| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
|---|
| 08/28/2008 | US20080206684 Method for forming ring pattern |
| 08/28/2008 | US20080206683 Mask and blank storage inner gas |
| 08/28/2008 | US20080206657 Multilayer; substrate with light shielding film; measurement flatness; calibration |
| 08/28/2008 | US20080204934 Magnetic recording medium, method for manufacturing the same, and magnetic recording/reproducing apparatus |
| 08/28/2008 | US20080203386 Photoresists; vapor deposition; atomic layer deposition; sputtering; lithography; etching |
| 08/27/2008 | EP1664923A4 Negative resist composition with fluorosulfonamide-containing polymer |
| 08/26/2008 | US7417711 Lithographic apparatus and device manufacturing method |
| 08/26/2008 | US7417709 Method and apparatus for exposing semiconductor substrates |
| 08/26/2008 | US7416837 A curable protective coatings for reducing an edge roughness during forming a small and fine pattern |
| 08/26/2008 | US7416836 Developing solution for lithographic printing plate precursor and method for making lithographic printing plate |
| 08/26/2008 | US7416830 positive-working, aqueous base developable photosensitive polybenzoxazole (PBO) precursor compositions of polyamides where the hydroxyl groups of the dihydroxydiamine monomer unit may be sulfonated with a quinonediazide, a diazonaphthoquinone photoactive compound, and a solvent; relief images |
| 08/21/2008 | WO2008099681A1 Triazinethiol-loaded carbide, method for producing triazinethiol-loaded carbide, method for adsorbing metal ion, and method for recovering metal |
| 08/21/2008 | US20080199813 Resolution and contrast during extreme ultraviolet light or electron beam micropatterning |
| 08/21/2008 | US20080199784 depositing a layer of photoresist on the integrated circuit, selectively exposing portions of the photoresist through photolithography mask having a pattern including means for alleviating line end shortening of first and second lines adjacent the gap, developing the photoresist after selective exposure |
| 08/21/2008 | US20080199665 Multilayer silver halide emulsion elements; transparent flexible support between photosensitive layers; imagewise exposure; conductive track patterns; printed circuits; display devices |
| 08/21/2008 | US20080198971 Small dental X-ray apparatus and method for positioning an X-ray emitter |
| 08/21/2008 | US20080197305 Solid-state radiation image detector |
| 08/19/2008 | US7414713 Method of measuring focal point, instrument used therefor, and method of fabricating semiconductor device |
| 08/19/2008 | US7414699 Lithographic apparatus and device manufacturing method |
| 08/19/2008 | US7413848 first solution and the second solution removal step to completely remove the photoresist layer have different polarities, and the polarity of the first solution is large than that of the second |
| 08/19/2008 | US7413833 Single exposure of mask levels having a lines and spaces array using alternating phase-shift mask |
| 08/14/2008 | US20080193884 Applying laser beam to photosensitive material comprising organic silver salt, silver halide, binder, and reducing agent; scanning exposure part comprises semiconductor laser, polygon mirror, and an imaging lense; high image quality; photothermography |
| 08/14/2008 | US20080192253 Method and test-structure for determining an offset between lithographic masks |
| 08/14/2008 | DE202008007707U1 Graukarte zur Einstellung der Belichtung und des Weissabgleichs bei fototechnischen Arbeiten Gray card to set the exposure and white balance for technical photographic work |
| 08/13/2008 | CN100410809C Method for evaluating the effects of multiple exposure processes in lithography |
| 08/13/2008 | CN100410808C Negative photoresists for short wavelength imaging |
| 08/12/2008 | US7411651 PSM alignment method and device |
| 08/12/2008 | US7410752 To a water-soluble silver ion supplier and an aqueous solution of an alkali metal salt of an organic acid to form an organic silver salt dispersion; mixing a polyacrylamide or derivative; excellent coated surface state |
| 08/12/2008 | US7410751 Compositions and methods for image development of conventional chemically amplified photoresists |
| 08/12/2008 | US7410745 Photothermographic material and image forming method using same |
| 08/12/2008 | US7410744 Iradiating a CO2 laser having a wavelength of 9 to 11 mu m onto a recording material composed of a recording layer having microcapsules encapsulating a basic dye precursor and a protective binder layer on a support; can be used for making labels for, e.g., beverage cans |
| 08/12/2008 | US7410737 System and method for process variation monitor |
