| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
|---|
| 05/26/2009 | US7537871 Method of manufacturing semiconductor device |
| 05/26/2009 | US7537869 Avoiding image macro-flare by determining the variations of lengths of parallel lines of transparency of two patterns adjacent or overlapping the photoresist film; the second has a larger transparent region than the first which has parallel lines of transparent regions of the same length |
| 05/26/2009 | US7537866 Patterning a single integrated circuit layer using multiple masks and multiple masking layers |
| 05/26/2009 | US7537864 Hole pattern design method and photomask |
| 05/26/2009 | US7537800 Method for producing light-transmitting electromagnetic wave-shielding film, light-transmitting electromagnetic wave-shielding film and plasma display panel using the shielding film |
| 05/21/2009 | US20090130614 Development device and development method |
| 05/21/2009 | US20090130613 Silver Halide color photographic light-sensitive material and color image-forming method |
| 05/21/2009 | US20090130591 Antireflective Coating Composition and Process Thereof |
| 05/21/2009 | US20090130569 Adjustable Mask Blank Structure for an Euv Phase-Shift Mask |
| 05/20/2009 | EP2059853A2 Method for separating optical and resist effects in process models |
| 05/19/2009 | US7534533 Polarization analyzing system, exposure method, and method for manufacturing semiconductor device |
| 05/19/2009 | US7534369 Method of producing liquid crystal emulsion compositions |
| 05/14/2009 | US20090123881 Photothermographic material and image formation method |
| 05/13/2009 | CN101432658A Method and system for controlling critical dimensions of structures formed on a wafer in semiconductor processing |
| 05/12/2009 | US7533022 Printed media with machine readable markings |
| 05/12/2009 | US7532307 Focus determination method, device manufacturing method, and mask |
| 05/12/2009 | US7531292 Method for producing disc overlay proofs |
| 05/12/2009 | CA2292745C Separating metal ions absorbed on a resin and installation for recycling photographic effluents including an exchanger and an electrolysis vessel |
| 05/07/2009 | WO2006060504A3 Tri-tone trim mask for alternating phase-shift photolithography |
| 05/07/2009 | US20090114430 Method for patterning of conductive polymer |
| 05/07/2009 | US20090114334 Method for manufacturing metallic panel having ripple luster |
| 05/05/2009 | US7527922 Selenium-sensitized silver chloride content of 90 mole % or above; N-(o-oxyphenyl)-alpha-(cyclo)alkanoyl-alpha-1-cyclicimidoacetamide yellow dye-forming coupler; magenta and cyan dye-forming couplers; light-insensitive hydrophilic colloid layer |
| 05/05/2009 | US7527921 Treating the pattern with a vapor of ozone and water to remove a hydrophobic group from the photoresist resin, and cleaning with and acid or base to render the pattern water soluble; photoresist is suitable for argon fluoride laser |
| 05/05/2009 | US7527442 Process for forming resist pattern, and resist coating and developing apparatus |
| 04/30/2009 | WO2007067267A3 Seamless exposure with projection system comprises array of micromirrors with predefined reflectivity variations |
| 04/30/2009 | US20090111055 Method of forming an image having multiple phases |
| 04/30/2009 | US20090111037 Protective overcoat transfer compensation |
| 04/30/2009 | US20090110912 Method for producing light-transmitting electromagnetic wave-shielding film, light-transmitting electromagnetic wave-shielding film and plasma display panel using the shielding film |
| 04/30/2009 | US20090110878 Methods for fabricating sub-resolution alignment marks on semiconductor structures and semiconductor structures including same |
| 04/30/2009 | US20090110151 X-ray window and resistive heater |
| 04/28/2009 | US7524621 Method of preparing silver carboxylate soaps |
| 04/28/2009 | US7524620 For forming a fine pattern in fabrication of semiconductor integrated circuit devices |
| 04/28/2009 | US7524615 High speed violet or ultraviolet laser sensitive; exposed plate is preferably developed on a processor with an alkaline developer coupled with a replenisher having higher pH |
| 04/28/2009 | US7524607 Water soluble negative tone photoresist |
| 04/28/2009 | US7524595 applies a fluid material onto a substrate and then conducts at least two curing steps; coating with no hole over the overlay mark can improve accuracy of the overlay measurement of lithography |
