| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
|---|
| 10/23/2008 | US20080261384 Removing photoresist layer with hydrogen, oxygen, and nitrogen to transform surface to a crust covering a soft photoresist layer; doping; wet, dry, or plasma stripping in pinning-down manner; temperature for first removing step is lower than second removing step and gasification temperature of solvent |
| 10/23/2008 | US20080261145 Alkaline-resistant negative photoresist for silicon wet-etch without silicon nitride |
| 10/23/2008 | US20080261128 Mask for semiconductor (integrated circuits) manufacture composed of a layer with a grain interface or a a material interface that provides enhanced etch selectivity, especially a tunable, etch resistant anti-reflective coating material and increased resistance to semiconductor manufacturing processes |
| 10/23/2008 | US20080261123 analyzing the monitored process parameter, and a data storage component; protective device against at unauthorized use and copying; detect optical radiation from a wafer exposure scanner; adjustment or alteration to the integrated circuit production steps |
| 10/23/2008 | US20080261122 Photolithography mask with protective capping layer |
| 10/23/2008 | US20080261121 photomask for the manufacture of integrated circuits, having a conformal protective chrome silicide capping layer on top surfaces and sidewalls of the first and second opaque regions; nondiffusion of underlying layers |
| 10/23/2008 | US20080261120 Photolithography mask with integrally formed protective capping layer |
| 10/22/2008 | CN101290501A Copying-proof film based on organic membrane structure and its preparation |
| 10/22/2008 | CN100428055C Photolithographic process, photomask and manufacturing thereof |
| 10/21/2008 | US7439001 Focus blur measurement and control method |
| 10/21/2008 | US7438998 Wiring pattern (mask layout) in the form of a line including angled portions with a local difference in line width is divided into rectangular patterns each having a large area and node portions interconnecting the rectangular patterns; high correction accuracy |
| 10/21/2008 | US7438996 Decreasing error of line width on coarse/dense pattern; adjusting numerical aperture and/or coherence factor |
| 10/21/2008 | US7438995 Use of partially fluorinated polymers in applications requiring transparency in the ultraviolet and vacuum ultraviolet |
| 10/21/2008 | US7438950 Forming a region in which a graft polymer, that directly bonds to a surface of a base material that includes a polyimide is generated in a pattern shape; imparting electroless plating catalyst or a precursor thereof and electroless plating so as to form a metallic film in the pattern shape |
| 10/16/2008 | WO2008022178A3 Method for separating optical and resist effects in process models |
| 10/16/2008 | US20080254395 Allowing easy, inexpensive user labeling of individual discs; professional look; activator and colorant precursor; radiation absorption marking |
| 10/16/2008 | US20080254393 Light emitting diode chip bonded to substrate ; patterned by photolithography |
| 10/16/2008 | US20080254392 Flexible circuit with cover layer |
| 10/16/2008 | US20080252910 Method and apparatus for managing printing solutions in a local area network |
| 10/15/2008 | CN100426460C Pattern formation method |
| 10/14/2008 | US7435763 Solid freeform compositions, methods of application thereof, and systems for use thereof |
| 10/14/2008 | US7435609 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server |
| 10/14/2008 | US7435533 Method of forming a semiconductor layer using a photomask reticle having multiple versions of the same mask pattern with different biases |
| 10/14/2008 | US7435517 Electron beam lithography system wherein the exposure is controlled in order to obtain resulting pattern after processing; allows reliable correction of the illumination parameters of an e-beam lithographic system by considering the influence of the fogging effect |
| 10/14/2008 | US7435514 Active mask lithography |
| 10/14/2008 | US7435512 Using a photomask that can prevent critical dimension biases of pattern images of different pattern densities while forming a circuit pattern |
| 10/09/2008 | WO2008094746A3 Sub-lithographic interconnect patterning using self-assembling polymers |
| 10/09/2008 | WO2008086116A3 Roll-to-roll method and system for micro-replication of a pattern of large relief three-dimensional microstructures |
| 10/09/2008 | WO2007111837A3 Plasma dielectric etch process including in-situ backside polymer removal for low-dielectric constant material |
| 10/09/2008 | US20080248655 DEVELOPMENT OR REMOVAL OF BLOCK COPOLYMER OR PMMA-b-S-BASED RESIST USING POLAR SUPERCRITICAL SOLVENT |
