Patents for C30B 23 - Single-crystal growth by condensing evaporated or sublimed materials (5,192)
07/1990
07/10/1990US4940693 High temperature superconducting thin film structure and method of making
07/04/1990EP0376798A1 Oriented polydiacetylene layer
06/1990
06/21/1990DE3842420A1 Hard cemented composite and process for the production thereof
06/19/1990US4935092 Molecular beam epitaxy at two seperate temperature stages
06/19/1990US4934313 Control of uniformity of growing alloy film
06/19/1990CA1270424A1 Chemical beam deposition method
06/06/1990EP0371481A2 Laminated film and method for producing the same
06/05/1990US4931132 Optical control of deposition of crystal monolayers
05/1990
05/23/1990EP0214207B1 Method and device for depositing a doped material by epitaxial growth
05/03/1990WO1990004857A1 EPITAXIAL Ba-Y-Cu-O SUPERCONDUCTOR FILM
04/1990
04/18/1990EP0364068A2 Method of depositing an oxide superconductor on a substrate
04/18/1990EP0363554A2 Process and apparatus for producing epitaxially and/or highly texturally grown, high TC-oxide superconductor films, lacking in foreign phases, on substrates
04/18/1990EP0363476A1 Method and apparatus for producing a layer of material from a laser ion source.
04/10/1990US4916114 Method for producing a layer-like composition of oxide-ceramic superconducting material
04/10/1990US4916089 Process for the epitaxial production of semiconductor stock material
04/10/1990US4915977 Method of forming a diamond film
04/04/1990EP0360994A1 Apparatus and method for producing diamond films at low temperatures
04/03/1990US4913652 Pyrolytic boron nitride crucible and method for producing the same
03/1990
03/07/1990EP0208851B1 Fabricating a semiconductor device by means of molecular beam epitaxy
03/06/1990US4906900 Coaxial cavity type, radiofrequency wave, plasma generating apparatus
02/1990
02/22/1990WO1990001794A1 Method of forming a semiconductor thin film and apparatus therefor
01/1990
01/31/1990EP0352931A1 Organic thin film controlled molecular epitaxy
01/31/1990EP0352860A2 Process for producing iron garnet coatings
01/31/1990EP0352857A2 Process for producing iron garnet coatings
01/31/1990EP0352472A2 Heteroepitaxy of lattice-mismatched semiconductor materials
01/17/1990EP0351176A2 Low gravity enhanced growth of phthalocyanine polymorphs
01/09/1990US4892615 Evacuation and purging with a gas
01/03/1990EP0349364A1 Device for holding a thin substrate, particularly made of a semiconducting material
12/1989
12/27/1989EP0348085A1 Vacuum deposition apparatus
12/26/1989US4889319 Bakeable vacuum systems
12/19/1989US4888202 Method of manufacturing thin compound oxide film and apparatus for manufacturing thin oxide film
12/13/1989EP0345441A2 High-Tc superconductor-gallate crystal structures
12/06/1989EP0344352A1 Method for making artificial layered high-Tc superconductors
11/1989
11/02/1989WO1989010427A1 Method and apparatus for producing a layer of material from a laser ion source
10/1989
10/31/1989US4877573 Molecular beam epitaxy
10/24/1989US4876218 Method of growing GaAs films on Si or GaAs substrates using ale
10/24/1989US4876144 Single crystal thin film
10/19/1989WO1989009847A1 Constant level supply of a mercury evaporation cell for epitaxy
10/05/1989WO1989009490A1 Tapered laser or waveguide optoelectronic structures and method
10/04/1989EP0335267A2 Molecular beam epitaxy apparatus
09/1989
09/27/1989EP0334682A2 Heterostructure transistor having a germanium layer on gallium arsenide and a method for manufacturing the same using molecular beam expitaxial growth
09/26/1989US4869776 Method for the growth of a compound semiconductor crystal
09/20/1989EP0333573A1 Process for obtaining an organic polycrystalline material, notably with electro-optical properties
09/12/1989US4866005 Sublimation of silicon carbide to produce large, device quality single crystals of silicon carbide
08/1989
08/16/1989EP0328202A2 Method of forming a quantum dot structure
08/15/1989US4857415 Gallium arsenide layer, metal layer
08/15/1989US4856457 Crucible with two separate zones; film formation
08/10/1989DE3834963A1 Method for the epitaxial production of a layer of a metal oxide superconductor material having high critical temperature
