Patents for C30B 25 - Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth (13,302) |
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06/09/1999 | EP0921214A1 Single crystal silicon carbide and process for preparing the same |
06/02/1999 | EP0918887A1 Co-rotating edge ring extension for use in a semiconductor processing chamber |
06/01/1999 | US5908507 Chemical vapor deposition reactor and method of producing oxide superconductive conductor using the same |
06/01/1999 | US5908504 Method for tuning barrel reactor purge system |
05/27/1999 | WO1999025909A1 Epitaxial growth furnace |
05/26/1999 | EP0918100A1 Method and apparatus for producing homoepitaxial diamond thin film |
05/26/1999 | EP0917596A1 Method of manufacturing a semiconductor device and a device for applying such a method |
05/26/1999 | CN1217563A Silicon substrate and mfg. method therefor |
05/25/1999 | US5906680 Method and apparatus for low temperature, low pressure chemical vapor deposition of epitaxial silicon layers |
05/20/1999 | WO1999024635A1 Method of fabricating iridium-based materials and structures on substrates, and iridium source reagents therefor |
05/19/1999 | EP0916750A1 Single crystal SiC and a method of producing the same |
05/19/1999 | EP0916749A1 Single crystal SiC and a method of producing the same |
05/19/1999 | EP0916745A1 Two piece diamond deposition mandrel having graphite ring |
05/18/1999 | US5904981 Polycrystal silicon rod having an improved morphyology |
05/18/1999 | US5904771 Stable evaporation rate |
05/18/1999 | US5904769 Epitaxial growth method |
05/18/1999 | US5904766 Process for preparing bismuth compounds |
05/18/1999 | US5904549 Methods for growing semiconductors and devices thereof from the alloy semiconductor GaInNAs |
05/14/1999 | WO1999023693A1 GaN SINGLE CRYSTALLINE SUBSTRATE AND METHOD OF PRODUCING THE SAME |
05/14/1999 | WO1999023690A1 Method of processing wafers with low mass support |
05/12/1999 | EP0915191A2 Apparatus for making a vacuum seal between two bodies made of different materials |
05/11/1999 | US5902640 Method of improving field emission characteristics of diamond thin films |
05/11/1999 | US5902563 The energies of particles are limited by selecting frequency, pressure, magnetic field and electric bias to the deposition region and chemical vapor depositing the diamond from the plasma source |
05/11/1999 | US5902406 Low pressure CVD system |
05/11/1999 | US5902396 Charging a reaction vessel with an alkaline earth chalcogenide, with or without transitional metal or halides, an acid mineralizer, anhydrous ammonia, sealing the vessel, heating to form single crystal, cooling and extracting |
05/11/1999 | US5902393 Method for growing p-type gallium nitride based compound semiconductors by vapor phase epitaxy |
05/11/1999 | US5902103 Vertical furnace of a semiconductor manufacturing apparatus and a boat cover thereof |
05/06/1999 | WO1999022403A1 Process and apparatus for preparation of epitaxial silicon layers free of grown-in defects |
05/06/1999 | WO1999013499A3 In-situ acceptor activation in group iii-v nitride compound semiconductors |
05/06/1999 | DE19727432A1 Growth substrate holder has a heat conductive screen for providing uniform temperature distribution |
05/05/1999 | CN1215766A Method for growing diamond crystal on liquid surface |
05/04/1999 | US5900177 Furnace sidewall temperature control system |
05/04/1999 | US5900056 Method for growing epitaxial layers of III-V compound semiconductors |
05/04/1999 | CA2247818A1 Two piece diamond deposition mandrel having graphite ring |
04/29/1999 | WO1999021216A1 Method for epitactical production of semi-insulating iii-v compound semiconductors |
04/29/1999 | WO1999020816A1 Method for producing a gallium nitride epitaxial layer |
04/27/1999 | US5898020 Structures having enhanced biaxial texture and method of fabricating same |
04/27/1999 | US5897311 Support boat for objects to be processed |
04/22/1999 | WO1999019546A1 Methods for growing defect-free heteroepitaxial layers |
04/22/1999 | WO1999019536A1 Introducing process fluid over rotating substrates |
04/22/1999 | WO1999019048A1 Semiconductor manufacturing system with getter safety device |
04/21/1999 | EP0909835A1 Superhard material film structure, process of making and use of same |
04/21/1999 | EP0644279B1 Alpha-alumina |
04/21/1999 | EP0644278B1 Alpha-alumina |
04/20/1999 | US5895596 Model based temperature controller for semiconductor thermal processors |
04/15/1999 | DE19745185A1 Arrangement for vacuum tight joining of two bodies consisting of different materials |
04/14/1999 | CN2313934Y Film crystal growth apparatus |
04/13/1999 | CA2249703A1 Device for the vacuum-tight connecting of two bodies of different materials |
