| Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726) |
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| 05/10/2011 | US7939225 Mask for controlling line end shortening and corner rounding arising from proximity effects |
| 05/10/2011 | US7939224 Mask with registration marks and method of fabricating integrated circuits |
| 05/10/2011 | US7938587 Substrate processing method, computer storage medium and substrate processing system |
| 05/03/2011 | US7935464 System and method for self-aligned dual patterning |
| 04/27/2011 | EP1583091B1 Manufacturing process of original disc for producing optical disc and production process of optical disc |
| 04/26/2011 | US7933015 Mark for alignment and overlay, mask having the same, and method of using the same |
| 04/26/2011 | US7932989 Liquid jet and recovery system for immersion lithography |
| 04/26/2011 | US7932190 Flow control of photo-polymerizable resin |
| 04/26/2011 | US7932003 Methods of forming and using reticles |
| 04/21/2011 | WO2011046973A1 Marking paper products |
| 04/21/2011 | US20110091822 Thermal processor employing a temperature compensation system |
| 04/21/2011 | US20110091819 Method for forming pattern |
| 04/21/2011 | US20110088576 Lithographic printing press for processless plate |
| 04/19/2011 | US7927783 Tunable lithography with a refractive mask |
| 04/19/2011 | US7927782 Simplified double mask patterning system |
| 04/19/2011 | US7927764 an optical proximity correction being applied only to the first mask opening, exposing the photoresist using a second mask pattern including a third mask opening and a fourth mask opening, an optical proximity correction being applied only to the fourth mask opening |
| 04/12/2011 | US7923199 Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition |
| 04/12/2011 | US7923182 Multi-focus method of enhanced three-dimensional exposure of resist |
| 04/12/2011 | US7923175 Photomask structure |
| 04/06/2011 | EP2304500A1 Detection of promiscuous small submicrometer aggregates |
| 04/06/2011 | CN101614951B Superfine grain developing bath of black and white negative films and developing method |
| 04/05/2011 | US7919231 Photolithographic method and mask devices utilized for multiple exposures in the field of a feature |
| 03/31/2011 | DE102004059439B4 Methode zur Entfernung eines Resistmusters Method of removing a resist pattern |
| 03/29/2011 | US7917244 Method and system for reducing critical dimension side-to-side tilting error |
| 03/29/2011 | US7916284 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
| 03/29/2011 | US7914970 Mixed lithography with dual resist and a single pattern transfer |
| 03/29/2011 | US7914958 Semiconductor device manufacturing method |
| 03/29/2011 | US7914954 Stencil, stencil design system and method for cell projection particle beam lithography |
| 03/24/2011 | US20110070548 Silver halide photosensitive material and process of producing black and white image using the same |
| 03/23/2011 | CN101228527B Manufacturing aware design and design aware manufacturing for IC |
| 03/22/2011 | US7911612 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
| 03/15/2011 | US7906271 System and method for making photomasks |
| 03/15/2011 | US7906258 Photomask, photomask superimposition correcting method, and manufacturing method of semiconductor device |
| 03/15/2011 | US7906257 Photomask manufacturing method and semiconductor device manufacturing method |
| 03/15/2011 | US7906253 System and method for making photomasks |
| 03/08/2011 | US7901872 Exposure process and photomask set used therein |
| 03/08/2011 | US7901871 Composition containing a photoacid generator monomer, substrate coated with the composition, method for synthesizing a compound on a substrate using the composition, and microarray produced according to the method |
| 03/08/2011 | US7901854 Wafer edge exposure unit |
| 03/08/2011 | US7901852 Metrology of bilayer photoresist processes |
| 03/08/2011 | US7901840 Mask blank transparent substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing method |
| 03/01/2011 | US7897308 Method for transferring a predetermined pattern reducing proximity effects |
| 03/01/2011 | US7897298 Photomask, photomask fabrication method, pattern formation method using the photomask and mask data creation method |
| 02/24/2011 | US20110045414 Rinsing method, developing method, developing system and computer-read storage medium |
| 02/23/2011 | CN101399277B Image sensor having large micro-lenses at the peripheral regions |
| 02/23/2011 | CN101052307B Method for reducing acrylamide formation in thermally processed foods |
| 02/22/2011 | US7894041 Limiting a portion of a patterning device used to pattern a beam |
| 02/22/2011 | US7892721 Storage medium |
| 02/22/2011 | US7892712 Exposure method |
| 02/17/2011 | DE102004040764B4 Verfahren zum Korrigieren von Verletzungen von Maskenregeln nach optischer Nachbarschaftskorrektur A method for correcting violations of rules after optical proximity correction mask |
| 02/17/2011 | DE102004026206B4 Belichtungsmaskensubstrat-Herstellungsverfahren und Belichtungsmasken-Herstellungsverfahren Exposure mask substrate manufacturing method, and exposure mask manufacturing method |
| 02/15/2011 | US7890203 Wiring forming system and wiring forming method for forming wiring on wiring board |
| 02/15/2011 | US7887998 Silver halide photographic light-sensitive material |
| 02/08/2011 | US7885526 Grey card for controlling exposure and white balance of a digital camera |
| 02/08/2011 | US7883834 Method for forming pattern |
| 02/08/2011 | US7883831 Method for translating a structured beam of energetic particles across a substrate in template mask lithography |
