| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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| 09/16/2009 | EP2101556A2 Light transmitting electromagnetic wave shielding film and plasma display panel using the shielding film |
| 09/15/2009 | US7589242 Use of highly purified hydrocarbons in vacuum ultraviolet applications |
| 09/15/2009 | US7588870 Dual layer workpiece masking and manufacturing process |
| 09/15/2009 | US7588869 Divided exposure method for making a liquid crystal display |
| 09/15/2009 | US7588868 Method and system for reducing the impact of across-wafer variations on critical dimension measurements |
| 09/15/2009 | US7588867 Reflection mask, use of the reflection mask and method for fabricating the reflection mask |
| 09/10/2009 | US20090227111 Barrier film material and pattern formation method using the same |
| 09/10/2009 | US20090226827 forming a self-aligning conductive high polypyrrole layer over the frame pattern by electrochemical polymerization, then etching to remove the conductive high polymer layer by providing oxygen plasma; forming a phase shift layer and an light shielding layer over a substrate; prevent defects in wafers |
| 09/09/2009 | EP2099050A2 Method for producing a metallic silver pattern on a transparent substrate and manufacture of a light-transmitting electromagnetic wave-shielding film |
| 09/08/2009 | US7587702 Step-walk relaxation method for global optimization of masks |
| 09/03/2009 | US20090220873 Belt skew correction controlling method, belt transportation device, and recording apparatus |
| 09/01/2009 | US7582414 exposing thin film to a radiation source in a liquid immersion lithography, rotating the substrate and remove fluids; baking; development; transferring pattern |
| 09/01/2009 | US7582403 Metal compositions, thermal imaging donors and patterned multilayer compositions derived therefrom |
| 09/01/2009 | US7582396 Hybrid phase-shift mask and manufacturing method thereof |
| 09/01/2009 | US7582394 Photomask and method for forming pattern |
| 09/01/2009 | US7581883 Radiographic apparatus |
| 08/27/2009 | US20090213346 Immersion lithography using hafnium-based nanoparticles |
| 08/25/2009 | US7580559 System and method for calibrating a spatial light modulator |
| 08/25/2009 | US7579136 Microfluidic device and method of manufacturing the same |
| 08/20/2009 | US20090208249 Coating liquid for forming undercoat layer, method for preparing coating liquid for forming undercoat layer, electrophotographic photoreceptor, image-forming apparatus, and electrophotographic cartridge |
| 08/18/2009 | US7576349 Radiation image readout apparatus |
| 08/13/2009 | WO2009099666A1 Extrusion reduction in imprint lithography |
| 08/13/2009 | WO2009099526A2 Apparatus and method for imaging ionizing radiation |
| 08/13/2009 | US20090202136 Polarization analyzing system, exposure method, and method for manufacturing semiconductor device |
| 08/13/2009 | CA2709188A1 Apparatus and method for imaging ionizing radiation |
| 08/12/2009 | EP1856575A4 Merging sub-resolution assist features of a photolithographic mask |
| 08/11/2009 | US7573574 Lithographic apparatus and device manufacturing method |
| 08/06/2009 | US20090197189 Focus measurement method and method of manufacturing a semiconductor device |
| 08/06/2009 | US20090197188 Method for a multiple exposure beams lithography tool |
| 08/05/2009 | CN101501567A System and method for increasing efficiency and quality for exposing images on celluloid or other photo sensitive material |
| 08/04/2009 | US7569842 Method for correcting electron beam exposure data |
| 08/04/2009 | US7569333 Wiring line structure and method for forming the same |
| 08/04/2009 | US7569312 Mask data creation method |
| 08/04/2009 | US7569311 single reticle photolithography system suitable for exposing regions of the reticle having distinct patterns under different illumination conditions optimal for each respective region |
| 07/30/2009 | US20090191473 Photomask manufacturing method, photomask manufacturing system, and device manufacturing method |
| 07/30/2009 | US20090190932 Electronic device |
| 07/30/2009 | US20090190721 X-ray detecting stand and x-ray imaging apparatus |
| 07/29/2009 | CN100520584C Method for reducing nonuniformity of image printed on substrate using light micro-image cover and light micro- image cover |
| 07/28/2009 | US7566181 Controlling critical dimensions of structures formed on a wafer in semiconductor processing |
| 07/22/2009 | CN100518432C Substrate, method of manufacturing multi-layer substrate, and satellite broadcasting reception apparatus |
| 07/21/2009 | US7565219 Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby |
| 07/21/2009 | US7563709 Pattern formation method and method for forming semiconductor device |
| 07/21/2009 | US7563564 Method of forming flexible electronic circuits |
| 07/21/2009 | US7563547 Photomask and method of manufacturing the same |
| 07/21/2009 | US7563546 Process for creating phase edge structures in a phase shift mask |
| 07/21/2009 | US7563146 Unbaked laminate for producing front plate of plasma display device, and method for producing front plate of plasma display device |
| 07/21/2009 | US7563025 Methods and apparatus for preserving orientation information in radiography images |
| 07/14/2009 | US7562336 Contrast based resolution enhancement for photolithographic processing |
| 07/14/2009 | US7560201 Patterning a single integrated circuit layer using multiple masks and multiple masking layers |
| 07/14/2009 | US7560197 Mask pattern data producing method, patterning method, reticle correcting method, reticle manufacturing method, and semiconductor apparatus manufacturing method |
| 07/09/2009 | US20090175634 Method for controlling image forming apparatus |
| 07/08/2009 | CN100511619C Membrane processing method and processor |
| 07/08/2009 | CN100510958C Pattern forming method |
| 07/08/2009 | CN100510794C Optical films and methods of making the same |
| 07/07/2009 | US7558643 Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby |
