Patents for C30B 25 - Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth (13,302)
03/2009
03/04/2009CN100465356C A GaN wafer with high surface quality and a production method thereof
03/03/2009US7498244 Method for fabricating GaN-based nitride layer
03/03/2009US7498059 Method for growing thin films
03/03/2009US7497906 Seed crystal fixing apparatus and a method for fixing the seed crystal
03/03/2009US7497905 Ternary nitride-based buffer layer of a nitride-based light-emitting device and a method for manufacturing the same
02/2009
02/26/2009WO2009026269A1 Stabilizing 4h polytype during sublimation growth of sic single crystals
02/26/2009US20090050913 Method for achieving low defect density algan single crystal boules
02/26/2009DE112006003485T5 Vorrichtung zum Herstellen einer Halbleiterdünnschicht An apparatus for manufacturing a semiconductor thin film
02/25/2009EP2027059A1 Method of manufacturing silicon nanotubes using doughnut-shaped catalytic metal layer
02/25/2009CN101373731A Electrostatic chuck apparatus and temperature control method thereof
02/24/2009US7494881 Methods for selective placement of dislocation arrays
02/24/2009US7494546 Method of growing insulating, semiconducting, and conducting group III-nitride thin films and coatings, and use as radiation hard coatings for electronics and optoelectronic devices
02/24/2009US7494545 Epitaxial deposition process and apparatus
02/19/2009WO2008152126A4 Device for coating substrates disposed on a susceptor
02/19/2009WO2008146126A3 Reactor for growing crystals with cooled inlets
02/19/2009WO2008142115A4 Device for coating a plurality of closest-packed substrates arranged on a susceptor
02/18/2009EP2025779A2 Gallium nitride crystal growth method, gallium nitride crystal substrate, epi-wafer manufacturing method, and epi-wafer
02/18/2009EP2024991A1 Method for producing a doped iii-n solid crystal and a free-standing doped iii-n substrate, and doped iii-n solid crystal and free-standing doped iii-n substrate
02/18/2009EP1570108B1 Susceptor system
02/18/2009CN101368289A Deposition boiler tube
02/12/2009US20090038934 Apparatus and method for diamond production
02/12/2009US20090038541 Production of bulk silicon carbide with hot-filament chemical vapor deposition
02/12/2009DE102008026828A1 Bildung von nitrid-basierten optoelektronischen und elektronischen Bauteilstrukturen auf gitterangepassten Substraten Formation of nitride-based optoelectronic and electronic device structures on lattice matched substrates
02/11/2009EP2023381A1 Method of selectively forming atomically flat plane on diamond surface, diamond substrate produced by the method, and semiconductor element employing the same
02/11/2009EP2021533A1 Low-temperature doping processes for silicon wafer devices
02/11/2009EP2021532A1 Source container of a vpe reactor
02/11/2009CN101363133A Method for cleaning reaction cavity interior
02/10/2009US7488922 Susceptor system
02/10/2009US7488455 Apparatus for the production of carbon nanotubes
02/10/2009US7488386 Atomic layer deposition methods and chemical vapor deposition methods
02/10/2009US7488385 Method for epitaxial growth of a gallium nitride film separated from its substrate
02/05/2009WO2009017829A1 Control of strain through thickness in epitaxial films via vertical nanocomposite heteroepitaxy
02/05/2009US20090031947 Reactor
02/05/2009DE19653124B4 Synthese von phosphor-dotiertem Diamant Synthesis of phosphorus-doped diamond
02/05/2009DE102008029784A1 Einkristalline Metallnanostrukturen aus Binärlegierung und Verfahren zu deren Herstellung Metal monocrystalline nanostructures binary alloy and process for their preparation
02/04/2009CN101359594A Semiconductor manufacture device, semiconductor manufacture method and electric machine
02/04/2009CN100459181C Nanostructure, electronic device having such nanostructure and method of preparing nanostructure
02/03/2009US7485583 Method for fabricating superlattice semiconductor structure using chemical vapor deposition
02/03/2009US7485484 Group III-V crystal
02/03/2009US7485340 Thin metal films by atomic layer deposition: tungsten nucleation layer over a silicon wafer; copper film from CuCl and triethylboron; vapor phase pulses in inert gas
02/03/2009US7485189 Thin film deposition device using an FTIR gas analyzer for mixed gas supply
01/2009
01/29/2009WO2009013914A1 Sic epitaxial substrate and process for producing the same
01/29/2009US20090026459 Epitaxial and polycrystalline growth of si1-x-ygexcy and si1-ycy alloy layers on si by uhv-cvd
01/29/2009US20090026417 Gallium Nitride Crystal Growth Method, Gallium Nitride Crystal Substrate, Epi-Wafer Manufacturing Method, and Epi-Wafer
01/29/2009US20090025629 Substrate for Growing Compound Semiconductor and Epitaxial Growth Method
01/28/2009EP2019155A2 Gallium nitride substrate and gallium nitride film deposition method
01/28/2009CN101353819A Gallium nitride crystal growth method, gallium nitride crystal substrate, epi-wafer manufacturing method, and epi-wafer
01/28/2009CN101353818A Gallium nitride growth method using CVD and HVPE
