Patents for C30B 25 - Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth (13,302)
05/2007
05/30/2007EP1791170A2 Method of manufacturing a substrate, in particular for optics, electronics or optoelectronics, and substrate obtained through said method
05/30/2007EP1790757A1 Susceptor
05/30/2007EP1220320B1 Sigec semiconductor crystal and production method thereof
05/30/2007CN1972880A Method for doping material and doped material
05/30/2007CN1972879A Selective doping of a material
05/30/2007CN1318661C III-v compound crystal and method for production thereof
05/29/2007US7223306 Laser apparatus, laser irradiation method, and manufacturing method of semiconductor device
05/24/2007WO2007057519A1 Ald reactor
05/24/2007WO2007057518A1 Arrangement in connection with ald reactor
05/24/2007WO2007018555B1 Ultratough cvd single crystal diamond and three dimensional growth thereof
05/24/2007WO2007008726A3 Use of surfactants to control unintentional dopant in semiconductors
05/24/2007WO2006134194B1 Epitaxial reactor for the large-scale production of wafers
05/24/2007US20070117383 Precursor material delivery system with staging volume for atomic layer deposition
05/24/2007US20070117359 Deposition of amorphous silicon-containing films
05/24/2007US20070117358 Epitaxy layer and method of forming the same
05/24/2007US20070117357 Method of manufacturing a semiconductor light emitting device, semiconductor light emitting device, method of manufacturing a semiconductor device, semiconductor device, method of manufacturing a device, and device
05/24/2007US20070117356 Method of manufacturing single crystalline gallium nitride thick film
05/24/2007US20070114566 METHOD FOR MAKING FREE-STANDING AlGaN WAFER, WAFER PRODUCED THEREBY, AND ASSOCIATED METHODS AND DEVICES USING THE WAFER
05/23/2007EP1788126A1 Method of manufacturing single crystalline gallium nitride thick film
05/22/2007US7221037 Method of manufacturing group III nitride substrate and semiconductor device
05/22/2007US7220673 Method for depositing tungsten-containing layers by vapor deposition techniques
05/22/2007US7220658 Growth of reduced dislocation density non-polar gallium nitride by hydride vapor phase epitaxy
05/22/2007US7220315 Method of producing polycrystalline thin film and method of producing an oxide superconducting element
05/22/2007US7220314 Single crystalline aluminum nitride film, method of forming the same, base substrate for group III element nitride film, light emitting device and surface acoustic wave device
05/22/2007US7220313 Reducing nitrogen content in silicon carbide crystals by sublimation growth in a hydrogen-containing ambient
05/22/2007US7220312 Methods for treating semiconductor substrates
05/22/2007US7220310 Nanoscale junction arrays and methods for making same
05/22/2007CA2294715C Apparatus and method for nucleation and deposition of diamond using hot-filament dc plasma
05/17/2007US20070111498 Method of fabricating n-type semiconductor diamond, and semiconductor diamond
05/17/2007US20070108450 Reduction of carrot defects in silicon carbide epitaxy
05/17/2007US20070107654 High-purity crystal growth
05/17/2007US20070107653 Vapor phase growth apparatus and method of fabricating epitaxial wafer
05/16/2007EP1784529A1 Manufacture of cadmium mercury telluride on patterned silicon
05/16/2007EP1784369A1 Selective doping of a material
05/16/2007EP1456436B1 Method for producing particles with diamond structure
05/16/2007CN1965390A Epitaxially growing equipment
05/16/2007CN1965111A Manufacture of cadmium mercury telluride
05/16/2007CN1316567C Preparation of green light gallium nitride base LED epitaxial wafer by adopting multiquantum well
05/16/2007CN1316077C Technology for continuous producing four-feet shape zine oxide whisker and rotating furnace thereof
05/15/2007US7217324 Method and device for producing an electronic GaAs detector for x-ray detection for imaging
05/15/2007US7217323 Equipment and method for manufacturing silicon carbide single crystal
05/15/2007US7217322 Method of fabricating an epitaxial silicon-germanium layer and an integrated semiconductor device comprising an epitaxial arsenic in-situ doped silicon-germanium layer
05/10/2007US20070105351 GaN single crystal substrate and method of making the same
05/10/2007US20070105349 Epitaxial semiconductor structures having reduced stacking fault nucleation sites
05/10/2007US20070105305 Method to form large grain size polysilicon films by nuclei-induced solid phase crystallization
05/10/2007US20070102790 Process for deposition of semiconductor films
05/10/2007US20070102709 P-type group ii-vi semiconductor compounds
05/10/2007US20070102111 Controlled nanotube fabrication and uses
