Patents for G03C 5 - Photographic processes or agents therefor; Regeneration of such processing agents (11,726)
08/2012
08/08/2012EP2484537A2 Authentication of security documents by means of photochromic dyes
08/07/2012US8239789 System and method of predicting problematic areas for lithography in a circuit design
08/07/2012US8239788 Frame cell for shot layout flexibility
08/07/2012US8236467 Exposure method, exposure apparatus, and device manufacturing method
08/01/2012EP1537445B1 Nanocomposites
07/2012
07/31/2012US8234600 Computer readable storage medium storing program for generating reticle data, and method of generating reticle data
07/26/2012US20120189958 Image transfer process
07/24/2012US8229062 Transmission mask with differential attenuation to improve ISO-dense proximity
07/24/2012US8227150 Holographic reticle and patterning method
07/24/2012US8227048 Photocurable compositions for preparing ABS-like articles
07/18/2012CN102591133A Developing solution and preparation method thereof
07/17/2012US8222051 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
07/17/2012US8221943 Photomask with assist features
07/11/2012CN102576187A Marking paper products
07/11/2012CN102566252A Aqueous development powder special for diazo-blueprint paper
07/04/2012CN101305320B System and method for mask verification using an individual mask error model
07/03/2012US8211626 Reducing poisoning of the photoresist during imaging by treating the surface of the dielectric anti-reflection coating film with a hydrogen or helium-containing plasma which is capable of removing hydroxyl groups
06/2012
06/19/2012US8202673 Method for manufacturing a surface and integrated circuit using variable shaped beam lithography
06/12/2012US8197996 Dual tone development processes
06/05/2012US8192919 Pattern forming method, semiconductor device manufacturing method and phase shift photomask having dummy gate patterns
05/2012
05/30/2012EP2318884B1 Binary ambiguous image
05/29/2012US8187775 High resolution photomask
05/15/2012US8178281 Method for improving sensitivity of resist
05/15/2012US8178280 Self-contained proximity effect correction inspiration for advanced lithography (special)
05/15/2012US8178263 Method for a lithographic apparatus
05/08/2012US8173335 Beam ablation lithography
05/01/2012US8169590 Exposure apparatus and device fabrication method
05/01/2012US8168355 Method of imaging in crystalline colloidal arrays
04/2012
04/24/2012US8163469 Coating and developing apparatus, coating and developing method, and storage medium
04/24/2012US8163448 Determination method, exposure method, device fabrication method, and storage medium
04/17/2012US8158420 Methods for inhibiting the differentation of proliferative telencephalic cells in vitro by addition of ATF5
04/17/2012US8158332 Method of manufacturing a semiconductor device
04/17/2012US8158312 Exposure method using charged particle beam
04/17/2012US8158311 Method for managing light exposure mask and light exposure mask
04/17/2012US8158310 Aberration evaluation pattern, aberration evaluation method, aberration correction method, electron beam drawing apparatus, electron microscope, master, stamper, recording medium, and structure
04/17/2012US8158306 Method and system for combining photomasks to form semiconductor devices
04/10/2012US8153335 Lithography masks, systems, and manufacturing methods
04/04/2012EP2437119A1 Film with blue dye
04/03/2012US8148049 Ink jet recording head and manufacturing method of the same
04/03/2012US8148036 Photomask blank and photomask
03/2012
03/28/2012CN1717437B Sacrificial compositions, methods of use thereof, and methods of decomposition thereof
03/27/2012US8145342 Methods and systems for adjusting operation of a wafer grinder using feedback from warp data
03/27/2012US8142964 Method of designing sets of mask patterns, sets of mask patterns, and device manufacturing method
03/27/2012US8142961 Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing method
03/21/2012EP1483628B1 Full phase shifting mask in damascene process
03/21/2012CN101536155B Plasma dielectric etch process including in-situ backside polymer removal for low-dielectric constant material
03/21/2012CN101300526B Visual film identification
03/15/2012US20120064464 Radiographic silver halide films having incorporated developer
03/07/2012EP1814955B1 Resin cured film for flexible printed wiring board and production process thereof
03/07/2012CN101611349B Method for sub-lithographic interconnect patterning using self-assembling polymers
03/06/2012US8130626 Recording apparatus, recording control signal generating apparatus, method of manufacturing imprint mold, imprint mold, and magnetic disc
