| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
|---|
| 12/07/2010 | US7846648 Supplying a developing solution to develop the resist film formed on the substrate; supplying a treatment solution to the substrate to dissolve the base film at a portion exposed by the development of the resist film |
| 12/07/2010 | US7846640 quaternaryammonium having a lower alkyl or a lower hydroxyalkyl groups as main component; anionic surfactant containing biphenyl ether having one or more metal sulfonate group and an alkyl or alkoxy group; prebaking resist layer, exposing to light, alkali developing; improved dimensional controllability |
| 12/07/2010 | US7846625 Phase shift mask |
| 12/07/2010 | US7846624 simultaneous determination of focus and source boresighting error for photolithographic steppers and scanners; reticle containing custom arrays of box-in-box test structures specifically designed for performing source or exit pupil division using aperture plate is exposed onto resist coated wafer |
| 12/07/2010 | US7846617 Pattern forming method and phase shift mask manufacturing method |
| 12/02/2010 | WO2010138965A1 Thermochemical nanolithography components, systems, and methods |
| 11/30/2010 | US7842933 System and method for measuring overlay errors |
| 11/30/2010 | US7842442 Method and system for reducing overlay errors within exposure fields by APC control strategies |
| 11/30/2010 | US7841787 Rinsing method, developing method, developing system and computer-read storage medium |
| 11/23/2010 | US7838209 forming a design on a semiconductor devices, integrated circuits; at least two irradiation steps; second irradiation step are defocused compared to the first irradiation |
| 11/23/2010 | US7838208 forming multi-component patterns via defining regions of localized magnetic field maxima and minima on a substrate; lithographic applications; use in electronics, photonics, genome analysis, drug discovery, and cellular systems |
| 11/23/2010 | US7838185 Focus measurement method and method of manufacturing a semiconductor device |
| 11/23/2010 | US7838174 Method of fabricating grayscale mask using smart cut® wafer bonding process |
| 11/18/2010 | WO2010132002A1 Method and equipment for an x-ray apparatus |
| 11/16/2010 | US7833691 Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether |
| 11/16/2010 | US7833598 Splittable sheet structure |
| 11/11/2010 | WO2010129926A1 Novel lanthanide doped barium mixed halide scintillators |
| 11/10/2010 | CN1854133B Heterocycle-bearing onium salts |
| 11/09/2010 | US7831954 Flash-based updating techniques for high-accuracy high efficiency mask synthesis |
| 11/09/2010 | US7831942 Design check database |
| 11/09/2010 | US7829267 forming a concave/convex pattern by pressing the stamper onto a resin layer formed on a substrate, and transferring the concave/convex pattern of the stamper to the resin layer, thereby forming a concave/convex pattern on the substrate |
| 11/09/2010 | US7829266 Multiple exposure technique using OPC to correct distortion |
| 11/09/2010 | US7829247 Transparent substrate, square mask cells having a side shorter than a resolution limit of an exposing device; cell includes a light transmitting region and a light shielding region; a planar region; cells transmitting lights greater than or equal to zero and less than the second light intensity |
| 11/03/2010 | EP1695143B1 FILLING AN AREA OF AN IMAGE MARKED ON A Material WITH A LASER |
| 11/03/2010 | CN1830039B Method and system for drying a substrate |
| 11/02/2010 | US7827519 Method, system, and computer program product for preparing multiple layers of semiconductor substrates for electronic designs |
| 11/02/2010 | US7824842 photolithography methods for exposing semiconductor substrates; enhancing lithographic printing image resolution, reducing mask error factor and line edge roughness |
| 11/02/2010 | US7824829 Method of monitoring focus in lithographic processes |
| 11/02/2010 | US7824828 Method and system for improvement of dose correction for particle beam writers |
| 11/02/2010 | US7824827 Method and system for improved lithographic processing |
| 10/28/2010 | US20100273099 Flood exposure process for dual tone development in lithographic applications |
| 10/26/2010 | US7823103 Method and system of introducing hierarchy into design rule checking test cases and rotation of test case data |
