Patents for C30B 25 - Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth (13,302)
09/2007
09/13/2007US20070209578 Method for producing substrate for single crystal diamond growth
09/13/2007US20070209577 Low micropipe 100 mm silicon carbide wafer
09/13/2007US20070209576 Formation of metal oxide nanowire networks (nanowebs) of low-melting metals
09/13/2007DE102006010273A1 Production of strained layer on strain-compensated layer stacks with small defect density, comprises arranging relaxed silicon-germanium buffer layer on silicon substrate and arranging intermediate layer on relaxed buffer layer
09/12/2007EP1832672A1 Single-crystal diamond
09/12/2007EP1831437A1 Cvd reactor comprising an rf-heated treatment chamber
09/12/2007EP1660702B1 A method of fabricating an epitaxially grown layer
09/12/2007EP1633911B1 Method of forming a layer of silicon carbide on a silicon wafer
09/12/2007CN101036215A Chemical vapor deposition reactor
09/12/2007CN100337338C Semiconductor device and semiconductor substrate
09/12/2007CN100337310C Low-resistance n type semiconductor diamond and process for producing the same
09/12/2007CN100337308C GaN single crystal base, nitride type semiconductor optical growth base, nitride type semiconductor device and its producing method
09/12/2007CN100336943C Diamond single crystal composite substrate and method for manufacturing the same
09/12/2007CN100336942C Method for growing high crystal quality indium nitride single-crystal epitaxial film
09/11/2007US7269343 Heating configuration for use in thermal processing chambers
09/06/2007US20070205481 Manufacturing method for semiconductor device, semiconductor device and semiconductor wafer
09/06/2007US20070204791 Drop Tube Granulated Crystal Manufacturing Device and Granulated Crystal Manufacturing Method
09/05/2007EP1828444A2 Topotactic anion exchange oxide films and method of producing the same
09/05/2007EP1479056B1 Device for depositing thin layers with a wireless detection of process parameters
09/05/2007CN100335889C Evaporating/ feeding system for organic metal compound
09/04/2007US7265420 Semiconductor substrate layer configured for inducement of compressive or expansive force
09/04/2007US7265029 Fabrication of substrates with a useful layer of monocrystalline semiconductor material
09/04/2007US7264750 Single crystal ingot doped with Cerium, Europium, Terbium or Ytterbium; crystal face is composed of a plurality of smooth partial region surfaces
08/2007
08/29/2007EP1158077B1 Method and apparatus for producing single crystal of silicon carbide
08/29/2007CN101024895A Epitaxial wafer and method for production of epitaxial wafer
08/29/2007CN100334262C Method for producing single crystal of multi- element oxide single crystal containing bismuth as constituting element
08/28/2007US7261777 Method for fabricating an epitaxial substrate
08/28/2007US7261776 Deposition of buffer layers on textured metal surfaces
08/23/2007WO2007018555A8 Ultratough cvd single crystal diamond and three dimensional growth thereof
08/23/2007US20070197022 Manufacture Of Cadmium Mercury Telluride
08/23/2007US20070196942 Method for producing group III nitride crystal, group III nitride crystal obtained by such method, and group III nitride substrate using the same
08/23/2007US20070196743 Method for crystallizing amorphous silicon into polysilicon and mask used therefor
08/23/2007US20070193505 Apparatus and method for diamond production
08/23/2007US20070193503 Method of fabricating polycrystalline silicon plates
08/23/2007US20070193502 Method of producing fine particle-like materials, and fine particle-link materials
08/23/2007DE102006055895A1 Ätzbeständiges Heizgerät und Zusammenbau desselben The same etch-heater and Assembly
08/22/2007EP1821339A1 GaN crystal substrate and method of manufacturing the same, and method of manufacturing semiconductor device
08/22/2007EP1820887A2 Gallium nitride crystal substrate and method of producing same
08/22/2007CN1333438C Coaxial air intake for acquiring uniform wide-band gap semiconductor thin film
08/22/2007CN1333117C Method for developping directionally aligning zinc oxide nanometer rod array on silicon substrate
08/22/2007CN101023028A Ultratough cvd single crystal diamond and three dimensional growth thereof
08/21/2007US7259436 Micromechanical component and corresponding production method
08/21/2007US7259108 Methods for fabricating strained layers on semiconductor substrates
08/21/2007US7258807 Controlled growth of gallium nitride nanostructures
08/21/2007US7258743 Composite structure with a uniform crystal orientation and the method of controlling the crystal orientation of one such structure
08/21/2007US7258742 Method of manufacturing potassium niobate single crystal thin film, surface acoustic wave element, frequency filter, frequency oscillator, electronic circuit, and electronic apparatus
08/21/2007US7258741 System and method for producing synthetic diamond
08/21/2007US7258739 Process for producing epitaxial silicon wafer and silicon wafer produced by process thereof