| 08/12/2008 | US7410736 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones |
| 08/12/2008 | US7410735 Method of characterization, method of characterizing a process operation, and device manufacturing method |
| 08/12/2008 | US7410732 Process for producing a mask |
| 08/07/2008 | US20080187867 Photosensitive polyimide composition, polyimide film and semiconductor device using the same |
| 08/07/2008 | US20080185039 Conductor fabrication for optical element |
| 08/06/2008 | EP1953149A2 A heterocycle-containing onium salt |
| 08/05/2008 | US7407736 radiation exposure selectively breaks the polymer chains of the antireflective coatings, reduces the thickness, etch selectivity, increase etching due to depolymerization |
| 08/05/2008 | US7407730 Inspected by disposing dummy inspection patterns having the same pattern as at least a part of the mask pattern portion, inside and/or outside an area of the mask pattern portion and comparing the portion of the mask pattern portion with the dummy inspection pattern portion |
| 07/31/2008 | US20080182208 Aligning a closing plate with the holder by using an optical detector, and then the fluid containment mechanism is lowered, and the closing plate is placed into the plate holder; collisions are avoided and efficiency improved |
| 07/31/2008 | US20080182185 Charged particle beam writing apparatus and method thereof, and method for resizing dimension variation due to loading effect |
| 07/30/2008 | CN101231362A Preparation of hologram reflection-type photo-induced polyalcohol dry film |
| 07/30/2008 | CN100406275C Multilayer body with a layer having at least one laser sensitive material |
| 07/30/2008 | CN100406274C Multilayer image particularly multiple color image |
| 07/29/2008 | US7405880 Multilayer optical filter |
| 07/29/2008 | US7405807 Method of forming optical images, apparatus for carrying out said method and process for manufacturing a device using said method |
| 07/29/2008 | US7405032 employing a non-lithographic shrink technique to heat a photoresist for causing the photoresist to just enter a liquid phase to mitigate line-edge roughness, which in turn increases a distance between gates and decrease a thickness of the photoresist layer; trim etching to mitigate increase distance |
| 07/29/2008 | US7405025 Dicing lines extending longitudinally and transversely, and chip areas surrounded by the dicing lines are formed in a resist mask; critical-dimension patterns are formed in the dicing lines so as to be paired while placing the center line in between; for verification of process accuracy |
| 07/29/2008 | US7405024 Lithographic mask, and method for covering a mask layer |
| 07/24/2008 | US20080176173 Exposure and development layers containing group 1B compounds on supports form silver segments, then plating to form electroconductive segments having nanostructure particles; clarity; radiation transparent |
| 07/23/2008 | EP1947509A2 Pattern formation method |
| 07/23/2008 | EP0968458B1 Optical proximity correction method for intermediate-pitch features using sub-resolution scattering bars |
| 07/23/2008 | CN101228527A Manufacturing aware design and design aware manufacturing |
| 07/23/2008 | CN100405135C A device having a light-absorbing mask and a method for fabricating same |
| 07/22/2008 | US7403323 Process control monitors for interferometric modulators |
| 07/22/2008 | US7402378 Illuminating a phase shift mask including a pattern and a cyclic dummy pattern overlaid onto the pattern by making a part of the pattern to be resolved by effects of the dummy pattern thicker than the line width using light having a peak near an optical axis in an intensity distribution |
| 07/22/2008 | US7402364 A mask for defining gate patterns on dynamic random access memory (DRAM) chips with open bit-line architecture; no unwanted images; only one exposure is needed to achieve high resolution |
| 07/22/2008 | US7402363 Pattern forming method and system, and method of manufacturing a semiconductor device |
| 07/17/2008 | US20080171284 Method for Removing Excess Uncured Build Material in Solid Imaging |
| 07/17/2008 | US20080171274 Latent imaging; electrostatics |
| 07/16/2008 | CN100403166C Photomask and method for forming pattern |
| 07/15/2008 | US7399978 Method and device for irradiating spots on a layer |
| 07/15/2008 | US7399577 Halogenated oxime derivatives and the use thereof |
| 07/15/2008 | US7399575 Laminated photosensitive relief printing original plate and method for producing the relief printing plate |
| 07/15/2008 | US7399558 Mask and manufacturing method thereof and exposure method |