| 10/26/2010 | US7820364 forming a transfer pattern of desired size with high accuracy, by performing multiple exposure using a plurality of masks having different patterns over different mask substrates |
| 10/26/2010 | US7820362 Writing a pattern by irradiating photosensitive material with a charged-particle beam; dividing pattern into X and Y segments; overlapping and writing with a half of the dose normally used; positional and dimensional accuracy; lithography, data processing |
| 10/26/2010 | US7820343 Method for producing a photomask, method for patterning a layer or layer stack and resist stack on a mask substrate |
| 10/26/2010 | US7819579 Radiation sensing device and holder |
| 10/21/2010 | US20100265571 Optical films and methods of making the same |
| 10/20/2010 | CN101868760A Porous template and imprinting stack for nano-imprint lithography |
| 10/20/2010 | CN101068893B Resin cured film for flexible printed wiring board and production process thereof |
| 10/19/2010 | US7816062 obtaining scanning electron microscopy image of target pattern |
| 10/19/2010 | US7816060 photosensitive resin films with selective opening patterns; photoresists |
| 10/14/2010 | WO2010117123A2 Image sensor and method for manufacturing the same |
| 10/14/2010 | US20100261116 Developer for a photopolymer protective layer |
| 10/13/2010 | EP2238511A2 Apparatus and method for imaging ionizing radiation |
| 10/12/2010 | US7811937 Apparatus and method of fabricating thin film transistor array substrate |
| 10/12/2010 | US7811720 Orthogonal corners produced in a semiconductor device pattern to include one edge defined by a first mask and an orthogonal edge defined by a second mask; alleviate proximity effects |
| 10/06/2010 | EP1683164B1 Phosphor screen and imaging assembly |
| 10/05/2010 | US7807343 Using alternating phase-shift implementation in lithography; electronic design automation (EDA); computer readable medium |
| 10/05/2010 | US7807342 transparent support glass with light attenuators, ultraviolet light exposure of photoresist layer is effectuated in predetermined patterns through exposure photomask having light-transmissive openings |
| 09/30/2010 | WO2010111074A1 An optical imaging writer system |
| 09/30/2010 | WO2010110845A1 Radiographic silver halide films having incorporated developer |
| 09/30/2010 | WO2010109859A1 Image forming method and photocurable composition |
| 09/28/2010 | US7803514 multifunctional photosensitive bisphenol A type epoxy resins, two-photon photosensitizer, gamma -butyrolactone as solvent, silver acetate, acid generators; uniform distribution of silver nanoparticles; nanoelectromechanical systems |
| 09/21/2010 | US7799517 illuminator patterns photoresists; photomasks |
| 09/21/2010 | US7799510 Method for correcting mask pattern, photomask, method for fabricating photomask, electron beam writing method for fabricating photomask, exposure method, semiconductor device, and method for fabricating semiconductor device |
| 09/21/2010 | US7799444 includes the constituents SiO2, Al2O3 and Y2O3 and is doped with high level of rare earth ions which can preferably be incorporated in crystal phases which are precipitated out of glass with a high yttrium content |
| 09/16/2010 | US20100233597 Method for scheduling transient document erase cycle |
| 09/15/2010 | EP2228401A1 Sacrificial compositions, methods of use thereof, and methods of decomposition thereof |
| 09/14/2010 | US7794904 Method and apparatus for producing interferometric lithography patterns with circular symmetry |
| 09/14/2010 | US7794903 making a semiconductor device, by using a lithography mask having a plurality of corner rounding test patterns formed thereon; improved methods of measuring corner rounding of lithography; prevent human errors and variations |
| 09/14/2010 | US7794899 Photo mask, exposure method using the same, and method of generating data |
| 09/14/2010 | US7794897 forming a desired pattern on a wafer by changing design pattern based on the allowable dimensional change quantity defined for the each design pattern; photomasking |
| 09/14/2010 | US7794623 Semiconductor die molded from a bis(epoxyalkyl) derivative of an aromatic initiator, e.g., 1,4-cyclohexylene bis(p-glycidyloxy)benzoate of or 4,4'-bis(4-(glycidyloxy)butoxyphenyl)stilbene; melting point of less than 140 degrees C.; are liquid crystalline at greater than 150 degrees C. |
| 09/09/2010 | US20100227270 Reusable paper media with compatibility markings and printer with incompatible media sensor |
