Patents for C30B 25 - Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth (13,302)
04/2008
04/23/2008CN101167190A Diamond transistor and method of manufacture thereof
04/23/2008CN101165225A IC sheet epitaxy technique
04/22/2008US7361578 Method to form large grain size polysilicon films by nuclei-induced solid phase crystallization
04/22/2008US7361222 Device and method for producing single crystals by vapor deposition
04/22/2008US7361221 Light irradiation apparatus, crystallization apparatus, crystallization method, semiconductor device and light modulation element
04/22/2008US7361220 Method of manufacturing group III nitride single crystal, device used for the method and group III nitride single crystal obtained by the method
04/17/2008WO2008045423A1 Self assembled controlled luminescent transparent conductive photonic crystals for light emitting devices
04/17/2008US20080090390 Method for producing ZnTe system compound semiconductor single crystal, ZnTe system compound semiconductor single crystal, and semiconductor device
04/17/2008US20080090386 Method for producing ZnTe system compound semiconductor single crystal, ZnTe system compound semiconductor single crystal, and semiconductor device
04/17/2008US20080090328 Method for producing ZnTe system compound semiconductor single crystal, ZnTe system compound semiconductor single crystal, and semiconductor device
04/17/2008US20080090327 Method for producing ZnTe system compound semiconductor single crystal, ZnTe system compound semiconductor single crystal, and semiconductor device
04/17/2008US20080089831 high carrier concentration and low resistivity
04/16/2008EP1673306B1 Method for the synthesis of filament structures on a nanometre scale and electronic components comprising such structures
04/16/2008EP1563121A4 Method for forming carbon nanotubes
04/16/2008CN101163818A Reactor
04/16/2008CN101163815A Source, an arrangement for installing a source, and a method for installing and removing a source
04/16/2008CN100381619C Semiconductor substrate, semiconductor device, light emitting diode and producing method therefor
04/15/2008US7358166 Relaxed, low-defect SGOI for strained Si CMOS applications
04/15/2008US7358159 Method for manufacturing ZnTe compound semiconductor single crystal ZnTe compound semiconductor single crystal, and semiconductor device
04/15/2008US7357837 GaN single crystal substrate and method of making the same
04/10/2008WO2008042590A2 Batch reaction chamber employing separate zones for radiant heating and resistive heating
04/10/2008US20080085233 Single crystal diamond
04/10/2008US20080083910 an element of III of periodic table, selected from Al, Ga and In, in a reactor for hydride vapor phase epitaxy (HVPE), a common source and/or a common feed line is/are provided in the HVPE reactor for both elements and dopant, and a halide reaction gas is introduce to form halide mixed product
04/10/2008US20080083366 Micropipe-free silicon carbide and related method of manufacture
04/10/2008DE112006000464T5 Chemischer Bedampfungs-Reaktor mit einer Vielzahl von Einlässen Chemical vapor deposition reactor comprising a plurality of inlets
04/10/2008DE102006028137B4 Verfahren zur Herstellung einer Nitrid-basierten Verbindungsschicht, eines GaN-Substrats und einer Nitrid-basierten Halbleiter-Leuchtvorrichtung mit vertikaler Struktur A method of manufacturing a nitride-based compound layer, a GaN substrate and a nitride-based semiconductor light-emitting device having a vertical structure
04/09/2008EP1907609A1 Method and reactor for growing crystals
04/09/2008EP1154049B1 Method of manufacturing single-crystal silicon carbide
04/09/2008CN101159228A Processing gas supplying mechanism, supplying method and gas processing unit
04/09/2008CN101158049A Method for preparing P-type transparent conductive oxide CuAlO2 film
04/09/2008CN100380675C High voltage micro-electronics device including GaN
04/09/2008CN100380588C Preparation method of coating of gallium nitride
04/09/2008CN100380586C Method and apparatus for manufacturing single crystal silicon carbide
04/09/2008CN100379901C III-V nitride substrate boule and its manufacturing method and use
04/09/2008CN100379678C Chemical mix and delivery systems and methods thereof
04/08/2008US7355216 Fluidic nanotubes and devices
04/08/2008US7354850 Directionally controlled growth of nanowhiskers
04/08/2008US7354622 Method for forming thin film and apparatus for forming thin film
04/08/2008US7354477 Method of growing GaN crystal, method of producing single crystal GaN substrate, and single crystal GaN substrate
04/03/2008WO2008039912A2 Retro-emission systems comprising microlens arrays and luminescent emitters
04/03/2008WO2008038084A1 Process for producing a silicon carbide substrate for microelectronic applications
04/03/2008US20080081015 First crystal by flux method; supply nitride gas into melt mixture containing metal sodium and metal gallium; crystal is sliced and polished to form wafers; growing unit grows a second crystal on a substrate formed using gallium nitride wafer; hydride vapor phase epitaxy; producing a bulked crystal.
