| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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| 12/18/2008 | US20080311530 Graded topcoat materials for immersion lithography |
| 12/18/2008 | US20080311529 Immersion multiple-exposure method and immersion exposure system for separately performing multiple exposure of micropatterns and non-micropatterns |
| 12/18/2008 | US20080311526 Method for a multiple exposure, microlithography projection exposure installation and a projection system |
| 12/18/2008 | US20080311518 Inkless printing paper and method |
| 12/18/2008 | US20080311517 Inkless printing paper and method |
| 12/18/2008 | US20080309900 Method of making patterning device, patterning device for making patterned structure, and method of making patterned structure |
| 12/16/2008 | US7465533 Back layer which composed of non-photosensitive layer containing fluoropolymer latex with units from an unsaturated fluorinated monomer and an unsaturated monomer having a group capable of forming a salt or a poly(alkylene oxide) group; adhesion resistance during storage; excellent transportability |
| 12/16/2008 | US7465523 stress control layer that suppress stress and cancels a stress change of the thin film layer generated in production processes of a mask; producing photoresists with high position accuracy; lithography for producing a semiconductor |
| 12/11/2008 | US20080305442 Patterned material layer, method of forming the same, microdevice, and method of manufacturing the same |
| 12/11/2008 | US20080305437 Multi-layer mask method for patterned structure ethcing |
| 12/11/2008 | US20080305435 Method of making lithographic printing plate substrate and imageable elements |
| 12/11/2008 | US20080305408 Aperture mask, manufacturing method thereof, charge beam lithography apparatus, and charge beam lithography method |
| 12/11/2008 | US20080305011 Microfluidic chip and method of fabricating the same |
| 12/11/2008 | US20080304164 Composite lens structure |
| 12/11/2008 | US20080304034 Dose control for optical maskless lithography |
| 12/11/2008 | US20080302980 Extreme ultra-violet lithographic apparatus and device manufacturing method |
| 12/10/2008 | CN100442436C Method for forming pattern and method for manufacturing semiconductor device |
| 12/09/2008 | US7462445 rapid thermal processing of a photothermographic materials; involving a transport feed roller, light-insensitive layer or back coating layer contains a lubricant fatty ester, a biphenol derivatives reducing agent for silver |
| 12/09/2008 | US7462444 Image forming method for the photothermographic material |
| 12/09/2008 | US7462442 Biocompatible microchip and a method for producing the same |
| 12/09/2008 | US7462430 Method and arrangement for predicting thermally-induced deformation of a substrate, and a semiconductor device |
| 12/09/2008 | US7462429 Pre-specified exposure information used to configure an exposure of the fields is then modified based on the thermally-induced deformation information as predicted by the model; pattern is exposed onto the fields in accordance with the pre-specified exposure information as modified |
| 12/09/2008 | US7462426 Method for producing a phase mask |
| 12/09/2008 | US7461472 Half-tone phase shift mask and patterning method using thereof |
| 12/04/2008 | US20080299501 The photomachinable glass composition is a low thermal expansion (CTE) glass having amorphous and crystalline phases consisting of spudomene and lithium disilicate; 6x10-6/ degrees C. from 0-300 degrees C. after heat treatment |
| 12/04/2008 | US20080299498 Zero-gap microlenses array is formed by forming a first set of microlens blocks on the planarization layer of a semiconductor using photolithography and baking; hardening the surfaces; forming a second set of microlens blocks on the planarization layer using photolithography and baking; color filters |
| 12/04/2008 | US20080299495 Selectively developing the regions of the positive photoresist layer disposed over the epilayer edges by backside exposure UV; the UV opaque metal layer prevents regions of the positive photoresist layer disposed over the UV opaque metal from exposure to UV light and prevents development; accuracy |