| 10/09/2008 | US20080248429 Method of forming a contact hole |
| 10/09/2008 | US20080248403 Method and system for improving critical dimension uniformity |
| 10/08/2008 | EP1470447B1 Photolithographic critical dimension control using reticle measurements |
| 10/07/2008 | US7432043 Distortions of the developed photosensitive film pattern are compensated for; more accurate target photosensitive film pattern; the depth of focus of the photolithography process is increased; uniformity |
| 10/07/2008 | US7432039 Method for simultaneous patterning of features with nanometer scales gaps |
| 10/07/2008 | US7432024 For semiconductors, microelectronic and microelectromechanical devices, and microfluidic and photonic devices; eliminating image distorting charging effects during electron beam patterning of the template and charging effects during scanning electron microscope inspection |
| 10/02/2008 | WO2007127407A3 Active mask lithography |
| 10/02/2008 | US20080242860 Silver halide color photographic light-sensitive material and image formation method using the same, silver halide emulsion, reducing compound having group adsorptive to silver halide and method for producing the same |
| 10/02/2008 | US20080241768 Transfer substrate, and fabrication process of organic electroluminescent devices |
| 10/02/2008 | US20080241767 Structure for providing deactivating agent capable of deactivating without developing the plate; deactivated plate is safe or has better stability at room lighting and can be handled under room lighting before and during development; development can be on press with ink or fountain solution or off press |
| 10/02/2008 | US20080241766 Photosensitive layers; lithography process using light sources ; development; heating; acid generator |
| 10/02/2008 | US20080241765 Methods and systems for providing direct manufactured interconnecting assemblies |
| 10/02/2008 | US20080241763 Patterning a thin film on substrate; photoresist; antireflective coating; photolithography |
| 10/02/2008 | US20080241760 Peb embedded exposure apparatus |
| 10/02/2008 | US20080241748 Organosilicon polymer containing chromogen; antireflactivity coating for lithography |
| 10/02/2008 | US20080241715 Eliminating problems occuring on restart of coating, transferring and developing system interrupted during continuous operation; semiconductor photolithography production |
| 10/02/2008 | US20080241714 Imaging asymmetric pattern with lens system and measuring alignment offset; low cost monitoring; preventing damage during extreme ultraviolet photolithography integrated circuit manufacturing |
| 10/02/2008 | US20080239580 Magnetic head for perpendicular magnetic recording and method of manufacturing same, the magnetic head including pole layer and two shields that sandwich the pole layer |
| 10/02/2008 | US20080239263 Lithographic system and device manufacturing method |
| 10/01/2008 | CN100423011C Effective proximity effect correction methodology |
| 09/30/2008 | US7430731 Method for electrochemically fabricating three-dimensional structures including pseudo-rasterization of data |
| 09/30/2008 | US7430072 System and method for increasing image quality in a display system |
| 09/30/2008 | US7429447 Photothermographic material and image forming method |
| 09/30/2008 | US7429446 Resist pattern forming method and semiconductor device fabrication method |
| 09/30/2008 | US7429444 Black and white photothermographic material and image forming method |
| 09/25/2008 | US20080233487 lithography focus and/or energy using a specially-designed optical critical dimension pattern. A wafer comprising a plurality of photomasks is received. Critical dimension, line-end shortening, and side wall angle of the plurality of photomasks are measured using an integrated metrology equipment. |
| 09/25/2008 | US20080231170 Wavelength Converter, Light-Emitting Device, Method of Producing Wavelength Converter and Method of Producing Light-Emitting Device |
| 09/25/2008 | DE102005059743B4 Verfahren zur Herstellung eines Unterscheidungsschutzes zwischen Original und Fotokopie Process for the preparation of a discrimination protection between Original and photocopy |
| 09/24/2008 | EP1627406B1 Unbaked laminate for producing front plate of plasma display device, and method for producing front plate of plasma display device |
| 09/23/2008 | US7427456 tabs having critical dimensions broader than those of the vertical patterns are additionally inserted into the edges of the vertical patterns disposed vertically to the dipole, thereby minimizing the difference in critical dimensions between central and edge portions of the vertical patterns |
| 09/18/2008 | WO2008111513A1 Physical developer, method of preparing conductive pattern, electromagnetic wave shielding material, fitter for plasma display and panel for plasma display |
