Patents for C25D 7 - Electroplating characterised by the article coated (12,170)
07/2003
07/10/2003US20030129442 Surface treated tin-plated steel sheet and chemical treatment solution
07/10/2003US20030129440 Method of metal layer formation and metal foil-based layered product
07/10/2003US20030127337 Apparatus and methods for electrochemical processing of microelectronic workpieces
07/10/2003US20030127336 Methods of and apparatus for making high aspect ratio microelectromechanical structures
07/10/2003US20030127320 Apparatus for electrochemically depositing a material onto a workpiece surface
07/09/2003EP1325176A1 Method for electroplating a strip of foam
07/09/2003CN1429284A Elastic contact element
07/09/2003CN1113984C Device for carrying out continuous electrolyting precipitation process
07/09/2003CN1113980C High fatigue ductility electrodeposited copper foil
07/08/2003US6589593 Method for metal coating of substrates
07/08/2003US6589413 Method of making a copper on INVAR® composite
07/08/2003US6589412 Forming sulfide based solid lubricating layer
07/08/2003US6589401 Apparatus for electroplating copper onto semiconductor wafer
07/08/2003US6589400 Apparatus for metal coating of bands by electroplating
07/08/2003US6589399 Electrolysis apparatus having liquid squeezer out of contact with strip
07/08/2003US6588408 Cylinder liner for diesel engines with EGR and method of manufacture
07/03/2003WO2003053621A2 Wire for high-speed electrical discharge machining
07/03/2003US20030124840 Material deposition from a liquefied gas solution
07/03/2003US20030124263 ULSI wiring and method of manufacturing the same
07/03/2003US20030124255 Layers are separately formed via a diffusion prevention layer with an insulating interlayer portion made of SiO2.
07/03/2003US20030121797 Electro-chemical plating with reduced thickness and integration with chemical mechanical polisher into a single platform
07/03/2003US20030121792 Electrolytic cell; vibration, agitation
07/03/2003US20030121791 Methods of and apparatus for making high aspect ratio microelectromechanical structures
07/03/2003US20030121774 Workpiece surface influencing device designs for electrochemical mechanical processing and method of using the same
07/02/2003EP1324384A2 Via filling method
07/02/2003EP1323850A1 Electroplating method of printed circuit with pulsed current density
07/02/2003EP1323848A1 Nickel electroplating solution
07/02/2003EP1323186A2 Plating system with remote secondary anode for semiconductor manufacturing
07/02/2003EP1015669A4 Article, method, and apparatus for electrochemical fabrication
07/02/2003CN1427668A Guide hole filling method
07/02/2003CN1427094A Electroplating method
07/02/2003CN1113111C Copper foil for printed wiring board, its producing method and electrolytic device
07/01/2003US6585877 Acid resistance; waterproof
07/01/2003US6585876 Electrolyte cell configured to receive a substrate to have a metal film deposited thereon; a porous, rigid diffuser positioned between where the substrate is to be and the anode; uniform coating; pressure removes bubbles
07/01/2003US6585875 Process and apparatus for cleaning and/or coating metal surfaces using electro-plasma technology
07/01/2003US6585865 Apparatus and method for selective electrolytic metallization/deposition utilizing a fluid head
06/2003
06/26/2003US20030119311 Planar metal electroprocessing
06/26/2003US20030118862 Sliding member with composite plating film
06/26/2003US20030118751 Electronic device, and method of patterning a first layer
06/26/2003US20030116442 Method for applying a metal layer to a light metal surface
06/26/2003US20030116441 Overcoating; prevention impedance, vibration; efficiency
06/26/2003US20030116440 Rinsing substrate in holder; retractable shutter
06/26/2003US20030116439 Electroless deposition of barrier material; forming aperture pattern by photolithography
06/26/2003US20030116429 Apparatus for continuous processing of semiconductor wafers
06/25/2003CN1426495A Electro-plating apparatus and method
06/25/2003CN1426333A Mold wall, especially broadside wall of continuous casting mould for steel
06/24/2003US6583510 Semiconductor device with varying thickness gold electrode
06/24/2003US6582580 Substrate plating apparatus
06/24/2003US6582578 Method and associated apparatus for tilting a substrate upon entry for metal deposition
06/19/2003WO2003050328A1 Plating apparatus, plating method, and method for manufacturing semiconductor device
06/19/2003WO2003023848A3 Apparatus and method of surface treatment for electrolytic and electroless plating of metals in integrated circuit manufacturing
06/19/2003WO2002033153A3 Copper bath and method of depositing a matt copper coating
06/19/2003US20030113996 Semiconductor production device and production method for semiconductor device
