Patents for C30B 25 - Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth (13,302)
06/2004
06/24/2004WO2004053187A1 Susceptor system________________________
06/24/2004WO2004039731A3 Nanostructures produced by phase-separation during growth of (iii-v)1-x(iv2)x alloys
06/24/2004US20040121616 Method for bottomless deposition of barrier layers in integrated circuit metallization schemes
06/24/2004US20040119067 Gallium nitride materials and methods
06/23/2004EP1432015A2 Semiconductor and semiconductor substrate, method of manufacturing the same, and semiconductor device
06/23/2004EP1431426A2 Substrate for epitaxial growth
06/23/2004CN1507506A High-resisting silicon carbide substrate for semiconductor devices with high breakdown voltage
06/23/2004CN1155053C Device and method for handling substrates in epitaxial induction reactors
06/22/2004US6753506 System and method of fast ambient switching for rapid thermal processing
06/22/2004US6752874 Apparatus for perpendicular-type ultra vacuum chemical vapor deposition
06/17/2004WO2004051725A1 Epitaxial growing method and substrate for epitaxial growth
06/17/2004WO2004051718A1 3-5 group compound semiconductor and method for preparation thereof
06/17/2004WO2004009492A3 Diamondoid-based components in nanoscale construction
06/17/2004US20040115941 Epitaxially coated semiconductor wafer and process for producing it
06/17/2004US20040115938 Method for producing a chalcogenide-semiconductor layer of the abc2 type with optical process monitoring
06/17/2004US20040115917 Group III nitride compound semiconductor device and method of producing the same
06/17/2004US20040115916 Selective placement of dislocation arrays
06/17/2004US20040115876 Method of manufacturing silicon carbide film
06/17/2004US20040115854 Method of MOCVD growth of compounds including GaAsN alloys using an ammonia precursor and radiation
06/17/2004US20040115853 Growth of III-nitride films on mismatched substrates without conventional low temperature nucleation layers
06/17/2004US20040113236 Semiconductor wafer and method for producing the same
06/17/2004US20040112279 Framework assisted crystal growth
06/16/2004EP1429374A2 Growth of III-Nitride films on mismatched substrates without conventional low temperature nucleation layers
06/16/2004EP1428911A1 Framework assisted crystal growth
06/15/2004US6750130 Heterointegration of materials using deposition and bonding
06/15/2004US6750121 Apparatus and method for forming single crystalline nitride substrate using hydride vapor phase epitaxy and laser beam
06/15/2004US6750120 Method and apparatus for MOCVD growth of compounds including GaAsN alloys using an ammonia precursor with a catalyst
06/15/2004US6750119 Low temperature growth technique is described for incorporating carbon epitaxially into si and sige with very abrupt and well defined junctions, without any associated oxygen background contamination.
06/15/2004US6749957 Method for fabricating a III nitride film, substrate for epitaxial growth, III nitride film, epitaxial growth substrate for III nitride element and III nitride element
06/15/2004US6749687 In situ growth of oxide and silicon layers
06/15/2004US6749686 Crystal growth method of an oxide and multi-layered structure of oxides
06/15/2004US6749684 Method for improving CVD film quality utilizing polysilicon getterer
06/10/2004WO2004049405A1 Backside heating chamber for emissivity independent thermal processes
06/10/2004WO2004048258A2 Method for forming carbon nanotubes
06/10/2004WO2004048257A2 Method for forming carbon nanotubes
06/10/2004WO2003054929B1 Method for depositing iii-v semiconductor layers on a non-iii-v substrate
06/10/2004US20040108506 Methods of forming a high conductivity diamond film and structures formed thereby
06/10/2004US20040107897 Atomic layer deposition apparatus and method for preventing generation of solids in exhaust path
06/10/2004US20040107895 Quartz thin film
06/10/2004US20040107891 Method for producing group III nitride compound semiconductor substrate
06/09/2004EP1427000A1 Growth of a single crystal region of a III-V compound on a single crystal silicon substrate
06/09/2004EP1426328A2 Method for manufacturing of uniformly sized and controled semi-conductor nano structures by CVD process on dieletric
06/09/2004EP1425784A1 Method for the production of iii-v- nitride-conductor-based semiconductor layers
06/09/2004EP1425434A1 Method for coating oxidizable materials with oxide-containing layers
06/09/2004CN1503327A Relaxed, low-defect SGOI for strained Si CMOS applications
06/09/2004CN1153259C Semiconductor substrate and thin-film semiconductive member, and method for making thereof
06/08/2004US6747317 Semiconductor device
06/08/2004US6746941 Semiconductor wafer and production method therefor
06/08/2004US6746908 Temperature controlling method, thermal treating apparatus, and method of manufacturing semiconductor device
06/08/2004US6746787 Manufacturing method of silicon carbide single crystals
06/03/2004WO2004046427A1 Optical quality diamond material
