| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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| 07/07/2010 | CN101772733A Alignment system and method for a substrate in a nano-imprint process |
| 07/06/2010 | US7749691 latent imaging; color filters; photomasks; semiconductors |
| 07/06/2010 | US7749690 multiple exposure patterning to provide mark; photoresists; integrated circuits |
| 07/06/2010 | US7749687 forming pattern on photosensitive resin film in lithography; photomasks; photoresists |
| 07/06/2010 | US7749666 System and method for measuring and analyzing lithographic parameters and determining optimal process corrections |
| 07/06/2010 | CA2578163C Method for reducing acrylamide formation in thermally processed foods |
| 07/01/2010 | DE19727066B4 Schwach alkalische Ascorbinsäure enthaltende Entwicklerzusammensetzung, Verarbeitungskit und Verfahren zu dessen Verwendung Ascorbic acid-containing weakly alkaline developer composition, and method for its use Verarbeitungskit |
| 06/29/2010 | US7745842 Graytone mask and method thereof |
| 06/29/2010 | US7745079 Providing sufficient pressure gas for establishing a temperature gradient and a method of cooling the environment of the surface to be protected using a shield emitting gas substantially parallel betweena first and second planes and away from the aperture where one of the gas ports has a slit-shape |
| 06/29/2010 | US7745078 Method and system for manufacturing a reticle using character projection lithography |
| 06/29/2010 | US7745073 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the same |
| 06/24/2010 | US20100159709 Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing method |
| 06/22/2010 | US7741017 Five-, six- or seven-membered heterocycle with a nitrogen-oxygen reducing group, preferably hydroxyamine, hydroxamic acid, hydroxyurea or hydroxysemicarbazide; high sensitivity, suppressed fogging, superior raw stock storability and exposure moisture dependency |
| 06/15/2010 | US7736838 Methods for forming pattern using electron beam and cell masks used in electron beam lithography |
| 06/09/2010 | CN1519955B Thin film transistor array panel, its manufacture method and mask for such panel |
| 06/08/2010 | US7732124 Performing image-wise exposure of light-sensitive material cut into sheets and subjecting exposed sheets to photographic processing including color development process, bleach-fix process, rinsing process and drying process, while conveying exposed sheets by means of pairs of rollers |
| 06/08/2010 | US7732107 makes it possible to estimate and correct flare with high accuracy over entire portion not only of single shot region but also of single chip region to thereby realize lithographic process causative of only a small dimensional variation in line width, and to realize highly-reliable semiconductor devices |
| 05/27/2010 | US20100129737 Development method, method of manufacturing photomask, method of manufacturing semiconductor device and development device |
| 05/27/2010 | US20100129098 Developing method and developing apparatus |
| 05/26/2010 | CN201489269U Negative developing machine of jointless sleeve negative |
| 05/26/2010 | CN1637620B Exposure processing system, exposure processing method and method for manufacturing a semiconductor device |
| 05/26/2010 | CN1577722B Image correcting method ,system and mask, semiconductor producing method and semiconductor device |
| 05/26/2010 | CN101713920A 半导体器件 Semiconductor devices |
| 05/25/2010 | US7723724 System for using test structures to evaluate a fabrication of a wafer |
| 05/18/2010 | US7718352 Process for producing electroluminescent element |
| 05/18/2010 | US7718348 integrated circuits; photoresists |
| 05/18/2010 | US7718327 Overlay management method and apparatus, processing apparatus, measurement apparatus and exposure apparatus, device manufacturing system and device manufacturing method, and program and information recording medium |
| 05/18/2010 | US7718081 etching includes transferring pattern into substrate using double patterned amorphous carbon layer on substrate as hardmask; photoresists; vapor deposition; semiconductors; integrated circuits |
| 05/12/2010 | EP2183644A1 Well plate |
| 05/12/2010 | CN1985335B Method for bilayer resist plasma etch |