| 04/28/2009 | US7524593 semi-transparent film, capable of forming a resist in which a convex portion is not formed in an end portion and the end portion has gentle shape |
| 04/28/2009 | US7524591 Photomask and manufacturing method thereof, fabrication process of an electron device |
| 04/23/2009 | US20090105071 using a donor element in a radiation-induced thermal transfer process, an assemblage is provided that includes a donor element and a receiver element, wherein the donor element has a support layer and a transfer layer |
| 04/23/2009 | US20090104572 Composition and method for providing a patterned metal layer having high conductivity |
| 04/23/2009 | US20090104564 Patterning process |
| 04/23/2009 | US20090104549 Method for error reduction in lithography |
| 04/16/2009 | WO2007035193A3 System and method for increasing efficiency and quality for exposing images on celluloid or other photo sensitive material |
| 04/16/2009 | WO2005036264A3 Photomask having an internal substantially transparent etch stop layer |
| 04/16/2009 | US20090098490 Radiation-Sensitive, Wet Developable Bottom Antireflective Coating Compositions and Their Applications in Semiconductor Manufacturing |
| 04/16/2009 | US20090098473 Photomask, method of lithography, and method for manufacturing the photomask |
| 04/16/2009 | US20090096676 Durable wideband antenna fabricated on low resistivity silicon substrate |
| 04/16/2009 | US20090096090 Photolithography Process and Photomask Structure Implemented in a Photolithography Process |
| 04/14/2009 | US7517632 Silver paste composition, method of forming conductive pattern by using the same, and the conductive pattern formed |
| 04/14/2009 | US7517621 first point and the second point being symmetric with respect to the center of the illumination, and to a straight line extending through the center of the illumination in a second direction perpendicular to the first direction; patterning the semiconductor |
| 04/09/2009 | US20090092932 Mixture of photomasks; controlling incline of pattern; lithography; phase shifting; removal of mask by etching |
| 04/09/2009 | US20090092928 Component fabrication using thermal resist materials |
| 04/09/2009 | US20090092926 Lithography Systems and Methods of Manufacturing Using Thereof |
| 04/09/2009 | US20090092922 Imaging Layers, Structures Including Imaging Layers, Methods of Making Imaging Layers, and Imaging Systems |
| 04/09/2009 | US20090092799 Mixed lithography with dual resist and a single pattern transfer |
| 04/09/2009 | US20090092226 Apparatus and method for recording radiation image data of an object |
| 04/09/2009 | US20090090179 Sensor with polymer substrate for use in corrosive liquids |
| 04/09/2009 | DE102005000734B4 Verfahren zum Einstellen einer Abweichung einer kritischen Abmessung von Mustern Method for adjusting a deviation of a critical dimension of patterns |
| 04/08/2009 | EP1810206A4 Method and apparatus associated with anisotropic shrink in sintered ceramic items |
| 04/08/2009 | EP1695143A4 Filling an area of an image marked on a product with a laser |
| 04/08/2009 | EP1537445A4 Nanocomposites |
| 04/08/2009 | CN100477058C Unbaked laminate for producing front plate of plasma display device, and method for producing front plate of plasma display device |
| 04/08/2009 | CN100475803C Heterocycle-bearing onium salts |
| 04/07/2009 | US7514699 Method and device for irradiating spots on a layer |
| 04/07/2009 | US7514697 Storage phosphor plate for the storage of X-ray information |
| 04/07/2009 | US7514477 Low-viscosity radiation-curable composition for making an earpiece |
| 04/07/2009 | US7514206 Thermally developable materials with buried conductive backside coatings |
| 04/07/2009 | US7514188 Process for providing marking on security papers |
| 04/07/2009 | US7514185 Forming a light-absorbing film on a transparent substrate, and irradiating the light-absorbing film with light from a flash lamp; flatness |
| 04/07/2009 | US7513433 Security feature |
| 04/02/2009 | WO2005077100A3 High aspect ratio c-mems architecture |
| 04/02/2009 | US20090089061 Audio Reader Device |
| 04/02/2009 | US20090087760 Image Forming Device, and Method and Computer Readable Medium Therefor |
| 04/02/2009 | US20090087663 Free-standing metallic micromechanical structure, method of manufacturing the same, resonator structure using the same, and method of manufacturing a resonator structure using the same |
| 04/01/2009 | CN101399277A Image sensor having large micro-lenses at the peripheral regions |