| 09/07/2010 | US7790355 Method of processing on-press developable lithographic printing plate |
| 09/07/2010 | US7790347 Multi-photon reacted articles with inorganic particles and method for fabricating structures |
| 09/01/2010 | CN1756992B Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARC |
| 08/31/2010 | US7787688 Interactive depth of field using simulated heat diffusion |
| 08/31/2010 | US7787102 Real-time configurable masking |
| 08/31/2010 | US7786607 Overlay correction by reducing wafer slipping after alignment |
| 08/26/2010 | US20100214545 Creating Metal Gate Structures Using Lithography-Etch-Lithography-Etch (LELE) Processing Sequences |
| 08/24/2010 | US7781151 depositing first polymer layer, first lithography, depositing chromium layer, depositing gold layer, removing first photo-resist layer, depositing second polymer layer, second lithography, plasma etching step, removing second photoresist layer; protective coatings for sensor; cost efficiency |
| 08/24/2010 | US7781145 Method for forming a photoresist pattern |
| 08/24/2010 | CA2693211A1 Reverse write erasable paper |
| 08/19/2010 | US20100209844 Method and apparatus for preparing a printing form using vibrational energy |
| 08/17/2010 | US7776514 Reduces the optical proximity effect by the light interference, and reduce the aberration of a projection lens such as the coma aberration; enhances the resolution limit |
| 08/17/2010 | US7776506 Coating compositions for photoresists |
| 08/17/2010 | US7776151 Method and apparatus for forming crystalline portions of semiconductor film |
| 08/17/2010 | US7775729 Developing apparatus, developing processing method, developing processing program, and computer readable recording medium recording the program |
| 08/12/2010 | US20100203458 Method for developing a printing plate precursor |
| 08/11/2010 | CN1871555B Forming partial-depth features in polymer film |
| 08/10/2010 | US7773296 Ultra-broadband UV microscope imaging system with wide range zoom capability |
| 08/10/2010 | US7773199 Methods and systems to compensate for a stitching disturbance of a printed pattern |
| 08/10/2010 | US7771906 Exposure method |
| 08/10/2010 | US7771903 Photolithography with optical masks having more transparent features surrounded by less transparent features |
| 08/10/2010 | US7771897 Resist-pattern forming method capable of improving the positional accuracy of a resist pattern by performing multiple-exposure through use of a mask pattern in a cellular form; pattern can beformed changing in film thickness on the overlying layer by performing development |
| 08/05/2010 | US20100195803 Radiographic receptor securing and positioning apparatus |
| 08/04/2010 | CN101794645A Method for producing conductive film |
| 07/29/2010 | US20100190098 Infrared endpoint detection for photoresist strip processes |
| 07/28/2010 | EP1729174B1 Photolithographically-patterned out-of-plane coil structures and method of making |
| 07/27/2010 | US7763414 Pseudo low volume reticle (PLVR) design for ASIC manufacturing |
| 07/27/2010 | US7763179 Color laser engraving and digital watermarking |
| 07/20/2010 | US7760360 Monitoring a photolithographic process using a scatterometry target |
| 07/20/2010 | US7760341 Systems and methods for in-situ reflectivity degradation monitoring of optical collectors used in extreme ultraviolet (EUV) lithography processes |
| 07/20/2010 | US7759660 Electron beam lithography system |
| 07/20/2010 | US7759027 inputting patterns to be formed on surface, subset of patterns being slightly different variations of each other and selecting set of characters some of which are complex characters to be used to form number of patterns, and reducing shot count or total write time by use of character varying technique |
| 07/20/2010 | US7759026 Method and system for manufacturing a reticle using character projection particle beam lithography |
| 07/20/2010 | US7759025 transparent substrate, half-tone film provided on a part on which light-shielding pattern is to be formed and a part on which semi-light shielding pattern is to be formed, where semi-light shielding pattern includes first and second light shielding patterns, second having smaller dimensions than first |
| 07/15/2010 | DE102004063140B4 Fotomaske und Verfahren für die Herstellung derselben Photo mask and method for manufacturing the same |
| 07/08/2010 | US20100173234 Photomask producing method and photomask blank |