Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726)
02/2010
02/16/2010US7662523 Photo mask, exposure method using the same, and method of generating data
02/16/2010US7662522 Method for manufacturing semiconductor devices, and method for forming a pattern onto an exposure mask
02/16/2010US7662313 For use as semiconductors for nanoscale electronics, optoelectronic applications in emissive devices
02/10/2010CN100589030C Method for implementing key size linear control in whole-chip chrome-less photoetching technique production
02/09/2010US7659525 Apparatus for and method of recording image
02/09/2010US7659041 Lithographic method of manufacturing a device
02/03/2010CN201397446Y Novel image film
02/02/2010US7655381 Method for producing a substrate having a resist layer in the form of a relief structure, which represents a diffraction structure, the substrate having a conductive layer which scatters the primary electrons and/or produces secondary electrons when the resist layer is exposed by an electron beam
02/02/2010US7655369 Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device
02/02/2010US7655368 Method for exposing a substrate and lithographic projection apparatus
02/02/2010US7655367 Lithographic apparatus and device manufacturing method
02/02/2010US7655362 Masks of semiconductor devices and methods of forming mask patterns
01/2010
01/28/2010US20100020359 Method For Playing Audio Signals Provided On A Photograph
01/26/2010US7652758 Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems
01/26/2010US7651826 Semiconductor device, fabricating method thereof, and photomask
01/26/2010US7651825 Method and system for overlay control using dual metrology sampling
01/21/2010US20100015558 Laser Marking
01/21/2010US20100015536 Photoresist solution dispensing volume monitoring system and method thereof
01/19/2010US7650588 Methods and systems for pattern generation based on multiple forms of design data
01/19/2010US7648821 Method of forming flexible electronic circuits
01/19/2010US7648809 Electron beam exposure method, hot spot detecting apparatus, semiconductor device manufacturing method, and computer program product
01/19/2010US7648802 Phase shifting test mask patterns for characterizing illumination and mask quality in image forming optical systems
01/14/2010WO2010005977A2 Method and apparatus for x-ray radiographic imaging
01/12/2010US7645546 Method for determining an overlay correlation set
01/07/2010US20100003468 Method of forming microfined resist pattern
01/05/2010US7644389 Method for producing a mask for the lithographic projection of a pattern onto a substrate
01/05/2010US7642022 Parameter determination method, exposure method, device fabrication method, and storage medium
01/05/2010US7642021 forming a photoresist pattern on the substrate, performing a device manufacturing process using the photoresist pattern as a mask to form sensor windows on the substrate, onne or more focus error sensors are formed in the sensor windows, focus errors are determined using the focus error sensors
01/05/2010US7642016 allows the lithographic measurement of the effective phase of an attenuated phase test structure at similar sensitivity to the lithography used for phase measurement of alternating aperture phase masks; capable of testing for 180 degrees phase differential in small-pitch attenuated phase-shift gratings
01/05/2010US7641406 Bevel inspection apparatus for substrate processing
12/2009
12/30/2009CN101617271A Enhanced input using flashing electromagnetic radiation
12/30/2009CN101614951A Superfine grain developing bath of black and white negative films and developing method
12/29/2009US7638247 Method for electron beam proximity effect correction
12/23/2009CN101611349A Sub-lithographic interconnect patterning using self-assembling polymers
12/23/2009CN100573316C Convex-pattern type thermosensitive/photosensitive plate developing liquid and preparing method
12/22/2009US7635545 Photomask features with interior nonprinting window using alternating phase shifting
12/15/2009US7633712 Method to print photoresist lines with negative sidewalls
12/15/2009US7633078 Storage phosphor layer and system and method for erasing same
12/15/2009US7632632 Color photographic materials with magenta minimum density dyes
12/15/2009US7632616 Photoresists, photolithography; spectroscopy
12/15/2009US7632539 Bismuth, germanium, silicon, titanium oxide particles are filled in aerosolization chamber, shaken/agitated together with carrier gas in high-pressure gas cylinder which stores carrier gas; electrostatic latent imaging
12/10/2009WO2009149285A1 Detection of promiscuous small submicrometer aggregates
12/10/2009DE112004001611B4 Farbzusammensetzungen, Verfahren zum Erzeugen von Farbbildern und System zum Etikettieren eines Substrats Color compositions, methods for forming color images and system for labeling of a substrate
12/08/2009US7631288 Optical proximity correction performed with respect to limited area
12/08/2009US7630054 Methods and systems to compensate for a stitching disturbance of a printed pattern
12/08/2009US7630052 Exposure processing system, exposure processing method and method for manufacturing a semiconductor device
12/08/2009US7629400 Comprises synthetic absorbent, conductive, or radiation transparent polymer which provides aesthetic element for fine artwork; preservation
12/08/2009US7629092 measuring an underlay film thickness for each individual semiconductor substrate, correcting an amount of exposure by use of an electron beam; forming patterns with desired dimensions, fineness as well as having great density difference
12/03/2009US20090297992 Silver halide color photographic film having multiple color imaging layers, has azo yellow dyes; status M blue density greater than 0.003 per mg/m2; solvent-free; cost efficiency; discoloration inhibition; negative photographic elements and motion picture origination films
12/03/2009US20090297958 Exposure mask and exposure method using the same
12/03/2009US20090294704 Active millimeter wave imaging system and method
12/01/2009US7625680 Method of real time dynamic CD control
