Patents for C30B 25 - Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth (13,302)
01/2005
01/06/2005US20050000449 Susceptor for epitaxial growth and epitaxial growth method
01/06/2005US20050000441 Process and device for depositing in particular crystalline layers on in particular crystalline substrates
01/06/2005US20050000431 Method of modifying source chemicals in an ALD process
01/06/2005US20050000406 Device and method for producing single crystals by vapor deposition
01/05/2005EP1494269A1 VAPOR PHASE GROWTH METHOD FOR Al-CONTAINING III-V GROUP COMPOUND SEMICONDUCTOR, AND METHOD AND DEVICE FOR PRODUCING Al-CONTAINING III-V GROUP COMPOUND SEMICONDUCTOR
01/05/2005EP1493848A1 Seed crystal of silicon carbide single crystal and method for producing ingot using same
01/05/2005EP1493175A1 Gas driven planetary rotation apparatus and methods for forming silicon carbide layers
01/05/2005CN1560330A Preparation process of zinc oxide bar shape single crystal nano-probe
01/05/2005CN1183578C Semiconductor making method and semiconductor making apparatus
01/04/2005US6838395 Method for fabricating a semiconductor crystal
01/04/2005US6838308 Semiconductor polysilicon component and method of manufacture thereof
01/04/2005US6837944 Cleaning and drying method and apparatus
01/04/2005US6837940 Film-forming device with a substrate rotating mechanism
01/04/2005US6837935 Microwave plasma film-forming apparatus for forming diamond film
01/04/2005US6837928 Electric field orientation of carbon nanotubes
12/2004
12/30/2004US20040266181 Coated semiconductor wafer, and process and device for producing the semiconductor wafer
12/30/2004US20040266157 Process for producing semiconductor layers based on III-V nitride semiconductors
12/30/2004US20040266144 Method of producing integrated semiconductor components on a semiconductor substrate
12/30/2004US20040266057 Silicon carbide and method of manufacturing the same
12/30/2004US20040264248 Crystal growth method of nitride semiconductor
12/30/2004US20040262636 Fluidic nanotubes and devices
12/30/2004US20040262624 GaN substrate and method of fabricating the same, nitride semiconductor device and method of fabricating the same
12/30/2004US20040261706 Method of growing a thin film onto a substrate
12/30/2004US20040261693 Epitaxial structure and process of GaN based compound semiconductor
12/30/2004US20040261689 Low temperature epitaxial growth of quartenary wide bandgap semiconductors
12/29/2004WO2004073024A3 Method and apparatus for making continuous films ofa single crystal material
12/29/2004EP1492158A2 GaN substrate and method of fabricating the same, nitride semiconductor device and method of fabricating the same
12/29/2004EP1491662A1 METHOD FOR PREPARING SiC CRYSTAL AND SiC CRYSTAL
12/29/2004EP1491255A1 Method for carrying out homogeneous and heterogeneous chemical reactions using plasma
12/29/2004CN2666931Y Apparatus for growing metal organic compound vapour phase deposit of zinc oxide crystal film
12/29/2004CN1559079A Heating system and method of reactor for heating atmosphere
12/29/2004CN1558001A Substrate holder
12/28/2004US6835966 Method for manufacturing gallium nitride compound semiconductor
12/28/2004US6835674 Methods for treating pluralities of discrete semiconductor substrates
12/28/2004US6835613 Method of producing an integrated circuit with a carbon nanotube
12/28/2004US6835416 Apparatus for growing thin films
12/28/2004US6835414 Low energy plasma discharges; generation high frequency electromagnetic radiation in container
12/28/2004US6835246 Nanostructures for hetero-expitaxial growth on silicon substrates
12/23/2004WO2004112126A1 A method of preparation of an epitaxial substrate
12/23/2004WO2004112112A1 Iii nitride crystal and method for producing same
12/23/2004WO2004112109A1 Defect-free semiconductor templates for epitaxial growth and method of making same
12/23/2004WO2004111319A2 Sacrificial template method of fabricating a nanotube
12/23/2004WO2004111316A1 System for growing silicon carbide crystals
12/23/2004WO2003097532A8 Process for manufacturing a gallium rich gallium nitride film
12/23/2004US20040259333 Method to planarize and reduce defect density of silicon germanium
12/23/2004US20040259275 Method of forming ferroelectric film
12/23/2004US20040255846 Method for fabricating a carrier substrate
12/23/2004US20040255843 Susceptor gaseous phase growing device, device and method for manufacturing epitaxial wafer, and epitaxial wafer
12/23/2004CA2509257A1 Sacrificial template method of fabricating a nanotube
12/22/2004EP1412552B1 Method for the production of coated substrates
12/22/2004EP1226285B1 Single crystal tungsten alloy penetrator and method of making
12/22/2004CN1556910A System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy
12/22/2004CN1181220C Method for producing coated workpieces, uses and installation for the method
