Patents for C30B 29 - Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape (27,107)
05/2003
05/28/2003EP1313897A1 Device and method for the deposition of, in particular, crystalline layers on, in particular, crystalline substrates
05/28/2003CN1420819A Beads of polycrystalline alkali-metal or alkali-earth metal fluoride, their preparation and their use
05/28/2003CN1420213A Method for producing silica glass crucible with crystallizing zone from porous silica glass parison
05/28/2003CN1109775C Hard carbon coating
05/27/2003US6569693 Method for fabricating epitaxial substrate
05/27/2003US6569535 Silicon wafer and epitaxial silicon wafer utilizing same
05/27/2003US6569237 Method of pulling up silicon single crystal and method of manufacturing epitaxial wafer
05/27/2003US6569236 Device and method for producing single-crystal ingot
05/22/2003WO2003043150A1 Light emitting element structure using nitride bulk single crystal layer
05/22/2003WO2003008674A3 Method of making high purity optical fluoride crystals
05/22/2003US20030096294 Automated method for setting up crystallization experiments employing a crystallization device identification code reader
05/22/2003US20030096293 Automated crystallization experiment setup apparatus comprising crystallization device identification code reader
05/22/2003US20030094618 Method for manufacturing gallium nitride compound semiconductor and light emitting element
05/22/2003US20030094129 Below 160NM optical lithography crystal materials and methods of making
05/22/2003US20030094128 Dispersion management optical lithography crystals for below 160nm optical lithography method thereof
05/21/2003CN1419612A Silicon ribbon growth dendrite thickness control system
05/21/2003CN1109135C Device and method for pulling single crystal
05/20/2003US6566595 Solar cell and process of manufacturing the same
05/20/2003US6566490 Geenration of preferential microcrystals; obtain peptide solutions, homogenize under pressure, recover protein crystal
05/20/2003US6566279 Method for fabricating a SiC film and a method for fabricating a SiC multi-layered film structure
05/20/2003US6566256 Dual process semiconductor heterostructures and methods
05/20/2003US6566218 Boride-based substrate for growing semiconducting layers thereon and a semiconductor device using the same
05/20/2003US6565826 Method of preparing zeolite single crystals
05/20/2003US6565822 Epitaxial silicon wafer, method for producing the same and subtrate for epitaxial silicon wafer
05/20/2003US6565651 Optimized silicon wafer strength for advanced semiconductor devices
05/20/2003US6565649 Epitaxial wafer substantially free of grown-in defects
05/20/2003US6565648 Production method of ferro-electric crystals having periodically-poled structure
05/15/2003WO2003040440A2 Apparatus and method for diamond production
05/15/2003US20030092263 Method for producing group III nitride compound semiconductor and group III nitride compound semiconductor device
05/15/2003US20030091934 Fluorides of alkaline earth cations having different optical polarizabilities to produce an overall isotropic polarizability
05/15/2003US20030091865 Manufacturing method for high-density magnetic data storage media
05/15/2003US20030091500 Magnetic recording media
05/15/2003US20030089967 Silicon wafer and fabricating method therefor
05/15/2003US20030089307 Method and device for growing large-volume oriented monocrystals
05/15/2003US20030089306 Method for producing crystal and/or crystal materials containing fluorine
05/15/2003US20030089304 Method of making high purity optical fluoride crystals
05/15/2003US20030089301 Single crystal production method
05/14/2003EP1310458A2 Method of assaying fluorite sample and method of producing fluorite crystal
05/14/2003CN1417387A Surface modifying method for quartz glass crucible and surface modified crucible
05/14/2003CN1108400C Method for removing heavy metal impurity from monocrystal silicon
05/13/2003US6562720 Apparatus and method for surface finishing a silicon film
05/13/2003US6562646 Method for manufacturing light-emitting device using a group III nitride compound semiconductor
05/13/2003US6562132 EFG crystal growth apparatus and method
05/13/2003US6562129 Formation method for semiconductor layer
05/13/2003US6562126 Method and device for producing optical fluoride crystals
05/13/2003US6562125 Heater arrangement for crystal growth furnace
05/13/2003US6562123 Process for growing defect-free silicon wherein the grown silicon is cooled in a separate chamber
05/08/2003WO2003038868A2 High resistivity silicon carbide single crystal and method of producing it
05/08/2003US20030087509 Method of making semiconductor device
05/08/2003US20030085426 Semiconductor device, method of forming epitaxial film, and laser ablation device
