Patents for C30B 25 - Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth (13,302)
06/2006
06/07/2006EP1664394A2 Ultrahard diamonds and method of making thereof
06/07/2006EP1664393A2 Methods of processing of gallium nitride
06/07/2006EP1664375A2 Precursor delivery system
06/07/2006EP1664373A2 Annealing single crystal chemical vapor deposition diamonds
06/07/2006EP1663866A2 Tough diamonds and method of making thereof
06/07/2006EP1086355B1 Ellipsometric method and control device for making a thin-layered component
06/07/2006CN1784515A Semiconductor substrate,semiconductor device,light emitting diode and producing method therefor
06/07/2006CN1782142A Wafer guide, MOCVD equipment, and nitride semiconductor growth method
06/07/2006CN1258807C Heat treatment equipment and semiconductor device manufacture method
06/06/2006US7057204 III-V group nitride system semiconductor substrate
06/06/2006US7056383 Tantalum based crucible
06/06/2006US7056382 Excimer laser crystallization of amorphous silicon film
06/01/2006WO2006057826A2 Topotactic anion exchange oxide films and method of producing the same
06/01/2006WO2006057659A1 Growth of carbon nanotubes at low temperature on a transition metal layer
06/01/2006US20060112874 Highly-oriented diamond film, method for manufacturing the same, and electronic device having highly-oriented diamond film
05/2006
05/31/2006EP1662023A1 Method of coating for diamond electrode
05/31/2006EP1661239A2 Method and apparatus for bi-planar backward wave oscillator
05/31/2006EP1660702A1 A method of fabricating an epitaxially grown layer
05/31/2006EP1660697A1 Alkyl push flow for vertical flow rotating disk reactors
05/31/2006EP1221177B1 Conformal lining layers for damascene metallization
05/31/2006CN1780936A Process and apparatus for depositing semiconductor layers using two process gases, one of which is preconditioned
05/31/2006CN1258005C Method of preparing oxide film by molecular beam epitaxy
05/31/2006CN1258000C Chemical raw material dispensing system
05/30/2006US7052979 Production method for semiconductor crystal and semiconductor luminous element
05/30/2006US7052547 Apparatus for supplying raw material
05/30/2006US7052546 High-purity crystal growth
05/25/2006US20060107891 Topotactic anion exchange oxide films and method of producing the same
05/25/2006US20060107890 One hundred millimeter single crystal silicon carbide wafer
05/24/2006EP1659198A1 Single crystal of silicon carbide, and method and apparatus for producing the same
05/24/2006EP1658394A1 Method to manufacture indium nitride quantum dots
05/24/2006EP0830218B1 Structures having enhanced biaxial texture and method of fabricating same
05/24/2006CN1777707A Support system for treating device
05/24/2006CN1777696A Methods and apparatus for atomic layer deposition
05/23/2006US7049627 Semiconductor heterostructures and related methods
05/23/2006US7049212 Method for producing III-IV group compound semiconductor layer, method for producing semiconductor light emitting element, and vapor phase growing apparatus
05/23/2006US7049154 Vapor phase growth method by controlling the heat output in the gas introduction region
05/23/2006US7048967 Organic film vapor deposition method and a scintillator panel
05/23/2006US7048802 CVD reactor with graphite-foam insulated, tubular susceptor
05/18/2006US20060102068 Reduction of subsurface damage in the production of bulk SiC crystals
05/18/2006US20060102067 Organic light emitting display with single crystalline silicon TFT and method of fabricating the same
05/18/2006DE10346368B4 Verfahren und Herstellungsanlage zum Herstellen eines schichtartigen Bauteils Processes and manufacturing plant for the production of a layer-like part
05/17/2006EP1657744A2 Wafer guide, MOCVD equipment, and nitride semiconductor growth method
05/17/2006EP1657740A1 Silicon carbide epitaxial wafer, method for producing such wafer, and semiconductor device formed on such wafer
05/17/2006CN1774794A Susceptor and vapor growth device
05/17/2006CN1774523A Volatile copper(I) complexes for deposition of copper films by atomic layer deposition
05/17/2006CN1772975A Process for Li doping growing P type ZnO Single Crystal film
05/16/2006US7045808 III-V nitride semiconductor substrate and its production lot, and III-V nitride semiconductor device and its production method
05/16/2006US7045009 Method and apparatus for manufacturing single crystal
05/11/2006WO2005095263A3 Methods of forming alpha and beta tantalum films with controlled and new microstructures
05/11/2006US20060099781 Method for producing by vapour-phase epitaxy a gallium nitride film with low defect density
05/11/2006US20060097353 Oxygen doping method to gallium nitride single crystal substrate and oxygen-doped n-type gallium nitride freestanding single crystal substrate
05/11/2006US20060096524 Crystal growth method for nitride semiconductor and formation method for semiconductor device
