Patents for C30B 29 - Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape (27,107)
04/2003
04/16/2003EP1302977A2 Method for producing group III nitride compound semiconductor
04/16/2003EP1302976A1 Single crystal wafer and solar battery cell
04/16/2003EP1302570A1 Langasite single crystal ingot, substrate for piezoelectric device and method for manufacture thereof, and surface acoustic wave device
04/16/2003EP1302248A2 Method and appartus for plasma deposition
04/16/2003EP1151155B1 Cdv method of and reactor for silicon carbide monocrystal growth
04/16/2003CN1411035A Single crystal gallium nitride substrate, method for growing single crystal gallium nitride and method for mfg. substrate thereof
04/16/2003CN1410604A Production method of hydroxy apatite crystal whisker
04/16/2003CN1410603A Growth of high curie point lead niobate lead indate-lead titanate single crystal using crucible descending method
04/15/2003US6548131 Quartz glass crucible and process for the manufacture of the crucible
04/15/2003US6546754 Apparatus for silica crucible manufacture
04/10/2003WO2003029431A2 Nanoscaling ordering of hybrid materials using genetically engineered mesoscale virus
04/10/2003WO2003004734A9 Method for the production of low defect density silicon
04/10/2003US20030068891 Method of manufacturing a wafer
04/10/2003US20030068890 Argon/ammonia rapid thermal annealing for silicon wafers
04/10/2003US20030068502 A surface treatment to form a quality, ultra-thin silicon wafer, first by smoothing the surface, setting annealing; high speed pulling a silicon ingot or rapidly cooling a pulled single crystal, slicing a silicon wafer off from ingot
04/10/2003US20030068501 Single crystalline silicon wafer, ingot, and producing method thereof
04/10/2003US20030066478 Crystal growth vessel and crystal growth method
04/10/2003US20030066477 Preparation of 157nm transmitting barium fluoride crystals with permeable graphite
04/10/2003CA2462766A1 Nanoscaling ordering of hybrid materials using genetically engineered mesoscale virus
04/09/2003EP1300879A2 Ideal oxygen precipating silicon wafers and oxygen out-diffusion-less process therefor
04/09/2003EP1300380A1 Adhesive composite coating for diamond and diamond-containing materials and method for producing said coating.
04/09/2003EP1299900A2 METHOD FOR ACHIEVING IMPROVED EPITAXY QUALITY (SURFACE TEXTURE AND DEFECT DENSITY) ON FREE-STANDING (ALUMINUM, INDIUM, GALLIUM) NITRIDE ((Al,In,Ga)N) SUBSTRATES FOR OPTO-ELECTRONIC AND ELECTRONIC DEVICES
04/09/2003EP1210472A4 Heater arrangement for crystal growth furnace
04/09/2003EP1200650B1 Sic monocrystal sublimation growth device with a film-covered crucible
04/09/2003EP1151154B1 Process of stacking and melting polycrystalline silicon for high quality single crystal production
04/09/2003EP0959148B1 Method for producing diamond films using a vapour-phase synthesis system
04/09/2003CN1409778A Magnesium-doped III-V nitrides & Methods
04/09/2003CN1408904A Process for producing high purity magnesium oxide monocrystal using waste magnesite ore
04/09/2003CA2670071A1 Gan substrate, method of growing gan and method of producing gan substrate
04/08/2003US6544899 Process for manufacturing silicon epitaxial wafer
04/08/2003US6544490 Silicon wafer and production method thereof and evaluation method for silicon wafer
04/08/2003US6544332 Method for manufacturing silicon single crystal, silicon single crystal manufactured by the method, and silicon wafer
04/03/2003WO2003028120A1 Permanent current switch material and production method therefor
04/03/2003WO2003027361A1 Mcraly-coating
04/03/2003US20030064541 ZnO film, method for manufacturing the same, and luminescent element including the same
04/03/2003US20030064225 Diamond-coated member
04/02/2003EP1298709A2 III-nitride epitaxial substrate, epitaxial substrate for III-nitride element and III-nitride element
04/02/2003EP1298234A2 Method of manufacturing a single crystal substrate
04/02/2003CN1407143A Nickel ammonium sulfate hexahydrate crystal for ultraviolet filter
04/01/2003US6542299 Material for bismuth substituted garnet thick film and a manufacturing method thereof
03/2003
03/27/2003WO2003025637A1 Photolithographic uv transmitting mixed fluoride crystal
03/27/2003WO2003025636A1 Photolithographic method and uv transmitting fluoride crystals with minimized spatial dispersion
03/27/2003WO2003025263A1 Nitride semiconductor substrate, its manufacturing method, and semiconductor optical device using the same
03/27/2003WO2003025260A1 High yield method for preparing silicon nanocrystals with chemically accessible surfaces
03/27/2003WO2002040417A9 Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby
03/27/2003US20030056718 Method of manufacturing single crystal substrate
03/27/2003US20030056715 Silicon semiconductor substrate and preparation thereof
