Patents for C30B 25 - Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth (13,302)
03/2006
03/09/2006US20060048700 Method for achieving device-quality, lattice-mismatched, heteroepitaxial active layers
03/08/2006EP1632591A1 Silicon epitaxial wafer, and silicon epitaxial wafer producing method
03/08/2006EP1632590A2 Thick single crystal diamond layer method for making it and gemstones produced from the layer
03/08/2006EP1631986A1 A method of preparation of an epitaxial substrate
03/08/2006EP1631703A1 Electromagnetic rotation of platter
03/08/2006EP1130137B1 Material for raising single crystal sic and method of preparing single crystal sic
03/07/2006US7008906 Oxide high-critical temperature superconductor acicular crystal and its production method
03/07/2006US7008881 Method for forming silicon epitaxial layer
03/07/2006US7008864 Method of depositing high-quality SiGe on SiGe substrates
03/07/2006US7007822 Chemical mix and delivery systems and methods thereof
03/02/2006WO2005065143A3 Isotopically pure silicon-on-insulator wafers and method of making same
03/02/2006US20060046511 Porous substrate and its manufacturing method, and gan semiconductor multilayer substrate and its manufacturing method
03/02/2006US20060046325 Group III nitride semiconductor substrate and its manufacturing method
03/02/2006US20060042542 Method of producing silicon-germanium-on-insulator material using unstrained Ge-containing source layers
03/02/2006US20060042541 Method for preparation of ferroelectric single crystal film structure using deposition method
03/01/2006EP1630878A2 GaN semiconductor substrate and semiconductor device manufactured by epitaxial growth on the GaN semiconductor substrate
03/01/2006EP1630261A2 Substrate holder for a vapour deposition system
03/01/2006EP1630260A2 Magnetic latch for a vapour deposition system
03/01/2006CN1741258A Process for growing high crystalline quality zinc oxide thin film on silicon substrate under low temperature
03/01/2006CN1740406A Nanometer silicon wire structure and its growth process
03/01/2006CN1243856C Vacuum system for the growth of semiconductor substrate crystalline material
03/01/2006CN1243855C Single crystal diamond prepared by CVD
02/2006
02/28/2006US7005391 Method of manufacturing inorganic nanotube
02/23/2006WO2006018101A1 Method for production of reactors for the decomposition of gases
02/23/2006US20060040477 Method and apparatus for forming expitaxial layers
02/23/2006DE102005038873A1 Vielkammer-MOCVD-Aufwachsvorrichtung für hohe Geschwindigkeit/ hohen Durchsatz Multi-chamber MOCVD growth apparatus for high speed / high throughput
02/22/2006EP1627940A1 Method for producing single crystal of multi- element oxide single crystal containing bismuth as constituting element
02/22/2006CN2760057Y Vacuum tube type reaction unit for controllable growth of nano material
02/22/2006CN1243136C Deposition method of seed-crystal-free and bias-less diamond quasi-monocrystal film
02/21/2006US7001791 GaN growth on Si using ZnO buffer layer
02/21/2006US7001460 Semiconductor element and its manufacturing method
02/21/2006US7001459 Spinel-structured metal oxide on a substrate and method of making same by molecular beam epitaxy
02/21/2006US7000636 Valve assemblies for use with a reactive precursor in semiconductor processing
02/16/2006WO2006016739A1 Method of fabricating strained thin film semiconductor layer
02/16/2006WO2005048297A3 Nanostructures including a metal
02/16/2006US20060035438 Method and resulting structure for manufacturing semiconductor substrates
02/16/2006US20060035035 Film forming method and film forming apparatus
02/16/2006US20060032848 Process and system for heating semiconductor substrates in a processing chamber containing a susceptor
02/16/2006US20060032433 Rapid X-ray diffraction method for structural analysis of a nano material on a surface or at an interface and for structural analysis of a solid/liquid interface, and apparatus used for the method
02/16/2006US20060032432 Bulk single crystal gallium nitride and method of making same
02/15/2006EP1625612A2 Manufacturing gallium nitride substrates by lateral overgrowth through masks and devices fabricated thereof
02/15/2006CN2758969Y Flat electrode structure
02/15/2006CN1734718A Compound semiconductor substrate and its production method
02/09/2006WO2006015185A2 GaInP/GaAs/Si TRIPLE JUNCTION SOLAR CELL ENABLED BY WAFER BONDING AND LAYER TRANSFER
02/09/2006WO2006014472A1 Iii-nitride materials including low dislocation densities and methods associated with the same
02/09/2006WO2006013344A1 Manufacture of cadmium mercury telluride on patterned silicon
02/09/2006US20060030133 Relaxed, low-defect SGOI for strained Si CMOS applications
02/09/2006US20060029832 High surface quality GaN wafer and method of fabricating same
