| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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| 03/03/2009 | US7499149 Holographic mask for lithographic apparatus and device manufacturing method |
| 03/03/2009 | US7498124 Sacrificial surfactanated pre-wet for defect reduction in a semiconductor photolithography developing process |
| 03/03/2009 | US7498122 Solvent-less process for producing transient documents |
| 03/03/2009 | US7498117 System and method for radiation imaging by in-situ particle formation |
| 03/03/2009 | US7497961 Method of making an inkjet printhead |
| 03/03/2009 | US7497959 Methods and structures for protecting one area while processing another area on a chip |
| 02/26/2009 | US20090053899 Method of pattern formation in semiconductor fabrication |
| 02/26/2009 | US20090053654 Mask and Method for Patterning a Semiconductor Wafer |
| 02/26/2009 | US20090053652 Photoresist compositions |
| 02/26/2009 | US20090053627 Methods and systems for normalizing error |
| 02/25/2009 | EP1856576A4 Medical implants |
| 02/24/2009 | US7494753 using a resist calibration model including Gaussian kernels with different diffusion lengths in different directions |
| 02/24/2009 | US7494752 Method and systems for utilizing simplified resist process models to perform optical and process corrections |
| 02/24/2009 | CA2321543C Methods for the preparation of an n-bis-[2-(1,2-dicarboxy-ethoxy)-ethyl]amine derivative and products of the methods and their uses |
| 02/19/2009 | WO2009023847A1 Well plate |
| 02/19/2009 | US20090047609 Metal conservation with stripper solutions containing resorcinol |
| 02/19/2009 | US20090047606 Lithography meandering order |
| 02/19/2009 | US20090047604 Lithographic apparatus and device manufacturing method |
| 02/19/2009 | US20090047583 Masks for microlithography and methods of making and using such masks |
| 02/19/2009 | US20090046263 Using phase difference of interference lithography for resolution enhancement |
| 02/19/2009 | US20090045530 Microelectronic lithographic alignment using high contrast alignment mark |
| 02/17/2009 | US7492443 Device manufacturing method, device manufactured thereby and a mask for use in the method |
| 02/17/2009 | US7491913 Bake apparatus for use in spin-coating equipment |
| 02/17/2009 | US7491478 Control of exposures is based on relative contrast loss for source spectrum and pattern to be projected; lithography |
| 02/17/2009 | US7491474 Photomasks having transparent and opaque, phase-shifting sections formed by trenches; photosenstivity; photoresists; etching; semiconductors |
| 02/17/2009 | US7491473 Photo mask and method for controlling the same |
| 02/12/2009 | WO2009020662A1 Apparatus and method for modifying optical material properties |
| 02/12/2009 | US20090042389 Double exposure semiconductor process for improved process margin |
| 02/12/2009 | US20090042148 Photoresist Composition for Deep UV and Process Thereof |
| 02/12/2009 | US20090042133 Antireflective Coating Composition |
| 02/11/2009 | EP1634122A4 Method for evaluating the effects of multiple exposure processes in lithography |
| 02/11/2009 | CN101366107A Oxidizing aqueous cleaner for the removal of post-etch residues |
| 02/10/2009 | US7488572 Utilizing a photothermographic material, which can form images showing less generation of density unevenness, high contrast and high maximum density without causing physical deformation |
| 02/05/2009 | US20090035880 Maunfacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server |
| 02/05/2009 | US20090035707 Rheology-controlled conductive materials, methods of production and uses thereof |
| 02/05/2009 | US20090035704 Underlayer Coating Composition Based on a Crosslinkable Polymer |
| 02/05/2009 | US20090035671 Adjustment method, exposure method, device manufacturing method, and exposure apparatus |
| 02/05/2009 | US20090035670 Hard imaging methods, liquid marking agent monitoring methods, and hard imaging devices |
| 02/05/2009 | US20090035668 forming block copolymer film placed on random copolymer film substrate operatively associated with electronic component and block copolymer film wherein surface energy of random copolymer film is tailored by use of a photolithographic or chemical process prior to self assembly step |
| 02/05/2009 | US20090035667 Method for correcting mask |
| 02/05/2009 | US20090035665 Process of semiconductor fabrication with mask overlay on pitch multiplied features and associated structures |
| 02/05/2009 | US20090032744 Radiation image capturing system |
| 02/03/2009 | US7485411 Method for manufacturing printed circuit board with thin film capacitor embedded therein |
| 01/29/2009 | WO2009014655A1 Alignment system and method for a substrate in a nano-imprint process |
| 01/29/2009 | US20090029272 Merging Sub-Resolution Assist Features of a Photolithographic Mask |
| 01/29/2009 | US20090029266 Multi-layer alternating phase shift mask structure |
| 01/29/2009 | US20090027635 Lithographic Apparatus and Contamination Removal or Prevention Method |
| 01/28/2009 | CN100456421C Barrier film material and pattern formation method using the same |
| 01/27/2009 | US7483804 Method of real time dynamic CD control |
| 01/27/2009 | US7483117 Exposure method, exposure apparatus, and method for producing device |
| 01/27/2009 | US7482113 Incorporating specific combinations of a trisphenol reducing agent and a substituted olefinic co-developer having a phosphonium cation in photothermographic materials, improves image tone with little change in other sensitometric properties; preferable bluer image tones identified by blue filter density |
| 01/27/2009 | US7482112 increasing its solubility in an alkaline developer under action of an acid generator; prevent development defect after development in immersion photolithography; silicon-free resin is a copolymer of trimethylsilanol modified methacrylic acid-methyl methacrylate; making the semiconductors |
| 01/27/2009 | US7482102 Monitoring pattern configured to obtain information required for adjusting optical system; asymmetrical diffraction grating generates positive first order diffracted light and negative first order diffracted light; probing phase shifters |