05/11/2006DE102004053307A1 Mehrschichtenstruktur umfassend ein Substrat und eine darauf heteroepitaktisch abgeschiedene Schicht aus Silicium und Germanium und ein Verfahren zu deren Herstellung Multilayered structure comprising a substrate and a heteroepitaxial layer deposited from silicon and germanium, and a process for their preparation
05/10/2006EP1655766A1 Substrate for nitride semiconductor growth
05/10/2006EP1654754A1 Gas-supply assembly, in particular for a cvd process reactor for growing an epitaxial layer
05/10/2006EP1654752A2 Holder for supporting wafers during semiconductor manufacture
05/10/2006CN1771356A CVD diamond in wear applications
05/10/2006CN1769546A Method for developping directionally aligning carbon nanometer tube array on silicon substrate
05/10/2006CN1769545A Method for developping directionally aligning zinc oxide nanometer rod array on silicon substrate
05/10/2006CN1255583C Method for producing gallium nitride
05/10/2006CN1255582C Reaction chamber for an epitaxial reactor
05/09/2006US7042141 An epitaxial crystal thin film on a substrate, having formula Pb1-xLnxZryTi1-yO3, ( Ln represents any one selected from the group consisting of lanthanum, lanthanoid elements, niobium, calcium, barium, strontium, iron, manganese and tin)
05/09/2006US7041170 Method of producing high quality relaxed silicon germanium layers
05/04/2006WO2005081283A3 Substrate support system for reduced autodoping and backside deposition
05/04/2006US20060091393 Isotopically pure silicon-on-insulator wafers and methods of making same
05/04/2006US20060090694 Method for atomic layer deposition (ALD) of silicon oxide film
05/04/2006US20060090693 Selective growth of ZnO nanostructure using a patterned ALD ZnO seed layer
05/04/2006US20060090692 Generating nano-particles for chemical mechanical planarization
05/04/2006US20060090691 Method for manufacturing bonded wafer with ultra-thin single crystal ferroelectric film
05/04/2006US20060090690 Method of purifying alkaline-earth and alkali-earth halides for crystal growth
05/03/2006EP1653502A1 Semiconductor layer
05/03/2006EP1651802A1 Support system for treatment apparatuses
05/03/2006EP1423558B1 Susceptor with epitaxial growth control devices and epitaxial reactor using the same
05/03/2006CN1768167A Substrate for forming magnetic garnet single-crystal film, process for producing the same, optical device and process for producing the same
05/03/2006CN1254567C Single-slice three-chambers type infrared heating superhigh vacuum CVD epitaxial system
05/02/2006US7038299 Selective synthesis of semiconducting carbon nanotubes
05/02/2006US7037574 Atomic layer deposition for fabricating thin films
05/02/2006US7037372 Method of growing a thin film onto a substrate
05/02/2006US7037370 Free-standing diamond structures and methods
04/2006
04/27/2006WO2006043780A1 Diamond shell with a geometrical figure and method for fabrication thereof
04/27/2006US20060089007 In situ deposition of a low K dielectric layer, barrier layer, etch stop, and anti-reflective coating for damascene application
04/27/2006US20060086314 Iridium oxide nanowires and method for forming same
04/27/2006US20060086313 Soi wafer and method for manufacturing same
04/26/2006EP1650788A1 Vapor deposition apparatus and vapor deposition method
04/26/2006EP1649500A2 Method and structure of strain control of sige based photodetectors and modulators
04/26/2006EP1649499A2 Silicon crystallization using self-assembled monolayers
04/26/2006EP1649495A2 Epitaxial growth of relaxed silicon germanium layers
04/26/2006EP1649076A2 Apparatus and method for chemical source vapor pressure control
04/26/2006EP1493175B1 Gas driven planetary rotation apparatus and methods for forming silicon carbide layers
04/26/2006EP1440180B1 Method and device for depositing especially crystalline layers onto especially crystalline substrates
04/26/2006CN1763913A Substrate processing apparatus and substrate processing method
04/26/2006CN1763268A Growth control method for A-plane and M-plane GaN film material
04/26/2006CN1763267A Preparation method for large-particle monocrystal diamond by DC plasma sedimentation
04/26/2006CN1763049A Trimethylgallium, a method for producing the same and a gallium nitride thin film grown from the trimethylgallium
04/26/2006CN1253611C Process for preparing monocrystal membrane of Gallium nitride
04/25/2006US7033938 Method of making a long wavelength indium gallium arsenide nitride (InGaAsN) active region
04/25/2006US7033922 Method and system for controlling the presence of fluorine in refractory metal layers
04/25/2006US7033921 Method and device for depositing crystalline layers on crystalline substrates
04/25/2006US7033858 Method for making Group III nitride devices and devices produced thereby
04/25/2006US7033843 Semiconductor manufacturing method and semiconductor manufacturing apparatus
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