| 09/18/2008 | US20080228309 Method and System for Reducing Critical Dimension Side-to-Side Tilting Error |
| 09/18/2008 | US20080227012 Charge control agent and toner comprising the same |
| 09/18/2008 | US20080227006 Stir-in pigment preparations for coloration of energy curable systems |
| 09/18/2008 | US20080226995 Having thermodynamically reversible Diels Alder bond; noncoated; tissue engineering, permeable membranes, packaging materials |
| 09/18/2008 | US20080226990 Maskless lithography; utilizing dark border region comprised of absorbing material, wedged reflective coating or interference grating to remove excess light; accuracy; maximizing active area |
| 09/17/2008 | CN100420354C Method for forming wire-layout pattern and method for making semiconductor device and photoelectronic device |
| 09/17/2008 | CN100419575C Image forming method using photothermographic material |
| 09/16/2008 | US7426017 Focus test mask, focus measurement method and exposure apparatus |
| 09/16/2008 | US7425707 Scintillator panel, method of manufacturing scintillator panel, radiation detection device, and radiation detection system |
| 09/16/2008 | US7425397 Method of determining an illumination profile and device manufacturing method |
| 09/16/2008 | US7425396 Photolithography and transfer of circuits for optical images for semiconductors and patterns |
| 09/16/2008 | US7425390 Preparation of halftone phase shift mask blank |
| 09/16/2008 | US7425389 Line photo masks and methods of forming semiconductor devices using the same |
| 09/16/2008 | US7425094 Apparatus for detecting position and format of a film cassette |
| 09/12/2008 | WO2006069255A3 Methods and systems for controlling variation in dimensions of patterned features across a wafer |
| 09/11/2008 | US20080222597 Photo mask, exposure method using the same, and method of generating data |
| 09/11/2008 | US20080220382 Lithographic apparatus and method |
| 09/11/2008 | US20080220377 Row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction; semiconductors |
| 09/11/2008 | US20080220345 Device manufacturing method, computer program and lithographic apparatus |
| 09/11/2008 | US20080220270 Fabricating Tall Micro Structures |
| 09/11/2008 | US20080217726 Integrated circuit system employing dipole multiple exposure |
| 09/09/2008 | US7423805 Ultra-broadband UV microscope imaging system with wide range zoom capability |
| 09/09/2008 | US7422777 N,N′-dicycloalkyl-substituted naphthalene-based tetracarboxylic diimide compounds as n-type semiconductor materials for thin film transistors |
| 09/09/2008 | US7422765 Alkali metal halide phosphor; vacuum deposition |
| 09/04/2008 | US20080213706 Method and apparatus for thermal development having a removable support member |
| 09/04/2008 | US20080213694 Acid generator mixture is a diphenyl iodinium mesylate, tosylate or perfluorobutylsulfonate salt, a nonionic fluoroaliphatic polymer ester surfactant and N-methylpyrrolidone; solid phase synthesis of DNA, RNA, peptide nucleic acids, locked nucleic acids, or proteins for chips; photolithography |
| 09/04/2008 | US20080212057 Substrate comprising a mark |
| 09/03/2008 | CN100416232C Light scattering EUVL mask |
| 09/02/2008 | US7420676 Alignment method, method of measuring front to backside alignment error, method of detecting non-orthogonality, method of calibration, and lithographic apparatus |
| 09/02/2008 | US7419774 Photothermographic material and method for processing the same |
| 09/02/2008 | US7419768 Methods of fabricating integrated circuitry |
| 09/02/2008 | US7419765 Engraving a printing relief on a flexographic printing element that can be laser engraved, said element having a photochemically cross-linked relief layer, transparent and comprises oxidic, siliceous or zeolitic solid matter |
| 09/02/2008 | US7419764 Method of fabricating nanoimprint mold |
| 09/02/2008 | US7419763 Near-field exposure photoresist and fine pattern forming method using the same |
| 09/02/2008 | US7419759 Photoresist composition and method of forming a pattern using the same |
| 09/02/2008 | US7419749 Halftone phase shift mask blank, halftone phase shift mask and their preparation |
| 08/28/2008 | US20080206689 Method of Forming Flexible Electronic Circuits |
| 08/28/2008 | US20080206688 zinc salts of an aryl sulfonic acid or of a fluorinated C2-C6 carboxylic acid; non-encapsulated alkali metal salts of an aryl sulfonic acid or of a fluorinated C2-C6 carboxylic acid; fluorinated C2-C6 carboxylic acids; improved Raw Stock Keeping; black and white photothermal material |
| 08/28/2008 | US20080206686 Method of forming fine patterns of semiconductor device |