08/09/1989EP0327493A2 Epitaxial arrangement of high TC superconductors on silicon
08/08/1989US4855255 Tapered laser or waveguide optoelectronic method
08/08/1989US4855013 Method for controlling the thickness of a thin crystal film
08/08/1989US4854264 Vacuum evaporating apparatus
08/03/1989DE3802236A1 Mixture of material for producing a metal chalcogenide and use of such a mixture
08/01/1989US4853076 Heat treatment while crystallizing to produce tensile stress which produces electron mobility
07/1989
07/26/1989EP0325275A2 A visible light semiconductor laser with (AlxGa1-x)0.5In0.5P crystal layers and a process for growing an (AlxGa1-x)0.5In0.5P crystal
07/26/1989EP0202329B1 Chemical beam deposition method
07/18/1989US4849146 Vapor phase reaction boron halide and ammonia; uniform structure
07/18/1989US4849080 Method of manufacturing an optical stripline waveguide for non-reciprocal optical components
07/13/1989WO1989006354A1 Differential ellipsometer
07/11/1989US4847216 Process for the deposition by epitaxy of a doped material
07/04/1989US4844785 Bombarding carbon coating with accelerated particles of inert gas
06/1989
06/28/1989EP0321909A2 Process and apparatus for atomic-layer epitaxy
06/28/1989EP0321557A1 Process for the deposition of diamond films
06/07/1989CN1004455B Method of growth of thin film layer for use in a composite semiconductor
06/06/1989CA1255192A1 Method of manufacturing a semiconductor device
05/1989
05/23/1989US4833101 Molecular beam epitaxy
05/16/1989US4831628 Transistors; waveguides
05/10/1989CN1032884A Method of growth of thin film layer for use in composite semiconductor
05/09/1989US4829022 Method for forming thin films of compound semiconductors by flow rate modulation epitaxy
05/09/1989US4829020 Molecular beam epitaxy, tungsten carbide
05/05/1989WO1989004055A1 Sublimation growth of silicon carbide single crystals
04/1989
04/18/1989US4822466 Chemically bonded diamond films and method for producing same
04/04/1989US4818636 Films of catenated phosphorus materials, their preparation and use, and semiconductor and other devices employing them
03/1989
03/22/1989EP0307995A2 Process and device for gas delivery to an epitaxy apparatus
03/21/1989US4813373 Cell for epitaxy by molecular beams and associated process
03/15/1989EP0307096A2 Growth rate monitor for molecular beam epitaxy
03/14/1989US4812650 Growth rate monitor for molecular beam epitaxy
03/14/1989US4812352 Article having surface layer of uniformly oriented, crystalline, organic microstructures
03/07/1989US4810473 Molecular beam epitaxy apparatus
03/01/1989EP0305292A2 A process for preparing a thin film of superconducting compound oxide
02/1989
02/21/1989US4806502 Method for doping semi-conductor material during epitaxial growth
02/21/1989CA1250209A1 Method of producing ii-v compound semiconductors
02/14/1989US4804583 Alternating thin films of hard and tough materials; superlattices
02/08/1989EP0302354A2 Method for preparing a laminated structure from an oxide-ceramic supraconducting material
01/1989
01/24/1989US4800100 Thin films
12/1988
12/29/1988WO1988010321A1 Process for the deposition of diamond films
12/07/1988EP0294285A1 Superconducting thin film
12/07/1988EP0294224A2 Bakeable vacuum systems
12/07/1988EP0293836A1 Method for preparing thin film of superconductor
12/01/1988DE3808463A1 Single crystals of mercury(I) halides, and methods and appliances for preparing them
12/01/1988DE3715717A1 Gas supply system for a molecular beam epitaxy installation
12/01/1988DE3715644A1 Molecular beam epitaxy installation
11/1988
11/30/1988EP0293232A1 Method for growing a metal layer over a substrate
11/30/1988EP0292533A1 Method of manufacturing multilayered structures by ion beam sputtering
11/22/1988US4786616 Method for heteroepitaxial growth using multiple MBE chambers
11/02/1988EP0289114A2 Process for producing crystals on a light-transmissive substrate
10/1988
10/20/1988DE3712205A1 Process for producing layers having very hard diamond-like and/or low-friction properties
10/18/1988US4778580 Lattice disorder formation by cathode sputtering in inert gas plasma
10/12/1988EP0286472A1 Device for vacuum evaporation of materials
10/12/1988EP0286274A1 Reagent source for molecular beam epitaxy
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