06/19/2003US20030113574 Process for manufacturing a conductive wire suitable for use in semiconductor packages
06/19/2003US20030111354 10-40 wt % of copper hexafluorosilicate and is used as an electrolyte
06/19/2003US20030111346 Micro structured electrode and method for monitoring wafer electroplating baths
06/19/2003US20030111339 Plating system
06/19/2003CA2467037A1 Manufacturing method for semiconductor device
06/18/2003EP1319093A2 Ternary tin zinc alloy, electroplating solutions and galvanic method for producing ternary tin zinc alloy coatings
06/18/2003CN1425196A Conductive interconnections
06/18/2003CN1425080A Electro-plating apparatus and method of electro-plating
06/18/2003CA2365573A1 Method of manufacturing part for optical fiber connector
06/17/2003US6579437 Acid resistance
06/17/2003US6579430 Semiconductor wafer plating cathode assembly
06/12/2003WO2003048864A1 Mask forming method and removing method, and semi-conductor device, electric circuit, display module, color filter and light emitting element produced by the techniques
06/12/2003WO2003048429A1 Copper electroplating method, pure copper anode for copper electroplating, and semiconductor wafer plated thereby with little particle adhesion
06/12/2003WO2003048427A2 Pretreatment process for coating of aluminium materials
06/12/2003WO2003048423A1 Contact assemblies for electrochemical processing of microelectronic workpieces and method of making thereof
06/12/2003WO2002016059B1 Narrow diameter needle having reduced inner diameter tip
06/12/2003WO2001090446A3 Method and apparatus to overcome anomalies in copper seed layers and to tune for feature size and aspect ratio
06/12/2003US20030106800 Rigidified mesh structure and process for obtaining same
06/11/2003EP1318371A2 Heat exchange surface with galvanized microstructures with protrusions
06/11/2003EP1318216A2 Electrolysis apparatus
06/11/2003CN1423830A A vertically configured chamber used for multiple processes
06/11/2003CN1422985A Electrolyzing apparatus
06/11/2003CN1422981A Method for producing copper-resin composite material
06/10/2003US6576113 Method of electroplating of high aspect ratio metal structures into semiconductors
06/10/2003US6576110 Use with metal film plating; having a planar electric field generating portion coated with an inert material such as tantalum that is impervious to electrolyte solution and an electrolyte solution chemical reaction portion
06/10/2003US6575635 Multi-layer sliding bearing
06/10/2003US6575354 Method for producing tin-silver alloy plating film, the tin-silver alloy plating film and lead frame for electronic parts having the film
06/05/2003WO2002059882A3 Method for seed layer removal for magnetic heads
06/05/2003US20030105533 Electrolysis apparatus
06/05/2003US20030102210 Electroplating apparatus with segmented anode array
06/05/2003US20030102104 Mold wall, especially a broad side wall of a continuous casting mold for steel
06/04/2003EP1259661A4 Pad designs and structures for a versatile materials processing apparatus
06/04/2003CN1421905A Method of and apparatus for producing semiconductor device
06/04/2003CN1421892A Method for producing grille of non-electrode illuminating system
06/03/2003US6573183 Method and apparatus for controlling contamination during the electroplating deposition of metals onto a semiconductor wafer surface
06/03/2003US6572982 Electromigration-resistant copper microstructure
06/03/2003US6572755 Pressing workpiece against polishing surface while causing relative motion between workpiece and polishing surface, supplying an electrolyte solution to polishing surface, applying a voltage between both surfaces
06/03/2003US6572742 Apparatus for electrochemical fabrication using a conformable mask
06/03/2003US6572517 Current roller for an electrolytic strip coating plant
06/03/2003US6571657 Multiple blade robot adjustment apparatus and associated method
05/2003
05/30/2003WO2003044248A1 Device for electrolytic treatment and hardening of the surface of the heat exchange tubes of steam generators of nuclear power plants
05/30/2003WO2003044247A1 Elemental silicon nanoparticle plating and method for the same
05/30/2003WO2003044246A1 Anodes for electroplating operations, and methods of forming materials over semiconductor substrates
05/30/2003WO2003009343A3 Plating apparatus
05/29/2003US20030098241 Process and apparatus for manufacturing a semiconductor device
05/29/2003US20030098101 Forming a mesh screen, a first metal plating, vacuum heat treating, a second metal plating and a photocatalytic coating
05/28/2003EP1313895A1 Method for metal coating the surface of high temperature superconductors
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