01/28/2009CN101353816A Growth method of tungsten oxide pencil-shaped nanostructured array
01/28/2009CN101353813A Free-standing (Al, Ga, In)N and parting method for forming same
01/27/2009US7482235 Semiconductor device and method of manufacturing the same
01/27/2009US7482068 n-type or a p-type conductivity; drift zone of high voltage power devices; low cost; swiches
01/27/2009US7481880 Mask and method for crystallizing amorphous silicon
01/27/2009US7481879 Diamond single crystal substrate manufacturing method and diamond single crystal substrate
01/22/2009WO2009011816A1 Method of producing large area sic substrates
01/22/2009DE10250915B4 Verfahren zur Abscheidung eines Materials auf einem Substratwafer A method for depositing a material on a substrate wafer
01/21/2009EP2016614A1 Method of zinc oxide film grown on the epitaxial lateral overgrowth gallium nitride template
01/21/2009EP2016209A2 Process for producing a iii-n bulk crystal and a free-standing iii -n substrate, and iii -n bulk crystal and free-standing ih-n substrate
01/21/2009EP2016205A2 Semiconductor buffer structures
01/21/2009CN201183822Y Thin film deposition apparatus
01/21/2009CN101351578A Differentiated-temperature reaction chamber
01/21/2009CN101350326A Method for monitoring base mounting center of germanium silicon epitaxial reaction cavity
01/21/2009CN101350294A System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy
01/21/2009CN101348936A Orientational alignment carbon nano-tube and carbon coating cobalt nano-particle complex and preparation thereof
01/21/2009CN100454489C Methods for deposition of semiconductor material
01/21/2009CN100454488C Group III nitride crystal substrate, method of its manufacture, and group-III nitride semiconductor device
01/20/2009US7479658 Epitaxial wafers, method for manufacturing of epitaxial wafers, method of suppressing bowing of these epitaxial wafers and semiconductor multilayer structures using these epitaxial wafers
01/20/2009US7479443 Germanium deposition
01/20/2009US7479188 Process for producing GaN substrate
01/20/2009US7479187 Method for manufacturing silicon epitaxial wafer
01/15/2009WO2007126463A3 Low-temperature dielectric formation for devices with strained germanium-containing channels
01/14/2009CN101345184A Plasma processing apparatus, gas dispensing device and gas delivery method
01/14/2009CN101343777A Nitride material extension apparatus
01/14/2009CN101343776A Chemical vapor deposition preparation apparatus method for oxide
01/14/2009CN100452449C Nitride semiconductors on silicon substrate and method of manufacturing the same
01/14/2009CN100451181C Method for carrying out epitaxial growth of single crystal film of nitride by using mask in situ
01/14/2009CN100451180C Method for growing ZnO mono-crystalline by closed pipe chemical vapour transmission
01/13/2009US7476895 Method of fabricating n-type semiconductor diamond, and semiconductor diamond
01/13/2009US7476596 Doped elongated semiconductors, growing such semiconductors, devices including such semiconductors, and fabricating such devices
01/08/2009US20090010822 Apparatus for the production of carbon nanotubes
01/07/2009EP1381710B1 Process and device for the deposition of a microcrystalline silicon layer on a substrate
01/07/2009EP1138063B1 Fabrication of gallium nitride layers by lateral growth
01/07/2009CN101338452A High-density carbon nanotube array and method for preparing same
01/06/2009US7473925 P-type group II-VI semiconductor compounds
01/06/2009US7473316 Method of growing nitrogenous semiconductor crystal materials
01/06/2009US7473315 AlxInyGa1-x-yN mixture crystal substrate, method of growing AlxInyGa1-x-yN mixture crystal substrate and method of producing AlxInyGa1-x-yN mixture crystal substrate
01/06/2009CA2352132C Method of producing a single crystal gan substrate and single crystal gan substrate
01/02/2009DE102007028293A1 Plasmareaktor und Verfahren zur Herstellung einkristalliner Diamantschichten A plasma reactor and method for producing single-crystal diamond films
01/01/2009US20090004093 Materials and methods for the manufacture of large crystal diamonds
01/01/2009US20090001329 Rare earth-oxides, rare earth-nitrides, rare earth-phosphies, and ternary alloys with silicon
01/01/2009US20090000541 Atomic layer epitaxy processed insulation
12/2008
12/31/2008WO2009001833A1 Epitaxial wafer and method for manufacturing the same
12/31/2008EP2008297A1 Epitaxial growth of iii-nitride compound semiconductors structures
12/31/2008EP1391941B1 Production method for a light emitting element
12/31/2008EP1373130B1 Process and apparatus for the production of carbon nanotubes
12/31/2008CN101336314A Process for growth of low dislocation density gan
12/31/2008CN101333680A Method and apparatus for quickly maintaining epitaxy end gas processor
12/31/2008CN101333679A Method and apparatus for shortening maintenance time of epitaxy end gas processor
12/31/2008CN101333678A Control pipeline for distributing and evaluating supply system of trichlorosilane or silicon tetrachloride
12/31/2008CN101333677A 300mm thin-film epitaxy process
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