| 05/11/2010 | US7713678 Resist material and electron beam recording resist material |
| 05/06/2010 | US20100112485 Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device |
| 05/06/2010 | US20100112467 Photolithography systems and associated methods of overlay error correction |
| 05/04/2010 | USRE41307 Mask for clamping apparatus, e.g. for a lithographic apparatus |
| 05/04/2010 | US7712070 Method for transferring self-assembled dummy pattern to substrate |
| 05/04/2010 | US7710539 Method and arrangement for predicting thermally-induced deformation of a substrate, and a semiconductor device |
| 05/04/2010 | US7710538 Method and arrangement for correcting thermally-induced field deformations of a lithographically exposed substrate |
| 05/04/2010 | US7709304 Thin film transistor array panel, manufacturing method thereof, and mask therefor |
| 05/04/2010 | US7709184 Printing plate is exposed with the radiation, deactivated, and then on-press developed with ink and/or fountain solution; deactivation of texposed plate allows handling of plate under regular office light or any other light without causing the hardening of the non-exposed areas of photosensitive layer |
| 05/04/2010 | US7709166 Measuring the effect of flare on line width |
| 05/04/2010 | US7709165 Image enhancement for multiple exposure beams |
| 05/04/2010 | US7709161 Photomask producing method and photomask blank |
| 04/29/2010 | US20100104986 Method for forming pattern |
| 04/28/2010 | EP2178655A1 Apparatus and method for indirect surface cleaning |
| 04/28/2010 | CN1690851B Chemical amplification positive photoresist compositions, (methyl) acrylate derivatives and method for preparing same |
| 04/28/2010 | CN1646994B Attenuated embedded phase shift photomask blanks |
| 04/27/2010 | US7704679 Method of making a lithographic printing plate |
| 04/27/2010 | US7704677 forming conductive polymer layer on a substrate, aligning a shadow mask above the conductive polymer layer, and forming a conductive polymer pattern area and an insulating area in the conductive polymer layer by radiating charged particle beams through the shadow mask; forms precise pattern; low energy |
| 04/27/2010 | US7704673 Forming a first hard mask layer over a substrate;forming an acid layer over the first hard mask layer;depositing a photoresist layer over the acid layer; patterning the photoresist layer to form a pattern; transferring the pattern to the first hard mask layer below the acid layer |
| 04/27/2010 | US7704653 Method of data encoding, compression, and transmission enabling maskless lithography |
| 04/27/2010 | US7704651 Radiographic image conversion panel and production method thereof |
| 04/27/2010 | US7704432 Imprint lithographic method for making a polymeric structure |
| 04/22/2010 | WO2010005977A3 Method and apparatus for x-ray radiographic imaging |
| 04/21/2010 | EP2176708A1 Apparatus and method for modifying optical material properties |
| 04/21/2010 | EP1203394B1 METHOD FOR PREPARING A CsX PHOTOSTIMULABLE PHOSPHOR AND PHOSPHORS THEREFROM |
| 04/21/2010 | CN1707357B Photothermographic material and image forming method |
| 04/15/2010 | US20100091117 Camera With Printhead For Printing Images With Encoded Audio Data |
| 04/13/2010 | US7696254 Method of producing liquid crystal emulsion compositions |
| 04/13/2010 | US7695898 Photothermographic material and image formation method |
| 04/13/2010 | US7695877 Methods and devices for lithography using electromagnetic radiation with short wavelengths |
| 04/13/2010 | US7695876 Method for identifying and using process window signature patterns for lithography process control |
| 04/13/2010 | US7695872 defocusing into a beam used during production of the mask to image the pattern on the mask; may eliminate the need for a second exposure with a trim mask; alignment problems associated with the second exposure may be avoided; single exposure may be more compatible with high speed manufacturing |
| 04/06/2010 | US7691550 photosensitivity; photopolymerization |
| 04/06/2010 | US7691549 high resolution; photomasks; photoresists |
| 04/06/2010 | US7691548 photomasks; photoresists; etching; semiconductors |
| 04/06/2010 | US7691547 Reticle containing structures for sensing electric field exposure and a method for its use |
| 04/06/2010 | US7691542 Projects images of grating pattern and test pattern; photoresists |
