7371023 Apparatus for processing substrates and method therefor |
| 05/13/2008 | US7371022 Developer endpoint detection in a track lithography system |
| 05/13/2008 | US7370975 Image processing apparatus |
| 05/08/2008 | WO2008055054A2 Devices and methods for pattern generation by ink lithography |
| 05/08/2008 | WO2008054513A2 Appararus and method for the calibration of laser ablateable printing plates |
| 05/08/2008 | US20080108000 Random negative index material structures in a three-dimensional volume |
| 05/08/2008 | US20080107999 Exposure Method, Device Manufacturing Method, and Substrate |
| 05/08/2008 | US20080107976 Hardware and software for directing a beam through a mask onto a wafer surface to outline a circuit pattern; photolithography system including an exposure tool, a mask, array of micromechanical mirrors capable of real time configurable imaging, and addressing circuitry |
| 05/08/2008 | US20080107974 Photomask, multiphase exposure method, and method of manufacturing semiconductor device including insulating gate-type transistors |
| 05/08/2008 | US20080107972 Halftone mask and method for making pattern substrate using the halftone mask |
| 05/08/2008 | US20080107878 Colored mask for forming transparent structures |
| 05/08/2008 | US20080106708 Method and apparatus to prevent contamination of optical element by resist processing |
| 05/07/2008 | EP1784079A4 Method for reducing acrylamide formation in thermally processed foods |
| 05/06/2008 | US7369152 Laser marking method |
| 05/06/2008 | US7368227 electron beam lithography, forming a photoresist pedestal in the conventional way, followed by flood exposing with electrons and then a second development treatment to remove additional material from the sidewalls; write pole for vertical magnetic recording |
| 05/06/2008 | US7368217 Multilayer image, particularly a multicolor image |
| 05/06/2008 | US7368209 Method for evaluating sensitivity of photoresist, method for preparation of photoresist and manufacturing method of semiconductor device |
| 05/06/2008 | US7368208 Measuring phase errors on phase shift masks |
| 05/06/2008 | US7368207 Dynamic compensation system for maskless lithography |
| 05/06/2008 | US7368206 Forming first separated features on a surface, forming second separated features on surface interleaved between first separated features, and illuminating first and second separated features and detecting an interference pattern |
| 05/06/2008 | US7368204 Includes a transmissive portion defining a crystallization pattern and an alignment pattern, and a shielding portion surrounding the transmissive portion; use making an liquid crystal display (LCD) device where a driving circuit and a pixel thin film transistor are formed on a single substrate |
| 05/06/2008 | US7367710 Developing solution supply nozzle with stirrer |
| 05/06/2008 | US7367345 Apparatus and method for providing a confined liquid for immersion lithography |
| 05/02/2008 | WO2008024537A3 Marking multilayered structures using electromagnetic radiation |
| 05/01/2008 | US20080102410 Method of manufacturing printed circuit board |
| 05/01/2008 | US20080102408 Producing layer of photoresist with relief structure on flat substrate by forming shape of a relief die disposed in opposite relationship to substrate; removing relilef die; producing interference pattern by dividing coherent light; positioning, exposure, development; forming grooves and recesses; drying |
| 05/01/2008 | US20080102407 Triphenylsulfonium 1,1,3,3,3-pentafluoro-2-methacryloyl-oxypropane-1-sulfonate type (co)monomers; generates strong sulfonic acid upon exposure to high energy radiation and facilitates effective scission of acid labile groups in chemically amplified resist compositions; photosensitivity, resolution |
| 05/01/2008 | US20080102405 Nitrogen-containing organic compound, resist composition and patterning process |
| 05/01/2008 | US20080102383 photomasks comprising a non-phase shifting, phase shifting and opaque segemnts, for use in photolithography to produce patterns having a very fine pitch |
| 05/01/2008 | US20080100812 Immersion lithography system and method having a wafer chuck made of a porous material |
| 04/29/2008 | US7365901 Pattern generator |
| 04/29/2008 | US7365321 Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis |
| 04/29/2008 | US7364841 Comprising support having thereon light-insensitive organic silver salt grains, photosensitive silver halide grains, a reducing agent for silver ions and a binder; improved storage stability, image lasting quality; use in medical diagnosis and graphic arts |