05/08/2003US20030084840 Crystal-pulling apparatus for pullig and growing a monocrystalline silicon ingot, and method therefor
05/08/2003US20030084839 Apparatus and method for diamond production
05/07/2003EP1308544A1 SILICON SINGLE CRYSTAL WAFER HAVING VOID DENUDED ZONE ON THE SUFRACE AND DIAMETER OF ABOVE 300 mm AND ITS PRODUCTION METHOD
05/07/2003EP1308543A1 Single crystal production method
05/07/2003EP1155171B1 Method for growing an $g(a)-sic volume single crystal
05/07/2003CN1415788A Monocrystal mfg process
05/07/2003CN1107877C Specular surface body
05/07/2003CN1107747C High-pressure sinter process for synthosizing large-size polymer crystal
05/07/2003CN1107746C Process and appts. for prodn. of polycrystalline semiconductor crystal ingot
05/06/2003US6558995 Holographic, laser-induced fabrication of indium nitride quantum wires and quantum dots
05/06/2003CA2263352C Single crystal sic and a method of producing the same
05/02/2003EP1305823A1 Process for growing a magnesium oxide film on a silicon (100) substrate coated with a cubic silicon carbide buffer layer
05/02/2003EP1305161A1 Electronic and optical materials
05/02/2003EP0989212B1 Lanthanum gallium silicate disc and its preparation method
05/01/2003WO2003036771A1 Nitride semiconductor laser element, and production method therefor
05/01/2003WO2003036698A2 Method of depositing high-quality sige on sige substrates
05/01/2003WO2003035946A1 Method of growing a mcraly-coating and an article coated with the mcraly-coating
05/01/2003WO2003035945A2 Substrate for epitaxy
05/01/2003WO2003035915A1 Method for producing monocrystalline metallic wire
05/01/2003US20030080345 Single crystal GaN substrate, method of growing same and method of producing same
05/01/2003US20030079677 Method for fabricating a semiconductor epitaxial wafer having doped carbon and a semiconductor epitaxial wafer
05/01/2003US20030079676 High resistivity silicon carbide single crystal
05/01/2003US20030079674 Silicon semiconductor substrate and process for producing the same
04/2003
04/30/2003CN1414149A Method of building crystal to grow lead zirconate titanate film
04/30/2003CN1414146A Using induction heating molybdenium crucible in hydrogen atmosphere to make Czochralski grown sapphire crystal
04/30/2003CN1414145A Growing technology of optical grade low corrusion tunnel density quartz crystal
04/29/2003US6555845 Method for manufacturing group III-V compound semiconductors
04/29/2003US6555194 Process for producing low defect density, ideal oxygen precipitating silicon
04/24/2003WO2003033781A1 Low temperature epitaxial growth of quaternary wide bandgap semiconductors
04/24/2003WO2002057519A9 Process for monitoring the gaseous environment of a crystal puller for semiconductor growth
04/24/2003US20030076608 Thin film formation method, display, and color filter
04/24/2003US20030075706 Terbium- or lutetium - containing garnet phosphors and scintillators for detection of high-energy radiation
04/23/2003EP1304749A1 Method of growing single crystal GaN, method of making single crystal GaN substrate and single crystal GaN substrate
04/23/2003EP1304399A1 Surface modification process of quartz glass crucible
04/23/2003EP0807839B1 Optical window and method of manufacturing the same
04/23/2003CN1413357A Method for producing group III nitride compound semiconductor and group III nitride compound semiconductor device
04/22/2003US6551652 Applying a first sol for forming the piezoelectric film on a substrate having the lower electrode, to form a lower film, applying second sol having greater lead content than first sol to form upper film, heat treating the films
04/22/2003US6550158 Substrate handling chamber
04/17/2003WO2003031694A1 Preparation of feedstock of alkaline earth and alkali metal fluorides
04/17/2003WO2002097173A3 Semi-insulating silicon carbide without vanadium domination
04/17/2003WO2002057518A3 Apparatus and process for the preparation of low-iron_contamination single crystal silicon
04/17/2003US20030073293 In situ growth of oxide and silicon layers
04/17/2003US20030073104 Nanoscaling ordering of hybrid materials using genetically engineered mesoscale virus
04/17/2003US20030072882 Method of depositing rare earth oxide thin films
04/17/2003US20030072877 Apparatus and method for making free standing diamond
04/17/2003US20030071276 Epitaxial growth of nitride semiconductor device
04/17/2003US20030070607 Method for producing group III nitride compound semiconductor
04/17/2003US20030070606 Loading a fluoride raw material into a chamber, exposing to a gas flow of fluoride at a predetermined temperature and storing in dry atmosphere
04/17/2003US20030070605 Apparatas For Growing Jingle Crystal, Method For Producing Jingle Crystal Utilizing The Apparatas And Jingle Crystal
04/17/2003US20030070585 Coating material for absorbing radiant heat, manufacturing method thereof