Patents for C30B 25 - Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth (13,302)
09/2008
09/24/2008CN100420569C Free-standing (Al, Ga, In)N and parting method for forming same
09/23/2008US7427556 Method to planarize and reduce defect density of silicon germanium
09/23/2008US7427326 Minimizing degradation of SiC bipolar semiconductor devices
09/18/2008WO2008111277A1 Single crystal zinc oxide substrate
09/17/2008CN101265572A Continuously produced heating reaction furnace
09/17/2008CN100419958C Susceptor for epitaxial growth and epitaxial growth method
09/16/2008US7425237 Method for depositing a material on a substrate wafer
09/12/2008WO2008108381A1 Process for producing group iii nitride crystal
09/12/2008WO2008107010A1 Method and device for the production of a compound semiconductor material by means of gas phase epitaxy
09/12/2008WO2008077386A3 METHOD FOR PRODUCING ONE-DIMENSIONAL COAXIAL Ge/SiCxNy HETEROSTRUCTURES, CORRESPONDING STRUCTURE AND USE OF SAID STRUCTURE
09/11/2008US20080219910 Single-Crystal GaN Substrate
09/10/2008EP1967599A1 Aluminum alloy sheet with excellent formability and paint bake hardenability and method for production thereof
09/10/2008EP1967598A1 Aluminum alloy sheet with excellent formability and paint bake hardenability and method for production thereof
09/10/2008EP1966414A2 Differentiated-temperature reaction chamber
09/10/2008EP1342075B1 Device contaning nanosensors for detecting an analyte and its method of manufacture
09/10/2008CN101263248A Process for manufacture of super lattice using alternating high and low temperature layers to block parasitic current path
09/10/2008CN101261952A Substrate carrying bench and substrate treatment device
09/10/2008CN100418246C Doped organic semiconductor materials and process for their preparation
09/10/2008CN100418191C 外延生长方法 Epitaxial growth
09/09/2008US7422986 Deposition methods utilizing microwave excitation
09/09/2008US7422630 Fabrication method of semiconductor device
09/09/2008CA2284475C Growth of gan on sapphire with mse grown buffer layer
09/04/2008WO2007117689A3 Growing large surface area gallium nitride crystals
09/04/2008US20080213543 Method and device for manufacturing semiconductor compound materials by means of vapour phase epitaxy
09/04/2008US20080211040 Semiconductor nanowire and deposited catalyst material; such as glucose level monitors for controlling insulin release
09/04/2008US20080210975 Method of fabricating heteroepitaxial microstructures
09/04/2008US20080210157 Systems and methods for forming strontium-and/or barium-containing layers
09/04/2008DE102007010286A1 Compound semi-conductor material manufacturing, involves applying gas phase epitaxies of reactor with in mixture of feed gases, which is carried along single or multiple reaction gases in direction of substrate
09/03/2008EP1723086B1 Method of incoporating a mark in cvd diamond
09/03/2008EP1292726B1 Single crystal diamond prepared by cvd
09/03/2008CN101258271A Method for producing iii-n layers, and iii-n layers or iii-n substrates, and devices based thereon
09/03/2008CN101257079A Semiconductor layer
09/03/2008CN101256940A Gas supply system and integrated unit for semiconductor manufacturing device
09/03/2008CN101256937A Method and apparatus for controlling gas flow to a processing chamber
09/03/2008CN101256936A Method and apparatus for controlling gas flow to a processing chamber
09/03/2008CN101256935A Method and apparatus for controlling gas flow to a processing chamber
09/03/2008CN101255545A Deposition of LICo02
09/03/2008CN100415952C Method for synthesizing ordered array of single crystal Sic Nano filament with small diameter through heat evaporation method
09/03/2008CN100415947C Method of fabricating an epitaxially grown layer
09/03/2008CN100415946C A substrate for epitaxy and a method of preparing the same
09/03/2008CN100415933C System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy
09/02/2008US7419903 Thin films
09/02/2008US7419546 Gas diffusion electrodes, membrane-electrode assemblies and method for the production thereof
09/02/2008CA2348397C Method of forming diamond film and film-forming apparatus
08/2008
08/28/2008WO2008101982A1 Device and method for selectively depositing crystalline layers using mocvd or hvpe
08/28/2008WO2008101626A1 Method for producing (al, ga)inn crystals
08/28/2008WO2008101625A1 Method for producing (al,ga)n crystals
08/28/2008US20080202582 Process for Producing Monocrystal Thin Film and Monocrystal Thin Film Device
08/28/2008US20080202409 Method of growing GaN crystal, method of producing single crystal GaN substrate, and single crystal GaN substrate
08/28/2008DE102007009839A1 Hydride vapor phase epitaxy method for producing aluminum gallium indium nitride mono-crystal, used in optoelectronics, particularly for ight-emitting diodes, involves utilizing mixture of aluminum, gallium and indium metals