03/06/2012US8129078 Mask, method for manufacturing the same, and method for manufacturing semiconductor device
02/2012
02/28/2012US8124319 Semiconductor lithography process
02/28/2012US8124318 Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent
02/23/2012US20120047475 Semiconductor device
02/22/2012CN102362223A Optical imaging writer system
02/22/2012CN102362222A Radiographic silver halide films having incorporated developer
02/21/2012US8119313 Method for manufacturing semiconductor device
02/21/2012US8119312 Manufacturing method for a semiconductor device
02/15/2012EP1307880B1 Method of storing holographical information
02/15/2012CN101950124B 黑白负片超微粒显影用浴液及显影方法 Black and white negatives ultrafine particles and developing methods for developing bath
02/14/2012US8114579 Manufacturing data-storage media using light-curable material
02/14/2012US8114575 Plate making method of lithographic printing plate precursor
02/07/2012US8112726 Phase-shifting masks with sub-wavelength diffractive optical elements
02/07/2012US8111398 Method of measurement, an inspection apparatus and a lithographic apparatus
02/07/2012US8110325 Substrate treatment method
02/07/2012US8110323 Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film
02/07/2012US8110322 Method of mask forming and method of three-dimensional microfabrication
02/02/2012DE102010033046A1 Licht-Therapievorrichtung sowie System zum Herstellen und Applizieren einer therapeutisch wirksamen Flüssigkeit Light therapy device and system for producing and applying a therapeutically effective liquid
02/01/2012EP2411872A1 Radiographic silver halide films having incorporated developer
01/2012
01/31/2012US8108806 Contrast-based resolution enhancement for photolithographic processing
01/31/2012US8107079 Multi layer alignment and overlay target and measurement method
01/31/2012US8106107 Compositions and methods for use in three dimensional model printing
01/31/2012US8105765 Method of manufacturing a semiconductor device
01/31/2012US8105755 Method for processing of photopolymer printing plates with overcoat
01/31/2012US8105754 Functionalized fullerenes for nanolithography applications
01/31/2012US8105738 Developing method
01/24/2012US8103980 Beam dose computing method and writing method and record carrier body and writing apparatus
01/24/2012US8102507 Lithographic apparatus and device manufacturing method
01/24/2012US8101337 Method of synthesizing ITO electron-beam resist and method of forming ITO pattern using the same
01/10/2012US8095897 Methods and systems for layout and routing using alternating aperture phase shift masks
01/10/2012US8092960 Exposing mask and production method therefor and exposing method
01/05/2012US20120004921 Method for retrieving audio signal stored on photograph
01/05/2012US20120003592 Imaging particulates, paper and process, and imaging of paper using dual wavelength light
01/04/2012EP2402127A2 Method and apparatus associated with anisotropic shrink in sintered ceramic items
01/03/2012US8088563 Reducing risk of detachment of photoresist from underlying substrate during development of photoresist pattern using fluid developer by controlling surface composition of the underlying substrate so that contact angle formed between substrate with developer is 20 degrees or greater
12/2011
12/27/2011US8085304 Photographic silver emulsion-based digital archival storage
12/20/2011US8082155 Camera with printhead for printing images with encoded audio data
12/20/2011US8081294 Method of evaluating optical beam source of exposure device, method of designing illumination shape of exposure device, and software for optimizing illumination shape of exposure device
12/07/2011CN1637594B 曝光掩模和使用该曝光掩模的曝光方法 Exposure mask and using the exposure mask exposure method
12/06/2011US8071278 Multiple patterning technique using a single reticle
12/06/2011US8071264 Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask
12/06/2011CA2578038C Method for reducing acrylamide formation in thermally processed foods
11/2011
11/30/2011CN101432658B 半导体处理中控制形成在晶片上的结构的临界尺寸的方法和系统 The semiconductor processing method of controlling the critical dimension of the wafer is formed on the structure and system for
11/29/2011US8068213 Photomask, method of lithography, and method for manufacturing the photomask
11/29/2011US8067135 Metrology systems and methods for lithography processes
11/23/2011CN101614995B Copying-proof film and preparation method thereof
11/23/2011CN101351746B Interferometric lithography system and method used to generate equal path lengths of interfering beams
11/22/2011US8065637 Semiconductor device
11/22/2011US8065153 Audio reader device
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