08/16/2007WO2007091920A2 A method of growing semiconductor heterostructures based on gallium nitride
08/16/2007WO2007091638A1 Susceptor and apparatus for manufacturing epitaxial wafer
08/16/2007US20070190757 Vapor phase growth method
08/16/2007US20070190248 Thin metal films by atomic layer deposition: tungsten nucleation layer over a silicon wafer; copper film from CuCl and triethylboron; vapor phase pulses in inert gas
08/16/2007US20070187700 Method of manufacturing group III nitride substrate and semiconductor device
08/16/2007US20070186858 Susceptor
08/16/2007DE10009876B4 Verfahren zum Bilden eines einkristallinen Films A method for forming a single-crystal film
08/15/2007EP1818429A2 Method of growing single crystal GaN, method of making single crystal GaN substrate and single crystal GaN substrate
08/15/2007EP1817440A1 Method and device for the deposition of gallium nitrite layers on a sapphire substrate and associated substrate holder
08/15/2007CN1332077C Lithium niobate substrate and manufacturing method thereof
08/14/2007US7256466 Nanosensors
08/14/2007US7256110 Crystal manufacturing method
08/14/2007US7255746 Nitrogen sources for molecular beam epitaxy
08/14/2007US7255744 Low-resistivity n-type semiconductor diamond and method of its manufacture
08/09/2007US20070184567 Method for material growth of gan-based nitride layer
08/09/2007US20070183964 Nano-fiber or nano-tube comprising v group transition metal dichalcogenide crystals, and method for preparation thereof
08/09/2007US20070183960 Carbon fiber precursor fiber bundle, production method and production device therefor, and carbon fiber and production method therefor
08/09/2007US20070181057 Epitaxial deposition process and apparatus
08/08/2007EP1815042A2 Diamond coated surfaces
08/08/2007EP1358683B1 Method and device for producing an electronic gaas detector for x-ray detection for imaging
08/08/2007CN2931505Y Apparatus for eliminating slip line and high stress region in silicon gas phase epitaxial layer
08/08/2007CN1331235C N-type semiconductor diamond producing method and semiconductor diamond
08/08/2007CN1331195C Method of producing integrated semiconductor components on a semiconductor substrate
08/08/2007CN1330800C Acicular silicon crystal and process for producing the same
08/07/2007US7253499 III-V group nitride system semiconductor self-standing substrate, method of making the same and III-V group nitride system semiconductor wafer
08/07/2007CA2453922C Oxide high-critical temperature superconductor acicular crystal and method for producing the same
08/02/2007WO2007087589A2 Silicon carbide formation by alternating pulses
08/02/2007US20070175384 Method of fabricating a quasi-substarte wafer and semiconductor body fabricated using such a quasi-substarte wafer
08/01/2007EP1812618A2 Cvd doped structures
08/01/2007EP1215730B9 SiC WAFER, SiC SEMICONDUCTOR DEVICE AND PRODUCTION METHOD OF SiC WAFER
08/01/2007CN1329955C Method of preparing high quality non-polar GaN self-support substrate
08/01/2007CN1329954C Process for producing an epitaxial layer of gallium nitride and photoelectric parts including it
08/01/2007CN1329561C A substrate for epitaxy and a method of preparing the same
08/01/2007CN1329560C Method for producing by vapour-phase epitaxy a gallium nitride film with low defect density
08/01/2007CN101008080A Film-forming device
07/2007
07/31/2007US7250083 ALD method and apparatus
07/26/2007US20070170428 Thin film material and method of manufacturing the same
07/26/2007US20070169688 Method for manufacturing silicon wafer
07/26/2007US20070169687 Silicon carbide formation by alternating pulses
07/26/2007DE102006003464A1 Verfahren zur Erzeugung einer Siliciumschicht auf einer Substratoberfläche durch Gasphasenabscheidung A method for producing a silicon film on a substrate surface by vapor deposition
07/25/2007CN1328418C Process for Li doping growing P type ZnO Single Crystal film
07/25/2007CN1328417C Method for by composition cladding germanium nanometer wire
07/25/2007CN1328410C Low-pressure metal organic chemical vapour phase depositing apparatus for zinc oxide and process thereof
07/25/2007CN101006548A Deposition technique for producing high quality compound semiconductor materials
07/25/2007CN101003912A Method for synthesizing ordered array of single crystal Sic Nano filament with small diameter through heat evaporation method
07/24/2007US7247583 Manufacturing method for strained silicon wafer
07/24/2007US7247581 Methods for treating pluralities of discrete semiconductor substrates
07/24/2007US7247513 Dissociation of silicon clusters in a gas phase during chemical vapor deposition homo-epitaxial growth of silicon carbide
07/19/2007US20070163504 Vapor phase growth apparatus
07/19/2007US20070163490 Process for selective masking of iii-n layers and for the preparation of free-standing iii-n layers or of devices, and products obtained thereby
07/19/2007US20070163489 Method of forming a layer having a single crystalline structure
07/19/2007US20070163488 Method of growing oxide thin films
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