Patents for C30B 25 - Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth (13,302)
04/2006
04/25/2006US7033439 Apparatus for fabricating a III-V nitride film and a method for fabricating the same
04/25/2006US7033438 Growth of a single-crystal region of a III-V compound on a single-crystal silicon substrate
04/25/2006US7033437 Method for making semiconductor device including band-engineered superlattice
04/25/2006US7033436 Crystal growth method for nitride semiconductor and formation method for semiconductor device
04/25/2006US7033435 Process for preparing p-n junctions having a p-type ZnO film
04/25/2006US7033434 Mask for crystallizing, method of crystallizing amorphous silicon and method of manufacturing array substrate using the same
04/20/2006US20060081187 Susceptor system
04/20/2006DE102005048680A1 Trimethylgallium, Verfahren zur Herstellung desselben und aus dem Trimethylgallium gezüchteter Galliumnitriddünnfilm Trimethylgallium, method for producing the same and bred from the trimethylgallium Galliumnitriddünnfilm
04/19/2006EP0954948A4 Model based temperature controller for semiconductor thermal processors
04/18/2006US7030037 Atomic layer deposition apparatus and method
04/18/2006US7029977 Fabrication method of semiconductor wafer
04/18/2006US7029940 Ammonia for use in manufacture of GaN-type compound semiconductor and method for manufacturing GaN-type compound semiconductor
04/18/2006US7029928 Real-time detection mechanism with self-calibrated steps for the hardware baseline to detect the malfunction of liquid vaporization system in AMAT TEOS-based Dxz chamber
04/13/2006WO2006039715A1 Semiconductor devices having bonded interfaces and methods for making the same
04/13/2006WO2006039065A2 Method of growing group iii nitride crystals
04/13/2006US20060079090 Method for depositing nanolaminate thin films on sensitive surfaces
04/13/2006US20060079073 Fabrication method of nitride semiconductors and nitride semiconductor structure fabricated thereby
04/13/2006US20060076559 Method of fabricating an epitaxially grown layer
04/13/2006US20060075959 Trimethylgallium, a method for producing the same and a gallium nitride thin film grown from the trimethylgallium
04/13/2006US20060075958 Low basal plane dislocation bulk grown SiC wafers
04/13/2006US20060075957 Annealed wafer and anneald wafer manufacturing method
04/13/2006DE10125929B4 Verfahren zur Herstellung eines Nb3Al-supraleitenden Mehrfaserdrahtes A method for producing a Nb3Al superconducting multifilamentary wire
04/13/2006DE10048203B4 Verbundwerkstoff und Verfahren zu seiner Herstellung Composite material and process for its preparation
04/12/2006EP1646077A1 Nitride semiconductor element and method for manufacturing thereof
04/12/2006EP1645656A1 Organometallic compounds suitable for use in vapor deposition processes
04/11/2006US7026228 Methods of fabricating devices and semiconductor layers comprising cadmium mercury telluride, mercury telluride, and cadmium telluride
04/11/2006US7026219 Integration of high k gate dielectric
04/11/2006US7026179 Method of manufacturing a semiconductor light emitting device utilizing a nitride III-V compound semiconductor substrate
04/11/2006US7026169 Method of forming PZT ferroelectric film
04/11/2006US7025826 Depositing amorphous material on substrate; ion beam bombardement with oxygen; high temperature superconductors
04/06/2006US20060073978 Method and apparatus for making continuous films of a single crystal material
04/06/2006US20060071165 Bulk synthesis of long nanotubes of transition metal chalcogenides
04/06/2006DE19963283B4 Verfahren zur Herstellung eines GaN-Verbindungshalbleiters A method of making a GaN compound semiconductor
04/05/2006EP1643544A1 Method for producing silicon epitaxial wafer and silicon epitaxial wafer
04/05/2006EP1642865A1 Nano-fiber or nano-tube comprising v group transition metal dichalcogenide crystals, and method for preparation thereof
04/05/2006EP1642327A2 METHOD FOR GROWING SINGLE CRYSTAL GaN ON SILICON
04/05/2006EP1397835B1 Method of controlling the crystal orientation of a composite structure
04/05/2006CN1249780C Method for growing GaN crystal chip and GaN crystal chip
04/05/2006CN1248959C Carbon nano pipe array growth method
04/04/2006US7023025 Crystal growth method of nitride semiconductor
04/04/2006US7022593 SiGe rectification process
04/04/2006US7022545 Production method of SiC monitor wafer
04/04/2006US7022191 Method of crystallizing amorphous silicon layer and crystallizing apparatus thereof
04/04/2006US7022184 Atomic layer CVD
04/04/2006US7021238 Molecular beam epitaxy equipment
03/2006
03/30/2006US20060068992 Method for growing thin oxide films
03/30/2006US20060065187 Ultratough CVD single crystal diamond and three dimensional growth thereof
03/30/2006US20060065186 Process for producing crystalline thin film
03/30/2006US20060065185 Crystallization apparatus, crystallization method, and phase shifter