| 03/31/2009 | US7510818 Reversible contrast enhancement layer (R-CEL) in optical lithography, lithography mask inspection and writing and optical storage |
| 03/31/2009 | US7510815 Via solvent selected from alkylene glycol monoalkyl ether carboxylic acid esters, alkoxycarboxylic acid esters and alicyclic ketones, linear amides, cyclic amides, sulfur-containing compounds and cyclic esters; color filters |
| 03/31/2009 | US7510813 Including a core and a resin coating layer containing a polyhydroxyalkanoate; excellent in durability, environmental stability; used for developing an electrostatic latent image in electrophotography, electrostatic recording, electrostatic printing, or the like |
| 03/26/2009 | US20090081598 Functionalized carbosilane polymers and photoresist compositions containing the same |
| 03/26/2009 | US20090081578 prepared from long chain carboxylic acids by sequential addition of at least two different alkali metal hydroxides, one of which is lithium hydroxide, followed by converting the mixture of alkali metal carboxylates to silver carboxylates; Photothermographic materials |
| 03/26/2009 | US20090081568 Exposure apparatus and method of manufacturing device |
| 03/26/2009 | US20090081562 Photolithographic method and mask devices utilized for multiple exposures in the field of a feature |
| 03/26/2009 | US20090080065 Ultra-broadband UV microscope imaging system with wide range zoom capability |
| 03/24/2009 | US7508515 System and method for manufacturing printed circuit boards employing non-uniformly modified images |
| 03/24/2009 | US7507508 Variation in the amount of exposure and focal position is quantitatively assessed by forming predetermined assessment pattern including a first pattern having a remaining pattern, and a second pattern which includes a remaining pattern formed in a position lower than the first |
| 03/24/2009 | US7507506 Uses a low cost high speed laser writer to print less critical chiplets and structures on a reticle, and applies a high cost and low throughput electron beam writer to print the most critical chips; total number photomask susbstrates required to produce integrated circuits is be reduced |
| 03/24/2009 | US7507505 Fabrication method of extreme ultraviolet radiation mask mirror using atomic force microscope lithography |
| 03/19/2009 | US20090077530 Design pattern correcting method, design pattern forming method, process proximity effect correcting method, semiconductor device and design pattern correcting program |
| 03/19/2009 | US20090077529 Design pattern correcting method, design pattern forming method, process proximity effect correcting method, semiconductor device and design pattern correcting program |
| 03/19/2009 | US20090077528 Pattern correction method, pattern correction system, mask manufacturing method, semiconductor device manufacturing method, recording medium, and designed pattern |
| 03/18/2009 | EP1849181A4 Replication tools and related fabrication methods and apparatus |
| 03/18/2009 | CN100470381C A method of patterning photoresist on a wafer using an attenuated phase shift mask |
| 03/17/2009 | US7504038 Utilizes silicone rubber or polydimethylsiloxane as planarization material for positional accuracy; aligning workpieces in fixture for spincoating, projection lithography, patterning and forming structural features; elastic deformation release; requiring only two manipulations |
| 03/12/2009 | US20090065843 Semiconductor Constructions, Semiconductor Processing Methods, And Methods Of Forming Flash Memory Structures |
| 03/11/2009 | EP1546803A4 Wet-developable anti-reflective compositions |
| 03/11/2009 | CN100468013C Phase shift photomask and method for improving printability of a structure on a wafer |
| 03/10/2009 | US7501230 To help reduce semiconductor procedure effects, such as undesired line edge roughness, insufficient lithographical resolution, and limited depth of focus problems associated with the removal of a photoresist layer |
| 03/10/2009 | US7501215 Analyzing front side mark behavior on a substrate during an integrated circuit manufacturing process, without the need of etching global alignment marks; Chemical Mechanical Polishing |
| 03/10/2009 | US7501214 Semiconductor device fabrication method and fabrication apparatus using a stencil mask |
| 03/10/2009 | US7501213 Method for forming generating mask data |
| 03/05/2009 | US20090061352 Imageable elements with improved abrasion resistance |