Patents for C30B 29 - Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape (27,107)
04/2002
04/18/2002WO2002030814A1 A process for the synthesis of nanotubes of transition metal dichalcogenides
04/18/2002WO2002001608A3 METHOD FOR ACHIEVING IMPROVED EPITAXY QUALITY (SURFACE TEXTURE AND DEFECT DENSITY) ON FREE-STANDING (ALUMINUM, INDIUM, GALLIUM) NITRIDE ((Al,In,Ga)N) SUBSTRATES FOR OPTO-ELECTRONIC AND ELECTRONIC DEVICES
04/18/2002WO2001068954A3 Axial gradient transport apparatus and process
04/18/2002US20020045340 Method of manufacturing group iii-v compound semiconductor
04/18/2002US20020045073 Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby
04/18/2002US20020045009 Method of chemically growing a thin film in a gas phase on a silicon semiconductor substrate
04/18/2002US20020043208 Crystal growth method
04/18/2002US20020043206 Method for controlling growth of a silicon crystal to minimize growth rate and diameter deviations
04/18/2002CA2425757A1 Epitaxial oxide films via nitride conversion
04/17/2002EP1197996A2 A III nitride epitaxial wafer and usage of the same
04/17/2002EP1197995A2 A method for fabricating a III nitride film
04/17/2002EP1196646A2 Dendrite thickness control system for growing silicon ribbon
04/17/2002CN1345096A Method and device for manufacture of gallium phosphide luminous component
04/17/2002CN1083077C Crucible fixing method and support base and base assembly equipment
04/16/2002US6372981 Semiconductor substrate, solar cell using same, and fabrication methods thereof
04/16/2002US6372040 Single crystal growth apparatus and single crystal growth method
04/16/2002CA2258388C Surface processing of thin film cvd diamond coatings for improved resistive properties and integrated circuit packages incorporating processed coatings
04/11/2002WO2001064975A8 Method and device for growing large-volume oriented monocrystals
04/11/2002US20020041931 Method for growing thin films
04/11/2002US20020040848 Method of smoothing diamond coating, and method of manufacturing diamond-coated body
04/11/2002DE10064941A1 Gaseinlassorgan Gas inlet element
04/11/2002DE10047929A1 Production of semiconductor and metal wafers used in the production of solar cells comprises solidifying a melt of a semiconductor, metal or a mixture of several semiconductors and/or metals on a moving substrate
04/10/2002EP1195455A1 Silicon wafer, method for determining condition under which silicon single crystal is produced, and method for producing silicon wafer
04/10/2002EP1194619A1 Doped diamond
04/10/2002EP1194618A1 Sublimation growth method for an sic monocrystal with growth-pressure heating
04/10/2002CN1344336A Prodn. of bulk single crystals of aluminum nitride, silicon carbide and aluminum nitride: silicon carbide alloy
04/10/2002CN1344335A Method and appts. for controlling diameter of silicon crystal in growth process
04/10/2002CN1082572C Method for preparing molten silcon melt from polycrystalline silicon charge
04/09/2002US6370288 Optical magnetic field sensor probe
04/09/2002US6368407 Single crystal-manufacturing equipment and a method for manufacturing the same
04/04/2002WO2002027778A1 Method of heat-treating silicon wafer
04/04/2002WO2002027079A1 Crystal growth method
04/04/2002WO2002027077A1 Method of manufacturing silicon monocrystal and device for manufacturing semiconductor monocrystal
04/04/2002US20020039462 Optical magnetic field sensor probe
04/04/2002US20020038892 Boride-based substrate for growing semiconducting layers thereon and a semiconductor devise using the same
04/04/2002US20020038627 Apparatus for growing low defect density silicon carbide
04/04/2002DE10044163A1 Elektrophoretisch nachverdichtete SiO2-Formkörper, Verfahren zu ihrer Herstellung und Verwendung Electrophoretically recompressed SiO2-shaped bodies, processes for their preparation and use
04/03/2002EP1193332A1 Method for producing silicon single crystal
04/03/2002EP1090167B1 Process and apparatus for preparation of silicon crystals with reduced metal content
04/03/2002EP0972095B1 Crucible and method of preparation thereof
04/03/2002CN1343265A Barium doping of molten silicon for use in crystal growing process
04/03/2002CN1343264A Strontium doping of molten silicon for use in crystal growing process
04/03/2002CN1342986A Manufacturing method for oxide superconductor material used for oxide superconductor and preparation method thereof
04/02/2002US6365461 Method of manufacturing epitaxial wafer
04/02/2002US6364947 Method and apparatus for manufacturing a silicon single crystal having few crystal defects, and a silicon single crystal and silicon wafers manufactured by the same
04/02/2002US6364946 Methods for growing large-volume single crystals from calcium fluoride and their uses
03/2002
03/28/2002WO2002025716A1 Method of producing silicon wafer and silicon wafer
03/28/2002WO2002024985A1 Gas inlet mechanism for cvd-method and device
03/28/2002US20020037249 Method of producing oxide whiskers, oxide whiskers, and photoelectric conversion apparatus
03/28/2002US20020036281 Spin electronic material and fabrication method thereof