| 12/04/2008 | US20080299494 Double patterning with a double layer cap on carbonaceous hardmask |
| 12/04/2008 | US20080299490 Writing method and charged particle beam writing apparatus |
| 12/04/2008 | US20080299489 Ultraviolet curable coating fluid for printing systems |
| 12/04/2008 | US20080299488 Imagable layer, polyvinyl alcohol protective overcoarting on hydrophilic substrate; including an infrared sensitive cyanine dyes ; antifogging by white light; high speed images |
| 12/04/2008 | US20080299486 Zinc oxide, silicon nitride layers, triarylsulfonium chloride as acid generator, polyvinyl alcohol, polyacrylic acid, and polyvinyl pyrrolidone as film forming polymers; photomasks |
| 12/04/2008 | US20080299470 Adjusting the calibration of an imaging system |
| 12/04/2008 | US20080298542 Image Producing Methods and Image Producing Devices |
| 12/04/2008 | US20080297752 Focus sensitive lithographic apparatus, systems, and methods |
| 12/03/2008 | EP1997127A2 Plasma dielectric etch process including in-situ backside polymer removal for low-dielectric constant material |
| 12/02/2008 | US7460282 Dynamic pattern generation for optical signal processing |
| 12/02/2008 | US7459323 Method of manufacturing a thin film transistor array panel |
| 12/02/2008 | US7459246 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the same |
| 12/02/2008 | US7459244 Mask, method for forming a pattern, and method for evaluating pattern line width |
| 12/02/2008 | US7459243 A before-correction pattern edge defining step, a deviated position setting step, an edge selecting step, a correcting step, after-correction pattern edge defining step |
| 12/02/2008 | US7459242 Method and system for repairing defected photomasks |
| 11/27/2008 | US20080292997 Method of developing photosensitive material and method of producing conductive layer-attached film |
| 11/27/2008 | US20080292996 Method for producing a high resolution resist pattern on a semiconductor wafer |
| 11/27/2008 | US20080292992 Writing pattern; data processing; etching masking film; removal segments of photoresists; generating method comprising correcting a first pattern data in accordance with a difference between first film pattern and second mask pattern and difference between first resist pattern and first mask pattern |
| 11/27/2008 | US20080292991 High fidelity multiple resist patterning |
| 11/27/2008 | US20080292987 Antireflective Coating Composition Comprising Fused Aromatic Rings |
| 11/27/2008 | US20080292975 Device manufacturing method, method of making a mask, and mask |
| 11/27/2008 | US20080292974 Exposure process and photomask set used therein |
| 11/27/2008 | US20080292061 Shoulder joint |
| 11/27/2008 | US20080290084 Method of Forming a Flexible Heating Element |
| 11/26/2008 | CN100437903C Photomask, pattern formation method using photomask and mask data creation method |
| 11/25/2008 | US7458057 Pattern correction method, pattern correction system, mask manufacturing method, semiconductor device manufacturing method, recording medium, and designed pattern |
| 11/25/2008 | US7458056 Effective proximity effect correction methodology |
| 11/25/2008 | US7457034 High NA system for multiple mode imaging |
| 11/25/2008 | US7455960 Photothermographic material |
| 11/25/2008 | US7455959 Photographic element containing a speed-enhancing compound |
| 11/25/2008 | US7455957 Blazed holographic grating, method for producing the same and replica grating |
| 11/25/2008 | US7455938 Methods of forming patterns in substrates |
| 11/20/2008 | WO2008140585A1 Apparatus and method for conformal mask manufacturing |
| 11/20/2008 | US20080286701 bidentate or tridentate copper complexants such as amino acids, aminophosphonic acids, di-and tricarboxylic acids, di-and triphosphonic acids, carboxyphosphonic acids; peroxy compound, buffer, ing compounds, peroxide stabilizer, and water; semiconductors; packaging |
| 11/20/2008 | US20080286699 Reticles, and methods of treating reticles, configuring reticles and using reticles |
| 11/20/2008 | US20080286698 Semiconductor device manufacturing methods |
| 11/20/2008 | US20080286683 Composite structures to prevent pattern collapse |
| 11/20/2008 | US20080286682 Material and method for photolithography |