| 07/15/2008 | US7399557 Writing pattern; data processing; etching masking film; removal segments of photoresists |
| 07/10/2008 | US20080166670 Complex includes a multifunctional epoxy resin, a photoacid generator, an organic solvent and a silver compound, or additionally includes a multifunctional acrylate resin and a photoinitiator, or an additive; photoreduction is improved; heat and wear resistance; dispersibility |
| 07/10/2008 | US20080166667 Tunable contact angle process for immersionlithography topcoats and photoresists |
| 07/10/2008 | US20080166661 Low cost, rapid production; securing margins of overlapping and arrangement; forming composite photoresist pattern having pitch equal to half of individual pitches; first photoresist contains copolymer of such as 2-methyl-2-adamantyl methacrylate, 2-hydroxyethyl methacrylate and n-isopropyl acrylamide |
| 07/10/2008 | US20080166640 Mask used for LIGA process, method of manufacturing the mask, and method of manufacturing microstructure using LIGA process |
| 07/10/2008 | US20080166638 Comprised of base resin, acrylic acid-3,3-dimethoxypropene copolymer, photoacid generator, organic base and solvent; reducing number of steps to perform etching and hard mask deposition |
| 07/10/2008 | US20080166530 Multi-layer coating method, and planographic printing plate and manufacturing method thereof |
| 07/09/2008 | CN101218537A Color film developer composition and process therefor |
| 07/08/2008 | US7396639 Photothermographic material and image forming method |
| 07/08/2008 | US7396638 Photothermographic material and image forming method |
| 07/08/2008 | US7396620 For photolithography; optimizing an exposure dose and focus in an exposure apparatus; controlling the optical constants (e.g. refractive index and/or the absorption coefficient) and/or coating thickness of the resist applied commonly to the test wafer and the mass-produced wafer |
| 07/08/2008 | US7396617 Photomask reticle having multiple versions of the same mask pattern with different biases |
| 07/03/2008 | WO2008079268A2 Customized printing with depth effect |
| 07/03/2008 | WO2007044417A3 Scatter correction |
| 07/03/2008 | US20080161520 Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether |
| 07/03/2008 | US20080160462 Response signal is modulated in phase and amplitude by the applied information on substrate warpage during wafer placement and provide for adjustment of the bake plate shape in response to the substrate warpage to compensate for substrate to bake plate gap variations; high-speed,uniforml coating wafer |
| 07/03/2008 | US20080160456 Image Sensor Fabricating Method |
| 07/03/2008 | US20080160453 Producing precisely aligned, high resolution flat panel display devices; reduced time and cost; simplified technique; developing plate applied photosensitive layer to form patterned insulating layer then sintering to crosslink |
| 07/03/2008 | US20080160423 Expose photosensitive layer using a mask and hyper-numerical aperture optics providing a first exposure pattern; orthogonal second exposure using mask and optics different than the first exposure pattern; form two-dimensional array of features in the layer beneath the photosensitive layer |
| 07/03/2008 | US20080160285 Structure having nano-hole and fabricating method thereof, tip array structure and fabricating method of tip structure |
| 07/03/2008 | US20080160261 Overlay vernier of semiconductor device and method of manufacturing the same |
| 07/03/2008 | US20080158725 Vibration damping utilizing a patterned visco-elastic polymer |
| 07/02/2008 | CN101213488A System and method for critical dimension reduction and pitch reduction |
| 07/02/2008 | CN100399192C Silver halide colour photographic photo-sensitive material |
| 07/02/2008 | CN100398329C Laser printing method |
| 07/01/2008 | US7394523 Exposure apparatus and method of controlling exposure apparatus |
| 07/01/2008 | US7393794 Pattern formation method |
| 07/01/2008 | US7393623 Incorporation of markings in optical media |
| 07/01/2008 | US7393619 Method and lithographic structure for measuring lengths of lines and spaces |
| 07/01/2008 | US7393617 Opaque material replaces defects/pinholes on radiation transparent/patterned substrate; semiconductors; integrated circuits; photolithography |
| 06/26/2008 | US20080153033 Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated device |
| 06/26/2008 | US20080153012 Method of measuring the overlay accuracy of a multi-exposure process |
| 06/26/2008 | US20080153011 Pattern transfer mask, focus variation measuring method and apparatus, and semiconductor device manufacturing method |
| 06/26/2008 | US20080151208 Real-Time Configurable Masking |