02/09/2006US20060029792 Process for manufacturing self-assembled nanoparticles
02/09/2006US20060027162 Crystallization apparatus, crystallization method, and phase modulation device
02/09/2006US20060027161 Method for heat-treating silicon wafer and silicon wafer
02/09/2006DE102004034667A1 Producing synthetic diamond particles comprises exposing hydrogen and fluidized carbon seed particles to an energy source
02/09/2006CA2569832A1 Manufacture of cadmium mercury telluride on patterned silicon
02/08/2006EP1624095A2 Nitride semiconductor single-crystal substrate and method of its synthesis
02/08/2006EP1623454A2 Reactor surface passivation through chemical deactivation
02/08/2006CN1731561A Method for preparing Poly-SiGe film
02/07/2006US6995396 Semiconductor substrate, semiconductor device and method for fabricating the same
02/07/2006US6995077 Epitaxially coated semiconductor wafer and process for producing it
02/07/2006US6994751 Nitride-based semiconductor element and method of forming nitride-based semiconductor
02/07/2006US6994750 Film evaluating method, temperature measuring method, and semiconductor device manufacturing method
02/02/2006WO2005007937A3 Annealing single crystal chemical vapor deposition diamonds
02/02/2006WO2005007935A3 Tough diamonds and method of making thereof
02/02/2006US20060022308 Group III-V compound semiconductor and method for producing the same
02/02/2006US20060022191 Nanostructure, electronic device having such nanostructure and method of preparing nanostructures
02/02/2006US20060021565 GaInP / GaAs / Si triple junction solar cell enabled by wafer bonding and layer transfer
02/02/2006US20060021564 Nanostructures produced by phase-separation during growth of (iii-v )1-x(iv2)x alloys
02/01/2006EP1620583A1 Semiconductor substrate, semiconductor device, light emitting diode and producing method therefor
02/01/2006EP1620294A2 Chemical vapor deposition epitaxial growth
02/01/2006EP1290251B8 Thick single crystal diamond layer method for making it and gemstones produced from the layer
02/01/2006CN1729317A Method for forming carbon nanotubes
02/01/2006CN1727524A Method for preparing needle shaped Nano ZnO line under low temperature without catalyst
01/2006
01/31/2006US6992321 Structure and method for fabricating semiconductor structures and devices utilizing piezoelectric materials
01/31/2006US6991959 Method of manufacturing silicon carbide film
01/26/2006WO2004081987A3 Sige rectification process
01/26/2006US20060019470 Directionally controlled growth of nanowhiskers
01/26/2006US20060016388 Domain epitaxy for thin film growth
01/26/2006US20060016387 Silicon wafer, its manufacturing method, and its manufacturing apparatus
01/25/2006EP1619276A2 Homoepitaxial growth of SiC on low off-axis SiC wafers
01/25/2006CN1725444A Epitaxial growing lanthanum aluminate film material on silicon substrate and preparation method
01/25/2006CN1238576C Baseless reactor for growing epitaxial layers by chemical vapor deposition
01/24/2006US6990156 Frequency offset estimation for communication systems method and device for inter symbol interference
01/24/2006US6989287 Method for producing nitride semiconductor, semiconductor wafer and semiconductor device
01/24/2006US6989202 comprises sapphire single crystal substrate and contoured/flat underfilm; usable for semiconductor films constituting light-emitting diode or high velocity integrated circuit chip
01/24/2006US6989058 Use of thin SOI to inhibit relaxation of SiGe layers
01/19/2006WO2006007156A1 Fabrication of crystalline materials over substrates
01/19/2006WO2006005637A1 Method for the deposition of layers containing silicon and germanium
01/19/2006US20060012010 Epitaxial growing method and substrate for epitaxial growth
01/19/2006US20060011131 SiC material, semiconductor device fabricating system and SiC material forming method
01/19/2006US20060011130 Methods of growing epitaxial silicon
01/19/2006US20060011129 Method for fabricating a compound semiconductor epitaxial wafer
01/19/2006US20060011128 Homoepitaxial growth of SiC on low off-axis SiC wafers
01/18/2006CN1723303A A substrate for epitaxy and a method of preparing the same
01/18/2006CN1723302A A substrate for epitaxy and a method of preparing the same
01/18/2006CN1722367A A method of manufacturing a semiconductor wafer
01/18/2006CN1237577C Method for producing gallium nitride film semiconductor and colligation production method
01/18/2006CN1237575C Method for producing Si1 Ge film on silicon substrate
01/17/2006US6987072 Method of producing semiconductor crystal
01/17/2006US6986955 Electronic and optical materials
01/12/2006WO2006003381A1 Deposition technique for producing high quality compound semiconductor materials
01/12/2006US20060009362 Single crystalline base thin film
1 ... 46 47 48 49 50 51 52 53 54 55 56 57 58 59 60 61 62 63 64 65 66 ... 134