| 04/01/2010 | US20100078583 Radiation image capturing system |
| 03/30/2010 | US7687211 photomasks, photoresists |
| 03/30/2010 | US7687210 Space tolerance with stitching |
| 03/30/2010 | US7687209 Lithographic apparatus and device manufacturing method with double exposure overlay control |
| 03/24/2010 | CN100595679C Automatic developing apparatus and process for forming image using the same |
| 03/23/2010 | US7685560 Method and apparatus for monitoring exposure process |
| 03/23/2010 | US7685559 Step-walk relaxation method for global optimization of masks |
| 03/23/2010 | US7684637 Method, computer program, and apparatus for detecting specific information included in image data of original image with accuracy, and computer readable storing medium storing the program |
| 03/23/2010 | US7684008 Lithographic apparatus and device manufacturing method |
| 03/23/2010 | US7682755 surface plasmon resonance as a result of coupling surface plasmon with light; a pattern having a dimension smaller than a half or less of a wavelength of light can be transferred to a resist without requiring closely contact of the resist with the mask |
| 03/23/2010 | US7682463 Resist stripping method and resist stripping apparatus |
| 03/16/2010 | US7681172 Method and apparatus for modeling an apodization effect in an optical lithography system |
| 03/09/2010 | US7676078 Inspection method, processor and method for manufacturing a semiconductor device |
| 03/09/2010 | US7674574 Several mask patterns of the seversl masks have different distances with the lenses of the thin film transistor liquid crystal displayexposure apparatus so the distance of the photoresist patterns and the lenses are different, which amends the lens mura of the glass panel |
| 03/09/2010 | US7674571 Exposing oleophilic photosensitive layer comprising polymeric binder, urethane (meth)acrylate monomer, nonurethane (meth)acrylate monomer, free radical initiator, and sensitizing dye, and water soluble or dispersible overcoat; hardening; removing non-exposed areas with aqueous developer or ink |
| 03/04/2010 | WO2010025198A1 Method of patterning a substrate using dual tone development |
| 03/04/2010 | WO2010022952A1 Binary ambiguous image |
| 03/04/2010 | CA2735297A1 Binary tilt image |
| 03/03/2010 | CN201417362Y Seamless sleeve plate fixer of plate washer |
| 03/02/2010 | US7670761 Method of forming a fine pattern of a semiconductor device using a resist reflow measurement key |
| 03/02/2010 | US7670758 providing an article that includes a layer comprising a plurality of rows of a metal where each adjacent row of metal is separated by a trench, rows of metal forming a grating, filling at least 80% of each trench with inorganic dielectric second material; for lenses, polarizers, optical filters |
| 03/02/2010 | US7670755 Writing pattern; data processing; etching masking film; removal segments of photoresists; generating method comprising correcting a first pattern data in accordance with a difference between first film pattern and second mask pattern and difference between first resist pattern and first mask pattern |
| 03/02/2010 | US7670731 Method for exposing a substrate and lithographic projection apparatus |
| 03/02/2010 | US7670730 Lithographic apparatus and device manufacturing method |
| 03/02/2010 | CA2241264C Method and apparatus for creating patterns in cast materials |
| 02/25/2010 | US20100046807 Vein Imaging Apparatus, Vein Imaging Method and Vein Authentication Apparatus |
| 02/23/2010 | US7669169 Shape-based geometry engine to perform smoothing and other layout beautification operations |
| 02/23/2010 | US7667216 Method of achieving CD linearity control for full-chip CPL manufacturing |
| 02/23/2010 | US7666577 Mixture of photomasks; controlling incline of pattern; lithography; phase shifting; removal of mask by etching |
| 02/18/2010 | US20100040980 Method and apparatus for reforming film and controlling slimming amount thereof |
| 02/16/2010 | US7664647 Camera for encoding audio signals |
| 02/16/2010 | US7663741 Lithographic apparatus, device manufacturing method, calibration method and computer program product |
| 02/16/2010 | US7662524 Scanning beam of metallic ions over defect to dope, reducing transparency; implanting gallium atoms to reduce transmission and quartz can be etched |