12/01/2009US7625679 Method of aligning a particle-beam-generated pattern to a pattern on a pre-patterned substrate
12/01/2009US7625675 Method for producing masks for photolithography and the use of such masks
11/2009
11/25/2009EP2122416A2 Enhanced input using flashing electromagnetic radiation
11/24/2009US7622245 Manufacturing data-storage media using light-curable material
11/17/2009US7619717 Method for performing a focus test and a device manufacturing method
11/17/2009US7618755 performing an exposure process for substrates in lithography tools using an automated focus adjustment process on the basis of focus tilt parameter; using a fault detection module; determining a current focus fault status on the basis of current value and a statistical value; wafers; cost efficiency
11/11/2009EP2116385A1 Paper with security impression
11/11/2009CN101577148A Transparent conducting film and preparation method thereof
11/11/2009CN100559914C Production method of suspension board with circuit
11/11/2009CN100559287C Photoresist stripping agent composition
11/10/2009US7615319 Quick and accurate modeling of transmitted field
11/10/2009US7615179 Use of novel micro- and nano-imprinting techniques for making supported three-dimensional micro- and nano-structures for pixel segregation in OLED-based displays; enables assembly of polymers without a glass transition temperature and eliminates heating required to assemble thermoplastic polymers
11/04/2009EP1634122B1 Method for evaluating the effects of multiple exposure processes in lithography
11/03/2009US7611829 Silver halide color photographic light-sensitive material and color image-forming method
10/2009
10/29/2009US20090271759 Contrast-based resolution enhancement for photolithographic processing
10/29/2009US20090269686 Substrate processing method, computer-readable storage medium and substrate processing system
10/27/2009US7610203 System for recording and playing audio signals provided on a photograph
10/27/2009US7608845 Charged particle beam writing apparatus and method thereof, and method for resizing dimension variation due to loading effect
10/27/2009US7608387 Method for fabricating mold core
10/27/2009US7608368 Pattern forming method, photomask manufacturing method, semiconductor device manufacturing method, and computer program product
10/20/2009US7605908 Near-field exposure mask, near-field exposure apparatus, and near-field exposure method
10/20/2009US7605350 System for two-step resist soft bake to prevent ILD outgassing during semiconductor processing
10/20/2009US7604912 manufacturing a semiconductor device; quantitatively correction by first calculating a effective numerical aperture to a pattern in the each region based on a light intensity distribution, then adjusting to form a desired pattern
10/20/2009US7604910 Exposure mask, method of forming resist pattern and method of forming thin film pattern
10/20/2009US7604905 Photomasks
10/15/2009WO2009099526A3 Apparatus and method for imaging ionizing radiation
10/13/2009US7603648 Mask design using library of corrections
10/13/2009US7601484 Imagewise multiphoton polymerization and blanket irradiation techniques are combined to fabricate optical elements in situ in an encapsulating, protective monolithic polymeric matrix; e.g. waveguides; encapsulated structure with good hardness, durability, dimensional stability, resilience, and toughness
10/13/2009US7601471 the transferred patterns of respective evaluation patterns transferred using the test photo mask are calculated on the basis of the relationship with the opening ratio of the flare generation patterns; enables performing accurate pattern-dimension corrections against local flares
10/13/2009US7601275 Liquid crystal drop apparatus and method for dropping liquid crystal using the same
10/07/2009EP2107420A1 Compositions for removing etching residue and use thereof
10/06/2009US7598026 Image forming method using a silver halide color photographic light-sensitive material, and silver halide color photographic light-sensitive material
10/06/2009US7598025 Hologram silver halide photographic material, hologram and method for producing the same
10/06/2009US7598024 for restoring an alignment mark, using a hard mask amorphous carbon material and expose to a dose of radiation to elevate a top surface region, serve as an alignment mark that preserves the original horizontal position of the underlying alignment mark; patterning process
10/06/2009US7598022 comprises a manganese(Mn)-containing precursor and hydrophilic polymer; preparing nano-scale patterns by varying exposure doses; water-soluble solvent developable property; uses water-soluble solvent as developing solvent with environmental protection; low cost, high speed process; integrated circuit
10/01/2009US20090246655 Electron beam writing apparatus and method
10/01/2009US20090242744 Arrangement for producing electromagnetic radiation and method for operating said arrangement
10/01/2009US20090242236 Method of forming conductive tracks
09/2009
09/29/2009US7596420 Device manufacturing method and computer program product
09/24/2009US20090239160 Method for preparing data for exposure and method for manufacturing photo mask
09/24/2009US20090238342 Cassette accommodating device, radiation detection system, and rechargeable battery accommodating device
09/22/2009US7592106 Halftone type phase shift mask blank and phase shift mask thereof
09/22/2009US7592105 Reducing the thickness of a portion of a radiation transparent substrate; the quartz-containing substrate can be protected with a patterned layer while being subjected to a dry etch
09/22/2009US7592103 Electron beam writing method and lithography mask manufacturing method
09/22/2009CA2220474C Value metal recovery
09/17/2009US20090233246 Method for producing material containing sensitizer dispersed therein for thermal recording article and thermal recording article
09/17/2009US20090233245 Color Film Developer Composition and Process Therefor
09/17/2009US20090233193 Pattern prediction method, pattern correction method, method of fabricating semiconductor device, and recording medium
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