Patents for C30B 25 - Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth (13,302)
06/1999
06/09/1999EP0921214A1 Single crystal silicon carbide and process for preparing the same
06/02/1999EP0918887A1 Co-rotating edge ring extension for use in a semiconductor processing chamber
06/01/1999US5908507 Chemical vapor deposition reactor and method of producing oxide superconductive conductor using the same
06/01/1999US5908504 Method for tuning barrel reactor purge system
05/1999
05/27/1999WO1999025909A1 Epitaxial growth furnace
05/26/1999EP0918100A1 Method and apparatus for producing homoepitaxial diamond thin film
05/26/1999EP0917596A1 Method of manufacturing a semiconductor device and a device for applying such a method
05/26/1999CN1217563A Silicon substrate and mfg. method therefor
05/25/1999US5906680 Method and apparatus for low temperature, low pressure chemical vapor deposition of epitaxial silicon layers
05/20/1999WO1999024635A1 Method of fabricating iridium-based materials and structures on substrates, and iridium source reagents therefor
05/19/1999EP0916750A1 Single crystal SiC and a method of producing the same
05/19/1999EP0916749A1 Single crystal SiC and a method of producing the same
05/19/1999EP0916745A1 Two piece diamond deposition mandrel having graphite ring
05/18/1999US5904981 Polycrystal silicon rod having an improved morphyology
05/18/1999US5904771 Stable evaporation rate
05/18/1999US5904769 Epitaxial growth method
05/18/1999US5904766 Process for preparing bismuth compounds
05/18/1999US5904549 Methods for growing semiconductors and devices thereof from the alloy semiconductor GaInNAs
05/14/1999WO1999023693A1 GaN SINGLE CRYSTALLINE SUBSTRATE AND METHOD OF PRODUCING THE SAME
05/14/1999WO1999023690A1 Method of processing wafers with low mass support
05/12/1999EP0915191A2 Apparatus for making a vacuum seal between two bodies made of different materials
05/11/1999US5902640 Method of improving field emission characteristics of diamond thin films
05/11/1999US5902563 The energies of particles are limited by selecting frequency, pressure, magnetic field and electric bias to the deposition region and chemical vapor depositing the diamond from the plasma source
05/11/1999US5902406 Low pressure CVD system
05/11/1999US5902396 Charging a reaction vessel with an alkaline earth chalcogenide, with or without transitional metal or halides, an acid mineralizer, anhydrous ammonia, sealing the vessel, heating to form single crystal, cooling and extracting
05/11/1999US5902393 Method for growing p-type gallium nitride based compound semiconductors by vapor phase epitaxy
05/11/1999US5902103 Vertical furnace of a semiconductor manufacturing apparatus and a boat cover thereof
05/06/1999WO1999022403A1 Process and apparatus for preparation of epitaxial silicon layers free of grown-in defects
05/06/1999WO1999013499A3 In-situ acceptor activation in group iii-v nitride compound semiconductors
05/06/1999DE19727432A1 Growth substrate holder has a heat conductive screen for providing uniform temperature distribution
05/05/1999CN1215766A Method for growing diamond crystal on liquid surface
05/04/1999US5900177 Furnace sidewall temperature control system
05/04/1999US5900056 Method for growing epitaxial layers of III-V compound semiconductors
05/04/1999CA2247818A1 Two piece diamond deposition mandrel having graphite ring
04/1999
04/29/1999WO1999021216A1 Method for epitactical production of semi-insulating iii-v compound semiconductors
04/29/1999WO1999020816A1 Method for producing a gallium nitride epitaxial layer
04/27/1999US5898020 Structures having enhanced biaxial texture and method of fabricating same
04/27/1999US5897311 Support boat for objects to be processed
04/22/1999WO1999019546A1 Methods for growing defect-free heteroepitaxial layers
04/22/1999WO1999019536A1 Introducing process fluid over rotating substrates
04/22/1999WO1999019048A1 Semiconductor manufacturing system with getter safety device
04/21/1999EP0909835A1 Superhard material film structure, process of making and use of same
04/21/1999EP0644279B1 Alpha-alumina
04/21/1999EP0644278B1 Alpha-alumina
04/20/1999US5895596 Model based temperature controller for semiconductor thermal processors
04/15/1999DE19745185A1 Arrangement for vacuum tight joining of two bodies consisting of different materials
04/14/1999CN2313934Y Film crystal growth apparatus
04/13/1999CA2249703A1 Device for the vacuum-tight connecting of two bodies of different materials