| 02/08/2011 | US7883824 obtain a dimensional difference between the first and second resist evaluation patterns; estimating an exposure dose and estimating an effective heating temperature of the resist |
| 02/03/2011 | US20110027727 Substrate developing method, substrate processing method and developing solution supply nozzle |
| 02/03/2011 | DE19953145B4 Verfahren zum Anpassen der optischen Dichte beim Abziehen einer Farbkorrekturfahne The method of adjusting the optical density when removing a color proof |
| 02/02/2011 | CN1698011B Lithographic printing with polarized light |
| 02/02/2011 | CN101052317B Method for reducing acrylamide formation in thermally processed foods |
| 02/01/2011 | US7879537 Double patterning is achieved with a single reticle while maintaining the integrity of in-scribe patterns and without blading the reticle; using a blank to prevent the target region from being exposed more than once; semiconductors |
| 02/01/2011 | US7879516 Manufacturing method of semiconductor integrated circuit device |
| 02/01/2011 | US7879515 determining positioning error between lithographically produced integrated circuit patterns on different levels of semiconductor wafer comprising exposing, developing and etching to create groups of marks comprising target at wafer locations; cost efficiency |
| 02/01/2011 | US7879514 Lithographic method and patterning device |
| 02/01/2011 | US7879513 Decreasing error of line width on coarse/dense pattern; adjusting numerical aperture and/or coherence factor |
| 01/25/2011 | US7876439 Multi layer alignment and overlay target and measurement method |
| 01/25/2011 | US7875409 Method of manufacturing semiconductor device, mask and semiconductor device |
| 01/25/2011 | US7875406 photomasks; photolithography; semiconductors; integrated circuits |
| 01/19/2011 | CN101950124A Bath solution for black-white negative film ultrafine particle development and development method |
| 01/18/2011 | US7871745 Exposure method |
| 01/13/2011 | WO2011005324A1 Dental radiograph sensor positioning device |
| 01/13/2011 | US20110006401 Method and system for combining photomasks to form semiconductor devices |
| 01/11/2011 | US7867698 providing a reticle system and assigning two or more of an image pattern onto the reticle system to form one or more layers of an integrated circuit system by grouping and pairing each of the image pattern onto the reticle system according to a multi-layer reticle grouping/pairing flow |
| 01/11/2011 | US7867674 allows a desired resist pattern dimension to be attained after a photolithography sequence, so that a uniform resist pattern is formed on the surface of a substrate, independently of the precision level in the light exposure process |
| 01/11/2011 | US7867673 Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program |
| 01/05/2011 | CN101939704A Extrusion reduction in imprint lithography |
| 01/04/2011 | US7864294 Focus sensitive lithographic apparatus, systems, and methods |
| 01/04/2011 | US7864290 Film security code |
| 01/04/2011 | US7862985 thin films: computer program; photoresist on the ARC layer; Once the layer of photoresist is optionally removed, a double patterned ARC layer remains for etching the underlying thin film |
| 01/04/2011 | US7862966 computer programs; development; etching; photolithography; electronics |
| 01/04/2011 | US7862965 photoresists; Scanning Electron Microscope, Charge-Coupled Device camera, image analysis device |
| 01/04/2011 | US7862962 Integrated circuit layout design |
| 12/30/2010 | US20100330496 Simultaneous two-photon absorption recording-reproduction method, and simultaneous two-photon absorption recording material for use therein |
| 12/30/2010 | US20100326469 Apparatus and method of fabricting thin film transistor array substrate |
| 12/29/2010 | CN101932974A Apparatus and method for imaging ionizing radiation |
| 12/28/2010 | US7859665 Polarization analyzing system, exposure method, and method for manufacturing semiconductor device |
| 12/28/2010 | US7858404 Measurement of overlay offset in semiconductor processing |
| 12/28/2010 | US7858276 lithography; printed circuits; scatterometry; dies; post exposure bake |
| 12/28/2010 | US7858268 Method for generating a circular periodic structure on a basic support material |
| 12/28/2010 | US7857530 Developing method and developing unit |
| 12/23/2010 | US20100321656 Transmission mask with differential attenuation to improve iso-dense proximity |
| 12/23/2010 | DE10327268B4 Vorrichtung zur Erkennung der Position und des Formats einer Filmkassette Apparatus for detecting the position and the format of a film cassette |
| 12/21/2010 | US7855047 multilayer photomasking; circuit patterns; connecting opacity zones; adjustment of pattern using photomasking; improved accuracy |
| 12/14/2010 | US7852477 Calculation method and apparatus of exposure condition, and exposure apparatus |
| 12/14/2010 | US7852457 Lithographic apparatus and device manufacturing method |
| 12/14/2010 | US7851122 Such as rapid prototyping and tooling; monofunctional acrylate monomers with glass transition temperature (Tg) higher than 60 degrees Celcius, and di-functional acrylate oligomers such as urethane diacrylates with Tg lower than 40 degrees Celcius; three-dimensional printing of complex structures |
| 12/08/2010 | EP2259136A1 Film with blue dye |
| 12/07/2010 | US7847926 Defining a pattern on a substrate |
| 12/07/2010 | US7846851 Method and apparatus for a two-step resist soft bake to prevent ILD outgassing during semiconductor processing |
| 12/07/2010 | US7846649 High resolution printer and a method for high resolution printing |