05/10/2007US20070101931 Method for producing semiconductor crystal
05/10/2007US20070101930 Feature forming methods to reduce stacking fault nucleation sites
05/10/2007US20070101928 Method of forming a layer of silicon carbide on a silicon wafer
05/09/2007EP1783250A2 Semiconductor material, production method thereof and semiconductor device
05/09/2007EP1782457A2 Growth of nitride semiconductor crystals
05/09/2007CN1961100A Directionally controlled growth of nanowhiskers
05/09/2007CN1958887A Single crystalline A-plane nitride semiconductor wafer having orientation flat
05/09/2007CN1958879A Method for carrying out epitaxial growth of single crystal film of nitride by using mask in situ
05/09/2007CN1958878A Method of using film formation apparatus
05/09/2007CN1958877A Periodic monocrystalline Nano structure of castellated ZnO, preparation method
05/09/2007CN1958841A Growth of very uniform silicon carbide epitaxial layers
05/08/2007US7215411 Method of exposing wafer using scan-type exposure apparatus
05/08/2007US7214598 Formation of lattice-tuning semiconductor substrates
05/08/2007US7214412 Magenta toner and method for producing same
05/08/2007US7214271 Silicon single crystal wafer process apparatus, silicon single crystal wafer, and manufacturing method of silicon epitaxial wafer
05/03/2007US20070096321 Conformal lining layers for damascene metallization
05/03/2007US20070095276 Synthesis of fibers of inorganic materials using low-melting metals
05/03/2007DE102006043991A1 Production of a semiconductor especially a semiconductor laser comprises placing a substrate on a satellite and forming a thin alloy semiconductor layer on the substrate whilst thermal energy is fed to the substrate through the satellite
05/03/2007DE10136605B4 Verfahren zum Wachsen von Galliumnitrid-Halbleitermaterial A method of growing gallium nitride semiconductor material
05/02/2007EP1780315A2 Boron doped diamond
05/02/2007EP1779411A1 Deposition technique for producing high quality compound semiconductor materials
05/02/2007EP1778897A1 Iii-nitride materials including low dislocation densities and methods associated with the same
05/02/2007EP1778890A1 Method for production of reactors for the decomposition of gases
05/02/2007CN1957446A Fabrication of crystalline materials over substrates
05/02/2007CN1957116A Nanocrystal diamond film, process for producing the same and apparatus using nanocrystal diamond film
05/02/2007CN1956234A Perovskite type oxide material, piezoelectric element using the same, liquid discharge head and liquid discharge apparatus, and manufacturing method
05/02/2007CN1956213A Semiconductor material, production method thereof and semiconductor device
05/02/2007CN1956145A Semiconductor process chamber
05/02/2007CN1313655C Method for growing high-mobility gallium nitride epitaxial film
05/02/2007CN1313654C Method for growing high-resistance gallium nitride epitaxial film
05/02/2007CN1313653C Growth of very uniform silicon carbide external layers
05/02/2007CN1313198C Method for carrying out homogeneous and heterogeneous chemical reactions using plasma
05/01/2007US7211769 Heating chamber and method of heating a wafer
05/01/2007US7211464 Doped elongated semiconductors, growing such semiconductors, devices including such semiconductors and fabricating such devices
05/01/2007US7211337 Compound crystal and method of manufacturing same
05/01/2007US7211146 Powder metallurgy crucible for aluminum nitride crystal growth
05/01/2007US7211144 Pulsed nucleation deposition of tungsten layers
05/01/2007US7211143 Sacrificial template method of fabricating a nanotube
04/2007
04/26/2007US20070092980 Method of fabricating GaN
04/26/2007US20070092647 Boron doped diamond
04/26/2007US20070089674 Precursor material delivery system with thermal enhancements for atomic layer deposition
04/26/2007US20070089669 Apparatus and method for growth of a thin film
04/25/2007EP1777325A2 Single crystalline a-plane nitride semiconductor wafer having orientation flat
04/25/2007EP1776321A1 Method for doping material and doped material
04/25/2007CN1953154A Semiconductor processing
04/25/2007CN1312327C Silicon wafer for epitaxial growth, epitaxial wafer, and its manufacturing method
04/25/2007CN1312326C Epitaxial silicon wafer free from autodoping and backside halo
04/25/2007CN1312318C Method of manufacturing inorganic nanotube
04/24/2007US7208422 Plasma processing method
04/19/2007US20070087576 Substrate susceptor for receiving semiconductor substrates to be deposited upon
04/19/2007US20070087539 Method for manufacturing compound semiconductor epitaxial substrate
04/19/2007US20070084404 Reactor surface passivation through chemical deactivation
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