04/08/1999 | WO1999017349A1 Method for producing an open three-dimensional microstructure |
04/08/1999 | WO1999016941A1 Substrates for superconductors |
04/08/1999 | CA2305571A1 Substrates for superconductors |
04/07/1999 | EP0630994B1 Process for vapor-phase diamond synthesis |
04/06/1999 | US5892886 Apparatus for uniform gas and radiant heat dispersion for solid state fabrication processes |
04/06/1999 | US5891575 Growing and releasing diamonds |
04/06/1999 | US5891250 Injector for reactor |
04/06/1999 | US5891243 Production of heavy doped ZnSe crystal |
04/01/1999 | WO1999015719A1 Low vacuum vapor process for producing superconductor articles with epitaxial layers |
04/01/1999 | WO1999015718A1 Low vacuum vapor process for producing epitaxial layers |
04/01/1999 | WO1999015333A1 Superconductor articles with epitaxial layers |
03/31/1999 | EP0905288A1 Process for preparing semiconductor monocrystalline thin film |
03/31/1999 | EP0905287A2 Method and apparatus for fabricating compound semiconductor epitaxial wafer by vapour phase growth |
03/30/1999 | US5888294 Epitaxial growth rate varying method for side surface of semiconductor pattern |
03/25/1999 | WO1999014797A1 Compliant universal substrates for epitaxial growth |
03/25/1999 | WO1999014395A1 Process tube with in situ gas preheating |
03/24/1999 | EP0903429A2 Process for producing heavily doped silicon |
03/23/1999 | US5886203 Metalorganic compounds |
03/23/1999 | US5885939 Sputtering a vertically oriented single crystal thin film of yttrium-barium-copper oxide onto horizontally oriented yttrium-barium-copper oxide initially vapor deposited onto single crystal substrate |
03/23/1999 | US5885356 Method of reducing residue accumulation in CVD chamber using ceramic lining |
03/23/1999 | CA2005737C Manufacturing method of zinc oxide whiskers |
03/18/1999 | WO1999013499A2 In-situ acceptor activation in group iii-v nitride compound semiconductors |
03/18/1999 | WO1999013129A1 Combustion chemical vapor deposition of phosphate films and coatings |
03/18/1999 | DE19739881A1 Production of crystalline silicon carbide |
03/18/1999 | CA2302580A1 Combustion chemical vapor deposition of phosphate films and coatings |
03/16/1999 | US5882805 Infrared detectors, solar cells and other advanced opto-electronic devices |
03/16/1999 | US5882786 Gemstones formed of silicon carbide with diamond coating |
03/16/1999 | US5882417 Apparatus for preventing deposition on frontside peripheral region and edge of wafer in chemical vapor deposition apparatus |
03/16/1999 | US5882366 Alternating wash/dry water scrubber entry |
03/09/1999 | US5879811 Oxide thin film having quartz crystal structure |
03/09/1999 | US5879462 Device for heat treatment of objects and a method for producing a susceptor |
03/09/1999 | US5879459 Vertically-stacked process reactor and cluster tool system for atomic layer deposition |
03/09/1999 | US5879450 Method of heteroepitaxial growth of beta silicon carbide on silicon |
03/04/1999 | WO1999010558A1 Vertically-stacked process reactor and cluster tool system for atomic layer deposition |
03/04/1999 | DE19747996C1 Ruthenium-doped semi-insulating III-V compound semiconductor epitaxy |
03/02/1999 | US5876684 Methods and apparati for producing fullerenes |
03/02/1999 | US5876504 Process for producing oxide thin films and chemical vapor deposition apparatus used therefor |
03/02/1999 | CA2061504C Method of forming a single crystal material |
02/25/1999 | DE19736207A1 MBE of a p-conductive carbon-doped InGaAs layer on an InP substrate |
02/23/1999 | US5874130 Wafer and method of producing a wafer |
02/23/1999 | US5874012 Plasma processing apparatus and plasma processing method |
02/23/1999 | CA2008946C Vapor-phase epitaxial growth method |
02/18/1999 | WO1999007925A1 Domed wafer reactor vessel window with reduced stress at atmospheric and above atmospheric pressures |
02/18/1999 | WO1999007924A1 Apparatus and method for the in-situ generation of dopants |
02/17/1999 | EP0897192A1 Silicon single crystal and process for producing single-crystal silicon thin film |
02/17/1999 | EP0897024A1 Process for epitaxy on a silicon substrate containing zones highly doped with arsenic |
02/17/1999 | EP0896643A1 Method and apparatus for growing oriented whisker arrays |
02/16/1999 | US5871586 Chemical vapor deposition |
02/16/1999 | CA2007388C Method of producing zinc oxide whiskers |
02/10/1999 | EP0896406A2 Semiconductor laser device, optical communication system using the same, and method for producing compound semiconductor |
02/10/1999 | CN1207575A Cubic crystal nitride semiconductor device and its mfg. method |
02/09/1999 | US5870526 Inflatable elastomeric element for rapid thermal processing (RTP) system |