03/28/2002DE10143761A1 Wafer used in the production of semiconductor devices comprises a region with a central axis, a region having no flow structure defect, a region with an oxidation-induced stacking fault region
03/27/2002EP1191130A1 Saucer for escaped melt in apparatus for pulling up single crystal
03/27/2002EP1190206A2 Tip structures, devices on their basis, and methods for their preparation
03/27/2002EP1190123A1 Encapsulation of crystals via multilayer coatings
03/27/2002EP1190122A1 Method and apparatus for epitaxially growing a material on a substrate
03/27/2002EP1190120A1 Compound gas injection system and methods
03/27/2002EP1099014B1 Method and device for producing at least one silicon carbide monocrystal
03/27/2002EP1090166B1 Process for growth of defect free silicon crystals of arbitrarily large diameters
03/27/2002EP0778838B1 Formation of a metalorganic compound for growing epitaxial metal or semiconductor layers
03/26/2002US6360755 Method for processing semiconductor material
03/21/2002WO2002022919A2 Forming a single crystal semiconductor film on a non-crystalline surface
03/21/2002WO2002022917A2 Single crystals of lead magnesium niobate-lead titanate
03/21/2002US20020034881 Selecting surface quality for surface of etched wafer and quantity of silicon to be removed from surface of wafer during the etching process; determining concentration of hydrofluoric acid in an aqueous etching solution; etching
03/21/2002DE10045264A1 Verfahren zum Aufheizen eines Werkstückes, insbesondere eines optischen Elementes A method of heating a workpiece, in particular an optical element
03/21/2002CA2421753A1 Single crystals of lead magnesium niobate-lead titanate
03/20/2002EP1189285A1 Production method for bonding wafer and bonding wafer produced by this method
03/20/2002EP1188545A2 Method for heating a work piece, in particular an optical element
03/20/2002EP0950132A4 CaTiO 3? INTERFACIAL TEMPLATE STRUCTURE ON SUPERCONDUCTOR
03/20/2002EP0665981B1 Process for fabricating layered superlattice materials and electronic devices including same
03/20/2002CN1340637A Method for using quasi-diamond to modify artificial crystal
03/19/2002US6358867 Orientation independent oxidation of silicon
03/14/2002WO2002021576A2 Organic nanoelectric conductors
03/14/2002WO2002020882A1 Silicon sheet producing apparatus and solar cell comprising silicon sheet produced by the same
03/14/2002WO2002020880A1 Production of low defect epitaxial films
03/14/2002WO2002020879A1 Production method for composite oxide thin film and device therefor and composite oxide film produced thereby
03/14/2002WO2002020424A1 Electrophoretically redensified sio2 moulded body, method for the production and use thereof
03/14/2002WO2002020403A1 Ultracoarse, monorystalline tungsten carbide and method for producing the same, and hard metal produced therefrom
03/14/2002US20020030042 Method for heating a workpiece
03/14/2002US20020029738 Apparatus for pulling a single crystal
03/14/2002US20020029737 Quartz glass crucible for pulling up silicon single crystal and production method therefor
03/14/2002US20020029735 Method of and apparatus for growing ribbon of crystal
03/14/2002US20020029734 Method for producing single
03/14/2002DE10043792A1 Ultragrobes, einkristallines Wolframkarbid und Verfahren zu dessen Herstellung; Ultra-coarse, single-crystalline tungsten carbide, and process for its production; und daraus hergestelltes Hartmetall and it produced carbide
03/14/2002DE10043601A1 Vorrichtung und Verfahren zum Abscheiden insbesondere kristalliner Schichten auf insbesondere kristallinen Substraten Apparatus and method for depositing in particular crystalline layers on in particular crystalline substrates
03/13/2002EP1187231A2 Method of preparing oxide superconductor
03/13/2002EP1186687A2 Method of and apparatus for growing ribbon of crystal
03/13/2002EP1185727A1 Sequential hydride vapor-phase epitaxy
03/13/2002EP1185726A1 Melt depth control for semiconductor materials grown from a melt
03/13/2002EP1185725A1 Continuous melt replenishment for crystal growth
03/13/2002CN1080777C Method for preparing relaxing ferroelectric single crystal lead magnoniobate
03/12/2002US6356006 Diamond wafer, method of estimating a diamond wafer and diamond surface acoustic wave device
03/12/2002US6355107 Compound gas injection system
03/10/2002WO2002077331A1 Method for flattening surface of oxide crystal to ultra high degree
03/07/2002WO2002019414A1 Methods of inspecting and manufacturing silicon wafer, method of manufacturing semiconductor device, and silicon wafer
03/07/2002WO2002018680A1 Device and method for the deposition of, in particular, crystalline layers on, in particular, crystalline substrates
03/07/2002WO2002018678A1 Method for preparing single crystal oxide thin film
03/07/2002WO2002018668A1 Titanium dioxide cobalt magnetic film and its manufacturing method
03/07/2002WO2001086036A3 A multi-stage arsenic doping process to achieve low resistivity in silicon crystal grown by czochralski method
03/07/2002US20020028564 Method of producing a single crystal gallium nitride substrate and single crystal gallium nitride substrate
03/07/2002US20020028291 Apparatus for fabricating a III-V nitride film and a method for fabricating the same