08/28/2008DE102007009412A1 Hydride vapor phase epitaxy process for the production of aluminum-gallium-nitrogen monocrystals useful in laser diode, comprises converting mixture of aluminum, gallium and indium metals having hydrogen compounds of halogens to halides
08/28/2008DE102007009145A1 Vorrichtung zum Abscheiden kristalliner Schichten wahlweise mittels MOCVD oder HVPE Apparatus for depositing crystalline layers either by MOCVD or HVPE
08/27/2008CN101250752A Group iii nitride semiconductor substrate
08/27/2008CN100414005C Production method for semiconductor crystal and semiconductor luminous element
08/27/2008CN100414004C Device and method for producing single crystals by vapor deposition
08/26/2008US7417255 Methods of forming a high conductivity diamond film and structures formed thereby
08/26/2008US7416606 Method of forming a layer of silicon carbide on a silicon wafer
08/26/2008US7416605 Anneal of epitaxial layer in a semiconductor device
08/26/2008US7416604 Nitride crystal, nitride crystal substrate, epilayer-containing nitride crystal substrate, semiconductor device and method of manufacturing the same
08/26/2008CA2412999C Nitride semiconductor substrate and method for manufacturing the same, and nitride semiconductor device using nitride semiconductor substrate
08/21/2008WO2008099422A2 Method and apparatus for producing single crystalline diamonds
08/21/2008WO2008064077A3 Methods for high volume manufacture of group iii-v semiconductor materials
08/21/2008WO2007117583A3 Cluster tool for epitaxial film formation
08/21/2008DE102005045337B4 Epitaxierte Siliciumscheibe und Verfahren zur Herstellung von epitaxierten Siliciumscheiben Epitaxially coated silicon wafer and method for producing epitaxially coated silicon wafers
08/20/2008EP1959033A2 Group III nitride semiconductor substrate
08/20/2008EP1957689A2 High crystalline quality synthetic diamond
08/20/2008EP1567531A4 Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride
08/20/2008EP1264011A4 Iii-v nitride substrate boule and method of making and using the same
08/20/2008CN101248210A High colour diamond layer
08/20/2008CN101246836A Substrate carrying platform and process method for its surface
08/20/2008CN101246835A Substrate support assembly
08/20/2008CN101245491A Method for growing unsupported gallium nitride nanocrystalline on zinc oxide of nano-stick
08/20/2008CN101245489A Nanocrystalline silicon forming method
08/20/2008CN101245488A Method for growing nanocrystalline silicon in critical condition
08/20/2008CN100413028C A method of manufacturing a semiconductor wafer
08/20/2008CN100412489C Wafer boat with arcuate wafer support arms
08/20/2008CN100412238C Equipment and process for preparing monocrystalline GaN film material
08/19/2008US7413608 Crystallization apparatus, crystallization method, and phase shifter
08/14/2008WO2008097484A2 Methods of depositing epitaxial thermoelectric films having reduced crack and/or surface defect densities and related devices
08/14/2008WO2008096884A1 N-type conductive aluminum nitride semiconductor crystal and method for producing the same
08/14/2008CA2676089A1 Methods of depositing epitaxial thermoelectric films having reduced crack and/or surface defect densities and related devices
08/13/2008EP1956112A2 System and method for reducing particles in epitaxial reactors
08/13/2008CN201099698Y Ternary airflow metallorganic chemical vapour deposition equipment reaction cavity
08/13/2008CN101241883A Preparation method of a coating of gallium nitride
08/13/2008CN101241851A Substrate for growing gallium nitride, method for preparing the substrate for growing gallium nitride and method for preparing gallium nitride substrate
08/13/2008CN101240451A In-situ corrosion method for reducing HVPE GaN thin film dislocation density
08/13/2008CN101240446A Apparatus of supplying organometallic compound
08/13/2008CN101240445A Heater rotating device used for silicon carbide epitaxy
08/13/2008CN100411102C Vaporizer for CVD, solution voporizing CVD device and voporization method for CVD
08/12/2008US7410923 SiC material, semiconductor device fabricating system and SiC material forming method
08/12/2008US7410671 Sequential chemical vapor deposition
08/12/2008US7410539 Template type substrate and a method of preparing the same
08/07/2008WO2008094491A1 New laser uses for single-crystal cvd diamond
08/07/2008WO2008039165A3 Carbon dioxide nanosensor, and respiratory co2 monitors
08/07/2008US20080188065 Preparation method of a coating of gallium nitride
08/07/2008US20080188064 Nanostructures and methods for manufacturing the same
08/07/2008US20080185611 Preparation method of a coating of gallium nitride
08/07/2008DE19848298B4 Hochtemperaturstabile Halbleitersubstratscheibe großen Durchmessers und Verfahren zu ihrer Herstellung High temperature stable semiconductor substrate disc of large diameter and methods for their preparation
08/06/2008EP1953831A2 Stacked photoelectric conversion device and method of producing the same
08/06/2008EP1953273A2 Method of incorporating a mark in CVD diamond
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