G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents

Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726)
11/2011
11/17/2011	US20110279900 Optical films and methods of making the same
11/15/2011	US8057972 Constant current multi-beam patterning
11/15/2011	US8057971 Method of compensation for bleaching of resist during three-dimensional exposure of resist
11/15/2011	US8057966 Manufacturing method of photomask for multiple exposure and semiconductor device manufacturing method using above photomask
11/08/2011	US8053146 Multi-layer body including a diffractive relief structure and method for producing the same
11/03/2011	US20110269061 Developing method
11/01/2011	US8049190 Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium
11/01/2011	US8048606 Imaging methods
11/01/2011	US8048596 Photomask producing method and photomask blank
11/01/2011	US8048588 Method and apparatus for removing radiation side lobes
10/2011
10/27/2011	WO2011133836A1 Method for patterning a substrate using ion assisted selective deposition
10/27/2011	US20110262848 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
10/25/2011	US8043800 Photosensitive material for forming conductive film, and conductive material
10/25/2011	US8043798 Method of forming fine patterns
10/18/2011	US8040497 monitoring the quality of a lithography process by determining respective lateral dimensions of respective test features, such as photoresist features, lines or apertures, patterned on the basis of the lithography process
10/18/2011	US8039181 Method and system for reducing overlay errors in semiconductor volume production using a mixed tool scenario
10/18/2011	US8039179 Integrated circuit layout design
10/13/2011	WO2011127014A1 Norbornene-type polymers, comositions thereof and lithographic process using such compositions
10/13/2011	WO2011059947A3 Photoresist simulation
10/13/2011	US20110250545 Composition, process of preparation and method of application and exposure for light imaging paper
10/11/2011	US8034542 Conductive film and manufacturing method thereof, and transparent electromagnetic shielding film
10/11/2011	US8034539 Exposure apparatus and method for producing device
10/11/2011	US8034515 Pattern forming method, pattern designing method, and mask set
10/11/2011	US8034287 Radiation sterilization of medical devices
10/06/2011	US20110244380 Image forming apparatus and image forming method
10/06/2011	US20110244378 Device and method for providing wavelength reduction with a photomask
10/04/2011	US8032381 Method for playing audio signals provided on a photograph
10/04/2011	US8029954 Exposure method and memory medium storing computer program
10/04/2011	US8029953 Lithographic apparatus and device manufacturing method with double exposure overlay control
10/04/2011	US8029947 Systems and methods for implementing and manufacturing reticles for use in photolithography tools
09/2011
09/27/2011	US8026025 Mask blank transparent substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing method
09/27/2011	US8025831 Imprinting of supported and free-standing 3-D micro- or nano-structures
09/27/2011	CA2533477C Process for providing marking on security papers
09/21/2011	CN1914559B Silver halide color photographic light-sensitive material and color image-forming method
09/20/2011	US8023191 Printable static interferometric images
09/20/2011	US8021809 Device manufacturing method, lithographic system, lithographic apparatus and design for manufacturing system
09/20/2011	US8021805 Backside phase grating mask and method for manufacturing the same
09/20/2011	US8021802 Phase shift mask for double patterning and method for exposing wafer using the same
09/20/2011	US8021801 depositing a phase shift layer of MoSiON, a first light blocking layer, an insulating layer, and a second light blocking layer on a transparent substrate; selectively exposing a surface of second light blocking layer to define the pattern ; high uniformity in a critical dimension (CD) of a pattern
09/20/2011	CA2461039C Photosensitive element for use as flexographic printing plate
09/13/2011	US8017306 Method for producing conductive film
09/13/2011	US8017289 Method for manufacturing a surface and integrated circuit using variable shaped beam lithography
09/06/2011	US8012676 Process for preparing conductive material
09/06/2011	US8012666 Compositions and processes for photolithography
09/01/2011	WO2011105011A1 Image formation method and photosensitive composition used in said method
08/2011
08/30/2011	US8007968 Substrate processing method, program, computer-readable storage medium and substrate processing system
08/30/2011	US8007961 Mask blank substrate set and mask blank set