| 07/07/2009 | US7557921 Apparatus and methods for optically monitoring the fidelity of patterns produced by photolitographic tools |
| 07/07/2009 | US7556908 Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same |
| 07/07/2009 | US7556900 Measuring the effect of flare on line width |
| 07/07/2009 | US7556898 Overlay target for polarized light lithography |
| 07/07/2009 | US7556893 reticle used to form alignment targets on a wafer; four fine alignment targets per stepper shot for compensating rotational error in the making of integrated circuits; saving time and reducing processing, increase precision |
| 07/02/2009 | US20090170016 Compensating for periodical defects in a multi-beam pattern generator without increasing critical dimension-error;scaling a pattern pitch in a first direction to be an integer multiple of pitch; adjusting the pitch in first direction to maintain a scale; adjusting predetermined separation to pitch |
| 07/02/2009 | US20090168953 Dental x-ray bite block and alignment method |
| 07/01/2009 | CN100507713C Photomask, photomask manufacturing method and semiconductor device manufacturing method using photomask |
| 06/30/2009 | US7553611 formation of monolithic three dimensional semiconductor memory arrays, using stepper to achieve alignment and measurement, creating blocking structure to prevent interference; integrated circuit; cost efficiency |
| 06/30/2009 | US7553610 Method of forming fine patterns |
| 06/30/2009 | US7553606 Methods of forming patterns in semiconductor devices using photo resist patterns |
| 06/25/2009 | US20090162789 Method for Transferring a Predetermined Pattern Reducing Proximity Effects |
| 06/25/2009 | US20090162760 Semiconductor device, method for manufacturing semiconductor device, and computer readable medium |
| 06/25/2009 | US20090162759 substrate processing method, substrate processing program, and computer readable storage medium storing the program, for forming a predetermined pattern on a substrate by a photolithography technique |
| 06/23/2009 | US7551977 Method and apparatus associated with anisotropic shrink in sintered ceramic items |
| 06/23/2009 | US7550253 Impervious barrier film includes an alkali-soluble addition polymer and a fluorine-based surface active agent; immersion photolithography using exposing light of a shorter wavelength, such as KrF or ArF excimer lasers, or F2 , ArKr, or Ar2 lasers; fine resist pattern; good shapes |
| 06/18/2009 | WO2005079233A3 Films for optical use and methods of making such films |
| 06/18/2009 | US20090158236 Semiconductor device fabrication method and fabrication apparatus using a stencil mask |
| 06/18/2009 | US20090155545 Method of imaging in crystalline colloidal arrays |
| 06/17/2009 | CN100501929C Method of adjusting deviation of critical dimension of patterns |
| 06/16/2009 | US7547495 Device manufacturing method and computer program product |
| 06/11/2009 | US20090145767 Method for Electrochemically Fabricating Three-Dimensional Structures Including Pseudo-Rasterization of Data |
| 06/09/2009 | US7545497 Alignment routine for optically based tools |
| 06/09/2009 | US7544449 Method and apparatus for measurement of crossfield chromatic response of projection imaging systems |
| 06/04/2009 | US20090142825 Composite detection devices having in-line desalting and methods of making the same |
| 06/04/2009 | US20090142702 Methods of using violet-sensitive imageable elements |
| 06/04/2009 | US20090141866 Universal dental x-ray sensor holder |
| 06/04/2009 | US20090139449 Silicon thin film in which an opening for selectively irradiating charged particles to a semiconductor substrate is provided and whose irradiation surface on which the charged particles are irradiated is implanted with an impurity, and selectively irradiating charged particles to semiconductor substrate |
| 06/03/2009 | EP1656592B1 Charge control agent comprising a mixture of a triphenylmethane compound and a tetraphenylmethane |
| 06/03/2009 | EP1652007B1 Further method to pattern a substrate |
| 06/03/2009 | CN101446761A Pattern formation method |
| 06/02/2009 | US7542263 Overlay correction by reducing wafer slipping after alignment |
| 06/02/2009 | US7542141 Stage controller and exposure method in which position of the stage is controlled based on position measurements of first and second laser interferometers |
| 06/02/2009 | US7541605 Radiation image information detecting panel |
| 06/02/2009 | US7541136 Transparent film configured to give a predetermined phase difference to exposure light passing through that part of the second opening area in which the transparent film is provided relative to exposure light passing through the second surrounding area; focus monitor masks; photolithography; efficiency |
| 06/02/2009 | US7541121 Calibration of optical line shortening measurements |
| 06/02/2009 | US7541120 Manufacturing method of semiconductor device |
| 06/02/2009 | US7541118 photomasks comprising a non-phase shifting, phase shifting and opaque segemnts, for use in photolithography to produce patterns having a very fine pitch |
| 06/02/2009 | US7541117 Shifter pattern image transferred to the photoresist film in the shifter pattern image light exposure step does not overlap the trim pattern image transferred to the film in the trim pattern image light exposure step; photoresist film is patterned with a photoresist material remaining in the dark part |
| 06/02/2009 | US7541115 Use of calcium fluoride substrate for lithography masks |
| 05/28/2009 | WO2009067241A1 Porous template and imprinting stack for nano-imprint lithography |
| 05/28/2009 | WO2009067149A1 Method of creating a template employing a lift-off process |
| 05/28/2009 | US20090136861 Electrophotographic photoreceptor, image-forming apparatus, and electrophotographic cartridge |
| 05/27/2009 | CN101443702A Tri-tone trim mask for alternating phase-shift photolithography |
| 05/26/2009 | US7538853 Exposure process and apparatus using glass photomasks |