03/27/2003US20030056546 Photonic crystal materials and devices
03/26/2003EP1296362A2 Single crystal GaN substrate, method of growing same and method of producing same
03/26/2003EP1295970A1 MCrAlY type alloy coating
03/26/2003EP1295969A1 Method of growing a MCrAIY-coating and an article coated with the MCrAIY-coating
03/26/2003EP1295320A2 Process for etching silicon wafers
03/26/2003EP1294962A1 Preparation of compounds based on phase equilibria of cu-in-se
03/26/2003EP0944916B1 Very long and highly stable atomic wires and method for making these wires
03/26/2003CN1406292A Silicon single crystal wafer and method for producing silicon single crystal
03/26/2003CN1406291A Method and apparatus for growing single crystal
03/26/2003CN1405903A Single Crystal gallium nitride base board and its growth method and manufacture method
03/26/2003CN1405842A Silicon semiconductor base-plate and its making method
03/26/2003CN1405841A Silicon-semiconductor lining and its producing method
03/26/2003CN1405366A Method for preparing Titanium dioxide photon crystal for purple-light waveband air balloon
03/26/2003CN1405083A Method of largely chiral separating single-wall tubelike fullerene
03/25/2003US6538285 Silicon wafer
03/25/2003US6537924 Method of chemically growing a thin film in a gas phase on a silicon semiconductor substrate
03/25/2003US6537370 Process for obtaining a layer of single-crystal germanium on a substrate of single-crystal silicon, and products obtained
03/25/2003US6537368 Ideal oxygen precipitating epitaxial silicon wafers and oxygen out-diffusion-less process therefor
03/20/2003WO2002075025A3 Process for preparing low defect density silicon using high growth rates
03/20/2003WO2002066714A3 Process for preparing single crystal silicon having improved gate oxide integrity
03/20/2003US20030052309 Nano-tube of multi-element system oxide
03/20/2003US20030052080 Improving bone bonding; acid etch removal of native oxide layer from titanium device and roughening
03/20/2003US20030051661 Crystal growth apparatus
03/20/2003US20030051657 Vacancy, dominated, defect-free silicon
03/19/2003EP1293592A2 Silicon semiconductor substrate and preparation thereof
03/19/2003EP1293591A2 Silicon semiconductor substrate and method for production thereof
03/19/2003EP1292727A2 A method for producing sphere-based crystals
03/19/2003EP1292726A1 Single crystal diamond prepared by cvd
03/19/2003EP1137826B1 Large-size monoatomic and monocrystalline layer, made of diamond-type carbon and device for making same
03/19/2003EP0909340B1 Multilayered material, process and device for producing a multilayered material
03/19/2003CN1404523A Scintillator crystals, method for making same, use thereof
03/19/2003CN1404522A Scintillator crystals, method for making same, use thereof
03/19/2003CA2666671A1 Single crystal gan substrate, method of growing same and method of producing same
03/18/2003US6534026 Density of defects of less than 104 per square centimeter, wherein said defects are comprised of micropipes and dislocations.
03/18/2003US6533906 Method of manufacturing an oxide epitaxially strained lattice film
03/18/2003US6533869 Apparatus and method for making free standing diamond
03/18/2003US6533838 High purity gallium for preparation of compound semiconductor, and method and apparatus for purifying the same
03/17/2003WO2002023604A1 Semiconductor base material and method of manufacturing the material
03/17/2003CA2422624A1 Semiconductor base material and method of manufacturing the material
03/13/2003WO2003021012A1 Semiconductor crystal producing method
03/13/2003WO2003020497A1 Free-standing (al, ga, in)n and parting method for forming same
03/13/2003WO2002035615A3 Precursor solutions and methods of using same
03/13/2003US20030049642 Screening nucleation tendency of a molecule in a fluid or gas; obtain fluid or gas sample, transfer sample to detection apparatus, detect nucleation tendency, score nucleation tendency
03/13/2003US20030047131 Method for pulling single crystal
03/13/2003US20030047129 Method of manufacturing compound single crystal
03/12/2003EP1291930A2 ZnOSSe compound semiconductor, integrated circuit using the semiconductor and method of manufacturing the semiconductor and the integrated circuit
03/12/2003EP1291456A1 Polycrystalline silicon rod and method for processing the same
03/12/2003EP1290721A1 Preparation method of a coating of gallium nitride
03/12/2003EP1290251A1 Thick single crystal diamond layer method for making it and gemstones produced from the layer
03/12/2003CN1402317A Semiconductor silicon wafer and mfg. method thereof
03/12/2003CN1402306A Nitride semiconductor growing process
03/12/2003CN1401828A Method for mfg. plate crystal of silicon carbide
03/12/2003CN1103116C Process for making electronic devices having low-leakage current and low-polarization fatigue