04/08/1999WO1999017349A1 Method for producing an open three-dimensional microstructure
04/08/1999WO1999016941A1 Substrates for superconductors
04/08/1999CA2305571A1 Substrates for superconductors
04/07/1999EP0630994B1 Process for vapor-phase diamond synthesis
04/06/1999US5892886 Apparatus for uniform gas and radiant heat dispersion for solid state fabrication processes
04/06/1999US5891575 Growing and releasing diamonds
04/06/1999US5891250 Injector for reactor
04/06/1999US5891243 Production of heavy doped ZnSe crystal
04/01/1999WO1999015719A1 Low vacuum vapor process for producing superconductor articles with epitaxial layers
04/01/1999WO1999015718A1 Low vacuum vapor process for producing epitaxial layers
04/01/1999WO1999015333A1 Superconductor articles with epitaxial layers
03/1999
03/31/1999EP0905288A1 Process for preparing semiconductor monocrystalline thin film
03/31/1999EP0905287A2 Method and apparatus for fabricating compound semiconductor epitaxial wafer by vapour phase growth
03/30/1999US5888294 Epitaxial growth rate varying method for side surface of semiconductor pattern
03/25/1999WO1999014797A1 Compliant universal substrates for epitaxial growth
03/25/1999WO1999014395A1 Process tube with in situ gas preheating
03/24/1999EP0903429A2 Process for producing heavily doped silicon
03/23/1999US5886203 Metalorganic compounds
03/23/1999US5885939 Sputtering a vertically oriented single crystal thin film of yttrium-barium-copper oxide onto horizontally oriented yttrium-barium-copper oxide initially vapor deposited onto single crystal substrate
03/23/1999US5885356 Method of reducing residue accumulation in CVD chamber using ceramic lining
03/23/1999CA2005737C Manufacturing method of zinc oxide whiskers
03/18/1999WO1999013499A2 In-situ acceptor activation in group iii-v nitride compound semiconductors
03/18/1999WO1999013129A1 Combustion chemical vapor deposition of phosphate films and coatings
03/18/1999DE19739881A1 Production of crystalline silicon carbide
03/18/1999CA2302580A1 Combustion chemical vapor deposition of phosphate films and coatings
03/16/1999US5882805 Infrared detectors, solar cells and other advanced opto-electronic devices
03/16/1999US5882786 Gemstones formed of silicon carbide with diamond coating
03/16/1999US5882417 Apparatus for preventing deposition on frontside peripheral region and edge of wafer in chemical vapor deposition apparatus
03/16/1999US5882366 Alternating wash/dry water scrubber entry
03/09/1999US5879811 Oxide thin film having quartz crystal structure
03/09/1999US5879462 Device for heat treatment of objects and a method for producing a susceptor
03/09/1999US5879459 Vertically-stacked process reactor and cluster tool system for atomic layer deposition
03/09/1999US5879450 Method of heteroepitaxial growth of beta silicon carbide on silicon
03/04/1999WO1999010558A1 Vertically-stacked process reactor and cluster tool system for atomic layer deposition
03/04/1999DE19747996C1 Ruthenium-doped semi-insulating III-V compound semiconductor epitaxy
03/02/1999US5876684 Methods and apparati for producing fullerenes
03/02/1999US5876504 Process for producing oxide thin films and chemical vapor deposition apparatus used therefor
03/02/1999CA2061504C Method of forming a single crystal material
02/1999
02/25/1999DE19736207A1 MBE of a p-conductive carbon-doped InGaAs layer on an InP substrate
02/23/1999US5874130 Wafer and method of producing a wafer
02/23/1999US5874012 Plasma processing apparatus and plasma processing method
02/23/1999CA2008946C Vapor-phase epitaxial growth method
02/18/1999WO1999007925A1 Domed wafer reactor vessel window with reduced stress at atmospheric and above atmospheric pressures
02/18/1999WO1999007924A1 Apparatus and method for the in-situ generation of dopants
02/17/1999EP0897192A1 Silicon single crystal and process for producing single-crystal silicon thin film
02/17/1999EP0897024A1 Process for epitaxy on a silicon substrate containing zones highly doped with arsenic
02/17/1999EP0896643A1 Method and apparatus for growing oriented whisker arrays
02/16/1999US5871586 Chemical vapor deposition
02/16/1999CA2007388C Method of producing zinc oxide whiskers
02/10/1999EP0896406A2 Semiconductor laser device, optical communication system using the same, and method for producing compound semiconductor
02/10/1999CN1207575A Cubic crystal nitride semiconductor device and its mfg. method
02/09/1999US5870526 Inflatable elastomeric element for rapid thermal processing (RTP) system