| 01/22/2009 | WO2006071419A3 Electrical, plating and catalytic uses of metal nanomaterial compositions |
| 01/22/2009 | US20090023100 Patterning a surface comprising silicon and carbon |
| 01/22/2009 | US20090023099 Mask registration correction |
| 01/22/2009 | US20090022443 Thermo-Optic Devices Providing Thermal Recirculation |
| 01/21/2009 | CN101351746A Interferometric lithography system and method used to generate equal path lengths of interfering beams |
| 01/20/2009 | US7479366 Mixture of photomasks; controlling incline of pattern; lithography; phase shifting; removal of mask by etching |
| 01/20/2009 | US7479365 Semiconductor device manufacturing method |
| 01/20/2009 | US7479356 Measuring plurality of first patterns formed over substrate positions of alignment marks to give first positional information; computing first disalignments of plurality of first patterns with respect to the first coordinate system; subtraction; semiconductors |
| 01/20/2009 | US7479355 For use in patterning underlying layer comprising opaque regions and transparent regions with slit extending laterally through the end of the line |
| 01/20/2009 | US7479203 Bonding a deformable film to a fluid flow structure to inhibit blocking of flow paths by placing the structure on an electrostatic chuck support, placing the film on another chuck support, and thermally bonding the structure and the film to one another; electrostatic forces inhibit deformation |
| 01/15/2009 | WO2009009554A1 Azo colourant |
| 01/13/2009 | US7477403 Optical position assessment apparatus and method |
| 01/13/2009 | US7476473 Process control method, a method for forming monitor marks, a mask for process control, and a semiconductor device manufacturing method |
| 01/08/2009 | US20090011669 Method for producing light-transmitting electromagnetic wave-shielding film, light-transmitting electromagnetic wave-shielding film and plasma display panel using the shielding film |
| 01/08/2009 | US20090011375 Immersion liquid for liquid immersion lithography process and method for forming resist pattern using the same |
| 01/08/2009 | US20090011369 Removing a portion of the anti-reflective coating adjacent to andaround a periphery of the substrate using a back-side removal process;simultaneously removing a portion of resist and topcoatand a portion of top-coat layer from near the edges using a top-sided removal process |
| 01/08/2009 | US20090009743 Method of defining patterns in small pitch and corresponding exposure system |
| 01/08/2009 | US20090009701 Light Diffusing Plate and Display Apparatus |
| 01/06/2009 | US7475380 Generating mask patterns for alternating phase-shift mask lithography |
| 01/06/2009 | US7475379 Methods and systems for layout and routing using alternating aperture phase shift masks |
| 01/06/2009 | US7474401 Multi-layer alignment and overlay target and measurement method |
| 01/06/2009 | US7473521 Composite mask for producing a diffuser |
| 01/06/2009 | US7473502 Imaging tool calibration artifact and method |
| 01/06/2009 | US7473500 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same |
| 01/06/2009 | US7473494 Exposure mask and mask pattern production method |
| 01/01/2009 | US20090004610 Method and apparatus for manufacturing semiconductor device |
| 01/01/2009 | US20090004596 Resist composition comprises a molecular glass having at least one fused polycyclic moiety and at least one base soluble functional group protected with an acid labile protecting group, and a photosensitive acid generator; high etch resistance |
| 01/01/2009 | US20090004581 Exposure apparatus, exposure method and optical proximity correction method |
| 01/01/2009 | US20090004579 Clear and colorless three-dimensional articles made via stereolithography and method of making said articles |
| 01/01/2009 | US20090004572 Method of monitoring focus in lithographic processes |
| 01/01/2009 | US20090004444 Novel Photosensitive Resin Compositions |
| 12/31/2008 | EP1481973B1 Heterocycle-bearing onium salts |
| 12/31/2008 | CN100447668C Silver halides color photographic sensitive material and color image forming method |
| 12/30/2008 | US7471375 Correction of optical proximity effects by intensity modulation of an illumination arrangement |
| 12/30/2008 | US7470502 a curable mixture a cationically polymerizable polyether and an onium salt with a organoboron anion; discharging the mixture onto a recording medium or hydrophilic supports and curing by irradiating with actinic radiation to form hydrophobic images |
| 12/30/2008 | US7470501 Pattern formation method through liquid immersion lithography |
| 12/25/2008 | US20080318170 Method of making an optical disc |
| 12/25/2008 | US20080318032 Method for selectively forming symmetrical or asymmetrical features using a symmetrical photomask during fabrication of a semiconductor device and electronic systems including the semiconductor device |
| 12/25/2008 | US20080315270 Multilayer antireflection coatings, structures and devices including the same and methods of making the same |
| 12/24/2008 | EP1774542A4 Method for bilayer resist plasma etch |
| 12/24/2008 | CN100445870C System and method for processing masks with oblique features |
| 12/23/2008 | US7469058 Method and system for a maskless lithography rasterization technique based on global optimization |
| 12/23/2008 | US7468779 Lithographic apparatus and device manufacturing method |
| 12/23/2008 | US7468241 Processing latitude stabilizers for photothermographic materials |
| 12/23/2008 | US7468240 Pattern exposure with oblique incidence illumination using a photomask having a light-shielding pattern formed from a film region and phase shift region having a phase difference with respect to a light-transmitting region of the substrate which has no light-shielding pattern |
| 12/23/2008 | US7468237 Integrated optical circuits having drop-in locations for optical circuit elements |
| 12/23/2008 | US7468235 Solution in an organic solvent of a polymer having units from maleic anhydride, vinyl fluoroalkanoate (especially vinyl trifluoroacetate) and optionally 5-norbornene-2-methanol; for use in immersion photolithography; can easily form fines pattern having a good profiles |