06/03/2004US20040104392 Production method for light emitting element abstract:
06/03/2004US20040104384 Growth of high temperature, high power, high speed electronics
06/02/2004EP1424724A1 Chemical vapor phase epitaxial device
06/02/2004EP1424410A1 Semiconductor crystal producing method
06/02/2004EP1424409A1 Semiconductor wafer and its manufacturing method
06/02/2004EP1424405A2 Method and apparatus for fabricating coated substrates
06/02/2004EP1423558A2 Susceptor with epitaxial growth control devices and epitaxial reactor using the same
06/02/2004EP1423259A1 Free-standing (al, ga, in)n and parting method for forming same
06/02/2004CN1502117A 半导体晶片及其制造方法 A semiconductor wafer and manufacturing method thereof
06/02/2004CN1500919A Method for preparing gallium nitride single crystal film
06/01/2004US6744076 Single crystalline aluminum nitride film, method of forming the same, base substrate for group III element nitride film, light emitting device and surface acoustic wave device
06/01/2004US6743738 Dopant precursors and processes
06/01/2004US6743291 Method of fabricating a CMOS device with integrated super-steep retrograde twin wells using double selective epitaxial growth
05/2004
05/27/2004WO2004044958A2 Composition and method for low temperature deposition of silicon-containing films
05/27/2004WO2003087431B1 Deposition methods utilizing phased array microwave excitation, and deposition apparatuses
05/27/2004US20040101460 Air pollution control during semiconductor forming; removal trace elements; circulating polishing scrubbers
05/27/2004US20040099871 Monocrystalline gallium nitride localized substrate and manufacturing method thereof
05/27/2004US20040099217 Uniform temperature workpiece holder
05/27/2004US20040099208 Method for forming carbon nanotubes
05/26/2004EP1422748A1 Group iii nitride semiconductor film and its production method
05/26/2004EP1422746A2 Monocrystalline gallium nitride localized substrate and manufacturing method thereof
05/26/2004EP1421607A2 Improved process for deposition of semiconductor films
05/26/2004EP0988407B1 Method for producing coated workpieces, which are coated with an epitactic layer
05/26/2004CN1500160A Method for mfg. ZnTe compound semiconductor single crystal ZnTe compound semiconductor single crystal, and semiconductor device
05/25/2004US6740421 Rolling process for producing biaxially textured substrates
05/25/2004US6740167 Device for mounting a substrate and method for producing an insert for a susceptor
05/25/2004CA2142307C Methods and apparati for producing fullerenes
05/21/2004WO2004042830A1 Nanostructure, electronic device having such nanostructure and method of preparing nanostructure
05/21/2004WO2004042798A2 Apparatus and method for treating objects with radicals generated from plasma
05/21/2004WO2004027844A3 Method for the production of a composite sicoi-type substrate comprising an epitaxy stage
05/20/2004US20040096582 Low temperature vapor deposition; using organosilicon compound; thin film semiconductor
05/20/2004US20040094773 Dissimilar substrate having a first major surface offangled from a second major surface; nitride semiconductor layer in a lateral direction; and an active nitride semiconductor layer containing indium on the first nitride layer
05/20/2004US20040094763 Relaxed, low-defect SGOI for strained Si CMOS applications
05/20/2004US20040094249 Aluminum alloy sheet excellent in formability and hardenability during baking of coating and method for production thereof
05/20/2004US20040094084 Method for growing GaN compound semiconductor crystal and semiconductor substrate
05/19/2004EP1420437A1 METHOD OF PRODUCING SEMICONDUCTOR THIN FILM, METHOD OF PRODUCING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, INTEGRATED CIRCUIT, ELECTROOPTICAL DEVICE AND ELECTRONIC APPARATUS
05/19/2004EP1420088A1 High-temperature superconductive film having flat surface
05/19/2004EP1419520A2 System and method for fast ambient gas switching in rapid thermal processing
05/19/2004EP1334222B1 Cvd reactor with graphite-foam insulated, tubular susceptor
05/19/2004DE10250915A1 Deposition of material on silicon carbide substrate wafer, comprises preparing wafer with growth- and thermal radiation absorption surfaces, then heating wafer for MOVPE deposition
05/19/2004CN1150631C Manufacturing method of quantum wires
05/18/2004US6738683 Apparatus and method for cleaning a bell jar in a barrel epitaxial reactor
05/18/2004US6737361 Method for H2 Recycling in semiconductor processing system
05/18/2004US6736894 Method of manufacturing compound single crystal
05/13/2004WO2004040047A1 Single crystal base thin film
05/13/2004WO2004040046A1 Method for forming thin film on basic material through intermediate layer
05/13/2004WO2004039731A2 Nanostructures produced by phase-separation during growth of (iii-v)1-x(iv2)x alloys
05/13/2004WO2004012243A3 Selective placement of dislocation arrays
05/13/2004US20040092043 Semiconductor manufacturing method and semiconductor manufacturing apparatus
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