Patents for C30B 25 - Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth (13,302)
08/2008
08/06/2008CN101235540A Method for preparing aluminum nitride thin film on lithium aluminate wafer surface under low temperature
08/06/2008CN101235539A Epitaxy growing method for La1-xCaxMnO3 single crystal thin film
08/06/2008CN101235538A Electric arc atomization auxiliary preparation method for four-needle type zinc oxide crystal whisker
08/06/2008CN101235537A Method for preparing ZnMgO alloy thin film
08/06/2008CN101235486A Container for packaging solid high-purity metal organic compound and application thereof
08/06/2008CN101234389A Collector unit and film formation apparatus for semiconductor process
08/06/2008CN100409415C Method for using alpha polycrystal silicon in integrated circuit
08/06/2008CN100409402C System and method of fast ambient switching for rapid thermal processing
08/05/2008US7407549 Diamond single crystal composite substrate and method for manufacturing the same
08/05/2008US7407548 Method of manufacturing a wafer
08/05/2008CA2312790C Growth of very uniform silicon carbide epitaxial layers
07/2008
07/31/2008WO2008090514A2 Diamond electronic devices and methods for their manufacture
07/31/2008WO2008090513A2 Diamond electronic devices including a surface and methods for their manufacture
07/31/2008WO2008090512A1 Electronic field effect devices and methods for their manufacture
07/31/2008WO2008090511A1 Plasma etching of diamond surfaces
07/31/2008WO2008090510A1 High uniformity boron doped diamond material
07/31/2008US20080182092 Defect reduction in seeded aluminum nitride crystal growth
07/31/2008US20080178973 Containing Si and Mg; bendability to allow flat hemming, resistance to denting and corrosion; for automobile outer panel
07/31/2008US20080178968 Aluminum alloy sheet with excellent formability and paint bake hardenability and method for production thereof
07/31/2008US20080178967 Containing Si and Mg; bendability to allow flat hemming, resistance to denting and corrosion; for automobile outer panel
07/30/2008EP1948844A1 Arrangement in connection with ald reactor
07/30/2008EP1948843A1 Ald reactor
07/30/2008CN101230487A Method for growing indium nitride monocrystal thin films
07/30/2008CN100406391C Preparation method of nanometer tungsten trioxide crystallite
07/29/2008US7405422 Epitaxial and polycrystalline growth of Si1-x-yGexCy and Si1-yCy alloy layers on Si by UHV-CVD
07/29/2008US7404984 Vapor-phase reactants pulse repeatedly and alternately into reaction zone containing substrate to form solid-state thin film wherein gas volume is evacuated between pulses
07/29/2008US7404858 Method for epitaxial growth of silicon carbide
07/24/2008WO2008087452A1 Production of single-crystal semiconductor material using a nanostructure template
07/24/2008US20080175782 High temperature, high strength composite nanostructure metal carbides, formed by heating carbon nanotubes with reactive gases to form in situ
07/23/2008EP1947684A1 Semiconductor base material and method of manufacturing the material
07/23/2008EP1656469B1 Methods of depositing materials over substrates and methods of forming layers over substrates
07/23/2008EP1341718B1 Method and device for electronic cyclotron resonance plasma deposit of single-wall carbon nanotubes and resulting nanotubes
07/23/2008CN101228612A System of rotatable bearing machine and treatment room inner support for chip processing device
07/23/2008CN101228013A Composition for adhering materials together
07/23/2008CN101225547A Growth chamber and gallium nitride material growth method
07/23/2008CN101225544A Epitaxially coated semiconductor wafer and device and method for producing an epitaxially coated semiconductor wafer
07/23/2008CN101225512A Method of vaporizing solid organometallic compound
07/23/2008CN100404731C Analogy method of GaAs-based InSb thin film heterogeneity epitaxial growth
07/22/2008US7402504 Epitaxial semiconductor deposition methods and structures
07/17/2008WO2008085129A1 Nitride nanowires and method of producing such
07/17/2008CA2674448A1 Nitride nanowires and method of producing such
07/16/2008CN101223630A Diamond medical devices
07/16/2008CN101220516A Low-temperature method for manufacturing nano-MgO crystal whisker
07/16/2008CN101220505A Gas supply system, gas supply method, method of cleaning thin film forming apparatus, thin film forming method and thin film forming apparatus
07/16/2008CN101220504A Method and apparatus for growing silicon carbide crystals
07/16/2008CN101220244A High surface quality GaN wafer and method of fabricating same
07/16/2008CN100402421C Tough diamonds and method of making thereof
07/15/2008US7399707 In situ application of etch back for improved deposition into high-aspect-ratio features
07/15/2008US7399358 Synthesis of large homoepitaxial monocrystalline diamond
07/15/2008US7399357 Atomic layer deposition using multilayers
07/15/2008US7399356 Method for preparation of ferroelectric single crystal film structure using deposition method