04/03/2008US20080079024 Semiconductor heterostructures having reduced dislocation pile-ups and related methods
04/03/2008DE102006045834A1 Verfahren zum Herstellen eines Halbleitermaterials A method of manufacturing a semiconductor material
04/02/2008EP1905066A1 Structures formed in diamond
04/02/2008EP1905063A1 System for supporting and rotating a susceptor inside a treatment chamber of a water treating apparatus
04/02/2008EP1397827B1 Arrangement comprising a support body with a substrate holder mounted thereon on a gas bearing with rotating drive
04/02/2008CN100378255C Growth control method for A-plane and M-plane GaN film material
04/01/2008US7351993 Rare earth-oxides, rare earth-nitrides, rare earth-phosphides and ternary alloys with silicon
04/01/2008US7351347 Gallium-nitride deposition substrate, method of manufacturing gallium-nitride deposition substrate, and method of manufacturing gallium nitride substrate
04/01/2008CA2352985C Large-size monoatomic and monocrystalline layer, made of diamond-type carbon and device for making same
03/2008
03/27/2008WO2008035632A1 PROCESS FOR PRODUCING GaN SINGLE-CRYSTAL, GaN THIN-FILM TEMPLATE SUBSTRATE AND GaN SINGLE-CRYSTAL GROWING APPARATUS
03/27/2008US20080073645 Thin films and methods of making them
03/27/2008US20080072823 Self aligning non contact shadow ring process kit
03/27/2008US20080072819 Metal oxide films
03/27/2008US20080072818 Growing a desired portion of the nanowire, growing a sacrificial portion of the nanowire that is doped differently than the desired portion, differentially removing the sacrificial portion, and removing a growth stub from the desired portion, especially by etching
03/27/2008US20080072817 Silicon carbide single crystals with low boron content
03/27/2008US20080072816 Crystalline structure and method of fabrication thereof
03/27/2008DE102007043840A1 Wafer bearbeitende Hardware für das epitaktische Abscheiden mit reduzierter Autodotierung und weniger Störstellen auf der Rückseite Wafer machined hardware for the epitaxial deposition of reduced autodoping and less rough spots on the back
03/27/2008DE10120295B4 Gerät und Prozess zur Gasphasenbeschichtung Device and process for gas-phase coating
03/26/2008EP1903618A1 Method for producing trialkyl gallium
03/26/2008CN101150055A Making method for large-area 3C-SiC thin film of MEMS part
03/26/2008CN101148780A Method for preparing twist silicon nitride ceramics crystal whisker
03/26/2008CN101148776A Epitaxy growth method for gallium antimonide on gallium arsenide substrate
03/26/2008CN100377306C Non-polar single crystalline A-plane nitride semiconductor wafer and preparation method thereof
03/26/2008CN100376477C Growth apparatus of carson nanotube array and growth method of multi-wall carbon nanotube array
03/25/2008US7348200 Method of growing non-polar a-plane gallium nitride
03/25/2008CA2406347C Gan substrate, method of growing gan and method of producing gan substrate
03/20/2008WO2007143743A3 High volume delivery system for gallium trichloride
03/20/2008WO2007092893A3 Materials and methods for the manufacture of large crystal diamonds
03/20/2008US20080070397 Methods for Selective Placement of Dislocation Arrays
03/20/2008US20080069953 three gas inlet zones disposed vertically one above the other, located between the ceiling and the heated floor; vapor deposition of semiconductor crystalline layers; reduce the horizontal extent of the inlet zone
03/20/2008US20080067543 Method of manufacturing single crystalline gallium nitride thick film
03/20/2008US20080066680 Sequential chemical vapor deposition
03/20/2008DE102006039956A1 Atomic layer deposition of hafnium oxide or hafnium silicon oxide, involves depositing material on substrate using hafnium precursor, fluctuating process temperature of substrate between low and high temperatures after heating
03/19/2008EP1901358A1 Method of fabricating light emitting device
03/19/2008EP1901335A1 Heating device of the light irradiation type
03/19/2008EP1900857A1 Method of manufacturing single crystalline gallium nitride thick film
03/19/2008EP1900856A2 Silicon carbide manufacturing device and method of maufacturing silicon carbide
03/19/2008EP1328014B1 Semiconductor base material and method of manufacturing the material
03/19/2008CN101145516A Silicon base nitride single crystal thin film epitaxial structure and growth method
03/19/2008CN101144182A Method of growing gallium nitride crystal
03/19/2008CN101144181A Film formation apparatus for semiconductor process and method for using the same
03/18/2008US7344753 Noncatalytically forming a nanowire on a substrate from an organometallic vapor without any type of reducing agent; use of Copper (ethylacetoacetate)trialkyl phosphite as copper precursor for example; integrated circuits
03/18/2008US7344597 Vapor-phase growth apparatus
03/13/2008WO2008029589A1 Method and equipment for producing group-iii nitride
03/13/2008WO2008028522A1 A method of synthesizing semiconductor nanostructures and nanostructures synthesized by the method
03/13/2008US20080063584 Aluminum Gallium Nitride; HVPE Hydride Vapor Phase Epitaxy; carrier gas is inert gas and hydrogen at partial pressure of 0 to <0.1 atm; relationship between reactant feed ratio and ratio of grown crystal made linear thereby enhancing control of crystal composition; large-size thick film substrate crystal
03/13/2008DE102006041513A1 Hochtemperatur-Schichtsupraleiteraufbau und Verfahren zu seiner Herstellung High-temperature layer superconductor structure and process for its preparation
03/13/2008CA2662594A1 Method and apparatus for producing a group iii nitride
03/12/2008EP1898446A2 Substrate processing method, substrate processing apparatus, and program storage medium
03/12/2008EP1778890B1 Method for production of reactors for the decomposition of gases
03/12/2008EP1614166A4 Fluidic nanotubes and devices
03/12/2008EP1583858A4 Sacrificial template method of fabricating a nanotube
03/12/2008CN201033809Y Situ stress optical monitoring apparatus for epitaxial growth
03/11/2008US7341929 Method to fabricate patterned strain-relaxed SiGe epitaxial with threading dislocation density control
03/06/2008US20080057197 Chemical vapor deposition reactor having multiple inlets
03/06/2008US20080054412 Reduction of carrot defects in silicon carbide epitaxy
03/06/2008US20080053371 Silicon carbide manufacturing device and method of manufacturing silicon carbide
03/05/2008CN101136324A Semiconductor manufacturing method and semiconductor laser device manufacturing method
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