12/21/2004US6833558 Parallel and selective growth method of carbon nanotube on the substrates for electronic-spintronic device applications
12/21/2004US6833027 Method of manufacturing high voltage schottky diamond diodes with low boron doping
12/16/2004WO2004108593A1 Nano-fiber or nano-tube comprising v group transition metal dichalcogenide crystals, and method for preparation thereof
12/16/2004US20040253796 Method for manufacturing gallium nitride (GaN) based single crystalline substrate
12/16/2004US20040250774 Wafer heater with protected heater element
12/16/2004US20040250773 Semiconductor film formation device
12/16/2004US20040250764 Method and apparatus for production of high purity silicon
12/16/2004US20040250753 Method for forming carbon nanotubes with post-treatment step
12/16/2004US20040250752 Heteroatomic single-crystal layers
12/15/2004EP1330846A4 Electrode and electron emission applications for n-type doped nanocrystalline materials
12/15/2004EP1230448A4 Patterned carbon nanotubes
12/15/2004EP1218572B1 Method and apparatus for growing silicon carbide crystals
12/15/2004EP1105549A4 High throughput organometallic vapor phase epitaxy (omvpe) apparatus
12/15/2004EP0988407B9 Method for producing coated workpieces, which are coated with an epitactic layer
12/15/2004CN1180483C Si Ge C semiconductor crystal and production method thereof
12/15/2004CN1180135C Method for preparing gallium nitride crystal
12/14/2004US6830618 Manufacturing method for producing silicon carbide crystal using source gases and apparatus for the same
12/09/2004WO2004106596A1 Single crystal of silicon carbide, and method and apparatus for producing the same
12/09/2004WO2004084275A3 Method for making group iii nitride devices and devices produced thereby
12/09/2004US20040249006 Porous material formation by chemical vapor deposition onto colloidal crystal templates
12/09/2004US20040248743 Method of producing biaxially textured buffer layers and related articles, devices and systems
12/09/2004US20040247947 comprises sapphire single crystal substrate and contoured/flat underfilm; usable for semiconductor films constituting light-emitting diode or high velocity integrated circuit chip
12/08/2004EP1484794A1 A method for fabricating a carrier substrate
12/08/2004EP1483786A1 Method and resulting structure for manufacturing semiconductor substrate
12/08/2004EP1483782A1 Production method of sic monitor wafer
12/08/2004CN1553523A Semiconductor device and semiconductor substrate
12/07/2004US6829270 Nitride III-V compound semiconductor substrate, its manufacturing method, manufacturing method of a semiconductor light emitting device, and manufacturing method of a semiconductor device
12/07/2004US6828182 Epitaxial thin film forming method
12/07/2004CA2311132C Gan single crystalline substrate and method of producing the same
12/07/2004CA2139551C Process for crystal growth of iii-v group compound semiconductor
12/02/2004WO2004105108A2 Manufacturing gallium nitride substrates by lateral overgrowth through masks and devices fabricated thereof
12/02/2004WO2004105098A2 P-type group ii-vi semiconductor compounds
12/02/2004WO2004104275A1 Electromagnetic rotation of platter
12/02/2004WO2004104274A2 Zinc oxide crystal growth substrate
12/02/2004WO2004082003A3 Apparatuses and methods for forming a substantially facet-free epitaxial film
12/02/2004WO2004019391A3 Semiconductor heterostructures having reduced dislocation pile-ups and related methods
12/02/2004US20040241992 Silicon monocrystal wafer processing device, and method of manufacturing silicon monocrystal wafer and silicon epitaxial wafer
12/02/2004US20040241975 Method of fabricating heteroepitaxial microstructures
12/02/2004US20040241966 Semiconductor crystal producing method
12/02/2004US20040237881 Methods for epitaxial silicon growth
12/02/2004DE10321305A1 Production of highly conducting tear-free gallium nitride-based buffer layers used in production of illuminating diodes comprises using a group III nitride buffer layer with a silicon nitride layer, and doping with a donator
12/02/2004DE10320133A1 Einkristalline Diamantschicht und Verfahren zu ihrer Herstellung Single-crystalline diamond layer and methods for their preparation
12/01/2004EP1482549A1 Microstructure and its method of fabrication
12/01/2004EP1481117A1 Method and device for depositing semi-conductor layers
12/01/2004CN1551932A Susceptor with epitaxial growth control devices and epitaxial reactor using the same
12/01/2004CN1551824A Free-standing (Al, Ga, In)N and parting method for forming same
11/2004
11/30/2004US6824753 Aerosolizing organoboron precursor; introducing carrier gas into chamber to forming a combined gas stream; sweeping into heated furnace; injecting nitriding agent to form powder of boron-nitrogen-oxygen-carbon-hydrogen; collecting
1 ... 56 57 58 59 60 61 62 63 64 65 66 67 68 69 70 71 72 73 74 75 76 ... 134