| 11/20/2008 | US20080286662 Photomask producing method and photomask blank |
| 11/20/2008 | US20080286449 forming a chrome layer, an intermediate film, and a photoresist film sequentially; intermediate film pattern removed using an etching selectivity between the intermediate film pattern and a spacer, then etching the chrome layer and the substrate using the spacer as an etching mask; memory such as DRAM |
| 11/20/2008 | US20080286016 Regenerated elastic roller manufacturing process, regenerated elastic roller, electropohotographic process cartridge, and electropohotographic image forming apparatus |
| 11/18/2008 | US7452661 zinc salts of an aryl sulfonic acid or of a fluorinated C2-C6 carboxylic acid; non-encapsulated alkali metal salts of an aryl sulfonic acid or of a fluorinated C2-C6 carboxylic acid; fluorinated C2-C6 carboxylic acids; improved Raw Stock Keeping |
| 11/18/2008 | US7452639 Photomask with photoresist test patterns and pattern inspection method |
| 11/18/2008 | CA2504995C Method for forming temporary image |
| 11/13/2008 | US20080280381 Method of forming a fine pattern of a semiconductor device using a resist reflow measurement key |
| 11/13/2008 | US20080280234 Method of forming visible image for on-press developable lithographic printing plate |
| 11/13/2008 | US20080280233 Method for deactivating on-press developable lithographic printing plate |
| 11/13/2008 | US20080280230 Photolithography process including a chemical rinse |
| 11/13/2008 | US20080278700 Sub-resolution assist devices and methods |
| 11/13/2008 | DE102004031079B4 Verfahren zur Herstellung einer Reflexionsmaske A method of manufacturing a reflection mask |
| 11/12/2008 | CN101305320A System and method for mask verification using an individual mask error model |
| 11/12/2008 | CN101305319A Photomask and method for forming a non-orthogonal feature on the same |
| 11/12/2008 | CN100432837C Thiopene-containing photo acid generators for photolithography |
| 11/11/2008 | US7449286 Method of forming conductive tracks |
| 11/11/2008 | US7449285 For semiconductor integrated circuits; improved contrast; forming a small pattern under the same exposure conditions without depending on the shape and the density of the pattern |
| 11/11/2008 | US7449230 Topography; forming a thin, conformal layer on substrate surface, removing layer from bottomwalls so as to yield holes, trenches; gate layers, dopes, dielectric patterning, damascene processes, packaging, electrodeposition, chemical vapor deposition, sputtering |
| 11/06/2008 | US20080274568 Reticle and method of fabricating semiconductor device |
| 11/06/2008 | US20080274421 Photosensitive composition and pattern forming method using the same |
| 11/06/2008 | US20080274414 High-transmission attenuating psm |
| 11/05/2008 | CN101300526A Visual film identification |
| 11/04/2008 | US7446781 Compositing two-dimensional and three-dimensional image layers |
| 11/04/2008 | US7446330 Phosphor panel |
| 11/04/2008 | US7445884 Photothermographic material, development method and thermal development device thereof |
| 11/04/2008 | US7445883 Custom polarization, such as a combination of radial and tangential polarization; Forbidden pitch is avoided; patterning the polarized beam of radiation; projecting the patterned beam of radiation onto a target portion of the wafer |
| 11/04/2008 | US7445875 Mask blank and mask for electron beam exposure |
| 10/30/2008 | WO2008101183A3 Enhanced input using flashing electromagnetic radiation |
| 10/30/2008 | US20080268384 Color forming composites capable of multi-colored imaging and associated systems and methods |
| 10/30/2008 | US20080264905 Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis |
| 10/28/2008 | US7443482 Liquid jet and recovery system for immersion lithography |
| 10/28/2008 | US7442490 Positive resist composition and pattern formation method using the positive resist composition |
| 10/28/2008 | US7442486 Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon |
| 10/28/2008 | US7442477 Exposing apparatus and exposing method, for maskless exposure of substrate to be exposed, and plotter and plotting method for directly plotting on object to be plotted |
| 10/28/2008 | US7442473 Method for forming mask pattern of semiconductor device |