08/24/2011	CN101366107B Oxidizing aqueous cleaner for the removal of post-etch residues
08/23/2011	US8004650 Exposure apparatus and device manufacturing method
08/17/2011	EP2357495A1 Scintillator panel
08/16/2011	US8001495 System and method of predicting problematic areas for lithography in a circuit design
08/16/2011	US7998759 Maunfacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
08/16/2011	US7998651 Imprint lithography
08/16/2011	US7998640 Mask reuse in semiconductor processing
08/09/2011	US7993813 Apparatus and method for conformal mask manufacturing
08/09/2011	US7993801 Multilayer active mask lithography
08/09/2011	US7993800 Multilayer active mask lithography
07/2011
07/28/2011	US20110181036 Color Laser Engraving
07/26/2011	US7985698 Methods of forming patterned photoresist layers over semiconductor substrates
07/26/2011	US7985516 Substrate processing method, computer-readable storage medium and substrate processing system
07/20/2011	CN101290501B Copying-proof film based on organic membrane structure and its preparation
07/12/2011	US7978304 Processing apparatus for processing object in vessel
07/12/2011	US7977653 Semiconductor device fabrication method and fabrication apparatus using a stencil mask
07/12/2011	US7977019 Semiconductor device manufacturing method, semiconductor device manufacturing equipment, and computer readable medium
07/12/2011	US7977018 Exposure data preparation method and exposure method
07/12/2011	US7977016 Method for fabricating extreme ultraviolet lithography mask
07/12/2011	US7976723 Method for kinetically controlled etching of copper
07/05/2011	US7972764 Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium
07/05/2011	US7972755 Substrate processing method and substrate processing system
06/2011
06/28/2011	US7971160 Creating method of photomask pattern data, photomask created by using the photomask pattern data, and manufacturing method of semiconductor apparatus using the photomask
06/28/2011	US7970485 Systems and methods for determining width/space limits for a mask layout
06/28/2011	US7968272 Semiconductor device manufacturing method to form resist pattern
06/28/2011	US7968260 Substrate processing method, computer-readable storage medium, and substrate processing system
06/28/2011	US7968259 Semiconductor device, method for manufacturing semiconductor device, and computer readable medium
06/23/2011	WO2010117123A3 Image sensor and method for manufacturing the same
06/21/2011	US7965883 Image inspection method and image inspection apparatus employing the same
06/21/2011	US7964337 Optical recording medium and method of producing the same
06/21/2011	US7964326 Exposure mask for divided exposure
06/21/2011	US7964325 Mask and method for forming a semiconductor device using the same
06/21/2011	US7964248 Dual photoinitiator, photocurable composition, use thereof and process for producing a three dimensional article
06/16/2011	US20110143290 Developing treatment method and computer-readable storage medium
06/14/2011	US7960094 Laser induced thermal imaging apparatus and laser induced thermal imaging method
06/14/2011	US7960078 Exposure condition setting method, substrate processing device, and computer program
06/07/2011	US7955778 Compositions and processes for photolithography
06/07/2011	US7955767 Method for examining a wafer with regard to a contamination limit and EUV projection exposure system
06/07/2011	US7955762 Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film
06/07/2011	US7955761 Exposure mask, pattern formation method, and exposure mask fabrication method
06/07/2011	US7955760 Method of correcting defect in photomask
05/2011
05/31/2011	US7952696 Exposure measurement method and apparatus, and semiconductor device manufacturing method
05/25/2011	CN1641485B Exposure system method for evaluating lithography process
05/24/2011	US7949967 Design Pattern correcting method, process proximity effect correcting method, and semiconductor device manufacturing method
05/24/2011	US7947970 Radiation detector
05/24/2011	US7947414 Method of fabricating halftone phase shift mask
05/24/2011	US7947413 Pattern evaluation method
05/17/2011	US7943291 Conductive film-forming photosensitive material and conductive material
05/17/2011	US7943273 Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same
05/11/2011	EP2318884A1 Binary ambiguous image
05/10/2011	US7941232 Control method, control system, and program
05/10/2011	US7939814 Radiographic image detector
05/10/2011	US7939227 Method and structure for fabricating dark-periphery mask for the manufacture of semiconductor wafers

1 2 3 4 5 6 7 8 9 10 11 12 13 14 ... 118