07/10/2008WO2005013326A3 Epitaxial growth of relaxed silicon germanium layers
07/10/2008US20080166522 Method for Producing III-N Layers, and III-N Layers or III-N Substrates, and Devices Based Thereon
07/10/2008DE10260860B4 Schicht aus Si1-xGex, Verfahren zu deren Herstellung und mikromechanisches Bauelement damit Layer of Si1-xGex, to processes for their preparation and micromechanical component thus
07/09/2008EP1498938B1 Method of forming silicon epitaxial layer
07/09/2008EP1456871B1 Susceptor for epitaxial growth
07/09/2008CN101217110A Group III nitride semiconductor substrate and its manufacturing method
07/09/2008CN100401482C Epitaxial growing method and substrate for epitaxial growth
07/09/2008CN100401470C Method for controlling and removing fog-shaped micro-defect of silicon gas-phase epitaxial layer
07/09/2008CN100401460C Substrate locally with mono-crystalline gallium nitride and its preparing method
07/08/2008US7396410 Featuring forming methods to reduce stacking fault nucleation sites
07/08/2008US7396409 Acicular silicon crystal and process for producing the same
07/08/2008US7396408 Monocrystalline diamond layer and method for the production thereof
07/08/2008US7396404 Methods for forming alkali halide ingots into rectangular plates
07/08/2008CA2346290C Production of bulk single crystals of silicon carbide
07/03/2008WO2008078302A2 Iii-nitride light emitting diodes grown on templates to reduce strain
07/03/2008WO2008078300A2 Iii-nitride light emitting diodes grown on templates to reduce strain
07/03/2008WO2008077386A2 METHOD FOR PRODUCING ONE-DIMENSIONAL COAXIAL Ge/SiCxNy HETEROSTRUCTURES, CORRESPONDING STRUCTURE AND USE OF SAID STRUCTURE
07/03/2008US20080157096 monocrystalline diamond, adapted for use as semiconductors or waveguides
07/03/2008US20080156256 System and method for producing synthetic diamond
07/03/2008DE112006002430T5 Verfahren zur Herstellung von Super-Gittern unter Verwendung von abwechselnden Hoch und Niedrig-Temperatur-Schichten zum Sperren von parasitären Strompfaden A process for the production of super-lattices using alternating high and low-temperature layers to block parasitic current paths
07/02/2008EP1661239A4 Method and apparatus for bi-planar backward wave oscillator
07/02/2008EP1374290B1 Improved process for deposition of semiconductor films
07/02/2008CN101210345A Device and method for growing zinc oxide film
07/02/2008CN100399511C Compound semiconductor substrate and its production method
07/01/2008US7393763 Manufacturing method of monocrystalline gallium nitride localized substrate
07/01/2008US7393562 Deposition methods for improved delivery of metastable species
07/01/2008US7393514 high temperature, high strength composite nanostructure metal carbides, formed by heating carbon nanotubes with reactive gases to form in situ solid carbides
07/01/2008US7393412 Method for manufacturing compound semiconductor epitaxial substrate
07/01/2008US7393410 Method of manufacturing nano-wire
07/01/2008US7393213 Method for material growth of GaN-based nitride layer
06/2008
06/26/2008US20080152570 Method of Growing III group nitride single crystal and III group nitride single crystal manufactured by using the same
06/26/2008US20080149021 Methods of Forming Dual Damascene Structures
06/26/2008US20080149020 Device and method to producing single crystals by vapour deposition
06/25/2008EP1936668A2 Nitride semiconductor substrate and manufacturing method thereof
06/25/2008CN101207174A 氮化物半导体衬底及其制造方法 The nitride semiconductor substrate and manufacturing method thereof
06/25/2008CN101207013A Method and apparatus for heating a substrate
06/25/2008CN101207012A Method and apparatus for heating a substrate
06/25/2008CN101205627A Hydride gas-phase epitaxy apparatus for preparing nitride monocrystalline substrate
06/25/2008CN101205626A Hydride gas-phase epitaxy apparatus independently supplying metal halide
06/24/2008US7390581 used for coating epitaxial films in the fabrication of electronic and opto-electronic devices such as laser diodes, light emitting diodes, transistors and detectors
06/24/2008US7390367 Housing assembly for an induction heating device including liner or susceptor coating
06/24/2008US7390360 Organometallic compounds
06/24/2008US7390359 Nitride semiconductor wafer
06/19/2008WO2008073930A1 Formation of epitaxial layers containing silicon and carbon
06/19/2008US20080143012 Novel Polymer Films and Textile Laminates Containing Such Polymer Films
06/19/2008US20080142926 Directionally controlled growth of nanowhiskers
06/19/2008US20080142846 Nitride semiconductor substrate and manufacturing method thereof
06/19/2008US20080142784 Nanostructures and methods for manufacturing the same
06/19/2008DE102006058820A1 Verfahren zur Herstellung von SGOI- und GeOI-Halbleiterstrukturen A process for preparing SGOI- and GeOI semiconductor structures
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