03/30/2006DE10043587B4 Verfahren zur Herstellung eines Substrats, nach diesem Verfahren hergestelltes Substrat A method for producing a substrate, prepared by this process substrate
03/29/2006EP1641051A2 Growth of III-nitride light-emitting devices on textured substrates
03/29/2006EP1640481A1 rotatable substrate holder
03/29/2006EP1639157A1 Method of synthesising a crystalline material and material thus obtained
03/29/2006EP1404903B1 Process chamber with a base with sectionally different rotational drive and layer deposition method in such a process chamber
03/29/2006CN1248288C Methods of fabricating gallium nitride semiconductor layers and related structure method
03/29/2006CN1247833C Silicon epitaxial wafer and its manufacturing method
03/28/2006US7018912 Fabrication method of nitride semiconductors and nitride semiconductor structure fabricated thereby
03/28/2006US7018728 Single crystal substrate having formed thereon a boron-phosphide (BP)-based semiconductor layer having p-type or n-type electrical conductivity or high resistance; light emitting diodes
03/28/2006US7018597 High resistivity silicon carbide single crystal
03/28/2006US7018478 Method of growing a thin film onto a substrate
03/28/2006US7018469 Atomic layer deposition methods of forming silicon dioxide comprising layers
03/28/2006US7017652 Method and apparatus for transferring heat from a substrate to a chuck
03/23/2006US20060060132 Production method for thin-film crystal wafer, semiconductor device using it and production method therefor
03/23/2006US20060060131 Method of forming a rare-earth dielectric layer
03/22/2006EP1636807A2 Method of producing biaxially textured buffer layers and related articles, devices and systems
03/22/2006EP1636404A1 System for growing silicon carbide crystals
03/22/2006CN1748862A Process for preparing carbon nano tube and carbon onion by Ni/Al catalyst chemical gas phase deposition
03/22/2006CN1246887C Plasma processing device and semiconductor mfg. device
03/22/2006CN1246508C Metal organic compound vapor deposition device for the growth of zinc oxide semiconductor film
03/21/2006US7015515 Group III nitride compound semiconductor device having a superlattice structure
03/21/2006US7015422 System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy
03/21/2006US7014830 Method for mass-producing carbon nanocoils
03/21/2006US7014710 Method of growing single crystal Gallium Nitride on silicon substrate
03/21/2006US7014709 Thin layer metal chemical vapor deposition
03/21/2006US7014708 Method of forming a thin film transistor by utilizing a laser crystallization process
03/21/2006US7014703 Method for annealing group IIA metal fluoride crystals
03/16/2006WO2006028868A2 Method and apparatus for growth of multi-component single crystals
03/16/2006US20060057800 Methods for treating pluralities of discrete semiconductor substrates
03/16/2006US20060057749 Template type substrate and a method of preparing the same
03/16/2006US20060054936 Nanosensors
03/16/2006US20060054091 Support system for a treatment apparatus
03/16/2006US20060054079 Forming structures by laser deposition
03/16/2006US20060054076 Phosphor single crystal substrate and method for preparing the same, and nitride semiconductor component using the same
03/16/2006US20060054075 Substrate for epitaxy and method of preparing the same
03/16/2006DE10303875B4 Struktur, insbesondere Halbleiterstruktur, sowie Verfahren zur Herstellung einer Struktur Structure, in particular semiconductor structure, as well as methods for manufacturing a structure
03/16/2006DE102004038573A1 Epitaxially growing thick tear-free group III nitride semiconductor layers used in the production of modern opto-electronic and electronic components comprises using an aluminum-containing group III nitride intermediate layer
03/15/2006EP1635383A2 Compound semiconductor device epitaxial growth substrate, semiconductor device, and manufacturing method thereof
03/15/2006EP1634321A2 Phase controlled sublimation
03/15/2006EP1633911A2 Method of forming a layer of silicon carbide on a silicon wafer
03/15/2006EP1305161A4 Electronic and optical materials
03/15/2006CN1748290A Gallium nitride crystal, homoepitaxial gallium-nitride-based devices and method for producing same
03/14/2006US7012318 Oxygen-doped n-type gallium nitride freestanding single crystal substrate
03/14/2006US7011711 Chemical vapor deposition reactor
03/14/2006US7011707 Production method for semiconductor substrate and semiconductor element
03/14/2006US7011706 Device substrate and method for producing device substrate
03/09/2006WO2006025593A2 Growth of nitride semiconductor crystals
03/09/2006US20060051554 To be used for growth of a nitride semiconductor on a sapphire substrate
03/09/2006US20060051280 Carbide nanofribrils and method of making same
03/09/2006US20060048702 Method for manufacturing a silicon structure
03/09/2006US20060048701 Method of growing group III nitride crystals
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